Abstract: A semiconductor package includes a carrier substrate including opposite first surface and second surface; a first chip and a second chip mounted on the first surface of the carrier substrate in a side-by-side manner, wherein the first chip has a plurality of high-speed signal pads disposed along its first side adjacent to the second chip, and the second chip has a plurality of data (DQ) pads along its second side adjacent to the first chip; and a plurality of first bonding wires, directly connecting the plurality of high-speed signal pads to the plurality of data (DQ) pads.

Abstract: A cut-last process for cutting fin segments of a FinFET structure on a substrate utilizes a two-step process. After the fins are formed, an oxide material is deposited in the trenches of the FinFET structure. The oxide material can be an STI oxide or a low-stress dummy gapfill material. A fin segment can be removed by an etchant and can leave a concave shaped (such as a u-shape or v-shape) portion of silicon at the bottom of the fin. Where the oxide material is an STI oxide, the void left by removing the fin can be filled with replacement STI oxide. Where the oxide material is a dummy gapfill material, the dummy gapfill material can be removed and replaced with an STI oxide or converted to an STI oxide and filled with replacement STI oxide before or after the conversion.

Abstract: The present application provides a semiconductor package and a manufacturing method thereof. The semiconductor package includes a package substrate, a bottom device die, a top device die and an additional package substrate. The bottom device die is attached on the package substrate. The top device die is attached on the bottom device die with its active side facing away from the bottom device die. A first portion of die I/Os at the active side of the top device die are electrically connected to the package substrate. The additional package substrate is attached on the active side of the top device die, and electrically connected to the package substrate and a second portion of the die I/Os of the top device die.

Abstract: A stack package includes a lower semiconductor chip disposed on a package substrate, an interposer bridge including through vias, and an upper semiconductor chip. The upper semiconductor chip has a first edge and a second edge which are opposite to each other. The upper semiconductor chip includes a first region, a third region and a connection region which are located between the first and second edges. The upper semiconductor chip also includes a redistributed layer pattern that connects pads disposed on the first and third regions to each other. The redistributed layer pattern extends onto the connection region.

Abstract: A semiconductor device may include a substrate, an interface insulation pattern, a gate insulation pattern, a threshold voltage controlling metal pattern and a conductive pattern. The interface insulation pattern may be formed on the substrate. The gate insulation pattern including an oxide having a dielectric constant higher than that of silicon oxide may be formed on the interface insulation pattern. The threshold voltage controlling metal pattern may be formed on the gate insulation pattern. The conductive pattern may be formed on the threshold voltage controlling metal pattern. First dopants including at least fluorine may be included within and at at least one surface of the gate insulation pattern and at an upper surface of an interface insulation pattern contacting the gate insulation pattern. The semiconductor device may have excellent electrical characteristics.

Abstract: A semiconductor device package includes a substrate, an electronic component disposed on the substrate, a supporting structure disposed on the substrate and surrounding the electronic component, and a heat spreading structure disposed on the supporting structure. A length of the supporting structure and a length of the heat spreading structure are greater than a length of the substrate.

Abstract: An integrated circuit structure may be fabricated having a first integrated circuit package comprising a first integrated circuit device electrically attached to a first surface of a first substrate, a second integrated circuit package comprising a second integrated circuit device electrically attached to a first surface of a second substrate and an opening extending between a first surface of the second substrate and the second surface of the second substrate, and an interconnection structure electrically attached to the first surface of the first substrate, wherein a portion of the interconnection structure extends into the second substrate opening and wherein the interconnection structure is electrically attached to a first surface of the second substrate.

Abstract: A semiconductor device is described that includes a substrate, an active region protruding from the substrate and extending in a first direction, a plurality of channel layers disposed on the active region and spaced apart from each other in a direction perpendicular to an upper surface of the substrate, an isolation film disposed between a lowermost channel layer of the plurality of channel layers and the active region, a gate electrode surrounding the plurality of channel layers and extending in a second direction intersecting the first direction, and a source/drain region disposed on at least one side of the gate electrode and connected to each of the plurality of channel layers. The isolation film is disposed on a level higher than a bottom surface of the source/drain region.

Abstract: A microelectronic package includes a substrate having a first surface. A microelectronic element overlies the first surface. Electrically conductive elements are exposed at the first surface of the substrate, at least some of which are electrically connected to the microelectronic element. The package includes wire bonds having bases bonded to respective ones of the conductive elements and ends remote from the substrate and remote from the bases. The ends of the wire bonds are defined on tips of the wire bonds, and the wire bonds define respective first diameters between the bases and the tips thereof. The tips have at least one dimension that is smaller than the respective first diameters of the wire bonds. A dielectric encapsulation layer covers portions of the wire bonds, and unencapsulated portions of the wire bonds are defined by portions of the wire bonds, including the ends, are uncovered by the encapsulation layer.

Abstract: A process of fabricating an electromagnetic circuit includes providing a first sheet of dielectric material including a top surface having at least one conductive trace and depositing a solder bump on the at least one conductive trace. The process further includes applying a second sheet of dielectric material to the first sheet of dielectric material with bond film sandwiched in between, the second sheet of dielectric material having a through-hole providing access to the solder bump. The process further includes bonding the first and second dielectric materials to one another and removing bond film resin from the solder bump. The process further includes machining the solder bump by the drilling or milling process to achieve a desired amount of solder in the solder bump.

Abstract: A semiconductor module includes a module substrate, a semiconductor package mounted on the module substrate, a first bonding wire connecting the module substrate to the semiconductor package, and a first molding member covering the first bonding wire. The semiconductor package includes a package substrate, a semiconductor chip mounted on the package substrate, a second bonding wire connecting the package substrate to the semiconductor chip, and a second molding member covering the semiconductor chip and the second bonding wire. The first and second bonding wires are each connected to one connection pad of the package substrate.

Abstract: Disclosed are a semiconductor device and a stacked semiconductor package. The semiconductor device may include a semiconductor chip and a plurality of chip pads disposed on the semiconductor chip in a second horizontal direction perpendicular to a first horizontal direction. The plurality of chip pads may include: a first chip pad connected to a wire extending in the first horizontal direction, when seen from the top; and a second chip pad connected to a diagonal wire extending in a direction at an angle to the first and second horizontal directions, when seen from the top. The width of the first chip pad in the second horizontal direction may be smaller than the width of the second chip pad in the second horizontal direction.

Abstract: A transistor, including an antiferroelectric (AFE) gate dielectric layer is described. The AFE gate dielectric layer may be crystalline and include oxygen and a dopant. The transistor further includes a gate electrode on the AFE gate dielectric layer, a source structure and a drain structure on the substrate, where the gate electrode is between the source structure and the drain structure. The transistor further includes a source contact coupled with the source structure and a drain contact coupled with the drain structure.

Abstract: An isolator device includes a laminate die having a dielectric laminate material with a metal laminate layer on one side of the dielectric laminate material, the metal laminate layer being a patterned layer providing at least a first plate, including a dielectric layer over the first plate that includes an aperture exposing a portion of the first plate. An integrated circuit (IC) including a substrate having a semiconductor surface includes circuitry including a transmitter and/or a receiver, the IC including a top metal layer providing at least a second plate coupled to a node in the circuitry, with at least one passivation layer on the top metal layer. A non-conductive die attach (NCDA) material for attaching a side of the dielectric laminate material is opposite the metal laminate layer to the IC so that the first plate is at least partially over the second plate to provide a capacitor.

Abstract: According to one embodiment, a semiconductor device includes a wiring board having a first surface. A first element is disposed on the first surface of the wiring board. A first resin layer covers the first element. A second element is larger than the first element and disposed on the first resin layer. The second element is superposed above the first element. A reinforcement member is disposed at a peripheral portion of the first resin layer and includes an edge disposed inside of the first resin layer. The reinforcement member has an upper surface above the first surface of the wiring board. The reinforcement member has a coefficient of linear expansion lower than the first resin layer. An encapsulating resin material, over the first surface of the wiring board, covers the first element, the second element, the first resin layer, and the reinforcement member.

Abstract: A method used in forming a memory array comprising strings of memory cells comprises forming a conductor tier comprising conductor material on a substrate. A stack is formed comprising vertically-alternating first tiers and second tiers above the conductor tier. The stack comprises laterally-spaced memory-block regions having horizontally-elongated trenches there-between. Channel-material strings extend through the first tiers and the second tiers. Material of the first tiers is of different composition from that of the second tiers. A lowest of the first tiers is thicker than the first tiers there-above. The first-tier material is isotropically etched selectively relative to the second-tier material to form void-space in the first tiers. Conducting material is deposited into the trenches and into the void-space in the first tiers. The conducting material fills the void-space in the first tiers that are above the lowest first tier.

Abstract: A semiconductor package may include: a chip stack including first to Nth semiconductor chips having first to Nth chip pads formed in active surfaces thereof, respectively, and sequentially stacked in a vertical direction such that the first to Nth chip pads are exposed, wherein N is a natural number equal to or more than 2; first to Nth vertical wires having first ends connected to the first to Nth chip pads, respectively, and extended in the vertical direction; a coating layer surrounding portions of the first to kth vertical wires, extended from the first ends, among the first to Nth vertical wires, and connection portions between the first ends of the first to kth vertical wires and the first to kth chip pads; and a molding layer covering the chip stack, surrounding the vertical wires, and covering the coating layer.

Abstract: A method of fabricating a metal gate transistor includes providing a substrate. An interlayer dielectric layer covers the substrate. A dummy gate is embedded in the interlayer dielectric layer. A high-k dielectric layer is disposed between the dummy gate and the substrate. Later, the dummy gate is removed to form a trench, and the high-k dielectric layer is exposed through the trench. After the dummy gate is removed, an ion implantation process is performed to implant fluoride ions into the high-k dielectric layer. Finally, after the ion implantation process, a metal gate is formed to fill in the trench.

Abstract: Semiconductor devices and methods are provided. A semiconductor device according to the present disclosure includes a first gate-all-around (GAA) transistor that includes a plurality of first channel members and a first gate dielectric layer over the plurality of first channel members, and a second GAA transistor that includes a plurality of second channel members, and a second gate dielectric layer over the plurality of second channel members. A first width (W1) of each of the plurality of first channel members is greater than a second width (W2) of each of the plurality of second channel members. A first thickness (GL1) of the first gate dielectric layer is smaller than a second thickness (GL2) of the second gate dielectric layer.

Abstract: Solar cells are attached together to form a plating assembly. The plating assembly is attached to a belt, which transports the plating assembly through a plating chamber where metal is electroplated on the solar cells. The electroplated metal is patterned to form metal contact fingers. After the metal is electroplated, the plating assembly is singulated to separate the two solar cells.