Abstract: The present disclosure relates to compositions and methods for cleaning medical and dental instruments. The disclosed compositions are preferably non-foaming or generate low foam to allow visual inspection of the cleaning process as well as safe handling of the instruments. The disclosed compositions preferably employ select proteases, a carbonate and a nonionic surfactant.

Abstract: Apparatus for treating a surface of a wind turbine blade (14), comprising an expandable structure (22) that is deployable from a collapsed state into an expanded state in which the structure defines an elongated treatment zone (32) into which a blade (14) is receivable in use. The apparatus includes treating means (52) arranged to apply a treatment in the treatment zone. Also provided is a method for treating a wind turbine blade (14) including: positioning a wind turbine blade in a substantially vertical orientation; locating an expandable structure (22) adjacent the wind turbine blade; deploying the expandable structure (22) about the blade (14) such that the expandable structure (22) defines an elongated treatment zone (32) which receives at least part of the blade (14); and applying surface treatment to the surface of the blade (14) using the expandable structure (22).

Abstract: The present invention relates to a liquid cleaning composition can be a cleaning composition for removing an acrylic-based polymeric material useful as enteric tablet coatings located on a surface of a vessel or other process equipment comprising: —diethylen glycol mono butylether; and —water.

Abstract: A method for cleaning a semiconductor wafer by using a chemical tank containing an SC-2 solution including, a plurality of the chemical tanks are used, and among SC-2 solutions contained in the plurality of chemical tanks, an HCl concentration in an SC-2 solution contained in a chemical tank to be finally used is lowered to the lowest to clean the semiconductor wafer. The method for cleaning a semiconductor wafer thus provided can improve the particle level in SC-2 cleaning for a semiconductor wafer without degrading the metal impurity level on the semiconductor wafer surface.

Abstract: Implementations described herein generally relate to methods and apparatus for in-situ removal of unwanted deposition buildup from one or more interior surfaces of a semiconductor substrate-processing chamber. In one implementation, the method comprises forming a reactive fluorine species from a fluorine-containing cleaning gas mixture. The method further comprises delivering the reactive fluorine species into a processing volume of a substrate-processing chamber. The processing volume includes one or more aluminum-containing interior surfaces having unwanted deposits formed thereon. The method further comprises permitting the reactive fluorine species to react with the unwanted deposits and aluminum-containing interior surfaces of the substrate-processing chamber to form aluminum fluoride. The method further comprises exposing nitrogen-containing cleaning gas mixture to in-situ plasma to form reactive nitrogen species in the processing volume.

Abstract: The substrate treating device performs a predetermined treatment on a substrate by immersing the substrate into a treating liquid that contains a predetermined chemical liquid and pure water. Further, the substrate treating device includes a treating tank in which a treating liquid with which a predetermined treatment is performed on the substrate is stored, a supply unit that supplies a chemical liquid or pure water to the treating tank, a discharge unit that discharges the treating liquid stored in the treating tank, and a control unit that controls supply of the treating liquid or the pure water by the supply unit. The control unit causes the supply unit to supply the chemical liquid or the pure water during performing the predetermined treatment.

Abstract: Lens cleaning systems, drivers and methods to detect faults or degradation in a lens cleaning system, including a controller to control a lens transducer drive signal frequency to vibrate the lens in a frequency range of interest and measure frequency response values according to driver feedback signals, and to compare the measured frequency response values to baseline frequency response values for a healthy system, and to selectively determine the existence of a fault or degradation in the lens cleaning system according to dissimilarities between the measured frequency response values and the baseline frequency response values.

Abstract: A substrate processing method includes a substrate holding step of disposing a substrate at a position surrounded by a plurality of guards which have a first guard and a second guard in a plan view and of holding the substrate horizontally, a substrate rotating step of rotating the substrate around a vertical rotation axis which passes through a central portion of the substrate, a hydrophobic agent supplying step of supplying to the upper surface of the substrate in a rotating state a hydrophobic agent which is a liquid for hydrophobizing the upper surface of the substrate, a low surface-tension liquid supplying step of supplying the low surface-tension liquid to the upper surface of the substrate in the rotating state in order to replace the hydrophobic agent on the substrate by the low surface-tension liquid lower in surface tension than water, a first guard switching step of switching a state of the plurality of guards to a first state in which the first guard receives a liquid scattered from the substrate

Abstract: A device can clean at least one pipetting needle with a washing station. In the device, the inside and an outside of the pipetting needle are brought into contact at least for a portion with a washing liquid, at least temporarily during a cleaning process, and with at least one movement apparatus, by which a relative movement is brought about between the pipetting needle and the washing station at least temporarily before, after, or during the cleaning process. The device has a drying device, which subjects at least one region of the pipetting needle brought into contact with washing liquid during the cleaning process to at least one flow of a drying agent.

Abstract: An electrostatic spray application apparatus and method for producing an electrostatically charged and homogeneous CO2 composite spray mixture containing an additive and simultaneously projecting at a substrate surface. The spray mixture is formed in the space between CO2 and additive mixing nozzles and a substrate surface. The spray mixture is a composite fluid having a variably-controlled aerial and radial spray density comprising pressure- and temperature-regulated propellant gas (compressed air), CO2 particles, and additive particles. There are two or more circumferential and high velocity air streams containing passively charged CO2 particles which are positioned axis-symmetrically and coaxially about an inner and lower velocity injection air stream containing one or more additives to form a spray cluster.

Abstract: Embodiments disclosed herein include a plasma abatement process that takes effluent from a processing chamber and reacts the effluent with water vapor reagent within a plasma source placed in a foreline by injecting the water vapor reagent into the foreline or the plasma source. The materials present in the effluent as well as the water vapor reagent are energized by the plasma source, converting the materials into gas species such as HF that is readily scrubbed by typical water scrubbing abatement technology. An oxygen containing gas is periodically injected into the foreline or the plasma source relative to the water vapor injection to reduce or avoid the generation of solid particles. The abatement process has good destruction removal efficiency (DRE) with minimized solid particle generation.

Abstract: A nozzle for water jet equipment and a method of use thereof. The nozzle has a body including a base with a shaft extending outwardly therefrom. The shaft is inserted through a bore of a sleeve that rotatable about the shaft. The base and shaft define a bore therein. At least one opening is defined in the shaft and one or more grooves are milled into the shaft's exterior surface. Each opening places the body's bore in fluid communication with one of the grooves and the sleeve's bore. Water flowing through the body's bore will flow through each opening, into the associated groove and into a space between the shaft and sleeve. The shaft terminates in a conical section usable as a battering ram to break up blockages in pipes during cleaning operations.

Abstract: Embodiments disclosed herein generally relate to systems and methods to prevent free radical damage to sensitive components in a process chamber and optimizing flow profiles. The processing chamber utilizes a cover substrate on lift pins and an inert bottom purge flow to shield the substrate support from halogen reactants. During a clean process, the cover substrate and the purge flow restricts halogen reactants from contacting the substrate support. The method of cleaning includes placing a cover substrate on a plurality of lift pins that extend through a substrate support in a processing chamber, raising the cover substrate via the lift pins to expose a space between the cover substrate and the substrate support, supplying a halogen containing gas into the processing chamber, supplying a second gas through an opening in the processing chamber, and flowing the second gas through the space between the cover substrate and the substrate support.

Abstract: An apparatus for treating a keg's interior comprises first and second tanks that maintain treatment medium at respective first and second temperatures, a first heat-exchanger, and a waste-air line. The first heat-exchanger is arranged upstream of a second-tank inlet for using heat recovered from the treatment medium through heat exchange with a heat-transfer medium to pre-heat treatment medium that is being conducted to the second tank. The heat-transfer medium includes any one or more of treatment medium conducted out of a keg interior after a treatment step, treatment medium in the first tank, and waste air in the waste-air line.

Abstract: Methods and apparatus for using two stage ultrasonic lens cleaning for water removal are disclosed. An apparatus can expel fluid from a droplet on an optical surface using an ultrasonic transducer mechanically coupled to the optical surface and having first and second resonant frequency bands. A signal generator can generate a first signal including a first frequency to be coupled with the ultrasonic transducer mechanically coupled to the surface, and can generate a second signal including a second frequency to be coupled with the ultrasonic transducer mechanically coupled to the surface. Switching circuitry can activate the ultrasonic transducer at the first frequency to reduce the droplet from a first size to a second size, and to activate the ultrasonic transducer at the second frequency to reduce the droplet from the second size to a third size.

Abstract: The present invention relates to a method of, and an apparatus for, rinsing materialographic samples. The method includes the steps of: arranging one or more materialographic samples in a sample holder; connecting the sample holder (10) to a rotation head of a rinsing device; placing the sample holder connected to the rotation head in the vessel of the rinsing device; rotating the sample holder relative to the vessel; filling the vessel with a rinsing liquid; and subjecting the materialographic samples in the sample holder to ultrasonic waves.

Abstract: A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.

Abstract: A substrate processing method includes a substrate holding step of horizontally holding a substrate, a substrate rotating step of rotating the substrate held horizontally around a rotational axis along a vertical direction, a liquid-film forming step of forming a liquid film of a first organic solvent that is used to process an upper surface of the substrate on the upper surface of the substrate by supplying the first organic solvent to the upper surface of the substrate held horizontally, a vapor supplying step of supplying a vapor of a second organic solvent to a space between a facing surface of a heater unit that has the facing surface facing a lower surface of the substrate held horizontally and the lower surface of the substrate, a substrate heating step of heating the substrate being in a rotational state by means of the vapor of the second organic solvent in parallel with the substrate rotating step and the liquid-film forming step, and a substrate drying step of, after the substrate heating step, exc

Abstract: The present invention relates to a dishwasher that can save wash water for cleaning and a method of controlling the dishwasher.

Abstract: A cleaning system for BIB beverage dispensers may comprise a rinse reservoir, a clean reservoir, and a first cleaning solution and a second cleaning solution. A method of cleaning BIB beverage dispensers may include dispensing from the clean reservoir a fluid having the first cleaning solution mixed therein, dispensing the second cleaning solution, allowing the second cleaning solution to rest in the beverage dispenser, and dispensing a rinse fluid.