Abstract: A method of objectively evaluating a surface mark provides an objective test methodology for the optical quantification of surface marks. The method may include the steps of reproducibly producing a surface mark on an object and optically evaluating the surface mark. The surface mark may be reproducibly produced by loading a stylus, contacting a surface on the object with the loaded stylus and moving the object and the surface thereon relative to the loaded stylus so as to thereby produce a mark on the surface. Any surface mark is optically evaluated by optically producing images of the surface mark, electronically capturing the optically produced images and measuring selected parameters of the captured optically produced images.

Abstract: A device for the photoelectric measuring of an opaque or transparent object to be measured includes a photoelectric sensor (4) and a measuring optics (3) which directs measuring light originating from a measurement field of the object to be measured (6) onto the sensor (4). A control electronic (5) cooperates with the sensor (4) for the processing of the electrical signals produced by the sensor. The sensor (4) includes at least two individually controlled and concentrically arranged partial sensors (41, 42, 43), and the control electronics (5) includes switching means (51) by which the partial sensors (41, 42, 43) can be selectively switched on or off-line. The use of a photoelectric sensor made of or divided into several partial sensors enables a purely electronic and therefore simple and fast selection of different effective measurement field sizes.

Abstract: A print media sensor (10) according to the present invention determines a print medium type by utilizing an ultrasonic transducer (22) to vibrate a print medium (28) at a resonant frequency of the print medium (28). The print medium (28) is irradiated with light from an LED (20). Sensors (24, 26) measure the amount of light reflected from and transmitted through the print medium (28) while it is being vibrated at the resonant frequency. The ratio of the reflected to transmitted light is compared to a stored table of ratios that are associated with the resonant frequencies of specific print medium types and print medium ink volume and application rates. The results of these comparisons are used to determine the print medium type and the associated ink volume and application rate to be used for printing on the print medium (28).

Abstract: An optical displacement-measuring apparatus has a scale on which optical gratings are formed along a first axis and a second axis. It also has a sensor head arranged opposite to the scale and relatively movable along the first and second axes. The sensor head includes a photosensitive unit (3) for optically detecting a relative movement to provide a displacement signal. The photosensitive unit (3) includes a transparent substrate (30). A photosensitive device array (PDAy) is formed with a semiconductor film deposited on the substrate (30) and arrayed along the first axis at a certain pitch for providing a displacement signal corresponding to a displacement along the first axis. A photosensitive device array (PDAx) is formed with a semiconductor film deposited on the photosensitive device array (PDAy) sandwiching an insulator layer therebetween and arrayed along the second axis at a certain pitch for providing a displacement signal corresponding to a displacement along the second axis.

Abstract: A lighting inspection apparatus is provided which uses a small backlight comprised of a dimmer plate and a xenon lamp or a fluorescent lamp that miniaturizes the inspection apparatus for a display panel. An inspection method is described for a display panel, which uses a dimmer plate autonomously adjusting light. The apparatus for inspecting a display panel includes: a support structure disposing thereon a display panel to be inspected; a light source; and a dimmer plate with a characteristic modulating a light transmission characteristic in accordance with an intensity of light incident thereonto, the dimmer plate being disposed between the support structure and the light source, wherein light emitted from the light source is made to transmit through the dimmer plate, then made incident onto the display panel disposed on the support structure.

Abstract: A method for inspecting semiconductor wafers is provided in which a plurality of independent, low-cost, optical-inspection subsystems are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer, the wafer location relative to the inspection being controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtered. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer to aid in statistical process control, particularly for manufacturing equipment.

Abstract: A sensing apparatus and method for use in the optical absorption analysis of the NO2 content of a gas sample. The apparatus and method employ radiation from a semiconductor radiation source. The emission spectrum of the radiation has a maximum wavelength of about 600 nm, preferably 380-520 nm. The radiation is passed through the gas sample and sensed by a detector to provide an output signal indicative of the NO2 content of the gas sample. A pair of alternately energized radiation sources may also be used. The sensor apparatus and method may be employed in conjunction with other gas sensing apparatus and methods, such as IR CO2 measurement or NO sensing.

Abstract: The present invention provides a method of analyzing multiple samples simultaneously by absorption detection. The method comprises: (i) providing a planar array of multiple containers, each of which contains a sample comprising at least one absorbing species, (ii) irradiating the planar array of multiple containers with a light source and (iii) detecting absorption of light with a detetion means that is in line with the light source at a distance of at leaat about 10 times a cross-sectional distance of a container in the planar array of multiple containers. The absorption of light by a sample indicates the presence of an absorbing species in it. The method can further comprise: (iv) measuring the amount of absorption of light detected in (iii) indicating the amount of the absorbing species in the sample. Also provided by the present invention is a system for use in the abov metho.

Abstract: An infectious disease or disorder in a fluid, such as a mammalian blood sample, is detected by taking a transmission spectrum of a test sample in at least a portion of the ultraviolet visible near-infrared and comparing the spectrum with a standard sample spectrum. From the comparison it is then determined whether the fluid from the test sample contains an infectious disease or disorder, and an identity of the infectious disease or disorder is determined. Spectroscopic and multiwavelength turbidimetry techniques provide a rapid, inexpensive, and convenient means for diagnosis. The comparison and determination steps may be performed visually or by spectral deconvolution.

Abstract: First and second laser inputs are directed to a location on a semiconductor wafer to be interrogated. A first signal analyzer receives a first light signal at a first second-harmonic wavelength generated by the first laser input and converts the signal to a first electronic signal, thus monitoring the intensity of the first second-harmonic wavelength as a function of contamination. A second surface optical signal analyzer provides a similar function at a second second-harmonic wavelength generated by the second laser input and provides a second electronic signal. A third surface optical signal analyzer receives a third light signal at a sum-frequency wavelength generated by the first laser input and the second laser input on the semiconductor wafer to be interrogated and converts the light signal to a third electronic signal. An electronic signal analyzer compares the first, second and third electronic signals for determining the level of semiconductor wafer contamination.

Abstract: A device for inspecting solder connections between a component and a substrate or between two components or substrates, wherein the component is disposed upon the surface of the substrate, the device including an image receiving unit. An image transmitting device, the image transmitting device including a first end and a second end, the first end coupled to the image receiving unit. A tip assembly removably coupled to the second end of the image transmitting device, the tip assembly further including a mirror and an image receiving aperture, the tip assembly configured to transmit an image of the solder connections received by the mirror, through the image transmitting device, to the image receiving unit, and an illumination device, the illumination device including a light source, at least one light transmitting device, and at least one light emitting aperture disposed adjacent the image receiving aperture, the light emitting aperture directed towards the solder connections to be inspected.

Abstract: A method and apparatus for rapid measurements of far-field radiation profiles having a large dynamic range from an optical source is disclosed. Some embodiments of the apparatus include a collector coupled to a rotating hub so that the rotation of an entrance to the collector defines a plane, a detector coupled to receive light captured at the entrance to the collector, and detector electronics having a programmable gain coupled to receive a signal from the detector, Some embodiments may include a rotatable entrance mirror for reflecting light from the optical source into the plane of the entrance of the collector. In some embodiments, the optical source is fixed relative to the plane of the entrance of the collector. In some embodiments, the optical source is rotatable in the plane defined by the entrance of the collector. In some embodiments, the source can be an optical fiber. In some embodiments, the source can be a material irradiated by a laser.

Abstract: A method is provided for determining one or more reflectance properties of a surface using a portable apparatus that includes reflecting a first beam of electromagnetic energy off of a measured surface, the first beam contacting the measured surface at an angle that is near normal to the measured surface. The method also includes reflecting a second beam of electromagnetic energy off of the measured surface, the second beam contacting the measured surface at an angle that is near grazing to the measured surface. Reflected portions of the first and second beams of electromagnetic energy are then collected and at least one reflectance characteristic value associated with the measured surface is determined based on the reflected portions of the first and second beams of electromagnetic energy.

Abstract: Two laser inputs having pulse durations of about 50-100 femtoseconds are directed to an area of a surface to be interrogated. The lasers are aligned so that their surface areas of optical illumination overlap on the interrogated surface. An optical delay line temporarily synchronizes the two inputs. An output wavelength discriminator receives reflections of the inputs from the interrogated surface and is substantially non-transmissive at the frequencies of the first laser input and the second laser input, but is substantially transmissive at the sum-frequency of the first input and the second input. Imaging optics direct the propagation of the output so that a real image is formed. A position sensitive detector monitors the intensity of the real image at the sum-frequency and an electronic signal equivalent to the real image is provided.

Abstract: A non-contact gauging system and method profiles a workpiece to accurately determine cylindrical surface profiles. The system includes a sensor head for performing reflected light measurements. The sensor head couples to a sensor arm that is movable in longitudinal, lateral, and transverse directions. A computer controls operation of the sensor head and arm to perform various proximity measurements of the workpiece. Proximity measurements are made along at least three parallel, lateral tracks that extend along a longitudinal length of the workpiece surface. The sensor head takes proximity measurements as it is moved continuously along each lateral track. The computer determines the diameters of the workpiece along the longitudinal length based on the proximity measurements and generates a profile.

Abstract: A microsphere whispering-gallery mode evanescent-wave sensor for use in the detection and identification of atoms or molecules has been developed. In operation, the species under scrutiny is introduced proximate to a microsphere in which a whispering-gallery mode has been excited. The subject species then absorbs a portion of the microsphere's evanescent light energy at compound-specific wavelengths, which absorption is then used to detect and identify the subject species. Its concentration may be determined from the absorption signal on the light in reflection or transmission. High sensitivity in the instant invention results from the long effective absorption path length provided by the whispering-gallery mode's large Q which results in a detector that is suitable for use in trace-gas sensing. The instant microsphere detection system can rival the performance of a multipass cell and can be made part of a much more compact and rugged system.

Abstract: A surface inspection method for inspecting a pattern formed at a surface of a test piece, includes: a first step in which a plurality of inspection conditions that are different from each other are set; a second step in which light from the surface of the test piece is detected by irradiating illumination light onto the surface of the test piece under each of the plurality of inspection conditions; a third step in which a plurality of sets of detection information corresponding to the plurality of inspection conditions are generated based upon the detected light; a fourth step in which a logical OR of the plurality of sets of detection information is obtained; and a fifth step in which a decision is made as to whether or not the pattern at the surface of the test piece is acceptable based upon results of the logical OR.

Abstract: The optical system of the present invention includes a lens system assembly, a spectral filter material and a pixel array configured such that small, distant, light sources can be reliably detected. The optical system of the present invention provides accurate measurement of the brightness of the detected light sources and identification of the peak wavelength and dominant wavelength of the detected light sources. Use of the optical system of the present invention provides the ability to distinguish headlights of oncoming vehicles and taillights of leading vehicles from one another, as well as, from other light sources.

Abstract: The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.

Abstract: An apparatus and method for absorbance detection in instrumental situations which have short absorption path lengths, such as microchip type devices, includes modulating the sample beam incident upon a sample cell to improve the sensitivity of the absorbance measurement. The modulation means includes a scanning device arranged to move the sample beam from a first position in which the sample beam is incident upon the sample area to a second position in which the sample beam is incident upon the cell.