Patents Examined by Sean M Luck
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Patent number: 10991565Abstract: Provided is an ion analyzer characterized by: an ionization chamber (10) to be maintained at atmospheric pressure; an analysis chamber (11) for analyzing an ion generated in the ionization chamber (10); a vacuum pump (15, 16) for evacuating the inside of the analysis chamber (11); a capillary (102) for allowing the ionization chamber (10) and the analysis chamber (11) to communicate with each other; a conductance changer (103, 104) for changing the conductance of the capillary (102); and a controller (20) for operating the conductance changer (103, 104) in such a manner as to decrease the conductance of the capillary (102) when the degree of vacuum in the analysis chamber (11) is lower than a predetermined degree of vacuum.Type: GrantFiled: December 17, 2015Date of Patent: April 27, 2021Assignee: SHIMADZU CORPORATIONInventor: Wataru Fukui
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Patent number: 10989698Abstract: A data independent acquisition method of mass spectrometry for analysing a sample as it elutes from a chromatography system is disclosed. The method comprises selecting a precursor mass range, and performing a plurality of MS1 scans and sets of MS2 scans across the precursor mass range. Each of the MS1 scans uses a mass analyser operated at a first, relatively higher resolution, for identification and/or quantitation of the sample in the MS1 domain. The set of MS2 scans comprises performing MS2 scans of fragmented mass range segments performed with the mass analyser, operated at a second, relatively lower resolution. In the method, the MS1 scans are interleaved throughout the performing of the set of MS2 scans such that the MS1 scans provide a mass chromatogram of the sample. The ratio of the number of MS1 scans to sets of MS2 scans performed across the chromatographic peak width is at least 3:1.Type: GrantFiled: May 5, 2020Date of Patent: April 27, 2021Assignee: Thermo Fisher Scientific (Bremen) GmbHInventor: Yue Xuan
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Patent number: 10991561Abstract: A mass spectrometer vacuum interface can include a skimmer apparatus having a skimmer aperture and an internal surface. A method of operating the mass spectrometer vacuum interface can include establishing an outwardly directed flow along the internal surface of the skimmer apparatus.Type: GrantFiled: October 15, 2019Date of Patent: April 27, 2021Assignee: Thermo Fisher Scientific (Bremen) GmbHInventors: Alexander Alekseevich Makarov, Lothar Rottmann
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Patent number: 10991544Abstract: A charged particle beam device for inspecting a specimen is described. The charged particle beam device includes a beam source for emitting a charged particle beam, an electrode for influencing the charged particle beam, and a damping unit provided on the electrode for damping vibrations of the electrode. Further, an objective lens module with an electrode is described, wherein a damping unit is provided on the electrode. Further, an electrode device is described, wherein a mass damper is mounted on a disk-shaped electrode body of the electrode device.Type: GrantFiled: May 29, 2019Date of Patent: April 27, 2021Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbHInventors: Matthias Firnkes, John Breuer, Florian Lampersberger, Hanno Kaupp, Stefan Lanio
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Patent number: 10991560Abstract: A method of mass or ion mobility spectrometry is disclosed that uses the Leidenfrost effect to cause a liquid to be repelled away from a heated surface so as to levitate above there-above. The repelled liquid is urged so as to move along the surface in a predetermined direction, for example, by the geometric configuration of the heated surface.Type: GrantFiled: May 30, 2019Date of Patent: April 27, 2021Assignee: Micromass UK LimitedInventors: Jeffery Mark Brown, Steve Bajic, Steven Derek Pringle
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Patent number: 10991564Abstract: The invention generally relates to mass spectrometry probes and systems for ionizing a sample. In certain embodiments, the invention provides a mass spectrometry probe including a substrate in which a portion of the substrate is coated with a material, a portion of which protrudes from the substrate.Type: GrantFiled: January 2, 2020Date of Patent: April 27, 2021Assignee: Purdue Research FoundationInventors: Robert Graham Cooks, Depanjan Sarkar, Thalappil Pradeep, Rahul Narayanan
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Patent number: 10984983Abstract: A particle beam system includes first and second particle beam columns. In a first operating mode, an end cap having an opening therein is outside a beam path of a first particle beam. In a second operating mode, the beam path of the first particle beam can extend through the opening of the end cap so that secondary particles coming from a work region can pass through the opening of the end cap to a detector in the interior of the first particle beam column. While the particle beam system is in the first operating mode, an image of an object arranged in the work region is recorded using the first particle beam column. While the particle beam system is in the second operating mode, the object is processed using a second particle beam.Type: GrantFiled: December 6, 2019Date of Patent: April 20, 2021Assignee: Carl Zeiss Microscopy GmbHInventors: Björn Gamm, Marko Matijevic
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Patent number: 10892064Abstract: A multi-leaf collimator is provided. The multi-leaf collimator may include a plurality of leaves configured to shield radiation beams. At least two leaves of the plurality of leaves may be movable in a direction parallel to each another. Each leaf of at least some of the plurality of leaves may be configured to be movable between at least two positions. At least one of the at least two positions may be adjustable.Type: GrantFiled: December 5, 2018Date of Patent: January 12, 2021Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.Inventors: Johannes Stahl, Jonathan Maltz
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Patent number: 10892151Abstract: A method of calibrating or optimising an analytical instrument is disclosed that comprises analysing analyte from a sample using an analytical instrument, determining a sample type of the sample based on analysis of analyte from the sample, identifying one or more species of the analyte that are known to be endogenous to the determined sample type, and calibrating or optimising the analytical instrument using the one or more identified endogenous species.Type: GrantFiled: June 1, 2016Date of Patent: January 12, 2021Assignee: Micromass UK LimitedInventors: Keith Richardson, Steven Derek Pringle, Michael Raymond Morris
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Patent number: 10884379Abstract: Method for acquisition of at least one hologram of a sample by off-axis holography using a transmission electron microscope, the microscope comprising an electron beam source, at least one objective lens, a sample holder, at electron biprism and means of displacing the electron beam in precession mode upstream from the sample holder and a compensator of the precession downstream from the sample holder, said method comprising the activation of means of displacing the electron beam in precession mode and the compensator and acquisition of a hologram of said sample in precession mode.Type: GrantFiled: November 20, 2018Date of Patent: January 5, 2021Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVESInventors: Victor Boureau, David Cooper
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Patent number: 10886103Abstract: In one embodiment, a data processing method is for processing data in a writing apparatus performing multiple writing by using multiple beams. The data is for controlling an irradiation amount for each beam. The method includes generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation position, and the plurality of layers corresponding to writing paths in multiple writing, performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each layer, calculating a sum of the irradiation amounts for the respective irradiation positions defined in the corrected irradiation amount data, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process based on the comparison result.Type: GrantFiled: June 5, 2019Date of Patent: January 5, 2021Assignee: NuFlare Technology, Inc.Inventors: Kei Hasegawa, Yoshiaki Onimaru, Hayato Kimura
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Patent number: 10879032Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.Type: GrantFiled: May 1, 2019Date of Patent: December 29, 2020Assignee: ASML Netherlands B.V.Inventors: Xuerang Hu, Xuedong Liu, Zhong-wei Chen, Weiming Ren
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Patent number: 10872753Abstract: In one embodiment, a high voltage power supply includes a DC voltage input, a converter for converting a DC voltage at the DC voltage input to an AC voltage, a booster for boosting the AC voltage to a boosted AC voltage, a rectifier in DC isolation from the DC voltage input, the rectifier operable to convert the boosted AC voltage to a high DC voltage at an isolated rectifier output, a high voltage DC output for outputting the high DC voltage, a voltage control input, and an error circuit coupled to the voltage control input and operable to reduce variation in the high DC voltage by driving a return side of the isolated rectifier output in response to feedback based on the high DC voltage.Type: GrantFiled: June 5, 2019Date of Patent: December 22, 2020Assignee: Agilent Technologies, Inc.Inventor: David Deford
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Patent number: 10874013Abstract: Provided herein are systems, devices, articles of manufacture, and methods for generating neutrons employing a high energy ion beam target (HEIB target) and a target backing configured to be in contact with the bottom surface of the HEIB target (e.g., to generate an ion beam target assembly). In certain embodiments, the HEIB target has a thickness that is less than the penetration depth of protons or deuterons in the high energy ion beam that strikes the target. In certain embodiments, the target backing comprises a high hydrogen diffusion metal (e.g., palladium), has open spaces dispersed throughout for reduced proton diffusion distances, and has a shape and thickness such that all, or virtually all, of the protons or deuterons that pass through the HEIB target are stopped. Also provided herein are systems, devices, and methods for changing targets in an ion beam accelerator system.Type: GrantFiled: June 4, 2019Date of Patent: December 22, 2020Assignee: PHOENIX NEUTRON IMAGING LLCInventors: Ross Radel, Tye Gribb
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Patent number: 10832886Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: GrantFiled: March 4, 2019Date of Patent: November 10, 2020Assignee: Hitachi High-Tech CorporationInventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
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Patent number: 10804088Abstract: A mass spectrometry method comprises: generating ions; directing the ions through an ion optical component within a first chamber having a first vacuum pressure, the ion optical component maintained at a first electrical potential; transferring the ions through an ion guide within a second chamber having a second vacuum pressure less than the first vacuum pressure, the ion guide maintained at a second electrical potential, wherein a difference between the first and second potentials imparts kinetic energy that causes collision-induced ion fragmentation within the second chamber that removes adduct species; and transferring the ions into another ion guide within a third chamber having a third vacuum pressure less than the second vacuum pressure, the other ion guide maintained at a third electrical potential, wherein a difference between the third and second potentials reduces a portion of the imparted kinetic energy of the ions passing into the third chamber.Type: GrantFiled: May 30, 2019Date of Patent: October 13, 2020Assignee: Thermo Finnigan LLCInventors: Michael P. Goodwin, Michael W. Senko, Graeme C. McAlister
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Patent number: 10804066Abstract: A method for routing data for an e-beam writer includes, with a switching device of the e-beam writer, receiving a packet. The method further includes, with a scheduling engine of the switching device, routing the packet to one of a plurality of output buffers, wherein the routing is based on availabilities of the plurality of output buffers and vacancy levels of memory devices associated with the plurality of output buffers. The method further includes, with the switching device, outputting the packet from an output port associated with a memory device to which the packet is routed.Type: GrantFiled: October 14, 2019Date of Patent: October 13, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Jensen Yang, Shy-Jay Lin, Yen-Hao Huang
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Patent number: 10779388Abstract: An extreme ultraviolet (EUV) generation device includes a housing module including a housing body whose inside is maintained in a vacuum state and an exit window formed on one side of the housing body, a laser source which emits lasers toward the inside of the housing body through the exit window, a plasma generation module which is located inside the housing body and generates plasma by allowing the lasers to be emitted toward a plasma gas, which flows into a laser focal area, and a radio frequency (RF) power supply module which preionizes the plasma gas before the plasma gas flows into the laser focal area.Type: GrantFiled: December 20, 2018Date of Patent: September 15, 2020Assignee: Samsung Electronics Co., Ltd.Inventor: Byeong Hwan Jeon
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Patent number: 10777399Abstract: A method of analysis is disclosed comprising providing a sample on an insulating substrate such as a petri dish (4) and contacting e.g. the rear surface of the insulating substrate with a first electrode (9). The method further comprises contacting the sample with a second electrode (2) and applying an AC or RF voltage to the first and second electrodes (9,2) in order to generate an aerosol from the sample.Type: GrantFiled: September 22, 2016Date of Patent: September 15, 2020Assignee: Micromass UK LimitedInventors: Steven Derek Pringle, Lajos Godorhazy, Daniel Simon, Daniel Szalay, Zoltan Takats, Tamas Karancsi
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Patent number: 10770279Abstract: An ion transfer apparatus for transferring ions from an ion source at an ion source pressure, which ion source pressure is greater than 500 mbar, along a path towards a mass analyser at a mass analyser pressure that is lower than the ion source pressure. The apparatus includes a plurality of pressure controlled chambers, wherein each pressure controlled chamber in the ion transfer apparatus includes an ion inlet opening for receiving ions from the ion source on the path and an ion outlet opening for outputting the ions on the path. The plurality of pressure controlled chambers are arranged in succession along the path from an initial pressure controlled chamber to a final pressure controlled chamber, wherein an ion outlet opening of each pressure controlled chamber other than the final pressure controlled chamber is in flow communication with the ion inlet opening of a successive adjacent pressure controlled chamber.Type: GrantFiled: October 20, 2016Date of Patent: September 8, 2020Assignee: SHIMADZU CORPORATIONInventors: Roger Giles, Alina Giles