Abstract: An imaging device capable of image processing is provided. The imaging device can retain analog data (image data) obtained by an image-capturing operation in a pixel and perform a product-sum operation of the analog data and a predetermined weight coefficient in the pixel to convert the data into binary data. When the binary data is taken in a neural network or the like, processing such as image recognition can be performed. Since enormous volumes of image data can be retained in pixels in the state of analog data, processing can be performed efficiently.

Abstract: A semiconductor device assembly that includes a first side of a semiconductor device supported on a substrate to permit the processing of a second side of the semiconductor device. A filler material deposited on the semiconductor device supports the semiconductor device on the substrate. The filler material does not adhere to the semiconductor device or the substrate. Alternatively, the filler material may be deposited on the substrate. Instead of a filler material, the substrate may include a topography configured to support the semiconductor device. Adhesive applied between an outer edge of the first side of the semiconductor and the substrate bonds the outer edge of the semiconductor device to the substrate to form a semiconductor device assembly. A second side of the semiconductor device may then be processed and the outer edge of the semiconductor device may be cut off to release the semiconductor device from the assembly.

Abstract: A reliability cover that is disposed over at least one of an integrated circuit package and a Si die of the integrated circuit package is disclosed. The integrated circuit package is mountable to a printed circuit board via a plurality of solder balls. The reliability cover is configured to reduce a difference in a coefficient of thermal expansion between the integrated circuit package and the printed circuit board, and between the Si die and a substrate of the integrated circuit package by a threshold value.

Abstract: Disclosed is a semiconductor package. The semiconductor package includes a substrate including an opening, a first semiconductor chip, disposed on the substrate, including a plurality of first chip pads exposed through the opening, a second semiconductor chip, disposed on the first semiconductor chip to partially overlap with the first semiconductor chip, including a plurality of second chip pads, aligned with the opening, and a redistribution layer formed on a surface on which the second chip pads of the second semiconductor chip are disposed. One or more of the second chip pads overlaps with the first semiconductor chip and is covered by the first semiconductor chip and with the remaining pads of the second chip pads being exposed through the opening. The redistribution layer includes redistribution pads, exposed through the opening, and includes redistribution lines, configured to connect the one or more of the second chip pads to the redistribution pads.

Abstract: A display apparatus includes a flexible substrate including a first area in which an image is displayed, a second area spaced apart from the first area, and a bending area between the first area and the second area, a first insulation layer on an upper surface of the flexible substrate in the bending area, a first source-drain pattern on the upper surface of the flexible substrate in the first area, and a signal line on the first insulation layer in the bending area, and a protecting pattern corresponding to the entire bending area, a first pattern film on a lower surface of the flexible substrate in the first area, a second pattern film spaced apart from the first pattern film, the second pattern film being on the lower surface of the flexible substrate in the second area, and a resin layer on a second source-drain pattern in the bending area.

Abstract: Various aspects of this disclosure provide a semiconductor device and a method of manufacturing a semiconductor device. As a non-limiting example, various aspects of this disclosure provide a semiconductor device comprising a stacked die structure and a method of manufacturing thereof.

Abstract: In some embodiments, the present application provides a magnetic memory device. The magnetic memory device comprises a bottom electrode, and a first synthetic anti-ferromagnetic (SyAF) layer including a first pinning layer and a second pinning layer disposed over the bottom electrode and having opposite magnetization directions and separated by a first spacer layer. The magnetic memory device further comprises a reference layer disposed over the first pair of pinning layers and a free layer disposed over the reference layer and separated from the reference layer by a tunneling barrier layer. The magnetic memory device further comprises a second synthetic anti-ferromagnetic (SyAF) layer including a third pinning layer and a fourth pinning layer disposed over the free layer and having opposite magnetization directions and separated by a second spacer layer.

Abstract: A method of manufacturing an image sensor includes at least the following steps. A storage node is formed in a substrate. A gate dielectric layer, a storage gate electrode, and a first dielectric layer are sequentially formed over the substrate. A portion of the first dielectric layer is removed to form an opening. A protection layer and a shielding layer are sequentially filled into the opening. The protection layer laterally surrounds the shielding layer and at least a portion of the protection layer is located between the storage gate electrode and the shielding layer. A second dielectric layer is formed over the shielding layer.

Abstract: A semiconductor device includes a transistor in a semiconductor body having a main surface. The transistor includes a source region; a drain region; a body region; a drift zone; a gate electrode at the body region, the body region and the drift zone being disposed along a first direction between the source region and the drain region, and the first direction being parallel to the main surface; a field plate disposed in each of a plurality of field plate trenches, each of the field plate trenches having a longitudinal axis extending along the first direction; and a field dielectric layer between the field plate and the drift zone, a thickness of the field dielectric layer at a bottom of each of the field plate trenches gradually increases along the first direction, the thickness being measured along a depth direction of the plurality of field plate trenches.

Abstract: A semiconductor device structure and method for fabricating the same. The semiconductor device structure includes a first vertical transport field effect transistor (VTFET) comprising at least a first gate structure having a first gate length, and a second VTFET stacked on the first VTFET and comprising at least a second gate structure having a second gate length that is less than the first gate length. The method includes forming, on a substrate, a first VTFET including at least a first gate structure having a first gate length. The method further includes forming a second VTFET stacked on the first VTFET and including at least a second gate structure having a second gate length that is less than the first gate length.

Abstract: A semiconductor device is provided. The semiconductor device includes a first substrate. The semiconductor device also includes a first light-emitting diode on the first substrate. The semiconductor device further includes a first insulating layer on the first substrate and adjacent to the first light-emitting diode. In addition, the semiconductor device includes an adhesive structure on the first insulating layer. The adhesive structure includes a first side facing the first light-emitting diode and a second side opposite to the first side. The semiconductor device also includes a second substrate disposed on the adhesive structure. The semiconductor device further includes an optical structure in contact with at least one of the first side and the second side.

Abstract: A method for fabricating semiconductor device includes the steps of: providing a substrate having a first region and a second region; forming a first fin-shaped structure on the first region and a second fin-shaped structure on the second region; forming a shallow trench isolation (STI) around the first fin-shaped structure and the second fin-shaped structure; forming a mask layer on the first fin-shaped structure; and performing a first anneal process so that the first fin-shaped structure and the second fin-shaped structure comprise different radius of curvature.

Abstract: Fin patterning methods disclosed herein achieve advantages of fin cut first techniques and fin cut last techniques while providing different numbers of fins in different IC regions. An exemplary method implements a spacer lithography technique that forms a fin pattern that includes a first fin line and a second fin line in a substrate. The first fin line and the second fin line have a first spacing in a first region corresponding with a single-fin FinFET and a second spacing in a second region corresponding with a multi-fin FinFET. The first spacing is greater than the second spacing, relaxing process margins during a fin cut last process, which partially removes a portion of the second line in the second region to form a dummy fin tip in the second region. Spacing between the dummy fin tip and the first fin in the second region is greater than the second spacing.

Abstract: A heat sink having a flexible heat sink base is disclosed in order to flex the heat sink into contact with concave heat sources. Flexibility is achieved by providing a series of concentric grooves on the heat sink base on a surface opposite the surface contacting the heat source. A central cylinder is provided at the center of the concentric grooves. A biasing device, such as a spring, exerts a force on the central cylinder to flex the heat sink base.

Abstract: Memory devices having a plurality of memory cells, with each memory cell including a phase change material having a laterally constricted portion thereof. The laterally constricted portions of adjacent memory cells are vertically offset and positioned on opposite sides of the memory device. Also disclosed are memory devices having a plurality of memory cells, with each memory cell including first and second electrodes having different widths. Adjacent memory cells have the first and second electrodes offset on vertically opposing sides of the memory device. Methods of forming the memory devices are also disclosed.

Abstract: A semiconductor device structure and method for fabricating the same. The semiconductor device structure includes a first vertical transport field effect transistor (VTFET) comprising a first semiconductor fin and a second VTFET stacked on the first VTFET. The second VTFET includes a second semiconductor fin that is separate and distinct from the first semiconductor fin. At least one insulating layer is disposed on a top surface of the first VTFET. The second VTFET is disposed on the at least one insulating layer. The method includes forming a first vertical VTFET on a first substrate and bonding a second substrate to and on top of the first VTFET. A second VTFET is formed on the second substrate.

Abstract: Provided herein may be a semiconductor device. The semiconductor device may include a first substrate, a second substrate disposed on the first substrate, a stack which is disposed on the second substrate and includes stacked memory cells, and a discharge contact structure electrically coupling the second substrate with the first substrate such that charges in the second substrate are discharged to the first substrate.

Abstract: A normally-off first gate channel region is provided on a first main surface side, in a region in a p base between an n base and an n emitter connected to an emitter electrode. On and off of the first gate channel region is controlled by a voltage of a first gate electrode. A normally-on second gate channel region is provided on a second main surface side, by an n-type region between an n collector electrically connected to a collector electrode and the n base. On and off of the second gate channel region is controlled by a voltage of a second gate electrode.

Abstract: Embodiments of the present disclosure provide wet process based methods for modifying threshold value (Vt) of high-k metal gate using self-assembled monolayer (SAM) on dedicated transistor. In one embodiment, the method includes forming a gate structure over a substrate, the gate structure comprising a gate dielectric layer, a barrier layer formed over the gate dielectric layer, and an oxide layer formed over the barrier layer, and forming a self-assembled monolayer on the oxide layer by exposing the oxide layer to an aqueous solution containing metal oxides in a metal dissolving acid.

Abstract: A SiGe channel FinFET structure has an asymmetric threshold voltage, Vth, laterally along the SiGe channel. Uses of sacrificial layers, selective Ge condensation, and/or the use of spacers enable precise creation of first and second channel regions with different Ge concentration, even for channels with short lengths. The second channel region near the source side of the device is modified with a selective Germanium (Ge) condensation to have a higher Vth than the first channel region near the drain side. A lateral electric field is created in the channel to enhance carrier mobility.