Patents Examined by Shamim Ahmed
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Patent number: 11939672Abstract: A nanoscale plate structure includes base plates and rib plates with nanoscale thickness and macroscopic lateral dimensions. The base plate resides in the first plane, the ribs can reside out-of-plane and form at least one strengthening rib, and additional base plates can reside in planes parallel to the first plane. The strengthening rib can be patterned such that there is no straight line path extending through a lateral dimension of the plate structure that does not intersect the at least one base plate and the at least one strengthening rib. The plates and ribs used in the structure have a thickness between about 1 nm and about 100 nm. The plate structures can be fabricated using a conformal deposition method including atomic layer deposition.Type: GrantFiled: December 3, 2021Date of Patent: March 26, 2024Assignee: THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIAInventors: Igor Bargatin, Keivan Davami
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Patent number: 11938511Abstract: A coating method includes supplying a film forming liquid onto a center of a front surface of a substrate from a nozzle in a state that a distance between the front surface and the nozzle is maintained at a coating distance; rotating the substrate at a first rotation speed in a period during which the film forming liquid is supplied onto the front surface, to allow the film forming liquid to be diffused toward an edge of the substrate from an outer periphery of the nozzle; and rotating the substrate at a second rotation speed after the supplying of the film forming liquid is stopped, to allow the film forming liquid to be further diffused. The coating distance is set to allow the film forming liquid to be kept between the nozzle and the front surface when a discharge of the film forming liquid is stopped.Type: GrantFiled: June 30, 2022Date of Patent: March 26, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Masatoshi Kawakita, Yusaku Hashimoto, Kosuke Yoshihara
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Patent number: 11931774Abstract: Disclosed is a method for treating wood veneer, including the steps of providing at least one sheet of wood veneer; coating at least one side of the sheet of wood veneer with an aqueous coating composition including nanocellulose to obtain a coated sheet of wood veneer; and drying the coated sheet using compression pressure and heat. Also disclosed is a coated wood veneer including a sheet of wood veneer and a coating including nanocellulose arranged on at least one surface of the sheet.Type: GrantFiled: January 16, 2019Date of Patent: March 19, 2024Assignees: TEKNOLOGIAN TUTKIMUSKESKUS VTT OY, AALTO UNIVERSITY FOUNDATION SRInventors: Jaakko Pere, Vesa Kunnari, Matti Kairi, Pekka Ahtila
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Patent number: 11926113Abstract: An optical element and a method for manufacturing the optical element are described. The optical element includes a transparent substrate, an optical layer, and an adhesive layer. The optical layer is located on a surface of the transparent substrate. The optical layer has a first surface and a second surface, which are opposite to each other. The first surface is set with various diffracting optical structures. A refractive index of the optical layer is equal to or greater than 1.4. The adhesive layer is sandwiched between the surface of the transparent substrate and the second surface of the optical layer.Type: GrantFiled: August 3, 2022Date of Patent: March 12, 2024Assignee: HIMAX TECHNOLOGIES LIMITEDInventors: Han Yi Kuo, Shu-Hao Hsu, Yin Tung Lu
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Patent number: 11926523Abstract: Embodiments of the disclosure provide methods for microfabricating an omni-view peripheral scanning system. One exemplary method may include separately fabricating a reflector and a scanning MEMS mirror, and then bonding the microfabricated reflector with the scanning MEMS mirror to form the omni-view peripheral scanning system. The microfabricated reflector may include a cone-shaped bottom portion, and a via hole across the cone-shaped bottom portion. The microfabricated scanning MEMS mirror may include a MEMS actuation platform and a scanning mirror supported by the MEMS actuation platform. The scanning MEMS mirror may face the cone-shaped bottom portion of the reflector when forming the omni-view peripheral scanning system.Type: GrantFiled: September 9, 2021Date of Patent: March 12, 2024Assignee: BEIJING VOYAGER TECHNOLOGY CO., LTD.Inventors: Youmin Wang, Yue Lu
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Patent number: 11915952Abstract: The present application provides a temperature control method, an apparatus, an electronic device and a storage medium for an etching workbench. A real-time temperature of an etching workbench and a real-time temperature of a temperature control fluid are acquired firstly; then, a temperature control instruction is determined according to the real-time temperature of the etching workbench, the real-time temperature of the temperature control fluid and a limit temperature; and finally, in response to the temperature control instruction, a target operating temperature of the etching workbench is stabilized within a preset range by a circulating temperature control fluid loop.Type: GrantFiled: June 7, 2021Date of Patent: February 27, 2024Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.Inventors: Yong Fang, Chien Chung Wang
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Patent number: 11913119Abstract: A manufacturing method is provided during which a preform component for a turbine engine is provided. The preform component includes a substrate and a locating feature at an exterior surface of the substrate. An outer coating is applied over the substrate. The outer coating covers the locating feature. At least a portion of the preform component and the outer coating are scanned with an imaging system to provide scan data indicative of a location of the locating feature. A cooling aperture is formed in the substrate and the outer coating based on the scan data.Type: GrantFiled: August 13, 2021Date of Patent: February 27, 2024Assignee: RTX CORPORATIONInventors: Brian Craig, James M. Koonankeil, Brian T. Hazel, Paul E. Denney, Dominic J. Mongillo
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Patent number: 11915926Abstract: A porous thin film includes a framework that includes a plurality of pores. The pores extend from an opening located at an upper surface of the framework to a bottom surface contained in the framework. A pore-coating film is formed on sidewalls and the bottom surface of the pores.Type: GrantFiled: September 27, 2021Date of Patent: February 27, 2024Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Leonidas Ernesto Ocola, Eric A. Joseph, Hiroyuki Miyazoe, Takashi Ando, Damon Brooks Farmer
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Patent number: 11905592Abstract: In various aspects of the disclosure, a method of operating a process group that performs at least a first reactive coating process and a second reactive coating process may comprise: coating of a substrate by means of the first reactive coating process and by means of the second reactive coating process; closed-loop control of the process group by means of a first manipulated variable of the first coating process and a second manipulated variable of the second coating process and using a correction element; wherein the correction element relates the first manipulated variable and the second manipulated variable to one another in such a way that their control values are different from one another.Type: GrantFiled: September 2, 2020Date of Patent: February 20, 2024Inventors: Ralf Biedermann, Bernd Teichert, Thomas Meyer, Torsten Dsaak
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Patent number: 11905598Abstract: An object is to coat a target position on a substrate with a dense film. In order to achieve the object, while a substrate on which a base containing a coating material is formed is transported, an auxiliary agent is applied to the substrate, and then a main agent containing a coating material is applied to the substrate to react the main agent with the auxiliary agent, so that a portion on the substrate where the base is formed is coated with the coating material.Type: GrantFiled: September 2, 2022Date of Patent: February 20, 2024Assignee: FUJIFILM CorporationInventors: Eijiro Iwase, Keio Okano, Katsuyuki Nukui
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Patent number: 11906763Abstract: A method of fabricating a blazed diffraction grating comprises providing a master template substrate and imprinting periodically repeating lines on the master template substrate in a plurality of master template regions. The periodically repeating lines in different ones of the master template regions extend in different directions. The method additionally comprises using at least one of the master template regions as a master template to imprint at least one blazed diffraction grating pattern on a grating substrate.Type: GrantFiled: July 19, 2022Date of Patent: February 20, 2024Assignee: Magic Leap, Inc.Inventors: Shuqiang Yang, Kang Luo, Vikramjit Singh, Frank Y. Xu
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Patent number: 11901192Abstract: To provide an etching processing method and an etching processing apparatus which allow an aluminum oxide film to be etched with high accuracy and with a high selectivity to each of a silicon oxide film and a silicon nitride film, the etching processing method includes the step of placing, in a processing chamber, a wafer having the aluminum oxide film disposed on an upper surface thereof, maintaining the wafer at a temperature of ?20° C. or less, and supplying vapor of hydrogen fluoride from a plurality of through holes in a plate-like member disposed above the upper surface of the wafer with a predetermined gap being provided therebetween only for a predetermined period to etch the aluminum oxide film.Type: GrantFiled: June 30, 2020Date of Patent: February 13, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Hiroto Otake, Takashi Hattori
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Patent number: 11892676Abstract: Embodiments described herein provide for methods of forming angled optical device structures. The methods described herein utilize etching a mandrel material with an etch chemistry that is selective to the hardmask, i.e., the mandrel material is etched at a higher rate than the hardmask. Therefore, mandrel trenches are formed in the mandrel material. Device material of the angled optical device structures to be formed is deposited on the plurality of angled mandrels. An angled etch process is performed on portions of the device material such that the angled optical device structures are formed.Type: GrantFiled: January 10, 2022Date of Patent: February 6, 2024Assignee: Applied Materials, Inc.Inventors: Rutger Meyer Timmerman Thijssen, Ludovic Godet
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Patent number: 11886122Abstract: A method comprising providing a carbonaceous material, the substrate having a first thermal conductivity. The method further comprises depositing a first masking layer having a second thermal conductivity on at least a portion of the substrate, a ratio of the second thermal conductivity to the first thermal conductivity being less than or equal to 1:30. The method further comprises depositing a second masking layer on the first masking layer to form an etch mask, and etching an exposed portion of the substrate.Type: GrantFiled: June 24, 2021Date of Patent: January 30, 2024Assignees: FRAUNHOFER USA, INC., THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORKInventors: Jung-Hun Seo, Yixiong Zheng, Matthias Muehle
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Patent number: 11885013Abstract: Methods and systems for depositing vanadium nitride layers onto a surface of the substrate and structures and devices formed using the methods are disclosed. An exemplary method includes using a cyclical deposition process, depositing a vanadium nitride layer onto a surface of the substrate. The cyclical deposition process can include providing a vanadium halide precursor to the reaction chamber and separately providing a nitrogen reactant to the reaction chamber. The cyclical deposition process may desirably be a thermal cyclical deposition process.Type: GrantFiled: December 7, 2020Date of Patent: January 30, 2024Assignee: ASM IP Holding B.V.Inventors: Giuseppe Alessio Verni, Qi Xie, Henri Jussila, Charles Dezelah, Jiyeon Kim, Eric James Shero, Paul Ma
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Patent number: 11880165Abstract: Disclosed is a method including the following steps: a) providing a substrate including a first silicon layer, a second silicon layer and an intermediate silicon oxide layer therebetween; b) etching the first silicon layer in order to form the timepiece components therein; c) releasing from the substrate a wafer formed by at least all or part of the etched, first silicon layer and including the timepiece components; d) thermally oxidizing and then deoxidizing the timepiece components; e) forming by thermal oxidation or deposition a silicon oxide layer on the timepiece components; f) detaching the timepiece components from the wafer.Type: GrantFiled: March 19, 2019Date of Patent: January 23, 2024Assignee: PATEK PHILIPPE SA GENEVEInventor: Sylvain Jeanneret
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Patent number: 11881400Abstract: Provided is a silicon-containing layer forming composition for forming a silicon-containing layer which exhibits an anti-reflective function during exposure in a multilayer resist process and, during dry etching, shows a high etching rate against a plasma of fluorine-based gas and a low etching rate against a plasma of oxygen-based gas. The silicon-containing layer forming composition includes a polysiloxane compound having a structural unit of the formula: [(R1)bR2mSiOn/2] and a solvent. In the formula, R1 is a group represented by the following formula: (where a is an integer of 1 to 5; and a wavy line means that a line which the wavy line intersects is a bond); R2 is each independently a hydrogen atom, a C1-C3 alkyl group, a phenyl group, a hydroxy group, a C1-C3 alkoxy group or a C1-C3 fluoroalkyl group; b is an integer of 1 to 3; m is an integer of 0 to 2; n is an integer of 1 to 3; and a relationship of b+m+n=4 is satisfied.Type: GrantFiled: July 26, 2022Date of Patent: January 23, 2024Assignee: Central Glass Company, LimitedInventors: Junya Nakatsuji, Kazuhiro Yamanaka
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Patent number: 11879688Abstract: A window assembly heat transfer system is disclosed in which a window member has a selected transparency to monitored or sensed electromagnetic wavelengths. One or more passages are provided in the window member for flowing a single-phase or two-phase heat transfer fluid. A mechanism allows either evaporation or condensation of the fluid and/or balancing of a flow of the fluid within the passages. In one embodiment, the window assembly can be made by producing passages in a top surface of a first single plate, optionally producing passages in a bottom surface of a second single plate and bonding the top surface of the first plate to a bottom surface of a second single plate to form the window member with the passage or passages. In another embodiment, the window assembly can be made by providing a core around which the window member material is grown and thereafter removing the core to produce the passage or passages.Type: GrantFiled: August 25, 2022Date of Patent: January 23, 2024Assignee: Mainstream Engineering CorporationInventors: Brian P. Tucker, Joshua D. Sole, Justin J. Hill, Robert P. Scaringe
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Patent number: 11878323Abstract: A powder-coating process of a brake caliper has in sequence the steps of: (a) preparing the brake caliper; (b) applying masking elements to at least one seat and/or duct of said brake caliper; (c) distributing the coating powder on at least one portion of said brake caliper; (d) removing the at least one masking element by automated de-masking means; (e) curing inside a curing oven.Type: GrantFiled: May 16, 2019Date of Patent: January 23, 2024Assignee: Brembo S.p.A.Inventors: Gianluigi Roncalli, Alessio Garghentini
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Patent number: 11878489Abstract: A method for manufacturing a sandwich panel for a vehicle includes: etching a sheet, which etches one surface of a metal sheet; pressing the sheet, which forms a pattern of a specific shape on the one surface of the metal sheet; laminating a pair of the metal sheets; and performing injection-molding by injecting a plastic resin into the laminated pair of the metal sheets. The method may improve the bonding performance of the sandwich panel, thereby improving the degree of freedom of shape due to the press-molding.Type: GrantFiled: January 21, 2021Date of Patent: January 23, 2024Assignees: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION, IL KWANG POLYMER. CO., LTDInventors: Jae-Gi Sim, Hyo-Moon Joo, Yong-Wan Jo