Abstract: Methods of determining the divergence angle between a primary image and a secondary image generated by a glazing are disclosed. In a first method, a glazing is illuminated with a light source and a primary and a secondary image of the light source, generated by the glazing, are captured using an image capture device. The distance between the primary and the secondary image is determined, and the divergence angle determined from this distance. In a second method, the primary and secondary images are viewed on a target marked with a scale indicating the divergence angle. The divergence angle is read from the scale and the positions the primary and secondary image. In this second method, the light source is located at the center of the target. In both methods, the light source comprises at least one light emitting diode. Preferably, the method is used to examine the edge region of a glazing.

Abstract: The present invention includes methods for ratiometric detection of analytes by surface plasmon coupled emission detection that includes disposing a target on the metal layer of a surface plasmon resonance detection system; coupling a first analyte to a first fluorescent dye and a second analyte to a second fluorescent dye; contacting the first and second analytes to the target on the surface plasmon resonance detection system; and measuring the intensity of a first and a second surface plasmon resonance enhanced fluorescence emission ring, wherein the first and second rings, respectively, quantitatively represents the amount of first and second analyte within 50 nanometers of the metal surface.

Abstract: The preferred embodiments of the invention is an optical system for a flow cytometer including a flow channel with an interrogation zone, and an illumination source that impinges the flow channel in the interrogation zone from a particular direction. The optical system preferably includes a lens system and a detection system. The lens system preferably includes multiple lens surfaces arranged around the flow channel and adapted to collect and collimate light from the interrogation zone. The detection system preferably includes multiple detectors adapted to detect light from the lens system. Each detector preferably includes a local filter that independently filters for specific wavelengths. Thus, the user may easily swap the filters in any order to achieve the same detection parameters.

Abstract: A pattern measurement method includes: acquiring sectional shapes of a first pattern corresponding to process parameters, respectively; using the acquired sectional shapes to calculate predicted spectral waveforms which would be obtained when light is applied to the first pattern, and adding information on the corresponding process parameters to the calculated predicted spectral waveforms, respectively, to form a waveform library; setting a process parameter to obtain a desired shape, and acquiring an actual spectral waveform of a second pattern actually created from the first pattern using the set process parameter; performing waveform matching between the actual spectral waveform and the predicted spectral waveforms to acquire matching scores for respective waveform matching, and calculating an optimum process parameter providing the maximum matching score; generating an optimum pattern sectional shape corresponding to the optimum process parameter to measure the optimum pattern sectional shape.

Abstract: A photoacoustic apparatus obtains information on a specimen by receiving photoacoustic waves which are generated from the specimen resulting from light irradiated to the specimen. The apparatus includes a light source for irradiating light to the specimen, an acoustic wave receiver for receiving the photoacoustic waves, and a light reflection member for causing the light, which is radiated out of the specimen by optical diffusion thereof after having entered an interior of the specimen from the light source, to reenter the interior of the specimen, wherein the light reflection member allows elastic waves to pass therethrough. As a result, a photoacoustic apparatus and a probe are provided which can confine scattered light from the specimen into the specimen, and which can reliably prevent photoacoustic waves from being generated from a receiving element region of the probe by the scattered light.

Abstract: A method for scanning a surface with a number of different illumination configurations, the method comprises capturing a plurality of images in a sequential manner during a single sweep, each image including one or more lines of pixels, sequentially altering an illumination configuration used to capture the plurality of images according to a predefined sequence of illumination configurations and shifts of the relative position of the imaging unit for capturing each of the plurality of images, and repeating the sequence of illumination configurations settings and associated image capture positions until a desired area of the surface is scanned, wherein said predefined shift is between 10 pixels and less then one pixel.

Abstract: A method for locating and eliminating defects on a substrate wafer includes illuminating a top surface of the substrate wafer with a first illumination source, illuminating a bottom surface of the substrate wafer with a second illumination source, forming an image of a portion of the top surface of the substrate wafer while the substrate wafer is illuminated by the first and second illumination sources, adjusting a contrast of the image to accentuate defects on the top surface of the substrate wafer, locating defects in the image, and ablating the defects on the top surface with a laser.

Abstract: A method for making a sample for evaluation of laser irradiation position and evaluating the sample, and an apparatus which is switchable between a first mode of modification of semiconductor and a second mode of making and evaluating the sample. Specifically, a sample is made by irradiating a semiconductor substrate for evaluation with a pulse laser beam while the semiconductor substrate is moved for evaluation at an evaluation speed higher than a modifying treatment speed, each relative positional information between pulse-irradiated regions in the sample is extracted, and stability of the each relative positional information between pulse-irradiated regions is evaluated. The evaluation speed is such a speed that separates the pulse-irradiated regions on the sample from each other in a moving direction.

Abstract: An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.

Abstract: A pattern evaluation method includes: acquiring data of a design pattern for an evaluation pattern to detect a first edge of the design pattern; acquiring an image of the evaluation pattern to detect a second edge of the evaluation pattern; dividing the first edge into first linear parts and first corner parts; performing matching of the first and second edges to obtain correspondence between the first and second edges; dividing the second edge into second linear parts and second corner parts based on the correspondence between the first and second edges; and evaluating the evaluation pattern based on at least one of the second linear parts and the second corner parts.

Abstract: An apparatus and method for estimating ore quality using color correlations is disclosed. The apparatus and method quantify ash or grade concentration in process streams arid/or samples in real time, allowing for the optimization of ore processing operations, The apparatus and method employ a light beam at a given wavelength, which allows for the measurement of ash content or grade.

Abstract: Apparatus for performing Raman analysis may include a laser source module, a beam delivery and signal collection module, a spectrum analysis module, and a digital signal processing module. The laser source module delivers a laser beam to the beam delivery and signal collection module. The beam delivery and signal collection module delivers the laser source beam to a sample, collects Raman scattered light scattered from the sample, and delivers the collected Raman scattered light to the spectrum analysis module. The spectrum analysis module demultiplexes the Raman scattered light into discrete Raman bands of interest, detects the presence of signal energy in each of the Raman bands, and produces a digital signal that is representative of the signal energy present in each of the Raman bands. The digital signal processing module is adapted to perform a Raman analysis of the sample.

Abstract: An additive {hacek over (S)}olc filter (ASF) includes i) a first polarizer for receiving an input light, such as from a monochromatic light source, and transmitting a first polarized output, ii) at least one birefringent plate positioned to receive the first polarizer output and transmit an output with wavelength-dependent polarization state, and iii) a second polarizer for receiving the plate output and transmitting a second polarized, filtered output. An ASF spectroscopy system includes the ASF; a monochromatic light source input, e.g. a laser; a sample chamber for exposing a sample to the second polarized, tuned output and generating a signal characteristic of the sample that is filtered by the ASF; and a detector for acquiring the characteristic signal.

Abstract: An object is to provide a substrate conveyance apparatus and a substrate detection device capable of improving flexibility in arrangement layout. The substrate detection device includes a projector 41 for projecting inspection light 40 so as to pass through a predetermined position on a path of a substrate 4 conveyed by conveyance belts 26, a light receiver 42 for receiving the inspection light 40 projected by the projector 41, and a detector (a control device 15) for detecting that the substrate 4 reaches the predetermined position based on a decrease in the amount of received light of the inspection light 40 received by the light receiver 42 when the substrate 4 conveyed by the conveyance belts 26 reaches the predetermined position and a portion of the inspection light 40 is blocked by the substrate 4.

Abstract: A device for handling a substantially circular wafer is provided. The device includes an interior accessible through a plurality of entrances, and a plurality of sensors consisting of two sensors for each one of the plurality of entrances, each sensor capable of detecting a presence of the substantially circular wafer, at a predetermined location within the interior, wherein the plurality of sensors are arranged so that at least two of the plurality of sensors detect the wafer for any position of the wafer entirely within the interior, wherein a first one of the two sensors is positioned to detect the wafer when the wafer has passed entirely into the interior through one of the plurality of entrances, and a second one of the two sensors is positioned immediately outside a diameter of the wafer when the wafer has passed entirely into the interior through one of the plurality of entrances.

Abstract: An apparatus for measuring a thickness of a printed product conveyed in a conveying direction at a conveying speed. The apparatus includes a conveying device having a guide arrangement along which the printed product is conveyed at the conveying speed in the conveying direction, the guide arrangement including a measuring region that extends in the conveying direction of the guide arrangement. The apparatus further includes a measuring element operative to act on printed sheets of the printed product to measure the thickness of the printed product while the printed product is conveyed across the measuring region and through a measuring gap located between the measuring element and the guide arrangement. The measuring element is arranged to move toward the guide arrangement with a process timing and to move synchronously with the printed product at the conveying speed across the measuring region of the guide arrangement. The apparatus additionally includes an evaluation unit connected to the measuring element.

Abstract: A method and device for facilitating measurement of thermo-optically induced material phase change response in a thin planar or a grating film stack is disclosed. The method may include using small-spot visible and ultraviolet spectra (ellipsometric or reflectance) for measuring a material phase change response. The device may include a measurement system platform, at least one electrical resistor, at least one external electric probe, and ohmic contact circuitry.

Abstract: Disclosed herein is a method of inspecting defects in a circuit pattern of a substrate. At least one laser beam radiation unit for radiating a laser beam onto an inspection target circuit pattern of a substrate in a non-contact manner is prepared. A probe beam radiation unit for radiating a probe beam onto a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner is prepared. The laser beam is radiated onto the inspection target circuit pattern using the laser beam radiation unit. The probe beam is radiated onto the connection circuit pattern using the probe beam radiation unit, thus measuring information about whether the probe beam is diffracted, and a diffraction angle. Accordingly, the method can solve problems such as erroneous measurements caused by contact pressure and can reduce the time required for measurements.

Abstract: A Computer Tomography (CT) C-arm system and method for examination of an object is provided.

Abstract: The present invention relates to a Raman spectroscopy system that includes a detection center. The detection center includes at least one light source for outputting exciting light which excites a detected object to generate Raman scattered light, and an analysis device for obtaining the Raman spectroscopy of the detected object. The Raman spectroscopy system further includes at least one detection terminal, each of which includes at least one Raman probe that each introduces the exciting light to the detected object, collects the Raman scattered light generated by the detected object, and returns said Raman scattered light to the detection center. The present invention also relates to a method for detecting Raman spectroscopy.