Abstract: Treatment chamber (C) for a chemical vapor deposition (CVD) reactor, comprising, within a body (B) defining an enclosure (E) under partial vacuum, a system (3) for injecting reactive species with a view to being deposited on a substrate (8) placed on a support element (5), and a thermal control system (2) for regulating the temperature of the injection system (3) or keeping it substantially constant, this thermal control system (2) having an interface zone (ZI) with the injection system (3). The treatment chamber (C) further comprises, in the interface zone (ZI), at least one thermal transfer zone (ZT) that is (i) insulated from the enclosure under partial vacuum (E) by an insulating barrier to the pressure and to the diffusion of contaminating species and (ii) filled with a thermal interface material (10). Application for carrying out CVD depositions, especially pulsed CVD depositions.

Abstract: A flexible method to provide a variety of value-added coatings to a piece of jewelry or a group of jewelries is disclosed. Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) technique is implemented to deposit a layer of conformal coating on intended jewelry surfaces, including both exterior and interior surfaces, to enhance a vast majority of process-driven or end of use driven properties. The coating compositions include dielectrics material, metals, organic materials or organic-inorganic hybrid materials. The method steps of forming a layer of coating are straightforward and can be tailed to different purposes.

Abstract: The invention provides a thin film deposition system and a method, and relates to the field of thin film deposition. The deposition method comprises the following steps: 1) heating metal substrate; carrying out deposition. The method is characterized in the step 1) that a current is conducted into the metal substrate at one end of the growth zone by one electrode, and out of the metal substrate at the other end of the growth zone by the other electrode, so that the metal substrate is heated by the heat emitting of the resistant of the metal substrate itself. According to the method, the quality of the prepared thin film is improved, while the preparation cost of the thin film is reduced. In addition, the consistent double-sided thin films can be easily prepared on two surfaces of the metal substrate by employing the system and method.

Abstract: Methods of forming porous nano-scale or micro-scale structured materials and structured materials formed thereby. Such methods entail providing a donor material and reacting the donor material to form a compound that deposits on a surface of a substrate to produce nano-scale or micro-scale geometric features of the structured material. In particular embodiments, the donor material is in a solution and the reacting step is performed by contacting the surface of the substrate with the solution and directing heat through the solution onto the surface to locally heat a portion of the solution in contact therewith.

Abstract: Process for the chemical vapor deposition by DLI-MOCVD on a substrate of a protective coating composed of at least one protective layer comprising a transition metal M: a) having available, in a feed tank, a mother solution containing a hydrocarbon solvent devoid of oxygen atom and a precursor of bis(arene) type containing the transition metal M to be deposited, and, if appropriate, a carbon-incorporation inhibitor; b) vaporizing said mother solution and introducing it into a CVD reactor in order to carry out the deposition of the protective layer on said substrate; c) collecting, at the outlet of the reactor, a fraction of the gaseous effluent comprising the unconsumed precursor, the aromatic byproducts of the precursor and the solvent, these entities together forming a daughter solution, and; d) pouring the daughter solution thus obtained into the feed tank in order to obtain a new mother solution capable of being used in step a).

Abstract: A method to permanently mark an item of plated jewelry involves creating a laminate of two metals, and upper layer typically formed of a more precious metal such as gold, platinum and palladium that do not readily oxidize laminated onto the surface of a less precious metal, such as silver, which is oxidized to create a dark color (e.g. black). A laser is used to create characters and/or designs in the upper layer by vaporizing portions to effectively remove those portions. This exposes the upper surface of the less precious metal that does become oxidized. An oxidizer, such as liquid sulfur, is used to blacken the silver, typically a dark gray. This allows an easy and inexpensive method of archiving information on jewelry bearing or supporting a gem that describes the supported gem rendering the gem more valuable collectible and traceable.

Abstract: A thermal transfer and process for producing it that provides a fully-digital printed heat transfer capable of little to no process changeover between different graphics. Specifically, the method comprises printing a digital image onto a treated adhesive substrate, applying the image side to a carrier substrate, then digitally cutting and removing substrate not containing graphic elements through a combination of kiss-and-through cutting to produce a high stretch, multi-color photographic quality print transfers for the apparel and soft goods industry.

Abstract: A process for the large scale manufacturing of vertically standing hybrid nanometer-scale structures of different geometries, including fractal architecture made of flexible materials, on a flexible substrate including textiles is disclosed. The nanometer-scale structures increase the surface area of the substrate. The nanometer-scale structures may be coated with materials that are sensitive to various physical parameters or chemicals such as but not limited to temperature, humidity, pressure, atmospheric pressure, electromagnetic signals originating from biological or non-biological sources, volatile gases, and pH. The increased surface area achieved through the disclosed process is intended to improve the sensitivity of the sensors formed by coating of the nanometer-scale structure and substrate with a material which can be used to sense physical parameters and chemicals as listed previously.

Abstract: The invention provides a vapor deposition apparatus, comprising: a heating source, a crucible lid, a first crucible, a second crucible, a moving part, and a bracket. The first and second crucibles and moving part are disposed under the crucible lid; the first crucible is fixed on the bracket; and the first crucible and the second crucible each comprises an inner sidewall, an outer sidewall and a bottom. The crucible lid is mounted on the outer sidewall of the first crucible, the second crucible is fixed to top surface of the moving part; projection of the inner sidewall of the first crucible in vertical direction is located outside the outer sidewall of the second crucible. The density of the heating wire in the first region corresponding to the position of the crucible lid and the first crucible is greater than the density of the second region below the first region.

Abstract: A method for depositing a functional material on a substrate is disclosed. An optically transparent plate having a first surface and a second surface with one or more wells is provided. After coating the second surface with a thin layer of light-absorbing material, the wells are filled with a functional material. The plate is then irradiated with a pulsed light to heat the layer of light-absorbing material in order to generate gas at an interface between the layer of light-absorbing material and the functional material to release the functional material from the wells onto a receiving substrate located adjacent to the plate.

Abstract: Methods and apparatus for use of a fill on demand ampoule are disclosed. The fill on demand ampoule may refill an ampoule with precursor concurrent with the performance of other deposition processes. The fill on demand may keep the level of precursor within the ampoule at a relatively constant level. The level may be calculated to result in an optimum head volume. The fill on demand may also keep the precursor at a temperature near that of an optimum precursor temperature. The fill on demand may occur during parts of the deposition process where the agitation of the precursor due to the filling of the ampoule with the precursor minimally effects the substrate deposition. Substrate throughput may be increased through the use of fill on demand.

Abstract: An embodiment of the present disclosure provides a vapor deposition device and a vapor deposition method thereof. The vapor deposition device comprises an adjustable magnet array. The adjustable magnet array comprises m magnet blocks, wherein a magnetization direction of at least one of the magnet blocks is adjustable. The vapor deposition device is used to prepare a film.

Abstract: A laser etching apparatus includes a chamber, a laser port, a laser emitter, a particle grabber, and a revolving window module. The chamber is configured to receive a substrate. The laser port is disposed below the chamber in a downward direction. The laser emitter is configured to emit a laser to the substrate disposed within the chamber through the laser port. The particle grabber is disposed within the chamber and includes a body disposed over the laser port. An opening is formed through the body. The opening is configured to pass the laser therethrough. The revolving window module includes a revolving window and a driving part configured to drive the revolving window. The revolving window is disposed between the particle grabber and the laser port.

Abstract: A system and method for providing a ceramic-based separator onto an electrode is disclosed. A separator is formed on the electrode via a dry, solvent-free application of a ceramic-based separator to the electrode. An electrode is provided to an application area via a feed mechanism and a separator layer is then applied to the electrode that is comprised of a binder including at least one of a thermoplastic material and a thermoset material and an electrically non-conductive separator material, with the separator layer being applied to the electrode via a dry dispersion application.

Abstract: Provided are methods for the deposition of films comprising SiCN. Certain methods involve exposing a substrate surface to a silicon precursor, wherein the silicon precursor is halogenated with Cl, Br or I, and the silicon precursor comprises a halogenated silane, a halogenated carbosilane, an halogenated aminosilane or a halogenated carbo-sillyl amine. Then, the substrate surface can be exposed to a nitrogen-containing plasma or a nitrogen precursor and densification plasma.

Abstract: A solventless system for fabricating electrodes includes a mechanism for feeding a substrate through the system, a first application region comprised of a first device for applying a first layer to the substrate, wherein the first layer is comprised of an active material mixture and a binder, and the binder includes at least one of a thermoplastic material and a thermoset material, and the system includes a first heater positioned to heat the first layer.

Abstract: Provided is a chamber system for solid free form fabrication, the chamber system having a deposition chamber, a service chamber and one or more loading/unloading chambers. The chamber system allows for a more efficient and cost effective process to service the deposition apparatus, load holding substrates, and unload workpieces without requiring having to adjust the atmosphere in the deposition chamber.

Abstract: A composition and method of infiltrating an article of manufacture prepared by a laser sintering process is disclosed. The infiltration process maintains the dimensions and flexibility of the article, increases the strength of the article, and improves the physic& and esthetic properties of the article.

Abstract: A coating system including a reflective cool down chamber with at least one arcuate wall; and an infrared lamp directed at the arcuate wall.

Abstract: A modified deposit-and-etch Bosch process of cyclic anisotropic etching and film deposition by gas switching. The modification of which includes depositing nucleated silicon layers as liquefied droplets of silicon instead of by passivation, and using a bias discharge to decelerate an otherwise ballistic deposition instead into a nuclei-generation cloud at the deposition site. Such is then useful in the refurbishment of gas distribution plates made of silicon.