Abstract: An anti-tamper layer is applied to a blank wafer. The layered wafer is then diced into shield dies. A shield die is oxide-to-oxide bonded to the top of an active die such that removing the shield die will damage the active die. The shield die may be sized and positioned such that wirebond pads along one or more edges of the active die remain exposed. The exposed wirebond pads may be used to electrically connect, via wirebonds, the active die to a substrate. A second shield die may be attached to the bottom of the active die to help protect against the use of bottom-to-top delayering.

Abstract: Vertical field-effect transistor (VFET) devices and methods of forming VFET devices are provided. The methods may include forming a preliminary VFET on a substrate. The preliminary VFET may include a bottom source/drain region on the substrate, a channel region on the bottom source/drain region, a top source/drain region on the channel region, a patterned sacrificial layer on a side surface of the channel region, and an insulating layer. The top source/drain region and the patterned sacrificial layer may be enclosed by the insulating layer. The methods may also include forming a contact opening extending through the insulating layer and exposing a portion of the patterned sacrificial layer, forming a cavity between the channel region and the insulating layer by removing the patterned sacrificial layer through the contact opening, and forming a gate electrode in the cavity.

Abstract: A three-dimensional semiconductor device includes a stacked structure including a plurality of conductive layers stacked on a substrate, a distance along a first direction between sidewalls of an upper conductive layer and a lower conductive layer being smaller than a distance along a second direction between sidewalls of the upper conductive layer and the lower conductive layer, the first and second directions crossing each other and defining a plane parallel to a surface supporting the substrate, and vertical channel structures penetrating the stacked structure.

Abstract: A semiconductor device includes a pair of spacers disposed on the surface of a substrate, the spacers are a first height and spaced from each other at a first distance along a first direction. A first semiconductor chip is mounted on the substrate surface. The first semiconductor chip has a second height that is less than the first height. The first semiconductor chip can be connected to the substrate with bonding wires or the like. A second semiconductor chip is mounted on the spacers and spans the distance between the spacers. The second semiconductor chip is above at least a portion of the first semiconductor chip. A projecting section is provided on the surface of the substrate between the spacers in the first direction. The projecting section is between the first semiconductor chip and an outer edge of the substrate and protrudes upward from the surface of the substrate.

Abstract: A method of manufacturing a die package structure includes steps described below. A conductive substrate with a plurality of trenches is provided. A die is disposed in each of the trenches. A conductive layer is formed covering the dies and the conductive substrate. A patterned photoresist layer with a plurality of openings is formed exposing a plurality of areas of the conductive layer. A mask is formed on each of the areas of the conductive layer. The patterned photoresist layer is removed after forming the masks. By using the masks, the conductive layer and the conductive substrate under thereof are selectively etched to a predetermined depth to form a plurality of conductive bumps and a plurality of electrodes, in which a remaining of the conductive substrate includes a bottom substrate, the electrodes and the conductive bumps. An upper sealing layer is formed covering the bottom substrate and the dies.

Abstract: A semiconductor package includes a metallic pad and leads, a semiconductor die attached to the metallic pad, the semiconductor die including an active side with bond pads opposite the metallic pad, a wire bond extending from a respective bond pad of the semiconductor die to a respective lead of the leads, a heat spreader over the active side of the semiconductor die with a gap separating the active side of the semiconductor die from the heat spreader, an electrically insulating material within the gap and in contact with the active side of the semiconductor die and the heat spreader; and mold compound covering the semiconductor die and the wire bond, and partially covering the metallic pad and the heat spreader, with the metallic pad exposed on a first outer surface of the semiconductor package and with the heat spreader exposed on a second outer surface of the semiconductor package.

Abstract: The power semiconductor apparatus includes: a semiconductor device 401; a bonding layer on chip 416 disposed on an upper surface of the semiconductor device; and a metal lead 419 disposed on the upper surface of the semiconductor device and bonded to the bonding layer on chip, wherein the metal lead 420 has a three-laminated structure including: a second metal layer 420b having a CTE equal to or less than 5×10?6/° C., for example; and a first metal layer 420a and a third metal layer 420c sandwiching the second metal layer and having a CTE equal to or greater than the CTE of the second metal layer. Provided is a power semiconductor apparatus capable of improving reliability thereof by reducing a thermal stress to a bonding layer between a semiconductor power device and a metal lead positioned on an upper surface thereof, and reducing a resistance of the metal lead.

Abstract: A semiconductor device package includes a substrate, a first electronic component and a first encapsulant. The substrate has a first surface and a second surface opposite to the first surface. The first electronic component is disposed on the first surface of the substrate. The first encapsulant is disposed on the first surface of the substrate and covers the first electronic component. The first encapsulant has a first surface facing away the first surface of the substrate and includes a recess at an edge of the first surface of the first encapsulant.

Abstract: A semiconductor package may include a package substrate, a support structure on the package substrate and having a cavity therein, and at least one first semiconductor chip on the package substrate in the cavity. The support structure may have a first inner sidewall facing the cavity, a first top surface, and a first inclined surface connecting the first inner sidewall and the first top surface. The first inclined surface may be inclined with respect to a top surface of the at least one first semiconductor chip.

Abstract: A gold-coated silver bonding wire includes: a core material containing silver as a main component; and a coating layer provided on a surface of the core material and containing gold as a main component. The gold-coated silver bonding wire contains gold in a range of not less than 2 mass % nor more than 7 mass %, and at least one sulfur group element selected from the group consisting of sulfur, selenium, and tellurium in a range of not less than 1 mass ppm nor more than 80 mass ppm, with respect to a total content of the bonding wire.

Abstract: A method for forming a semiconductor device is provided. In the disclosed method, a stack is formed on a working surface of a substrate. The stack has alternating first layers and second layers positioned over the substrate. A separation structure is formed in the stack that separates the stack into a first region and a second region, where the separation structure extends in a first direction of the substrate. The second layers in the second region are further replaced with insulating layers, and the first layers in the second region are doped with a dopant.

Abstract: A method of fabricating a semiconductor substrate includes the following activities: a) providing a donor substrate with a weakened zone inside the donor substrate, the weakened zone forming a border between a layer to be transferred and the rest of the donor substrate, b) attaching the donor substrate to a receiver substrate, the layer to be transferred being located at the interface between the donor substrate and the receiver substrate; c) detaching the receiver substrate along with the transferred layer from the rest of the donor substrate, at the weakened zone; and d) at least one step of smoothing the surface of the transferred layer, wherein the semiconductor substrate obtained from step c) is kept, at least from the moment of detachment until the end of the smoothing step, in a non-oxidizing inert atmosphere or in a mixture of non-oxidizing inert gases. Semiconductor substrates are fabricated using such a method.

Abstract: An isolator device includes a laminate die having a dielectric laminate material with a metal laminate layer on one side of the dielectric laminate material, the metal laminate layer being a patterned layer providing at least a first plate, including a dielectric layer over the first plate that includes an aperture exposing a portion of the first plate. An integrated circuit (IC) including a substrate having a semiconductor surface includes circuitry including a transmitter and/or a receiver, the IC including a top metal layer providing at least a second plate coupled to a node in the circuitry, with at least one passivation layer on the top metal layer. A non-conductive die attach (NCDA) material for attaching a side of the dielectric laminate material is opposite the metal laminate layer to the IC so that the first plate is at least partially over the second plate to provide a capacitor.

Abstract: A switch module (1) includes RF input/output wires (51a, 51c) connecting RF input/output pad electrodes (11a, 11c) and RF input/output lead electrodes (31a, 31c), control signal wires (52a, 52b) connecting control-signal pad electrodes (12a, 12b) and control-signal lead electrodes (32a, 32b), and a ground wire (53a) connected to a ground pad electrode (13a). The control-signal pad electrodes (12a, 12b), the control-signal lead electrodes (32a, 32b), and the control signal wires (52a, 52b) are disposed in a region (a2) on the opposite side, with respect to a boundary defined by a linear line (L1) along an extension direction of the ground wire (53a), to a region (a1) in which the RF input/output wire (51a), the RF input/output pad electrode (11a), and the RF input/output lead electrode (31a) are disposed.

Abstract: Semiconductor devices may include a first semiconductor chip, a first redistribution layer on a bottom surface of the first semiconductor chip, a second semiconductor chip on the first semiconductor chip, a second redistribution layer on a bottom surface of the second semiconductor chip, a mold layer extending on sidewalls of the first and second semiconductor chips and on the bottom surface of the first semiconductor chip, and an external terminal extending through the mold layer and electrically connected to the first redistribution layer. The second redistribution layer may include an exposed portion. The first redistribution layer may include a first conductive pattern electrically connected to the first semiconductor chip and a second conductive pattern electrically insulated from the first semiconductor chip. The exposed portion of the second redistribution layer and the second conductive pattern of the first redistribution layer may be electrically connected by a first connection wire.

Abstract: A light emitting device includes a first LED chip to emit a light having a peak wavelength in a range of 410 to 430 nm, a second LED chip to emit a light having a peak wavelength in a range of 440 to 460 nm, a first quantum dot to convert light emitted by the first and second LED chips into light having a peak wavelength in a range of 510 to 550 nm, and a second quantum dot to convert light emitted by the first and second LED chips into light having a peak wavelength in a range of 610 to 660 nm, wherein, in an emission spectrum of final light, intensity of a peak wavelength of the first LED chip is 15% or less of intensity of a peak wavelength of the second LED chip.

Abstract: The present disclosure relates to a display device and a method of manufacturing the same. The display device includes: a plurality of display units, each display unit including one or more pixels; and a plurality of elastically stretchable stretching units respectively connected among the plurality of display units and forming elastic connection points with the display units, the stretching units and the plurality of display units forming a net-shaped distribution structure, wherein in a state that the display device is not under tension, a connection lines between the elastic connection points at both ends of the stretching unit are not parallel to a normal of the display units connected with at least one end of the stretching unit at the elastic connection points.

Abstract: There are provided a semiconductor device and a method of manufacturing the same. A semiconductor device includes a memory block having local lines; a peripheral circuit disposed below the memory block; and a plurality of connection lines connecting the peripheral circuit and the local lines to each other, wherein the plurality of connection lines is stacked in a step shape.

Abstract: Semiconductor device and the manufacturing method thereof are disclosed herein. An exemplary semiconductor device comprises a substrate; a gate structure disposed over the substrate and over a channel region of the semiconductor device, wherein the gate structure includes a gate stack and spacers disposed along sidewalls of the gate stack, the gate stack including a gate dielectric layer and a gate electrode; a first metal layer disposed over the gate stack, wherein the first metal layer laterally contacts the spacers over the gate dielectric layer and the gate electrode; and a gate via disposed over the first metal layer.

Abstract: A plasma processing method for efficiently processing a wafer using plasma which includes two processing steps and a bridging step between the two processing steps. The plasma processing method includes: supplying a processing-use gas into a processing chamber during a processing step; supplying a bridging-use gas into the processing chamber during a bridging step; switching the supply of the processing-use gas from a first gas supply unit and the bridging-use gas from a second gas supply unit to the processing chamber in transition between the two processing steps and the bridging step; and regulating a flow rate of the bridging-use gas to be supplied during the bridging step to a flow rate regarded equal to a supply amount of the processing-use gas to be supplied during a succeeding processing step out of the two processing steps.