Abstract: The present invention relates to a method for measuring porosity of a rock according to the present invention including: (a) capturing a first image by using SEM with respect to a rock sample; (b) determining a first area of a portion determined to be a heavy mineral in the first image; (c) immersing the rock sample in an aqueous solution in which a gadolinium compound is dissolved in that the aqueous solution flows into pores and the gadolinium compound is deposited in pores inside the rock sample; (d) capturing a second image by using SEM with respect to the rock sample; and (e) determining a second area of a portion determined as a heavy mineral and a pore in the second image, and then subtracting the first area from the second area to determine an area of pores in the rock sample.

Abstract: A method of static gas mass spectrometry is provided. The method includes the steps of: introducing a sample gas comprising two or more isotopes to be analyzed into a static vacuum mass spectrometer at a time, t0; operating an electron impact ionization source of the mass spectrometer with a first electron energy below the ionization potential of the sample gas for a first period of time that is following t0 until a time t1; and operating the electron impact ionization source with a second electron energy at least as high as the ionization potential of the sample gas for a second period of time that is after time t1. The first time period from t0 to t1 is a period corresponding to a period taken for the isotopes of the sample gas to equilibrate in the mass spectrometer. A constant ion source temperature is preferably maintained. Also provided is a static gas mass spectrometer.

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.

Abstract: The invention relates to the measurement of current profiles of free-flying ion or electron clusters which impinge on a detector electrode of a Faraday detector. The detector electrode here consists of a large number of structural elements in a bipolar arrangement, where neighboring structural elements have opposite polarities and structural elements with the same polarity are electrically connected, and a voltage is applied between neighboring structural elements so that before ions or electrons impinge on the detection electrode, they are essentially deflected onto the structural elements with one of the two polarities. If the current profiles on the structural elements of the two polarities are measured separately and subtracted from each other, a current profile which corresponds to the pure ion or electron current profile is obtained without using a screen grid.

Abstract: A three-dimensional fine movement device includes a moving body, a fixation member to which the moving body is fixed, a three-dimensional fine movement unit, to which the fixation member is fixed, and which allows for three-dimensional fine movement of the moving body with the fixation member interposed therebetween, a base member to which the three-dimensional fine movement unit is fixed, and movement amount detecting means that is fixed to the base member to detect a movement amount of the fixation member.

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract: A method for examining a gas by mass spectrometry includes: ionizing the gas for producing ions; and storing, exciting and detecting at least some of the produced ions in an FT ion trap. Producing and storing the ions in the FT ion trap and/or exciting the ions prior to the detection of the ions in the FT ion trap includes at least one selective IFT excitation, such as a SWIFT excitation, which is dependent on the mass-to-charge ratio of the ions. The disclosure further relates to a mass spectrometer. A mass spectrometer includes: an FT ion trap; and an excitation device for storing, exciting, and detecting ions in the FT ion trap.

Abstract: An electron-beam lithography method includes, computing and outputting a development time of a positive-tone electron-sensitive layer and a parameter recipe of an electron-beam device by using a pattern dimension simulation system, performing a low-temperature treatment to chill a developer solution, utilizing an electron-beam to irradiate an exposure region of the positive-tone electron-sensitive layer based on the parameter recipe, and utilizing the chilled developer solution to develop a development region of the positive-tone electron-sensitive layer based on the development time. The development region is present within the exposure region, and an area of the exposure region is smaller than that of the first portion. As a result, the electron-beam lithography method may control a dimension of a development pattern of the positive-tone electron-sensitive layer more accurately, and may also shrink a minimum dimension of the development pattern of the positive-tone electron-sensitive layer.

Abstract: A method, composition and system respond to ionizing radiation to adjust biological activity. In some approaches the ionizing radiation is X-ray or extreme ultraviolet radiation that produces luminescent responses that induce biologically active responses.

Abstract: A method, composition and system respond to ionizing radiation to adjust biological activity. In some approaches the ionizing radiation is X-ray or extreme ultraviolet radiation that produces luminescent responses that induce biologically active responses.

Abstract: A modulator for radiation therapy provides modulation of an area beam to decrease treatment time. Separate channels passing modulated “beamlets” are possible by spacing the channels such that spreading of the beams and multiple angles of treatment eliminate cold spots. The space between the channels allows well-defined channel walls and space for modulator mechanisms.

Abstract: An apparatus and method for coupling a fixed-aperture collimator to a variable-aperture collimator. The variable-aperture collimator may be an IRIS collimator having multiple leaves configured to open and close an aperture of the IRIS collimator within which the fixed-aperture collimator is retained.

Abstract: Selectivity of a measurement from a mass spectrometer is improved by selecting an extracted ion current window for the measurement after data acquisition. A plurality of mass spectra are acquired over a period of time. A first extracted ion current window is selected and from the plurality of mass spectra a first intensity as a function of time is calculated for an ion using the first extracted ion current window. A second extracted ion current window is selected and from the plurality of mass spectra a second intensity as a function of time is calculated for the ion using the second extracted ion current window. A first signal-to-noise ratio of the first intensity is compared with a second signal-to-noise ratio of the second intensity. If the second signal-to-noise ratio is greater than the first signal-to-noise ratio, the second intensity as a function of time is used for the measurement.

Abstract: A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housing at an eigenfrequency of at least one of the one or more lens elements and/or of the projection system housing.

Abstract: Systems and methods for analyzing compounds in a sample. In one embodiment, the present technology is directed towards a method of analyzing a sample, comprising: emitting ions from the sample; selectively filtering the emitted ions for at least one designated trigger ion; fragmenting the designated trigger ions; scanning for a designated trigger ion fragment; and upon detecting the designated trigger ion fragment, scanning for at least one confirmatory ion fragment.

Abstract: A charged particle beam device is provided. The device includes a primary objective lens for focusing a primary charged particle beam, the primary objective lens defining an optical axis, a specimen stage defining a specimen location area, a deflection unit for deflecting the primary charged particle beam between the primary objective lens and the specimen location area, towards a beam path for impingement on the specimen, wherein the deflection unit is movable with respect to the optical axis.

Abstract: In one characterization, the present invention relates to a radiation-shielding assembly for holding a container having a radioactive material disposed therein. The assembly may, at least in one regard, be referred to as an elution shield and/or a dispensing shield. The assembly includes a body at least partially defining a cavity. There is at least one opening through the body into the cavity. The assembly may include a cap that at least generally hinders escape of radiation from the assembly through the opening. The cap may be releasably attached to the body in one orientation and may establish non-attached engagement with the body in another orientation. The assembly may include an adjustable spacer system for adapting the assembly for use with containers having different heights.

Abstract: A system, components thereof, and methods are described for time-of-flight mass spectrometry. A microwave or high-frequency RF energy source is used to ionize a reagent vapor to form reagent ions. The reagent ions enter a chamber and interact with a fluid sample to form product ions. The reagent ions and product ions are directed to a time-of-flight mass spectrometer module for detection and determination of a mass value for the ions. The time-of-flight mass spectrometer module can include an optical system and an ion beam adjuster for focusing, interrupting, or altering a flow of reagent and product ions according to a specified pattern. The time-of-flight mass spectrometer module can include signal processing techniques to collect and analyze an acquired signal, for example, using statistical signal processing, such as maximum likelihood signal processing.

Abstract: A system and methods are described for generating reagent ions and product ions for use in a quadruple mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadruple mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system.

Abstract: An ion implantation system comprising an ion source that generates an ion beam along a beam path, a mass analyzer component downstream of the ion source that performs mass analysis and angle correction on the ion beam, a resolving aperture electrode comprising at least one electrode downstream of the mass analyzer component and along the beam path having a size and shape according to a selected mass resolution and a beam envelope, a deflection element downstream of the resolving aperture electrode that changes the path of the ion beam exiting the deflection element, a deceleration electrode downstream of the deflection element that decelerates the ion beam, a support platform within an end station for retaining and positioning a workpiece which is implanted with charged ions, and wherein the end station is mounted approximately eight degrees counterclockwise so that the deflected ion beam is perpendicular to the workpiece.