Patents Examined by Shamim Ahmed
  • Patent number: 10800711
    Abstract: A ceramic and plastic composite and a method for fabricating the same are disclosed. A chemical cleaning treatment, a microetching treatment, a hole reaming treatment, and a surface activating treatment are performed on the surface of a ceramic matrix to form nanoholes with an average diameter ranging between 150 nm and 450 nm. Plastics are injected onto the surface of the baked ceramic matrix to form a plastic layer. The plastic layer more deeply fills the nanoholes to have higher adhesion. Thus, the higher combined strength and air tightness exist between the ceramic matrix and the plastic layer to improve the reliability and the using performance of the ceramic and plastic composite.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: October 13, 2020
    Assignees: COXON PRECISE INDUSTRIAL CO., LTD, SINXON PLASTIC (DONG GUAN) CO., LTD, DONG GUAN CHENG DA METAL PRODUCT CO., LTD, DONG GUAN CHENSONG PLASTIC CO., LTD
    Inventors: Wen-Tung Chang, Jong-Yi Su
  • Patent number: 10796890
    Abstract: There is disclosed a plasma processing apparatus for processing a wafer put on a sample stage disposed in a processing chamber within a vacuum vessel by the use of a plasma generated in the processing chamber after mounting the wafer on the sample stage. The apparatus has heaters in areas of the interior of the sample stage which are divided radially and circumferentially. At least those of the heaters which are arranged in the areas located in the radially outer position include circumferentially arranged heater portions that are connected in series. The amounts of heat generated by these circumferentially arranged heater portions are adjusted.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: October 6, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Hironori Kusumoto, Yutaka Ohmoto, Kazunori Nakamoto, Koji Nagai
  • Patent number: 10792683
    Abstract: A paint spraying apparatus includes a supporting structure, a lower nozzle unit, and an upper nozzle unit. The lower nozzle unit includes lower flexible tubes and nozzles, and ejects powder paint toward an eye portion on a lower side of a stabilizer. The upper nozzle unit includes a first frame and a second frame. First flexible tubes are arranged on the first frame. Second flexible tubes are arranged on the second frame. The upper nozzles eject the powder paint toward an eye portion on an upper side of the stabilizer.
    Type: Grant
    Filed: April 17, 2018
    Date of Patent: October 6, 2020
    Assignee: NHK SPRING CO., LTD.
    Inventors: Yasuharu Sakurai, Yoshihiro Koshita, Akifumi Otani
  • Patent number: 10790155
    Abstract: In a method of forming a groove pattern extending in a first axis in an underlying layer over a semiconductor substrate, a first opening is formed in the underlying layer, and the first opening is extended in the first axis by directional etching to form the groove pattern.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: September 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Yung-Sung Yen, Ken-Hsien Hsieh, Chin-Hsiang Lin
  • Patent number: 10773282
    Abstract: Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: September 15, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Brian J. Coppa, Deepak Vedhachalam, Francois C. Dassapa
  • Patent number: 10775158
    Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: September 15, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Joseph C. Olson, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Morgan Evans
  • Patent number: 10773993
    Abstract: A cover glass and a manufacturing method thereof are provided, the method includes: coating a first organic layer on a transparent substrate; forming first via holes on the first organic layer at intervals, heating and melting the first organic layer to flow; wet-etching the transparent substrate having the first organic layer to form a first microstructure on a region of the transparent substrate not shielded by the first organic layer; and removing the first organic layer form the transparent substrate. The present disclosure breaks the limitation for preparing microstructures with size below 5 ?m in the existing photolithography process, the organic material in wet-etching process can be controlled by heating to make the organic material melted to flow. The size of the microstructure can be reduced and flexibly adjusted according to the pixel size of display panel, the speckle effect of the display device caused by anti-glare treatment can be reduced.
    Type: Grant
    Filed: November 14, 2017
    Date of Patent: September 15, 2020
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Yong Yang, Yingbao Yang
  • Patent number: 10770284
    Abstract: A substrate processing method according to an embodiment includes an etching process, a temperature-difference forming process, and a rinsing process. The etching process supplies an etchant onto a first surface of a substrate on which a pattern is formed to etch the pattern. The temperature-difference forming process makes, in parallel with the etching process, a temperature in a lower portion of the pattern lower than a temperature in an upper portion of the pattern. The rinsing process supplies rinse liquid onto the first surface after the etching process to replace the etchant remaining on the pattern with the rinse liquid.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: September 8, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroki Yonekawa, Shuhei Takahashi, Kouzou Tachibana, Hideki Nishimura
  • Patent number: 10763083
    Abstract: Methods and apparatus for performing high energy atomic layer etching are provided herein. Methods include providing a substrate having a material to be etched, exposing a surface of the material to a modification gas to modify the surface and form a modified surface, and exposing the modified surface to an energetic particle to preferentially remove the modified surface relative to an underlying unmodified surface where the energetic particle has an ion energy sufficient to overcome an average surface binding energy of the underlying unmodified surface. The energy of the energetic particle used is very high; in some cases, the power applied to a bias used when exposing the modified surface to the energetic particle is at least 150 eV.
    Type: Grant
    Filed: October 1, 2018
    Date of Patent: September 1, 2020
    Assignee: Lam Research Corporation
    Inventors: Wenbing Yang, Samantha Tan, Tamal Mukherjee, Keren Jacobs Kanarik, Yang Pan
  • Patent number: 10758934
    Abstract: A method for controlling a recirculation pump assembly is disclosed. The method includes receiving a process-dependent characteristic and determining a recirculation flow rate of adhesive that flows to the recirculation pump assembly based on the process-dependent characteristic. The method further includes determining a recirculation pump speed of the recirculation pump assembly for pumping the adhesive to a supply channel using the recirculation flow rate, and adjusting an operating speed of the recirculation pump assembly to match the recirculation pump speed. A system and storage device for performing the above method are also disclosed.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: September 1, 2020
    Assignee: Nordson Corporation
    Inventors: Joel E. Saine, John W. Fritz
  • Patent number: 10762940
    Abstract: Multi-period thin-film structures exhibiting giant magnetoresistance (GMR) are described. Techniques are also described by which narrow spacing and/or feature size may be achieved for such structures and other thin-film structures having an arbitrary number of periods.
    Type: Grant
    Filed: December 6, 2017
    Date of Patent: September 1, 2020
    Assignee: Integrated Magnetoelectronics Corporation
    Inventor: Edward Wuori
  • Patent number: 10763501
    Abstract: Porous silicon and methods for preparation and use of the same are disclosed. The porous silicon materials have utility either alone or in combination with other materials, for example, combined with carbon particles for energy storage applications.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: September 1, 2020
    Assignee: Group14 Technologies, Inc.
    Inventors: Aaron M. Feaver, Leah A. Thompkins, Katharine Geramita, Benjamin E. Kron, Avery J. Sakshaug, Sarah Fredrick, Henry R. Costantino, Chad Goodwin, Christopher Timmons, Farshid Afkhami, Adam Strong
  • Patent number: 10751751
    Abstract: A method for treating a metal substrate surface before coating or printing thereof, the method including: preheating to 40° C. or above a specific metal substrate having a thermal conductivity of 10 W/mK or higher, and thereafter continuously performing a flame treatment on the substrate surface, prior to coating or printing of the surface of the substrate with a coating material or an ink.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: August 25, 2020
    Assignee: NISSHIN STEEL CO., LTD.
    Inventors: Masaki Satou, Seiju Suzuki, Masaru Hiraku, Shuichi Sugita
  • Patent number: 10752837
    Abstract: Disclosed herein is an environmentally safe etching composition and method for a concrete or mortar surface. The composition includes, in some embodiments, an aqueous solution of urea, acetic acid, an anticorrosive agent, and a surfactant with no more than about 30% (w/v) urea and at least about 10% (v/v) acetic acid. The method includes, in some embodiments, obtaining the etching composition; applying the etching composition to the concrete or mortar surface at a prescribed ratio of the etching composition to the concrete or mortar surface; allowing the etching composition to stand on the concrete or mortar surface for a prescribed amount of time; and washing the concrete or mortar surface with water to produce an etched surface of the concrete or mortar.
    Type: Grant
    Filed: October 15, 2018
    Date of Patent: August 25, 2020
    Inventors: Lee Shaw, Linda S. Shaw
  • Patent number: 10752807
    Abstract: A polishing liquid comprises: abrasive grains; a compound having an aromatic heterocycle; an additive (excluding the compound having an aromatic heterocycle); and water, wherein: the abrasive grains include a hydroxide of a tetravalent metal element; the aromatic heterocycle has an endocyclic nitrogen atom not bound to a hydrogen atom; and a charge of the endocyclic nitrogen atom obtained by using the Merz-Kollman method is ?0.45 or less.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: August 25, 2020
    Assignee: HITACHI CHEMICAL COMPANY, LTD
    Inventors: Hisataka Minami, Tomohiro Iwano, Keita Arakawa, Takahiro Hidaka
  • Patent number: 10751752
    Abstract: A method for modifying the surface of an architectural finish for a metal structure that increases its surface energy to almost double the surface energy obtained by the methods currently being performed, particularly in the curtain wall industry. Specifically, a flame plasma treatment process is applied to the surface of the finish in accordance with the disclosed principles to achieve the disclosed results.
    Type: Grant
    Filed: October 13, 2017
    Date of Patent: August 25, 2020
    Assignee: Permasteelisa North America Corp.
    Inventors: Susan Agro, Sandor Erdei, Douglas Walker
  • Patent number: 10752710
    Abstract: A method for polymerizing an open-cell foam including exposing an emulsion comprising a photoinitiator to an Ultraviolet light source, partially polymerizing the top surface of the emulsion, and moving the partially polymerized emulsion to a second polymerization stage.
    Type: Grant
    Filed: October 18, 2018
    Date of Patent: August 25, 2020
    Assignee: The Procter & Gamble Company
    Inventors: Steven Ray Merrigan, Thomas Allen Desmarais
  • Patent number: 10748766
    Abstract: Based on the fact that a film thickness of a film formed in a film formation processing of repeatedly performing a first sequence varies according to a temperature of the surface on which the film is to be formed, the film formation processing is performed after the temperature of each region of the surface of the wafer is adjusted to reduce a deviation of a trench on the surface of the wafer, so that the film is very precisely formed on the inner surface of the trench while reducing the deviation of the trench on the surface of the wafer. When the trench width is narrower than a reference width, an etching processing of repeatedly performing a second sequence is performed in order to expand the trench width, so that the surface of the film provided in the inner surface of the trench is isotropically and uniformly etched.
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: August 18, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Masahiro Tabata
  • Patent number: 10750618
    Abstract: Methods, systems, and apparatus for fabricating a circuit board. The method includes fabricating, using an additive manufacturing device, a trace layer, a sacrificial layer, a rail layer and a lid. The method includes placing the sacrificial layer on the trace layer such that the raised traces protrude through corresponding openings of the sacrificial layer. The method includes depositing a conductive material on top of the sacrificial layer and the plurality of traces. The method includes removing the sacrificial layer from the trace layer and placing the rail layer on the trace layer such that the raised traces align with the corresponding openings of the rail layer. The method includes connecting one or more electrical components and melting a sealing sheet on top of the rail layer and the electrical components to reinforce connections and to provide protection. The method includes placing the lid on top of the sealing sheet.
    Type: Grant
    Filed: April 16, 2019
    Date of Patent: August 18, 2020
    Assignee: University of Hawaii
    Inventors: David Garmire, Jie Zhou, Tamra Oyama
  • Patent number: 10737293
    Abstract: A method for treating a metal substrate surface before coating or printing thereof, the method including preheating to 40° C. or above a specific metal substrate having a thermal conductivity of 10 W/mK or higher, and thereafter performing a flame treatment on the substrate surface, prior to coating or printing of the surface of the substrate with a coating material or an ink.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: August 11, 2020
    Assignee: NISSHIN STEEL CO., LTD.
    Inventors: Masaki Satou, Seiju Suzuki, Masaru Hiraku, Shuichi Sugita