Abstract: Methods for forming microelectronic devices include forming lower and upper stack structures, each comprising vertically alternating sequences of insulative and other structures arranged in tiers. Lower and upper pillar structures are formed to extend through the lower and upper stack structures, respectively. An opening is formed through the upper stack structure, and at least a portion of the other structures of the upper stack are replaced by (e.g., chemically converted into) conductive structures, which may be configured as select gate structures. Subsequently, a slit is formed, extending through both the upper and lower stack structures, and at least a portion of the other structures of the lower stack structure are replaced by a conductive material within a liner to form additional conductive structures, which may be configured as access lines (e.g., word lines). Microelectronic devices and structures and related electronic systems are also disclosed.

Abstract: Integrated circuit (IC) packages employing a supplemental metal layer coupled to embedded metal traces in a die-side embedded trace substrate (ETS) layer to reduce metal density mismatch, and related fabrication methods. An IC package includes a semiconductor die (“die”) electrically coupled to a package substrate. The package substrate includes a die-side ETS metallization layer adjacent to and coupled to the die. To reduce or avoid metal density mismatch between the die-side ETS metallization layer and another metallization layer(s) in the package substrate, a supplemental metal layer with additional metal interconnects is disposed adjacent to the die-side ETS metallization layer. The additional metal interconnects are coupled in a vertical direction to the embedded metal traces in the die-side ETS metallization layer to increase metal density of die-side metal interconnects formed by the additional metal interconnects coupled to the embedded metal traces in the die-side ETS metallization layer.

Abstract: A method for forming a semiconductor device structure is provided. The method includes forming a dielectric layer over a substrate. The substrate has a base and a fin structure over the base, and the dielectric layer is over the base and surrounds the fin structure. The method includes forming a gate stack over the fin structure and the dielectric layer. The method includes removing portions of the dielectric layer, which are not covered by the gate stack. The method includes forming first spacers over first sidewalls of the gate stack. The method includes forming second spacers over second sidewalls of the fin structure. The method includes partially removing the fin structure, which is not covered by the gate stack and the first spacers. The method includes forming a source/drain structure over the fin structure, which is not covered by the gate stack and the first spacers.

Abstract: A light-emitting device includes a first electrode, a second electrode, a light-emitting layer, and a composite material layer. The first electrode and the second electrode are arranged oppositely to each other. The light-emitting layer is arranged between the first electrode and the second electrode. The composite material layer is arranged between the second electrode and the light-emitting layer. A material for forming the composite material layer includes a titanium dioxide nanoparticle and a ligand. The ligand has a structure of The ligand is bonded to the titanium dioxide nanoparticle by a sulfur anion. n is an integer of 0˜8.

Abstract: Discussed is a display device including a base portion; a first electrode formed on the base portion; a barrier rib portion stacked on the first electrode while forming a plurality of cells; a second electrode formed on the barrier rib portion; and semiconductor light emitting diodes seated in the plurality of cells, wherein the first electrode and the second electrode are spaced apart from each other with the barrier rib portion disposed therebetween.

Abstract: A light-emitting device includes: a first layer; a second layer; a light-emitting element layer positioned between the first layer and the second layer and including a light-emitting element; a first adhesive layer positioned between the first layer and the light-emitting element layer, and having a thickness of 10 ?m or greater and less than 25 ?m and a shear modulus at 23 degrees Celsius of 4.0E+04 Pa or greater and less than 1.0E+05 Pa; and a second adhesive layer positioned between the light-emitting element layer and the second layer, and having a thickness of greater than 0 ?m and no greater than 15 ?m and a shear modulus at 23 degrees Celsius of 1.0E+05 Pa or greater.

Abstract: A method used in forming a memory array comprising strings of memory cells comprises forming an upper stack directly above a lower stack. The lower stack comprises vertically-alternating lower-first-tiers and lower-second-tiers. The upper stack comprises vertically-alternating upper-first-tiers and upper-second-tiers. Lower channel openings extend through the lower-first-tiers and the lowers-second-tiers. The lower channel openings have sacrificial material therein. An upper of the lower-first-tiers or a lower of the upper-first-tiers comprises non-stoichiometric silicon nitride comprising (a) or (b), where (a): a nitrogen-to-silicon atomic ratio greater than 1.33 and less than 1.5; and (b): a nitrogen-to-silicon atomic ratio greater than or equal to 1.0 and less than 1.33. A higher of the upper-first-tiers that is above said lower upper-first-tier comprises silicon nitride not having either the (a) or the (b).

Abstract: A semiconductor package includes a die, a first conductive pattern, a second conductive pattern and first and second under-ball metallurgy (UBM) patterns. The first conductive pattern and the second conductive pattern are disposed below and electrically connected to the die, wherein the first conductive pattern has an ellipse-like shape, and the second conductive pattern has a circular shape. The first and second under-ball metallurgy (UBM) patterns correspond to the first and second conductive patterns, the first conductive pattern has a first length, the second conductive pattern has a second length, the first and second UBM patterns have a third length, wherein the first length is larger than the third length and the second length is smaller than the third length.

Abstract: A wiring board includes an interconnect structure including a plurality of interconnect layers, and a plurality of insulating layers having a photosensitive resin as a main component thereof, and an encapsulating resin layer having a non-photosensitive thermosetting resin as a main component thereof, laminated on an uppermost insulating layer of the plurality of insulating layers. An uppermost interconnect layer of the plurality of interconnect layers includes a pad protruding from the uppermost insulating layer. The encapsulating resin layer exposes an upper surface of the pad, and covers at least a portion of a side surface of the pad, and at least a portion of side surfaces of the plurality of insulating layers. The pad is configured to receive a semiconductor chip to be mounted thereon.

Abstract: A semiconductor device includes a memory cell including a write transistor and a read transistor that are electrically connected to each other. The write transistor includes a write bit line disposed over a substrate, a write channel structure disposed on the write bit line and extending in a direction perpendicular to a surface of the substrate on the write bit line, a write gate dielectric layer disposed on a side surface of the write channel structure, and a write word line disposed on the write gate dielectric layer. The read transistor includes a read gate electrode layer disposed on the write channel structure, a read gate dielectric layer disposed on the read gate electrode layer, a read channel layer disposed on the read gate dielectric layer, and a read word line and a read bit line that are disposed at opposite ends of the read channel layer.

Abstract: The present disclosure relates integrated chip structure. The integrated chip structure includes one or more interconnects disposed within a dielectric structure over a substrate. A bond pad having a top surface is arranged along a top surface of the dielectric structure. The top surface of the bond pad includes a plurality of discrete top surface segments that are laterally separated from one another by non-zero distances that extend between interior sidewalls of the bond pad, as viewed in a cross-sectional view. The dielectric structure is disposed directly between the interior sidewalls of the bond pad.

Abstract: The invention relates to a method for manufacturing a power electronic module (1) by additive manufacturing, characterized in that it comprises the steps of: making or fixing preforms (15) of polymer material on at least one face of an insulating substrate (2a) covered with at least one layer of metal (2b, 2c), referred to as a metallized substrate (2), depositing a first metal layer (17) on the preform (15), depositing by electroforming a second metal layer (18) on the first metal layer (17).

Abstract: The present disclosure relates to a method of forming a semiconductor structure. The method includes depositing an etch-stop layer (ESL) over a first dielectric layer. The ESL layer deposition can include: flowing a first precursor over the first dielectric layer; purging at least a portion of the first precursor; flowing a second precursor over the first dielectric layer to form a sublayer of the ESL layer; and purging at least a portion of the second precursor. The method can further include depositing a second dielectric layer on the ESL layer and forming a via in the second dielectric layer and through the ESL layer.

Abstract: Provided is a semiconductor device capable of improving the optical response speed. The semiconductor device includes a pixel array portion in which a plurality of pixels are arranged in a matrix, each of the plurality of pixels including: a pixel forming region partitioned by a separation region in a semiconductor layer; a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity type sequentially arranged from a first surface side of the pixel forming region toward a second surface side opposite to the first surface; a pn junction portion in which the first semiconductor region and the second semiconductor region are bonded; a charge extraction region of the second conductivity type provided in a side wall of the separation region; and a relay region of the second conductivity type provided at a position deeper than the second semiconductor region so as to be connected to the charge extraction region and the second semiconductor region.

Abstract: An apparatus includes a plurality of layers arranged on top of one another and including at least one ground layer and a signal layer; a first set of signal pads and a second set of signal pads on the signal layer; and a slot formed in a portion of the at least one ground layer between the first set of signal pads and the second set of signal pads. The apparatus can include an optical assembly housed by the plurality of layers and connected to the first set of signal pads and the second set of signal pads. The optical assembly can include a micro Intradyne Coherent Receiver (?ICR), a Coherent Driver Modulator (CDM), or a Coherent Optical Subassembly (COSA).

Abstract: A semiconductor package includes a substrate; and a first semiconductor device and a second semiconductor device that are provided on the substrate. The substrate includes a first dielectric layer and a second dielectric layer provided on the first dielectric layer, a plurality of signal lines provided between the first dielectric layer and the second dielectric layer and connecting the first semiconductor device to the second semiconductor device, and a conductive pad and a conductive plate provided on the second dielectric layer. The conductive pad overlaps the first semiconductor device or the second semiconductor device. The conductive plate overlaps the signal lines.

Abstract: A thin film transistor, a manufacturing method thereof, an array substrate and an electronic device arc provided. The thin film transistor includes an active layer including multiple oxide layers which includes a channel layer, a transition layer and a first barrier layer, the channel layer is an layer with a highest carrier mobility, the channel layer is a crystalline or amorphous oxide layer, the transition layer is in direct contact with the channel layer, the first barrier layer is an outermost oxide layer, the first barrier layer and the transition layer are both crystalline oxide layers; a crystallization degree of the first barrier layer and a crystallization degree of the transition layer are greater than a crystallization degree of the channel layer, and a band gap of the first barrier layer and a band gap of the transition layer are larger than a band gap of the channel layer.

Abstract: A color conversion substrate includes a base substrate having a display area and a peripheral area positioned around the display area. A color filter layer is disposed in the display area under the base substrate. A front light blocking member is disposed in the peripheral area under the base substrate and includes first light blocking layers. The first light blocking layers overlap each other in a first direction that is a thickness direction of the base substrate. A side light blocking member is disposed in the peripheral area under the base substrate and is disposed outside the front light blocking member to surround the front light blocking member.

Abstract: A method of forming a semiconductor device includes forming a first dielectric layer over a first channel region in a first region and over a second channel region in a second region; introducing a first dipole element into the first dielectric layer in the first region to form a first dipole-containing gate dielectric layer in the first region; forming a second dielectric layer over the first dipole-containing gate dielectric layer; introducing fluorine into the second dielectric layer to form a first fluorine-containing gate dielectric layer over the first dipole-containing gate dielectric layer; and forming a gate electrode over the first fluorine-containing gate dielectric layer.

Abstract: An electroluminescent element including an anode, a cathode, and a light-emitting layer provided between the anode and the cathode, in which the electroluminescent element further includes an electron transport layer [[(33) including n-type semiconductor particles and a first insulating polymer, and a hole transport layer including p-type semiconductor particles, the electron transport layer is provided between the cathode and the light-emitting layer, the hole transport layer is provided between the anode and the light-emitting layer, and a volume proportion of the n-type semiconductor particles in the electron transport layer is smaller than a volume proportion of the p-type semiconductor particles in the hole transport layer.