Abstract: A transistor can include a source and a drain with each implemented in a first type active region, a gate implemented relative to the source and the drain, and a body implemented in the first type active region and substantially covered by the gate. The transistor can further include a body tie implemented in a second type active region and including a connecting portion substantially covered by the gate and engaging the body. The first and second active regions can be dimensioned to provide a gap therebetween on each side of the gate.

Abstract: A semiconductor device includes a source region. A drain region has a first conductivity type and a second dopant concentration spaced apart from the source region. A first drift region is located between the source region and the drain region and has the first conductivity type and a first dopant concentration that is lower than the second dopant concentration of the drain region. An oxide structure includes a first portion on or over the first drift region and a tapered portion between the first portion and the drain region. A substrate surface extension is between the tapered portion and the drain region. A buffer region has the first conductivity type between the first drift region and the drain region and under the tapered portion of the oxide structure. The buffer region has a third dopant concentration between the second dopant concentration and the first dopant concentration.

Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated chip structure. The method includes forming a first dielectric bonding layer over a first dielectric structure, which is disposed on a first substrate and surrounds a first plurality of interconnects. The first dielectric bonding layer is patterned to form a first recess exposing one of the first plurality of interconnects. A first conductive bonding segment is formed within the first recess. A second dielectric bonding layer is formed over a TSV extending through a second substrate. The second dielectric bonding layer is patterned to form a second recess exposing the TSV. A second conductive bonding segment is formed within the second recess. The first substrate is bonded to the second substrate along an interface comprising dielectric and conductive regions. The conductive region includes a conductive interface between the first and second conductive bonding segments.

Abstract: Aspects of the disclosure provide a semiconductor device and a method for forming the semiconductor device. The semiconductor device includes a first channel structure, a first gate dielectric layer surrounding the first channel structure, and a first metal gate surrounding first gate dielectric layer. The first metal gate includes a first metal layer in direct contact with the first gate dielectric layer and a first metal cap in direct contact with the first gate dielectric layer, wherein the first metal cap is in direct contact with the first metal layer.

Abstract: An integrated circuit includes a first field effect transistor (FET) and a second FET formed in or over a semiconductor substrate and configured to selectively conduct a current between a first circuit node and a second circuit node. The first FET has a first source, a first drain and a first buried layer all having a first conductivity type, and a first gate between the first source and the first drain. The second FET has a second source, a second drain and a second buried layer all having the first conductivity type, and a second gate between the second source and the second drain. A first potential between the first source and the first buried layer is configurable independently from a second potential between the second source and the second buried layer.

Abstract: Quantum devices formed from a single superconducting wire having a configurable ground connection are described. An example quantum device, configurable to be grounded, comprises a single superconducting wire having at least a first section and a second section, each of which is configurable to be in a topological phase and at least a third section configurable to be in a trivial phase. The quantum device further comprises semiconducting regions formed adjacent to the single superconducting wire, where the single superconducting wire is configurable to store quantum information in at least four Majorana zero modes (MZMs). The semiconducting regions formed adjacent to the single superconducting wire may be used to measure quantum information stored in the at least four MZMs.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a lateral bipolar transistor with gated collector and methods of manufacture. The structure includes: an extrinsic base region vertically over a semiconductor substrate and comprising asymmetrical sidewall spacers on opposing sidewalls of the extrinsic base region; a collector region on the semiconductor substrate and separated from the extrinsic base region by at least a first spacer of the asymmetrical sidewall spacers; and an emitter region on the semiconductor substrate and separated from the extrinsic base region by a second spacer of the asymmetrical sidewall spacers.

Abstract: Structures for a high-voltage field-effect transistor that include a deep trench isolation region and methods of forming such structures. The structure comprises a semiconductor substrate, a semiconductor layer on the semiconductor substrate, and a doped layer between the semiconductor layer and the semiconductor substrate. The structure further comprises a trench isolation region including a metal layer that extends through the semiconductor layer and the doped layer into the semiconductor substrate.

Abstract: A semiconductor device includes a substrate, an epitaxial structure over the substrate, a conductive structure, and a dielectric liner. The conductive structure extends from within the epitaxial structure to above the epitaxial structure. The dielectric liner extends along a sidewall of the conductive structure. The dielectric liner has a top end capped by the conductive structure.

Abstract: Provided is a semiconductor device including: a substrate containing a semiconductor material; an electrode provided on a substrate surface of the substrate, the electrode containing a metal material; and a mixed member provided on the substrate surface to be in contact with the electrode, the mixed member containing the semiconductor material and the metal material, in which a portion of the substrate surface is exposed at an end of the substrate.

Abstract: A display panel, a mask used for evaporation, a mask assembly and a manufacturing method thereof are provided. The display panel includes: a base substrate; and a display area and a peripheral area; wherein, the peripheral area is provided with two types of dummy sub-pixel units, each type of dummy sub-pixel unit includes a dummy light-emitting material layer and a dummy auxiliary light-emitting layer, wherein, a first structure layer of a first dummy light-emitting material layer and a first dummy auxiliary light-emitting layer is arranged in the same layer as a second structure layer of a second dummy light-emitting material layer and a second dummy auxiliary light-emitting layer, and at least one of a size and a shape of an orthographic projection of the second structure layer on the base substrate is different from that of an orthographic projection of the first structure layer on the base substrate.

Abstract: A method for fabricating semiconductor device includes the steps of: forming a first inter-metal dielectric (IMD) layer on a substrate; forming a metal interconnection in the first IMD layer; forming a bottom electrode layer and a pinned layer on the first IMD layer; forming a sacrificial layer on the pinned layer; patterning the sacrificial layer, the pinned layer, and the bottom electrode layer to form a first magnetic tunneling junction (MTJ); forming a second IMD layer around the first MTJ; removing the sacrificial layer to form a recess; forming a barrier layer and a free layer in the recess; forming a top electrode layer on the free layer; and patterning the top electrode layer and the free layer to form a second MTJ.

Abstract: Provided is a field effect transistor including a gate insulating layer having a two-dimensional material. The field effect transistor may include a first channel layer; a second channel layer disposed on the first channel layer; a gate insulating layer disposed on the second channel layer; a gate electrode disposed on the gate insulating layer; a first electrode electrically connected to the first channel layer; and a second electrode electrically connected to the second channel layer. Here, the gate insulating layer may include an insulative, high-k, two-dimensional material.

Abstract: The present disclosure provides a semiconductor structure. The semiconductor structure includes a fin active region formed on a semiconductor substrate and spanning between a first sidewall of a first shallow trench isolation (STI) feature and a second sidewall of a second STI feature; an anti-punch through (APT) feature of a first type conductivity; and a channel material layer of the first type conductivity, disposed on the APT feature and having a second doping concentration less than the first doping concentration. The APT feature is formed on the fin active region, spans between the first sidewall and the second sidewall, and has a first doping concentration.

Abstract: A semiconductor device includes a drift region, a dielectric film, and an anti-type doping layer. The drift region has a first type conductivity. The anti-type doping layer is located between the drift region and the dielectric film, and has a second type conductivity opposite to the first type conductivity so as to change a current path of a current in the drift region, to thereby prevent the current from being influenced by the dielectric film. A method for manufacturing a semiconductor device and a method for reducing an influence of a dielectric film are also disclosed.

Abstract: Structures including an inductor and methods of forming such structures. The structure comprises a semiconductor substrate including a first plurality of sealed cavities and a back-end-of-line stack on the semiconductor substrate. Each sealed cavity includes an air gap, and the back-end-of-line stack includes an inductor having a winding that overlaps with the scaled cavities.

Abstract: A method of making a semiconductor device, includes: providing a first dielectric layer; sequentially forming a first metal layer, a dummy capacitor dielectric layer, and a second metal layer over the first dielectric layer; and using a single mask layer with two patterns to simultaneously recess two portions of the second metal layer so as to define a metal thin film of a resistor and a top metal plate of a capacitor.

Abstract: A negative differential resistance device includes a dielectric layer having a first surface and a second surface opposing the first surface, a first semiconductor layer that includes a first degenerated layer that is on the first surface of the dielectric layer and has a first polarity, a second semiconductor layer that includes a second degenerated layer that has a region that overlaps the first semiconductor layer and has a second polarity, a first electrode electrically connected to the first semiconductor layer, a second electrode electrically connected to the second semiconductor layer, and a third electrode on the second surface of the dielectric layer and which has a region overlapping at least one of the first semiconductor layer or the second semiconductor layer.

Abstract: A high voltage semiconductor device includes a semiconductor substrate, an isolation structure, a gate oxide layer, and a gate structure. The semiconductor substrate includes a channel region, and at least a part of the isolation structure is disposed in the semiconductor substrate and surrounds the channel region. The gate oxide layer is disposed on the semiconductor substrate, and the gate oxide layer includes a first portion and a second portion. The second portion is disposed at two opposite sides of the first portion in a horizontal direction, and a thickness of the first portion is greater than a thickness of the second portion. The gate structure is disposed on the gate oxide layer and the isolation structure.

Abstract: Provided is a synaptic device including a substrate, a channel layer on the substrate, a gate dielectric layer on the channel layer; and a gate electrode on the gate dielectric layer, wherein the gate dielectric layer includes a charge supply dielectric film and a piezoelectric film, wherein the charge supply dielectric film includes a metal oxide or metal sulfide, wherein the piezoelectric film includes a piezoelectric material that converts a pressure stimulation into an electrical signal, wherein accordance to a change in a signal applied to the gate electrode, a magnitude and aspect of a current flowing through the channel layer are changed.