Abstract: A battery washing machine for automotive type vehicle batteries, comprising an enclosed wash cabinet with an overhead spray apparatus, drain racks for supporting the batteries below the spray apparatus, and a water tank beneath the drain racks. The water tank is divided into separator and recirculating supply portions by a vertical separator wall that is partly screened and partly solid. The upper end of the separator portion of the tank is covered with a screen, while the upper end of the recirculating supply portion is covered with a solid water-diverting panel. Solid contaminants are screened and/or settled out of the re-circulated wash water in the tank by the vertical separator wall.

Abstract: One or more techniques and/or systems are disclosed for producing beneficial re-use sand from foundry sand. Foundry sand can be collected from a mold making operation, and/or from the casting removal and cleaning process. The collected sand product can be cleaned and separated into a clay and carbon mixture, and a beneficial re-use sand. The collected sand product can be cleaned by mixing with water, and subjecting the resulting mix to a hydrocyclone at appropriate flow rates. The hydrocyclone can separate the mix into a carbon, clay and water mix for re-use, and a wet sand mix. Water can be separated from the wet sand and reused, and the resulting sand can be used as beneficial re-use sand.

Abstract: A substrate processing apparatus includes a substrate rotating unit 11 configured to hold and rotate a substrate 3; a processing liquid supplying unit 13 configured to supply a processing liquid to the substrate; and a replacement liquid supplying unit 14 configured to supply, to the substrate, a replacement liquid with which the processing liquid supplied from the processing liquid supplying unit is replaced. While the replacement liquid supplying unit 14 supplies the replacement liquid to the substrate, the processing liquid supplying unit 13 supplies the processing liquid to a position on the substrate positioned at an outer peripheral side thereof than a supply position of the replacement liquid to form a liquid film of the processing liquid. It is possible to maintain a state in which the entire surface of the substrate is covered with the liquid film without increasing consumption amount of the replacement liquid.

Abstract: Certain exemplary aspects of the present disclosure are directed towards apparatuses and methods which autonomously decontaminate parts. Parts to be cleaned are identified, and based on the identification of the part, a part specific cleaning program is initiated. During the cleaning, the part is manipulated about a gas supply in such a way that the drag force on the contamination particles attached to the part exceeds the contamination particles' surface adhesion force and accordingly is removed from the surface of the part. The removed contamination is then evacuated from the atmospheric environment near the part by a low pressure zone of a second gaseous material near the part.

Abstract: A method of treating a sensor array including a plurality of sensors and an isolation structure, where a sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array and the isolation structure is disposed between the sensor pad and sensor pads of other sensors of the plurality of sensors, comprises exposing the sensor pad and the isolation structure to a non-aqueous organo-silicon solution including an organo-silicon compound and a first non-aqueous carrier; applying an acid solution including an organic acid and a second non-aqueous carrier to the sensor pad; and rinsing the acid solution from the sensor pad and the isolation structure.

Abstract: Disclosed are a dissolved ozone removal unit that removes dissolved ozone from liquid, an apparatus for treating a substrate, a method of removing dissolved ozone, and a method of cleaning a substrate. The method of removing dissolved ozone in liquid includes supplying micro bubbles to the liquid, and allowing dissolved ozone to exit from the liquid by energy or radical ions that are generated while the micro bubbles are dissolved in the liquid.

Abstract: A method for automatically cleaning a solar panel using an atmospheric water generator is provided. The method includes the steps of generating water using the atmospheric water generator. The water can be stored for using in a cleaning operation. The system can monitor the efficiency of the solar panel power generation. If the efficiency drops below a certain level, which can indicate that the solar panels are dirty, the system can automatically initiate a cleaning operation. The stored water can be pumped through pipes and nozzles to clean the solar panels. The system can automatically initiate the atmospheric water generator to replenish the used water. The system can use a portion of the power generated by the solar panels to perform the cleaning and water generation operations. Accordingly, an automatic and self-contained solar panel cleaning method and system is provided.

Abstract: A near neutral pH pickling composition for the removal of oxides from metallic surfaces, including heat treated steel. The pickling composition comprises a) a water-soluble organic or inorganic nitro compound, wherein a central N atom has an oxidation state of 3+; b) a polarizing agent for the nitro compound, wherein the polarizing agent comprises at least one of a phosphonate and a carboxylate; c) a pH buffer, and d) at least one metal complexing agent. The composition is preferably maintained at a pH between about 4.5 and about 7.5. The near neutral pH pickle composition can be used on various metallic surfaces as well as composite surfaces comprising metallic and non-metallic portions.

Abstract: A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning wafer working surfaces is removed by the particle removal film allowing the debris and foreign matter to be discarded. The use of the cleaning film allows the operator to refresh the cleaning wafer without use of an outside vendor and eliminates wet washing and the use of solvents in the cleaning process.

Abstract: A substrate processing device 10 has a water removing unit 110 and, when a solvent supply unit 58 supplies a volatile solvent to a surface of a substrate W, the water removing unit 110 supplies a water removing agent to the surface of the substrate W to promote replacement of the cleaning water on the surface of the substrate W with the volatile solvent.

Abstract: A nozzle for water jet equipment and a method of use thereof. The nozzle has a body including a base with a shaft extending outwardly therefrom. The shaft is inserted through a bore of a sleeve that rotatable about the shaft. The base and shaft define a bore therein. At least one opening is defined in the shaft and one or more grooves are milled into the shaft's exterior surface. Each opening places the body's bore in fluid communication with one of the grooves and the sleeve's bore. Water flowing through the body's bore will flow through each opening, into the associated groove and into a space between the shaft and sleeve. The grooves create turbulence in water in this space and thereby reduce leakage from the nozzle. The shaft terminates in a conical section usable as a battering ram to break up blockages in pipes during cleaning operations.

Abstract: The invention relates to a gel for removing a graffiti from a surface of a solid substrate, consisting of a colloidal solution comprising an inorganic viscosifying agent, at least one solvent, optionally at least one surfactant, and optionally at least one dye and/or pigment. The invention also relates to a method for removing a graffiti from a surface of a solid substrate, wherein the gel is applied to said surface.

Abstract: An automated system and method for washing bins. The system includes an infeed conveyor zone having a first conveyor platform for transporting the bins in a conveying direction. The system also includes a bin rotator disposed next to the infeed conveyor zone and rotates upward to allow the bins to be flipped and then loaded onto the first conveyor platform. The system further includes a bin washer zone located downstream from the infeed conveyor zone and having a second conveyor platform for receiving and transporting the bins in the conveying direction. The bin washer zone has sprayers for washing and sanitizing the bins with pressurized liquid. A flipping zone is located downstream from the bin washer zone for allowing the bins to be flipped and transferred onto an outfeed zone that allows the bins to be transported into a loading position at the end of the outfeed zone for reuse.

Abstract: Disclosed is a substrate processing method including a first surface cleaning step of supplying a first cleaning liquid containing water to a first surface of a substrate; a second surface cleaning step of supplying a second cleaning liquid containing water to a second surface that is opposite to the first surface; a water removal step of removing the water remaining on the second surface of the substrate in a state where the first surface is not exposed to outside air, after the second surface cleaning step; a water-repellency step of supplying a water-repellent agent to the first surface of the substrate after the water removal step; and a drying step of drying the substrate after the water-repellency step.

Abstract: A device for the dry cleansing of surfaces to remove particulates contains triboelectrically chargeable component(s) of an organic polymer material containing uniformly distributed finely divided silicone polymer particles.

Abstract: A method for removing a residue of a substance, extrudable through a nozzle of an automated end-effector, from an exterior of the nozzle, the method including steps of (1) establishing contact between the nozzle and a cleaning pad; (2) adhering the cleaning pad to the nozzle; (3) inserting the nozzle, with the cleaning pad adhered thereto, into a constricting device; (4) circumferentially squeezing the cleaning pad around the nozzle with the constricting device; (5) withdrawing the nozzle from the constricting device to separate the cleaning pad from the nozzle and remove the residue of the substance from the exterior of the nozzle; and (6) transferring the cleaning pad from the constricting device to a disposal receptacle.

Abstract: An apparatus for cleaning trash containers after emptying of solid refuse by spraying a solution into inverted containers at a high pressure from a nozzle to remove the residue.

Abstract: The present disclosure relates to a processing liquid supplying unit configured to supply a processing liquid that contains a removing agent of an adhered substance and a solvent having a boiling point lower than a boiling point of the removing agent to a substrate, a substrate heating unit configured to subsequently heat the substrate at a predetermined temperature that is equal to or higher than the boiling point of the solvent in the processing liquid and is lower than the boiling point of the removing agent, and a rinsing liquid supplying unit configured to subsequently supply a rinsing liquid to the substrate so as to remove the adhered substance from the substrate.

Abstract: Systems and methods for the removal of scale in humidification-dehumidification desalination apparatuses are generally described.

Abstract: A method for treating a substrate with a treatment liquid is disclosed, wherein the substrate is treated while a location at which the treatment liquid is supplied onto the substrate that is rotated is moved in an outward direction from a central area of the substrate towards a peripheral area of the substrate and in an inward direction from a peripheral area of the substrate towards a central area of the substrate a plurality of times, and wherein the movement distances of some of the plurality of movements are different from each other.