Patents Examined by Shamim Ahmed
  • Patent number: 10598832
    Abstract: Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
    Type: Grant
    Filed: January 9, 2018
    Date of Patent: March 24, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Morgan Evans, Rutger Meyer Timmerman Thijssen, Joseph Olson, Peter Kurunczi, Robert Masci
  • Patent number: 10600653
    Abstract: A method for forming a fine pattern includes forming line patterns and a connection pattern on a semiconductor substrate, the line patterns extending in a first direction and spaced apart from each other in a second direction intersecting the first direction, and the connection pattern connecting portions of the line patterns adjacent to each other in the second direction, and performing an ion beam etching process on the connection pattern. The ion beam etching process provides an ion beam in an incident direction parallel to a plane defined by the first direction and a third direction perpendicular to a top surface of the semiconductor substrate, and the incident direction of the ion beam is not perpendicular to the top surface of the semiconductor substrate.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: March 24, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: KeunHee Bai, Jongchul Park, Seungjun Kim, Seungju Park, Young-Ju Park, Hak-Sun Lee
  • Patent number: 10591221
    Abstract: A window assembly heat transfer system is disclosed in which a window member has a selected transparency to monitored or sensed light wavelengths. One or more passages are provided in the window member for flowing a single-phase or two-phase heat transfer fluid, the passages being optically non-transparent to the monitored or sensed light wavelengths. A mechanism allows either evaporation or condensation of the fluid and/or balancing of a flow of the fluid within the passages. In one embodiment, the window assembly can be made by producing passages in a top surface of a first single plate, optionally producing passages in a bottom surface of a second single plate and bonding the top surface of the first plate to a bottom surface of a second single plate to form the window member with the passage or passages. In another embodiment, the window assembly can be made by providing a core around which the window member material is grown and thereafter removing the core to produce the passage or passages.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: March 17, 2020
    Assignee: Mainstream Engineering Corporation
    Inventors: Brian P. Tucker, Joshua D. Sole, Justin J. Hill, Robert P. Scaringe
  • Patent number: 10593551
    Abstract: A method for manufacturing a reticle for double patterning includes providing a first reticle for a first patterning and a second reticle for a second patterning according to a target pattern, the first reticle having a first mask pattern, and the second reticle having a second mask pattern, the first patterning being performed before the second patterning, and forming a sub-resolution assist feature (SRAF) pattern at a gap of the first mask pattern of the first reticle. The SRAF pattern is covered by the second mask pattern of the second reticle and has a size sufficient large to enable a transfer of the SRAF pattern to a material to be patterned in the first patterning.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: March 17, 2020
    Assignees: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION, SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventor: Qing Yang
  • Patent number: 10591721
    Abstract: A method for manufacturing a protective wafer including a frame wafer and an optical window, and to a method for manufacturing a micromechanical device including such a protective wafer having an inclined optical window. Also described are a protective wafer including a frame wafer and an optical window, and a micromechanical device including a MEMS wafer and such a protective wafer, which delimit a cavity, the protective wafer including an inclined optical window.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: March 17, 2020
    Assignee: Robert Bosch GmbH
    Inventor: Stefan Pinter
  • Patent number: 10583458
    Abstract: A method for coating hollow fiber membranes is disclosed. The method includes preparing a continuous circulating circuit, which includes a membrane contactor module, two liquid reservoirs containing a solvent, two pipeline paths, and at least one injector. The membrane module include a plurality of hollow fiber membranes with an inside area and an outside area, and a housing, where the plurality of hollow fiber membranes are extended inside the housing.
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: March 10, 2020
    Inventors: Hasan Farrokhzad, Ali Poorkhalil
  • Patent number: 10577805
    Abstract: The present invention relates to a method for applying a wallpaper material onto a surface comprising the steps of providing a liquid suspension comprising cellulosic fibers wherein at least part of said cellulosic fibers comprises microfibrillated cellulose and wherein said liquid suspension has a dry content of at least 10% by weight, applying at least one layer of said liquid suspension onto the surface, drying said liquid suspension layer after it has been applied onto the surface, and thereby forming a dry fiber web layer, wherein said fiber web layer forms said wallpaper material.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: March 3, 2020
    Assignee: Stora Enso OYJ
    Inventors: Isto Heiskanen, Duncan Mayes, Simo Siitonen
  • Patent number: 10577575
    Abstract: Embodiments for coating a bioreactor with a reagent are described. The embodiments may provide for changing flow rates, direction of flow, and/or bioreactor rotation to enhance the coating of the bioreactor prior to growing cells in the bioreactor.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: March 3, 2020
    Assignee: Terumo BCT, Inc.
    Inventor: Nathan D. Frank
  • Patent number: 10578981
    Abstract: Methods for post-lithographic inspection using an e-beam inspection tool of organic extreme ultraviolet sensitive (EUV) sensitive photoresists generally includes conformal deposition of a removable metal carboxide or metal carboxynitride onto the relief image. The conformal deposition of the metal carboxide or metal carboxynitride includes a low temperature vapor deposition process of less than about 100° C. to provide a coating thickness of less than about 5 nanometers. Subsequent to e-beam inspection, the metal carboxide or metal carboxynitride coating is removed using a wet stripping process. Once stripped, the wafer can continue on to further process fabrication without being a sacrificial wafer.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: March 3, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Luciana Meli Thompson, Ekmini A. De Silva, Yasir Sulehria, Nelson Felix
  • Patent number: 10577511
    Abstract: Hydrophobic materials, processes for their production, and uses thereof are described. The materials can be made with silica or polytetrafluoroethylene particles embedded into a liquid polymer. The hydrophobic materials are stretchable.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: March 3, 2020
    Assignee: Battelle Memorial Institute
    Inventors: Curtis J. Larimer, Raymond S. Addleman, Michelle R. Brann, George T. Bonheyo, Eric M. Winder
  • Patent number: 10573524
    Abstract: A process for chemical mechanical polishing a substrate containing titanium nitride and titanium is provided comprising: providing a polishing composition, containing, as initial components: water; an oxidizing agent; a linear polyalkylenimine polymer; a colloidal silica abrasive with a positive surface charge; a carboxylic acid; a source of ferric ions; and, optionally pH adjusting agent; wherein the polishing composition has a pH of 1 to 4; providing a chemical mechanical polishing pad, having a polishing surface; creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition onto the polishing surface at or near the interface between the polishing pad and the substrate; wherein at least some of the titanium nitride and at least some of the titanium is polished away with a selectivity between titanium nitride and titanium.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: February 25, 2020
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Wei-Wen Tsai, Cheng-Ping Lee, Jiun-Fang Wang
  • Patent number: 10569068
    Abstract: Method for targeted application of active agents to a target surface including the steps of: (a) capturing an image of the target surface; (b) transforming the image into a digital geometric representation of the target surface; (c) forming an applicator mask having an applicator surface with a three-dimensional shape corresponding to the target surface; (d) disposing the active agent on the applicator surface of the applicator mask; (e) disposing the applicator mask on the target surface so that the active agent is in contact with the target surface; and (f) removing the applicator mask from the target surface while leaving at least some of the active agent in contact with the target surface.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: February 25, 2020
    Assignee: The Procter & Gamble Company
    Inventors: Scott Kendyl Stanley, Michael Sean Farrell, Andrew Paul Rapach
  • Patent number: 10570316
    Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Colloidal or fumed inorganic particles (A) or a mixture thereof in a total amount of from 0.0001 to 2.5 wt.-% based on the total weight of the respective CMP composition (B) at least one amino acid in a total amount of from 0.2 to 1 wt.-% based on the total weight of the respective CMP composition (C) at least one corrosion inhibitor in a total amount of from 0.001 to 0.02 wt.-% based on the total weight of the respective CMP composition (D) hydrogen peroxide as oxidizing agent in a total amount of from 0.0001 to 2 wt.-% based on the total amount of the respective CMP composition (E) aqueous medium wherein the CMP composition (Q) has a pH in the range of from 6 to 9.5.
    Type: Grant
    Filed: July 14, 2015
    Date of Patent: February 25, 2020
    Assignee: BASF SE
    Inventors: Robert Reichardt, Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman Guevenc, Julian Proelss, Sheik Ansar Usman Ibrahim, Reza Golzarian
  • Patent number: 10569296
    Abstract: The invention relates to a method for performing a coating process of a workpiece (4), comprising the steps of: providing the workpiece (4) in a coating unit (2); prefilling (S2) the coating unit (2) with a coating medium using a pump (6); filling (S3) the coating unit (2) with the coating medium by a dosing unit (5), wherein a predetermined amount of coating medium is applied to the coating unit (2) by the dosing unit (5) as soon the coating medium level has reached a given reference level (R).
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: February 25, 2020
    Assignee: UMICORE AG & CO. KG
    Inventor: Stéphane Masson
  • Patent number: 10568204
    Abstract: A method for making conformal non-planar multi-layer circuitry is described. The method can include providing a substrate having a non-planar surface and depositing a first conformal dielectric layer on the substrate, the first conformal dielectric layer conforming to the non-planar surface of the substrate and having a non-planar surface. The method can also include applying a first conformal circuitry layer on the first conformal dielectric layer. The method can include depositing a second conformal dielectric layer on the first conformal circuitry layer, the second conformal dielectric layer conforming to a non-planar surface of the first conformal circuitry layer, and applying a second conformal circuitry layer on the second conformal dielectric layer. Successive layers can be sequentially deposited. Microvias may provide electrical connections between circuit layers.
    Type: Grant
    Filed: January 22, 2018
    Date of Patent: February 18, 2020
    Assignee: LOCKHEED MARTIN CORPORATION
    Inventors: Stephen Gonya, Kenn Twigg, Jim Patterson
  • Patent number: 10557060
    Abstract: A process for chemical mechanical polishing a substrate containing tungsten and titanium is provided comprising: providing the substrate; providing a polishing composition, containing, as initial components: water; an oxidizing agent; an allylamine additive; a carboxylic acid; a source of iron ions; a colloidal silica abrasive with a positive surface charge; and, optionally pH adjusting agent; providing a chemical mechanical polishing pad, having a polishing surface; creating dynamic contact at an interface between the polishing pad and the substrate; and dispensing the polishing composition onto the polishing surface at or near the interface between the polishing pad and the substrate; wherein the tungsten (W) is selectively polished away from the substrate relative to the titanium (Ti).
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: February 11, 2020
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Lin-Chen Ho, Wei-Wen Tsai, Cheng-Ping Lee, Jiun-Fang Wang
  • Patent number: 10559495
    Abstract: A method for processing semiconductor dice comprises removing material from a surface of a semiconductor wafer to create a pocket surrounded by a sidewall at a lateral periphery of the semiconductor wafer, forming a film on a bottom of the pocket and securing semiconductor dice to the film in mutually spaced locations. A dielectric molding material is placed in the pocket over and between the semiconductor dice, material is removed from another surface of the semiconductor wafer to expose the film, bond pads of the semiconductor dice are exposed, redistribution layers in electrical communication with the bond pads of associated semiconductor dice are formed, and the redistribution layers and associated semiconductor dice are singulated along spaces between the semiconductor dice.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: February 11, 2020
    Assignee: Micron Technology, Inc.
    Inventors: Andrew M. Bayless, James M. Derderian, Xiao Li
  • Patent number: 10559475
    Abstract: A method for performing atomic layer etching (ALE) on a substrate is provided, including the following operations: performing a surface modification operation on a substrate surface, the surface modification operation configured to convert at least one monolayer of the substrate surface to a modified layer, wherein a bias voltage is applied during the surface modification operation, the bias voltage configured to control a depth of the substrate surface that is converted by the surface modification operation; performing a removal operation on the substrate surface, the removal operation configured to remove at least a portion of the modified layer from the substrate surface, wherein removing the portion of the modified layer includes applying thermal energy to effect desorption of the portion of the modified layer. A plasma treatment can be performed to remove residues from the substrate surface following the removal operation.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: February 11, 2020
    Assignee: Lam Research Corporation
    Inventors: Andreas Fischer, Thorsten Lill, Richard Janek
  • Patent number: 10549310
    Abstract: A device applies a coating to a surface of an turbomachine annular casing, wherein the casing has an abradable layer obtained by polymerising a resin. The device includes first support means and, optionally, second automated means movable relative to the first support means. The automated means includes means for depositing said resin on the surface of the casing. The automated means further includes means for spreading the resin on the surface of the casing, and means for unwinding a plastic film that is intended to be interposed between said spreading means and the resin.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: February 4, 2020
    Assignee: SAFRAN AIRCRAFT ENGINES
    Inventors: Thierry Sacy, Patrice Le Bec, Philippe Charles Alain Le Biez, Serge Georges Vladimir Selezneff, Franck Bernard Léon Varin, Michel Lenfant, Fabrice Marsaleix, Jacques Chazal Dufour
  • Patent number: 10538677
    Abstract: A composition for application to a base material, rendering the base material able to shield alternating electromagnetic fields in the range from low frequencies up to radio frequencies, includes an aqueous solution of a hydratable salt; a modifier selected from the group consisting of acrylic dispersions, styrene-acrylic dispersions, silicone emulsions and combinations thereof; and an enhancing additive selected from the group consisting of surface active agents, aluminosilicates, silicates, soluble calcium compounds, insoluble calcium compounds, metal oxides, metalloid oxides and combinations thereof. The alternating field is shielded at least in the range from 10?2 Hz to 106 Hz. The composition may be used to coat/impregnate fibrous and/or porous matrices.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: January 21, 2020
    Assignee: Selena Labs Sp. z o.o.
    Inventor: Stanislaw Wosiński