Abstract: The invention relates to a surface treatment for a carbon surface. A carbon-rich silicon carbide layer is applied over the carbon surface. The ratio of silicon to carbon in the carbon-rich layer varies from zero at the carbon surface interface to greater than zero and preferably 0.3 to 0.5 on the surface of the carbon-rich layer remote from the interface. A preferred method of making the silicon carbide layer is also presented.

Abstract: A production method for producing a high permeability alloy film which includes evaporating an alloy material composed of 1-6 wt % Al, 20-35 wt % Si, and the remainder of iron by irradiating the alloy with an electron beam, and then depositing the vapor from the alloy material onto a substrate for a predetermined time to produce an alloy film composition having a high permeability. The vapor deposition onto the substrate is preferably intercepted with the shutter until the concentration of aluminum of the vapor to be deposited has been decreased to a value between 20 and about 4 wt %.

Abstract: A one step metallization is disclosed for applying a layer of gold or gold alloy to the back of a silicon substrate to facilitate bonding that substrate to a metallized package member. The gold is applied to the substrate, for example by evaporation, while the substrate is maintained at a temperature between about 200.degree. C. and about 360.degree. C. Following the deposition the substrate is quickly cooled to room temperature. The thickness of the gold layer and the deposition temperature are adjusted to insure that the silicon diffusion profile is contained within the gold film during deposition. This insures good adhesion of the gold to the silicon substrate and provides a pure gold surface layer necessary for optimum bonding of the semiconductor substrate to a metallized package portion.

Abstract: A very thin coating layer having a thickness of the order of angstroms of a hydroxymethyl substituted phenol is applied to the surface of a metal material. The hydroxylmethyl substituted phenol, such as saligenin, is applied in the gaseous phase to the surface of the metal material maintained at a high temperature.By forming this ultra-thin coating layer, the heat bondability of a thermoplastic resin layer to the metal material can be effectively improved. This technique is advantageously used in various fields, for example, for production of bonded cans.

Abstract: A method for artificially ageing wood in which the surface of the wood is subjected to the action of at least one jet of high velocity, high temperature gas, whereby the surface of the wood is scorched, and wherein a lacquer is subsequently applied to the treated surface.

Abstract: A process for preparing a ceramic substrate for metallization wherein a surface of the ceramic substrate is contacted with a composition containing one or more alkali metal compounds, preferably in the form of solid pellets. The pellets are melted on the ceramic surface. As the pellets melt, advancing waves of the molten composition spread across and wet the ceramic surface. The molten alkali metal composition is kept in contact with the ceramic surface for a time period sufficient to etch the surface and thus prepare it for adherent deposition of metal. The moving waves of melting composition supply fresh alkali metal compounds at the ceramic surface. After adhesion promotion, the ceramic surface is treated with compounds that promote adsorption of catalyst for metal deposition before being plated with metal. Uniform surface coverage with catalyst and metal and an improved adherent bond of metal to the ceramic surface are obtained.

Abstract: In forming a silicon nitride film by the low-pressure CVD method using a silane gas and ammonia, the reaction pressure is set to lie over a range of from about 0.05 to about 0.25 Torr, enabling a silicon nitride film to be formed, of uniform thickness, highly efficiently even on large wafers, and maintaining high yield, improved uniformity and good quality as a whole without decreasing the film-forming efficiency. Preferably, the reaction pressure is maintained over a range of from 0.1 to 0.2 Torr to further increase the efficiency, while preferably maintaining the temperature over a range of from 700.degree. to 1000.degree. C.

Abstract: A method of manufacturing diaphragms which are sensitive to fluoride ions, by depositing a poly-crystalline thin layer of difficulty soluble fluoride of 20 nm to 5,000 nm thick by means of sputtering or vaporization onto a substrate at temperatures of above 280.degree. C.

Abstract: In accordance with the invention, there is provided herein an improved chemical vapor deposition method for forming fluorine-doped tin oxide coatings using a liquid coating composition which includes a reactive organic fluorine dopant and an organotin compound. The method is carried out under a defined set of process conditions such that the coating produced has a minimum and constant sheet resistance which is substantially independent of deposition temperature.

Abstract: A novel curing process for preceramic organosilicon polymers is disclosed which involves contact with a gaseous thionyl chloride.

Abstract: Substrates such as aggregates, particularly for roadbuilding, are coated with asphalt by foaming the asphalt and mixing the hot asphalt foam with the aggregate. The asphalt is foamed by dispersing water in the hot asphalt as to maintain the water in the liquid phase and then vaporizing the water to form the foam structure.

Abstract: A process of coating a surface of an article which is capable of being heated, by contacting the heated surface of the article with a coating composition comprising an aqueous dispersion of an organic film-forming material which is sterically stabilized and which has a critical coalescence temperature which is lower than the temperature to which the surface of the article is heated. Suitable coating compositions are described.

Abstract: Disclosed is concrete surface coated with a cast in place surfacing composition comprising at least three layers, in order from the concrete surface:a first layer comprising: (1) a hard, epoxy resin, and (2) an inert, inorganic filler material consisting essentially of hollow ceramic beads;a second layer comprising a bonding agent which improves adhesion between said first and third layers, and;a third layer comprising: (1) 20 to 80 parts by weight of a polyurethane, said polyurethane formed by reacting a polyisocyanate with a polyurethane precursor at a mole ratio of 0.8 to 1.4:1, said polyurethane precursor comprising 15 to 60 parts by weight of a high molecular weight polyol and 2 to 10 parts by weight of a low molecular weight chain stiffener, (2) 20 to 80 parts by weight of a substantially non-volatile extender, and (3) 0 to 20 parts by weight of a volatile solvent.

Abstract: A process for producing a two element deposition coating on metals e.g. for oxidation/corrosion protection of superalloys, comprises halide transfer of the two elements in sequence from a reaction charge, the reaction charge including a significant excess of halide activator over the amount required for stoichiometric considerations. The transportation of the first element is terminated by reacting its source to exhaustion, in the course of the transport reaction or by evacuating from the reaction vessel. Preferred elements are aluminum with silicon and aluminum with chromium.

Abstract: A method is set forth of chemically vapor depositing a substantially uniform carbonaceous film on to each of a plurality of small refractory particles. Uncoated small refractory particles are intimately intermixed with an organic precursor in liquid or solid form, the intermixing being at a temperature below the sublimation, boiling or decomposition temperature of the precursor. The resulting intimate intermixture is subjected to a temperature of 700.degree. C. to 1200.degree. C. in a deposition zone which is substantially oxygen-free. Residence time in the deposition zone is restricted to be less than that which would deleteriously effect properties of the resulting coated particles. The organic precursor, under the residence time and temperature conditions in the deposition zone, is substantially completely converted by sublimation, boiling and/or decomposition to one or more vaporous species. The organic precursor is selected to either (1) sublime or boil at a temperature in excess of about 400.degree. C.

Abstract: Discontinuities, e.g. scratches, in a plastics surface are removed by exposing the surface to a pulsed radio frequency plasma comprising a mixture of argon and hydrogen. After melting has been effected the surface is exposed to an argon plasma to effect cross-linking to form a smooth surface layer.

Abstract: An electrically conducting material including a polymeric material having adsorbed sulfides of a first metal selected from copper, cobalt, tin, mercury and lead and of a second metal selected from silver, gold and elements of the platinum group. The polymeric material is in the form of powder or a shaped body such as a fiber, film or string and is formed of a synthetic polymer without cyanic groups such as a polyester or a polyamide or a naturally occurring polymeric substance such as silk or wool. The electrically conducting material may be prepared by treating the polymeric material with hydrogen sulfide, and then treating the resultant material having absorbed hydrogen sulfide with (a) a source of ions containing the first metal, (b) a source of ions containing the second metal and, optionally, (c) a sulfur-containing compound to form sulfides of the first and second metals adsorbed by the polymeric material.

Abstract: A cofired structure comprised of a refractory metal metallization supported by a substrate free of large voids is produced by forming a liquid phase sinterable ceramic composition containing SiO.sub.2 in some form and a sulfate of an alkali metal and/or an alkaline earth metal, admixing the composition with an organic binding medium, shaping the mixture into a thin sheet, contacting the sheet with refractory metal metallization material, and cofiring the resulting structure whereby the free carbon produced by pyrolysis of the organic medium is removed by reaction with the sulfate before closed porosity is initiated.

Abstract: For vacuum deposition plating steel strip, a vacuum deposition plating apparatus is used including an inlet-side vacuum sealing device provided in front of a vacuum deposition plating chamber, with an inlet-side inactive gas replacement chamber provided between the inlet-side vacuum sealing device and an annealing furnace. An outlet-side vacuum sealing device is provided at the rear of the vacuum deposition plating chamber, with an outlet-side inactive gas replacement chamber provided between the outlet-side vacuum sealing device and the atmosphere. An inactive gas circulating/purifying device circulates an inactive gas from vacuum chambers of both the vacuum sealing devices to atmospheric pressure chambers of both the vacuum sealing devices and removes water, oil and oxygen from the inactive gas. Oxygen and hydrogen in the inactive gas are regulated to provide 60 ppm or less of oxygen and 0.2 to 2.0% of hydrogen, and also to regulate the dew point of the inactive gas to -50.degree. C. or less.

Abstract: A process for the deposition, on an optical substrate, of an antireflection coating capable of being engraved. In the process, metal is evaporated in a reactive atmosphere within the enclosure of an evaporator under vacuum and then deposited on the substrate. Previously cleaned substrates are disposed within the enclosure, which is then evacuated until a pressure of at most 1.5 .mu.Pa (10.sup.-8 torr) is obtained. Pure oxygen is injected at a regulated throughput in such a manner that the pressure is within the range of from 2 to 4 mPa, preferably 3 mPa (2.times.10.sup.-5 torr). A heated boat which is disposed within the enclosure and contains chromium is unmasked. The chromium evaporates at a temperature such that a coating of chromium oxide grows in thickness on the substrates at a rate of 0.1 to 0.5 nm per second, preferably 0.2 nm per second.