Patents Examined by Joel G Horning
  • Patent number: 11472747
    Abstract: A method of infiltrating a fiber preform comprises positioning an assembly in a process chamber, where the assembly includes a tool comprising through-holes, a fiber preform constrained within the tool, and a sacrificial preform disposed between the fiber preform and the tool. The sacrificial preform is gas permeable. The process chamber is heated, and gaseous reactants are delivered into the process chamber during the heating. The gaseous reactants penetrate the through-holes of the tool and infiltrate the sacrificial preform and the fiber preform. Deposition of reaction products occurs on exposed surfaces of the fiber preform and the sacrificial preform, and a coating is formed thereon. In addition, the sacrificial preform accumulates excess coating material formed from increased reactions at short diffusion depths. Accordingly, the coating formed on the fiber preform exhibits a thickness variation of about 10% or less throughout a volume of the fiber preform.
    Type: Grant
    Filed: October 8, 2019
    Date of Patent: October 18, 2022
    Assignee: ROLLS-ROYCE HIGH TEMPERATURE COMPOSITES INC.
    Inventor: Andrew J. Ritchey
  • Patent number: 11465943
    Abstract: A component includes a substrate at least a portion of which adjacent to a surface of the substrate is made of a material including silicon; a bond coat located on the surface of the substrate and including silicon, an environmental barrier which includes an outer layer of ceramic material covering the bond coat, wherein the environmental barrier further includes a self-healing inner layer located between the bond coat and the outer layer, the inner layer including a matrix in which silico-forming particles are dispersed, these particles being capable of generating a matrix crack healing phase in the presence of oxygen.
    Type: Grant
    Filed: October 3, 2018
    Date of Patent: October 11, 2022
    Assignee: SAFRAN
    Inventors: Luc Bianchi, Hugues Denis Joubert, Philippe Picot, Amar Saboundji
  • Patent number: 11421317
    Abstract: A system and method for depositing a coating may comprise a coating chemical reactor, surface activation component, and a deposition component. A target surface may be prepared for deposition with the surface activation component. The coating chemical reactor may comprise a coating chemical dispenser and a coating chemical verifier that prepares the coating chemical for deposition. The coating chemical verifier may utilize an optical excitation source and at least one optical detector, wherein chemical substances are identified by unique signatures composed of binary code. The coating chemical may be received by the deposition component to depositing the coating chemical on the target surface.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: August 23, 2022
    Assignee: University of Houston System
    Inventors: Seamus Curran, Nigel Alley, Kang-Shyang Liao, Amrita Haldar
  • Patent number: 11396044
    Abstract: The present invention relates to granular composite density enhancement, and related methods and compositions. The application where the properties are valuable include but are not limited to: 1) additive manufacturing (“3D printing”) involving metallic, ceramic, cermet, polymer, plastic, or other dry or solvent-suspended powders or gels, 2) concrete materials, 3) solid propellant materials, 4) cermet materials, 5) granular armors, 6) glass-metal and glass-plastic mixtures, and 7) ceramics comprising (or manufactured using) granular composites.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: July 26, 2022
    Assignees: The Trustees of Princeton University, Heavy Metal LLC
    Inventors: Adam Bayne Hopkins, Salvatore Torquato
  • Patent number: 11394017
    Abstract: A solventless system for fabricating electrodes includes a mechanism for feeding a substrate through the system, a first application region comprised of a first device for applying a first layer to the substrate, wherein the first layer is comprised of an active material mixture and a binder, and the binder includes at least one of a thermoplastic material and a thermoset material, and the system includes a first heater positioned to heat the first layer.
    Type: Grant
    Filed: May 17, 2021
    Date of Patent: July 19, 2022
    Assignee: Eskra Technical Products, Inc.
    Inventors: Michael David Eskra, Paula Margaret Ralston, Rodney Mortensen LaFollette, James Bernard Nowakowski
  • Patent number: 11394085
    Abstract: A system and method for providing a ceramic-based separator onto an electrode is disclosed. A separator is formed on the electrode via a dry, solvent-free application of a ceramic-based separator to the electrode. An electrode is provided to an application area via a feed mechanism and a separator layer is then applied to the electrode that is comprised of a binder including at least one of a thermoplastic material and a thermoset material and an electrically non-conductive separator material, with the separator layer being applied to the electrode via a dry dispersion application.
    Type: Grant
    Filed: June 28, 2021
    Date of Patent: July 19, 2022
    Assignee: Eskra Technical Products, Inc.
    Inventors: Michael David Eskra, Paula Margaret Ralston
  • Patent number: 11382216
    Abstract: A method for selectively metallizing a surface of a ceramic substrate, a ceramic product and use of the ceramic product are provided.
    Type: Grant
    Filed: February 12, 2019
    Date of Patent: July 5, 2022
    Assignee: BYD COMPANY LIMITED
    Inventors: Qing Gong, Xinping Lin, Yongpeng Ren, Baoxiang Zhang
  • Patent number: 11370065
    Abstract: A laser etching apparatus includes a chamber, a laser port, a laser emitter, a particle grabber, and a revolving window module. The chamber is configured to receive a substrate. The laser port is disposed below the chamber in a downward direction. The laser emitter is configured to emit a laser to the substrate disposed within the chamber through the laser port. The particle grabber is disposed within the chamber and includes a body disposed over the laser port. An opening is formed through the body. The opening is configured to pass the laser therethrough. The revolving window module includes a revolving window and a driving part configured to drive the revolving window. The revolving window is disposed between the particle grabber and the laser port.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: June 28, 2022
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventor: Dong-Hoon Lee
  • Patent number: 11371143
    Abstract: Provided is a pore-filling method for protecting the pores of a porous material. The method, which is performed using a modified i-CVD technique, involves filling the pores of a porous material with a gas phase monomer within a pressure chamber and subsequently polymerizing the monomer, both within the pores and on the surface of the material as an overburden. The method is solvent-free and can fill and protect pores of any size of any material.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: June 28, 2022
    Assignees: International Business Machines Corporation, Tokyo Electron Limited
    Inventors: Krystelle Lionti, Geraud Jean-Michel Dubois, Willi Volksen, Jacques Faguet
  • Patent number: 11370669
    Abstract: Amorphous silicon doped yttrium oxide films and methods of making same are described. Deposition of the amorphous silicon doped yttrium oxide film by thermal chemical vapor deposition or atomic layer deposition process are described.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: June 28, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Tatsuya E. Sato, Li-Qun Xia, Sean M. Seutter
  • Patent number: 11358237
    Abstract: Systems for processing a material by submerging the material in a fluid and directing laser pulses at the fluid and the material for processing the material. An embodiment removes the surface of concrete, brick, or rock or minerals in a relatively gentle, energy-efficient, and controlled manner that also confines the material that is removed.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: June 14, 2022
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Raymond P. Mariella, Jr., Alexander M. Rubenchik, Mary A. Norton
  • Patent number: 11332411
    Abstract: A method for producing a consolidated fiber preform intended for the manufacture of a part made of composite material, includes shaping a fiber texture in a heated metal mold, the texture being pre-impregnated with a transient or fugitive material, or shaping a fiber texture in a metal mold and injecting a transient or fugitive material into the fiber texture held in shape in the metal mold, cooling the mold, removing the set fiber preform from the mold, coating the fiber preform with a slurry containing a powder of ceramic or carbon particles, heat-treating the coated fiber preform so as to form a porous shell around the fiber preform by consolidation of the slurry and so as to remove the transient or fugitive material present in the fiber preform, consolidating the fiber preform by gas-phase chemical infiltration.
    Type: Grant
    Filed: March 5, 2018
    Date of Patent: May 17, 2022
    Assignees: SAFRAN, SAFRAN CERAMICS
    Inventors: Thierry Guy Xavier Tesson, Maxime François Roger Carlin, Simon Thibaud, Rémy Dupont, Ramzi Bohli
  • Patent number: 11326253
    Abstract: A multi-component coating composition for a surface of a semiconductor process chamber component comprising at least one first film layer of a yttrium oxide or a yttrium fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process and at least one second film layer of an additional oxide or an additional fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process, wherein the multi-component coating composition is selected from the group consisting of YOxFy, YAlxOy, YZrxOy and YZrxAlyOz.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: May 10, 2022
    Assignee: Applied Materials, Inc.
    Inventors: David Fenwick, Jennifer Y. Sun
  • Patent number: 11326249
    Abstract: In various embodiments, evaporation sources for deposition processes have disposed therearound an insulation material configurable to fit snugly around the source body of the evaporation source and to be at least partially distanced away from the source body to expedite heat transfer therefrom.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: May 10, 2022
    Assignee: First Solar, Inc.
    Inventors: Markus Eberhard Beck, Ulrich Alexander Bonne
  • Patent number: 11328901
    Abstract: A deposition method performed by a deposition apparatus is provided. The deposition apparatus includes an antenna that forms an inductive magnetic field in a plasma processing region; and a rotary table that revolves a substrate around a rotational center of the rotary table. The method includes: supplying an ignition gas containing a noble gas and an additive gas to the plasma processing region; setting electric power supplied to the antenna to a first predetermined value to form a plasma of the ignition gas; increasing the electric power to a second predetermined value; stopping the supply of the additive gas; switching a gas supplied to the plasma processing region from the ignition gas to a gas for forming the film; and lifting an end of the antenna on a side closer to the rotational center while maintaining a height of another end of the antenna.
    Type: Grant
    Filed: March 23, 2020
    Date of Patent: May 10, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Shigehiro Miura, Masato Yonezawa, Takehiro Fukada, Yoshitaka Enoki, Yuji Sawada
  • Patent number: 11293093
    Abstract: Processing methods comprising exposing a substrate to a first reactive gas comprising an ethylcyclopentadienyl ruthenium complex or a cyclohexadienyl ruthenium complex and a second reactive gas comprising water to form a ruthenium film are described.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: April 5, 2022
    Assignee: Applied Materials Inc.
    Inventors: Feng Q. Liu, Feng Chen, Jeffrey W. Anthis, David Thompson, Mei Chang
  • Patent number: 11293100
    Abstract: A device for synthesising core-shell nanoparticles by laser pyrolysis is provided. The device includes a reactor having a first chamber for synthesising the core, which is provided with an inlet for a core precursor; a second chamber for synthesising the shell, which is provided with an inlet for a shell precursor; and at least one communication channel between the two chambers for transmitting the core of the nanoparticles to be formed in the first chamber towards the second chamber. The device also includes an optical device for illuminating each of the two chambers, and at least one laser capable of emitting a laser beam intended to interact with the precursors in order to form the core and the shell.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: April 5, 2022
    Assignee: Commissariat A L'Energie Atomique Et Aux Energies Alternatives
    Inventors: Yann Leconte, Olivier Sublemontier, Nathalie Herlin-Boime, Cécile Reynaud, Dominique Porterat, Axelle Quinsac
  • Patent number: 11293094
    Abstract: A method of manufacturing polycrystalline silicon rod, wherein a reactor for manufacturing a polycrystalline silicon rod includes gas supply nozzles, and at least one nozzle is a flow rate amplification nozzle having a function that the amount of a silicon deposition raw material gas supplied to the nozzle can be increased.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: April 5, 2022
    Assignee: Tokuyama Corporation
    Inventors: Takafumi Tatsukawa, Yasumasa Aimoto
  • Patent number: 11286566
    Abstract: A III-V semiconductor layer is deposited using an apparatus comprising a process chamber, a susceptor for receiving one or more substrates to be coated, and a gas inlet element which comprises a plurality of process gas inlet zones. An etching gas inlet in the flow direction of the hydride and the MO compound opens into the process chamber downstream of the process gas inlet zones. A control device is adapted and the process gas inlet zones and the etching gas inlet are arranged such that the process gases cannot enter into the etching gas inlet during deposition of the semiconductor layer and the etching gas cannot enter into the process gas inlet zones during purification of the process chamber. The etching gas inlet is formed by an annular zone of the process chamber cover around the gas inlet element and by an annular fastening element for fastening a cover plate.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: March 29, 2022
    Assignee: AIXTRON SE
    Inventors: Francisco Ruda Y Witt, Markus Deufel, Marcel Kollberg
  • Patent number: 11285712
    Abstract: An analog method of making a patterned flexographic printing plate, the method comprising impressing a flexible patterned substrate into an uncured soft photopolymer plate to form the patterned flexographic printing plate.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: March 29, 2022
    Assignee: The Procter & Gamble Company
    Inventors: Edward Daniel Theiss, III, Scott David Hochberg