Abstract: A system and method for cleaning mesa sidewalls of a template. Curable material may be deposited in a cleaning drop pattern onto a non-yielding imprint field of one of: a device yielding substrate; and a non-yielding substrate. The template may be brought into contact with the curable material. The template has: a recessed surface; a mesa extending from the recessed surface; and wherein the mesa sidewalls connect the recessed surface to the mesa. A relative position of the template to the cleaning drop pattern may be such that the curable material spreads up the mesa sidewalls and does not contact the recessed surface. Cured material may be formed by exposing the curable material to actinic radiation after the curable material has spread up the mesa sidewalls, and before the curable material contacts the recessed surface. The template may be separated from the cured material.

Abstract: A cleaning system comprising: (a) one or more pumps; (b) one or more foamers; and (c) one or more cleaning reservoirs including one or more cleaning solutions; wherein the one or more foamers combine a fluid and the cleaning solution to form a foamed solution so that the solution is introduced into a system to be cleaned.

Abstract: A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

Abstract: A cleaning method for dry cleaning a susceptor disposed in a process chamber of a film deposition apparatus is provided. In the method, a protective member is placed on a substrate receiving region provided in the susceptor. A cleaning gas is supplied to the susceptor having the protective member placed on the substrate receiving region, thereby removing a film deposited on a surface of the susceptor by etching.

Abstract: Included are methods and systems for recycling a gas emitted from non-aqueous cleaning. An example method includes contacting a contaminated equipment with a non-aqueous cleaning material; wherein the spent non-aqueous cleaning material emits the gas. The method further comprises capturing the emitted gas, filtering the emitted gas, and recycling the emitted gas into the non-aqueous cleaning material.

Abstract: In an embodiment, a system includes: a wafer support configured to secure a wafer; a nozzle configured to dispense a liquid or a gas on the wafer when the nozzle is in an active state of dispensing; a shutter configured to catch the liquid from the nozzle when the shutter is in a first position below the nozzle; and a shutter actuator configured to: move the shutter to the first position in response to the nozzle not being in an inactive state; move the shutter to a second position away from the first position in response to the nozzle being in the active state.

Abstract: There are provided methods of treating a catalyst-containing reactor system with a liquid solvent to remove contaminants from the reactor system. An exemplary method includes the steps of: isolating the reactor system to be treated from upstream and downstream equipment; reducing the temperature and pressure of the isolated reactor system by flushing with a hydrogen rich gas; injecting a non-aqueous liquid solvent into the reactor system at an injection point while continuously flowing hydrogen-rich gas through the reactor system; maintaining the solvent in a liquid state while flowing the solvent continuously through the reactor system; and terminating the step of injecting solvent and terminating the continuous flowing of hydrogen-rich gas. The exemplary method is free of the injecting of a carrier gas into the reactor system comprising alkanes selected from the methane, ethane, propane, butane and pentane.

Abstract: A vibration cleaning device, method and system are provided. The vibration cleaning device includes a cleaning module configured to clean an object through a cleaning solution; a cleaning solution delivering module configured to deliver the cleaning solution to the object when the cleaning module performs a cleaning process on the object; a vibrating module configured to vibrate, move and drive the cleaning module to vibrate the object at a predetermined vibration frequency, so that the cleaning module performs vibration cleaning on the object through the cleaning solution; a cleaning tank configured to accommodate the object and the cleaning solution after cleaning the object; a transfer module configured to transfer the uncleaned object to the cleaning tank and transfer the cleaned object out of the cleaning tank; and a control module configured to control working states of the cleaning solution delivering module, the vibrating module and the transfer module.

Abstract: A cleaning method of sufficiently cleaning a workpiece is provided. The cleaning method, including: rotating or swinging a workpiece having a first cleaning surface about a table rotation axis; ejecting cleaning fluid from a nozzle along an ejection axis; and swinging the nozzle about a nozzle rotation axis parallel to the table rotation axis to keep a constant impact angle formed between the ejection axis and the first cleaning surface for cleaning the workpiece.

Abstract: The present invention relates to a method for removing powder from a component or part produced by a powder bed additive manufacturing system. The method comprises the steps; providing a part, the part having at least one internal cavity with at least one external opening, the at least one cavity being at least partly filled with powder grains, the powder grains being connected to each other and to the walls of the cavity by mechanical, frictional, electrical, physical or chemical forces; adding medium in liquid phase to the at least one cavity of the part, the liquid having the property that it expands in phase transition from liquid to solid phase; transforming added medium to solid phase to loosen and break up at least a fraction of the powder grains connections from each other; and removing powder from the at least one internal cavity.

Abstract: A method of managing a fluid flow within a conduit includes determining a presence of a flow blockage within the conduit, the conduit being equipped with an expandable device, controlling an electric actuator to flow a current to the expandable device to expand the expandable device radially, compacting the flow blockage radially along a length of the expandable device to create a channel adjacent the flow blockage, controlling the electric actuator to terminate a flow of the current to the expandable device to collapse the expandable device radially, and exposing the channel to open the conduit to fluid flow.

Abstract: The present invention relates to an aerosol spray for cleaning a drain with an excellent foam cleaning effect by spraying a drain cleaning composition to a drain hole and a drain of a sink, and the foamed cleaner can remain for a long time by spraying the drain cleaning composition in an aerosol or foam form to a sink filter, a drain hole and a drain, to maximize the cleaning effect. In addition, the present invention discloses a method for cleaning a drain of a sink comprising; (a) preparing a cleaner container comprising a first receiving part and a second receiving part in which a first agent and a second agent are received respectively; (b) mixing the first agent and the second agent each other; and (c) arranging the cleaner container in a drain inlet of a sink to inject a mixed foam cleansing agent released through an outlet of the cleaner container.

Abstract: A method and a system for cleaning a machine for making liquid and/or semi-liquid food products for the ice cream, pastry or catering trade, wherein the machine is fed with a capsule containing a preparation for cleaning the machine, after which a cycle for cleaning the machine is started.

Abstract: There is provided a cleaning method of a substrate processing apparatus comprising cleaning an inside of an exhaust pipe through which a gas of an inside of a processing container is exhausted. The cleaning the inside of the exhaust pipe includes: removing a deposit on a downstream side of an opening/closing valve in the exhaust pipe by supplying a first exhaust pipe cleaning gas containing fluorine to the downstream side of the opening/closing valve in the exhaust pipe in a state in which the opening/closing valve provided in a middle of the exhaust pipe is closed; and removing a deposit on an upstream side of the opening/closing valve in the exhaust pipe by supplying a second exhaust pipe cleaning gas not containing fluorine as a gas constituent element to the inside of the processing container in a state in which the opening/closing valve is opened.

Abstract: The present invention relates to a dishwasher for washing the dishes or the cooking utensils by spraying washing water and steam and a controlling method therefor. The method of controlling a dishwasher includes: a steam supply step of supplying washing water to the sump from an external water source; and a steam generation step of maintaining a water level of the washing water existing inside the washing pump at a certain water level or higher and heating the washing water.

Abstract: A method of processing a semiconductor device including following operation is provided. A substrate is provided. The substrate is then processed with a treating solution, in which the treating solution includes liquid carbon dioxide and an additive. The treating solution is then displaced by a supercritical fluid carbon dioxide. The substrate is then dried by transforming the supercritical fluid carbon dioxide to gaseous carbon dioxide.

Abstract: A method of cleaning deposited solid material from a fouled portion of a gas compressor whilst the gas compressor is in situ in a natural gas processing system is provided. The method comprises the steps of supplying a liquid cleaning agent to a gas inlet of the gas compressor, the liquid cleaning agent being capable of removing the deposited solid material; passing the liquid cleaning agent through the gas compressor to a gas outlet of the gas compressor, wherein at least a portion of the cleaning agent remains in a liquid state as it passes through the fouled portion of the gas compressor; and recovering a fluid containing removed material that is output from the gas compressor so as to prevent the removed material reaching one or more gas processing stages of the gas processing system downstream of the gas compressor.

Abstract: Methods and systems for removing a gel from wellbore equipment. An example method includes introducing a cleaning fluid into the wellbore equipment comprising the gel disposed therein or thereon. The cleaning fluid includes a brine having a total dissolved solids concentration of between about 30K ppm to about 300K ppm. The method further includes contacting the gel with the cleaning fluid in the wellbore equipment, and removing the gel and the cleaning fluid from the wellbore equipment.

Abstract: A device for treating 3D powder printing elements includes a first chamber with a first partial chamber and a second partial chamber separated by at least one screen grid. Grid meshes allow compressed powder residues to pass through. A rotation means rotates the first chamber about an axis of rotation, in particular with a rotary passage. The screen grid is inclined, in particular perpendicular, to the axis of rotation of the first chamber. A filling region allows filling the 3D powder printing elements into the first partial chamber. Gas medium is supplied in the first chamber, in particular in the first partial chamber. Gas medium suction means extract plastic powder residues from the first chamber, in particular from the second partial chamber. The gas medium suction means are mounted in or parallel to the axis of rotation and/or centered by the rotary means, in particular within the rotary passage.

Abstract: A cleaning fabric wound on a roll (12) is used for cleaning printing cylinders (2, 3, 4) of a printing system (1). The cleaning fabric (13) includes a liquid absorbable material configured to be soaked with a cleaning liquid containing a polar additive configured to make the cleaning liquid polar. The roll (12) of cleaning fabric (13) is included in a cleaning cassette (10) which is movable between an idle position out of contact with the printing cylinders, and an active position in which the cleaning fabric (13) included in the cassette (10) is in contact with a printing cylinder to be cleaned.