Patents Examined by Shamim Ahmed
  • Patent number: 10920105
    Abstract: A chemical mechanical polishing (CMP) slurry composition includes an oxidant including oxygen, and an abrasive particle having a core structure encapsulated by a shell structure. The core structure includes a first compound and the shell structure includes a second compound different from the first compound, where a diameter of the core structure is greater than a thickness of the shell structure, and where the first compound is configured to react with the oxidant to form a reactive oxygen species.
    Type: Grant
    Filed: June 28, 2019
    Date of Patent: February 16, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: An-Hsuan Lee, Shen-Nan Lee, Chen-Hao Wu, Chun-Hung Liao, Teng-Chun Tsai, Huang-Lin Chao
  • Patent number: 10922524
    Abstract: An optical path modulator, applied to a fingerprint identification apparatus, is configured to direct reflected light reflected back from a surface of a finger to an optical detection unit disposed below the optical path modulator, and the optical detection unit is configured to detect the received reflected light, where an array of through holes is arranged between an upper surface and a lower surface of the optical path modulator, and the array of through holes includes a plurality of tilt through holes, where each tilt through hole has a tilt angle greater than 0°, and the tilt angle is an angle between an axial direction of the tilt through hole and a normal direction perpendicular to a surface of the optical path modulator. In a case of the same hole depth, a thinner optical path modulator can be obtained.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: February 16, 2021
    Assignee: SHENZHEN WEITONGBO TECHNOLOGY CO., LTD.
    Inventors: Hongchao Wang, Jian Shen
  • Patent number: 10913861
    Abstract: A process and composition for coating a pipe and a pipe support includes mixing a cellulose acetate, a plasticizer, and an oil together so as to form a solid mixture, heating the solid mixture so as to form a liquid state, covering an area of the joinder of the pipe and the pipe support with the liquid state, and drying the liquid state on the area of the joinder. An ethylene-based polymer stabilizer is added to the mixture of the cellulose acetate, the plasticizer and the oil. The oil migrates by gravity from the liquid state from the covered pipe into an area of contact between the pipe and the pipe support. The liquid state is applied around the outer diameter of the pipe and over the outer surface of the pipe support underlying the outer diameter of the pipe.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: February 9, 2021
    Assignee: STOPAQ B.V.
    Inventor: Edward Hall
  • Patent number: 10914529
    Abstract: A window assembly heat transfer system is disclosed in which a window member has a selected transparency to monitored or sensed light wavelengths. One or more passages are provided in the window member for flowing a single-phase or two-phase heat transfer fluid, the passages being optically non-transparent to the monitored or sensed light wavelengths. A mechanism allows either evaporation or condensation of the fluid and/or balancing of a flow of the fluid within the passages. In one embodiment, the window assembly can be made by producing passages in a top surface of a first single plate, optionally producing passages in a bottom surface of a second single plate and bonding the top surface of the first plate to a bottom surface of a second single plate to form the window member with the passage or passages. In another embodiment, the window assembly can be made by providing a core around which the window member material is grown and thereafter removing the core to produce the passage or passages.
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: February 9, 2021
    Assignee: Mainstream Engineering Corporation
    Inventors: Brian P Tucker, Joshua D. Sole, Justin J. Hill, Robert P. Scaringe
  • Patent number: 10910201
    Abstract: Described is a method for determining an endpoint of an etch process using optical emission spectroscopy (OES) data as an input. OES data is acquired by a spectrometer in a plasma etch processing chamber. The acquired time-evolving spectral data is first filtered and de-meaned, and thereafter transformed into transformed spectral data, or trends, using multivariate analysis such as principal components analysis, in which previously calculated principal component weights are used to accomplish the transform. Grouping of the principal components weights into two separate groups corresponding to positive and negative natural wavelengths, creates separate signed trends (synthetic wavelengths).
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: February 2, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Yan Chen, Xinkang Tian, Vi Vuong
  • Patent number: 10898913
    Abstract: A plasma nozzle (120) having a nozzle body and a liner material (123) arranged within the nozzle body. The liner material (123) has a higher melting temperature than the nozzle body and includes one of a Tungsten alloy having a cross-sectional thickness (C) significantly greater than 0.25 mm, Molybdenum, Silver and Iridium.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: January 26, 2021
    Assignee: OERLIKON METCO (US) INC.
    Inventors: Ronald J. Molz, Dave Hawley
  • Patent number: 10903084
    Abstract: First and second silicon containing films can be etched selectively against each other with high efficiency. A method includes preparing a processing target object within a chamber; etching the first silicon containing film of the processing target object by generating plasma of a processing gas within the chamber in a state that a temperature of the processing target object is set to a first temperature; and etching the second silicon containing film of the processing target object by generating the plasma of the processing gas within the chamber in a state that the temperature of the processing target object is set to a second temperature higher than the first temperature.
    Type: Grant
    Filed: April 19, 2019
    Date of Patent: January 26, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Taku Gohira, Sho Tominaga
  • Patent number: 10899662
    Abstract: According to an exemplary embodiment of the present disclosure, a method of manufacturing a display window includes preparing a mother substrate, performing a salt treatment on the mother substrate to form a silicon-rich layer in a surface of the mother substrate to a first depth from the surface of the mother substrate, and removing the silicon-rich layer, wherein the first depth is greater than a depth of any cracks in the surface of the mother substrate, and a ratio of silicon content in the silicon-rich layer to a silicon content in the mother substrate is 1.2 to 1.4.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: January 26, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Hoi Kwan Lee, Cheol Min Park, Eun Kyung Yeon, Jeong Seok Lee, Seung Ho Kim
  • Patent number: 10900121
    Abstract: There is provided a film formation processing method for forming, in a vacuum atmosphere, a silicon nitride film along an inner wall surface of a recess constituting a pattern formed on a surface of a substrate, which includes: forming the silicon nitride film on the substrate by repeating, plural times, a process of supplying a raw material gas containing silicon to the substrate and subsequently, supplying an ammonia gas to the substrate to generate a silicon nitride on the substrate; and subsequently, modifying the silicon nitride film by activating a hydrogen gas and an ammonia gas and supplying the activated hydrogen gas and the activated ammonia gas to the substrate.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: January 26, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Noriaki Fukiage, Kentaro Oshimo, Shimon Otsuki, Hideomi Hane, Jun Ogawa, Hiroaki Ikegawa
  • Patent number: 10898138
    Abstract: Exemplary embodiments relate to a skin-adherable flexible patch including a flexible patch layer having one surface that can adhere to skin and configured to support a micro scale semiconductor device; and a plurality of holes passing through from one surface of the flexible patch to the other surface of the flexible patch, and a method for manufacturing the flexible patch.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: January 26, 2021
    Assignees: AMOREPACIFIC CORPORATION, MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Jiyeon Han, Han-Wool Yeun, Eunjoo Kim, Jeehwan Kim
  • Patent number: 10894157
    Abstract: A method of producing an electrode for use in the manufacture of electrolytic capacitors for implantable cardioverter defibrillators comprises first growing a hydrate layer and/or formed oxide layers of the foil, applying a laser beam to portions of the foil to ablate the aluminum oxide foil surface before etching in order to induce etching in the specific areas, and then, etching the foil. The laser marks the oxide layer in a pulsed spot pattern through the hydrate layer and/or formed oxide layer leaving a dimpled nascent aluminum surface. The oxide layer left behind is a mask and the fresh aluminum areas are the high etching activation sites. After marking the aluminum oxide foil surface, the foil may be electrochemically etched in an electrolyte containing chloride and/or various oxidative species.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: January 19, 2021
    Assignee: Pacesetter, Inc.
    Inventors: David R. Bowen, Ralph Jason Hemphill, Kurt J. Erickson
  • Patent number: 10895944
    Abstract: A touch control structure and a manufacturing method thereof, and a display device. The manufacturing method of the touch control structure includes providing a thin film substrate; providing a base substrate, and affixing the thin film substrate on the base substrate; forming a laminate structure on the thin film substrate for implementation of touch control functions; removing the thin film substrate with the laminate structure formed on top thereof from the base substrate.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: January 19, 2021
    Assignees: Hefei Xinsheng Optoelectronics Technology Co., Ltd., BOE Technology Group Co., Ltd.
    Inventors: Jing Wang, Lei Zhang, Zouming Xu, Guiyu Zhang, Qitao Zheng, Lingyan Wu, Qicheng Chen, Dong Li, Tsung Chieh Kuo, Xiaodong Xie
  • Patent number: 10890843
    Abstract: Methods and systems for imprint lithography are described. In an embodiment, a method may include receiving a substrate in an imprint lithography chamber. Such a method may also include applying a deformable layer to a surface of the substrate. The method may further include injecting a gas that dissolves into the deformable layer more quickly than air into the chamber. Additionally, the method may include pressing a mold into the deformable layer. The method may also include controlling one or more processing parameters in order to achieve device formation objectives.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: January 12, 2021
    Assignee: Tokyo Electron Limited
    Inventor: Hoyoung Kang
  • Patent number: 10892161
    Abstract: Methods for depositing desired materials formed on certain locations of a substrate with desired materials using a selective deposition process for semiconductor applications are provided. In one embodiment, a method of forming a structure with desired materials on a substrate includes supplying a first gas comprising a hydroxy terminated hydrocarbon containing material to a surface of a substrate, selectively forming a passivation layer on a first material of the substrate, selectively forming self assembled monolayers on a second material of the substrate, and selectively forming a material layer on the passivation layer.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: January 12, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Biao Liu, Cheng Pan, Erica Chen, Srinivas D. Nemani, Chang Ke, Lei Zhou
  • Patent number: 10892183
    Abstract: Methods to remove metal oxides from substrate surfaces are described. Some embodiments of the disclosure utilize an aqueous alkaline solution to remove metal oxides from substrate surfaces using a wet method. Some embodiments of the disclosure are performed at atmospheric pressure and lower temperatures. Methods of forming self-aligned vias are also described.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: January 12, 2021
    Assignee: Micromaterials LLC
    Inventors: Amrita B. Mullick, Uday Mitra, Regina Freed
  • Patent number: 10889757
    Abstract: The present disclosure is directed to etching compositions that are useful, e.g., for selectively removing tantalum (Ta) and/or tantalum nitride (TaN) from a semiconductor substrate as an intermediate step in a multistep semiconductor manufacturing process.
    Type: Grant
    Filed: October 17, 2018
    Date of Patent: January 12, 2021
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventor: Atsushi Mizutani
  • Patent number: 10882998
    Abstract: Methods of enhancing release of bulk solids from a surface are provided. The methods comprise wetting the surface with a substance comprising water, a fatty acid, an emulsifier, and a carrier oil. The carrier oil may be selected from mineral oil, silicone oil, and combinations thereof. The fatty acid may be tall oil fatty acid. The substance may be formed from diluting a concentrate with water. The substance may be applied to the surface at a dose of from about 0.1 gallons to about 50 gallons of the substance per about 2000 square feet of surface, thereby wetting the surface.
    Type: Grant
    Filed: November 16, 2017
    Date of Patent: January 5, 2021
    Assignee: Ecolab USA Inc.
    Inventors: Sankar Bhattacharja, John Cranfill, III, Ollie O'Neal, Jr.
  • Patent number: 10870124
    Abstract: A method for covering inner walls of a cavity with a protective layer made of anti-corrosion wax, in particular for use on vehicle bodies and add-on parts for vehicle bodies. Anti-corrosion wax is brought into an atomized form (protective agent mist) by a mist generator and supplied through an outlet opening to the cavity to be preserved. The protective agent mist is deposited on inner walls of the cavity and forms an anti-corrosion agent layer.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: December 22, 2020
    Assignee: IPR- INTELLIGENTE PERIPHERIEN FÜR ROBOTER GMBH
    Inventors: Fredy Doll, Marc Engelhart, Bernhard Woll
  • Patent number: 10864548
    Abstract: A step of constantly supplying first and second carrier gases into a processing container having a substrate therein through first and second carrier gas flow paths, respectively, and supplying a source gas into the processing container through a source gas flow path, a step of purging the source gas by supplying a purge gas into the processing container through a purge gas flow path provided separately from the carrier gas, a step of supplying a reactant gas into the processing container through a reactant gas flow path, and a step of purging the reactant gas by supplying a purge gas into the processing container through the purge gas flow path are performed in a predetermined cycle. An additive gas having a predetermined function is supplied as at least a part of the purge gas in at least one of the purging steps.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: December 15, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroaki Ashizawa, Yasushi Fujii, Tsuyoshi Takahashi, Seokhyoung Hong, Kazuyoshi Yamazaki, Hideo Nakamura, Yu Nunoshige, Takashi Kamio
  • Patent number: 10865484
    Abstract: The invention relates to a solution for etching titanium based materials, comprising from about 27 w % to about 39 w % hydrogen peroxide, from about 0.2 w % to about 0.5 w % potassium hydroxide, and at about 0.002 w % to about 0.02 w % 1,2-Diaminocyclohexane-N,N,N,N Tetra acetic Acid (CDTA), the rest being water, said solution comprising no corrosion inhibitor, and said solution having a pH comprised between about 7 and about 8. The invention further relates to a chemical composition for preparing such a solution by mixing said composition with concentrated hydrogen peroxide, said chemical composition comprising potassium hydroxide from about 5 w % to about 30 w %, C.D.T.A. at a concentration ranging from about 1% to about 5% of the potassium hydroxide concentration, the rest being water.
    Type: Grant
    Filed: March 29, 2017
    Date of Patent: December 15, 2020
    Assignee: TECHNIC FRANCE
    Inventors: Christian Pizzetti, Marine Cazes, Jérôme Daviot, Philippe Vernin