Patents by Inventor Atsushi Miyamoto

Atsushi Miyamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120254881
    Abstract: There is provided a parallel computer system for performing barrier synchronization using a master node and a plurality of worker nodes based on the time to allow for an adaptive setting of the synchronization time. When a task process in a certain worker node has not been completed by a worker determination time, the particular worker node performs a communication to indicate that the process has not been completed, to a master node. When the communication has been received by a master determination time, the master node performs a communication to indicate that the process time is extended by a correction process time, in order to adjust and extend the synchronization time. In this way, it is possible to reduce the synchronization overhead associated with the execution of an application with a relatively large variation in the process time from a synchronization point to the next synchronization point.
    Type: Application
    Filed: April 2, 2012
    Publication date: October 4, 2012
    Applicant: HITACHI, LTD.
    Inventors: Masaki HAMAMOTO, Tetsuya YAMADA, Atsushi TOMODA, Atsushi MIYAMOTO
  • Patent number: 8237119
    Abstract: Design data and sample characteristic information corresponding to individual areas on the design data are used to perform an image quality improvement operation to make appropriate improvements on image quality according to sample characteristic corresponding to the individual areas on the image, allowing a high speed area division on the image. Further, the use of a database that stores image information associated with the design data allows for an image quality improvement operation that automatically emphasizes portions of the image that greatly differ from past images of the similar design data.
    Type: Grant
    Filed: March 31, 2009
    Date of Patent: August 7, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kenji Nakahira, Atsushi Miyamoto
  • Publication number: 20120181426
    Abstract: (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
    Type: Application
    Filed: March 28, 2012
    Publication date: July 19, 2012
    Inventors: Atsushi Miyamoto, Wataru Nagatomo, Ryoichi Matsuoka, Hidetoshi Morokuma
  • Publication number: 20120126117
    Abstract: In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated on the basis of an imaging condition or specimen information, and an image restoration is performed by using a resolving power deterioration factor other than the beam intensity distribution as a target of a deterioration mode, so that a high resolving power image can be acquired under various conditions. In the scanning electron microscope for semiconductor inspections and semiconductor measurements, the restored image is used for pattern size measurement, defect detections, defect classifications and so on, so that the measurements can be improved in precision and so that the defect detections and classifications can be made high precise.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Inventors: Kenji NAKAHIRA, Toshifumi HONDA, Atsushi MIYAMOTO
  • Publication number: 20120112067
    Abstract: The present invention is for providing a scanning electron microscope system adapted to output contour information fitting in with the real pattern edge end of a sample, and is arranged to generate a local projection waveform by projecting the scanning electron microscope image in the tangential direction with respect to the pattern edge at each point of the pattern edge of the scanning electron microscope image, estimate the cross-sectional shape of the pattern transferred on the sample by applying the local projection waveform generated at each point to a library, which has previously been created, correlating the cross-sectional shape with the electron beam signal waveform, obtain position coordinate of the edge end fitting in with the cross-sectional shape, and output the contour of the pattern as a range of position coordinates.
    Type: Application
    Filed: January 12, 2012
    Publication date: May 10, 2012
    Inventors: Chie Shishido, Maki Tanaka, Atsushi Miyamoto
  • Publication number: 20120104254
    Abstract: A charged particle beam device enabling prevention of degradation of reproducibility of measurement caused by an increase of the beam diameter attributed to an image shift and having a function of dealing with device-to-device variation. The charged particle beam device is used for measuring the dimensions of a pattern on a specimen using a line profile obtained by detecting secondary charged particles emitted from the specimen when the specimen is scanned with a primary charged particle beam converged on the specimen. A lookup table in which the position of image shift and the variation of the beam diameter are associated is prepared in advance by actual measurement or calculation and registered. When the dimensions are measured, image processing is carried out so as to correct the line profile for the variation of the beam diameter while the lookup table is referenced, and thereby the situation where the beam diameter is effectively equal is produced irrespective of the position of the image shift.
    Type: Application
    Filed: January 26, 2010
    Publication date: May 3, 2012
    Inventors: Chie Shishido, Atsushi Miyamoto, Mayuka Iwasaki, Tomofumi Nishiura, Go Kotaki
  • Publication number: 20120098952
    Abstract: A high-performance image quality improvement process, capable of improving the image quality of low-definition areas (lower layer patterns in a multilayer, bottoms of holes in a hole pattern, etc.), is performed to a captured image. Definition enhancement intensity is calculated using height information included in design data or estimate values of sample height information calculated from the captured image, and the image quality improvement process is performed to the captured image using the definition enhancement intensity.
    Type: Application
    Filed: June 18, 2010
    Publication date: April 26, 2012
    Inventors: Kenji Nakahira, Atsushi Miyamoto
  • Publication number: 20120098953
    Abstract: In a panoramic image construction technology of dividing a wide-range imaging area (EP) of semiconductor patterns into a plurality of imaging areas (SEP), and joining a group of images, which are obtained by imaging the SEPs using an SEM, through image processing, a fact that although a pattern serving as a key to joining is not contained in an overlap area between some of the SEPs, all the images can be joined in some cases is noted so that: although the number of patterns serving as keys to joining is small, SEPs whose images are all joined can be determined; or even if such SEPs cannot be determined, SEPs satisfying user's request items as many as possible can be determined. The cases are extracted by optimizing an SEP arrangement, whereby the number of cases in which SEPs whose images are all joined can be determined is increased.
    Type: Application
    Filed: July 1, 2010
    Publication date: April 26, 2012
    Inventors: Go Kotaki, Atsushi Miyamoto, Ryoichi Matsuoka
  • Patent number: 8158938
    Abstract: (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
    Type: Grant
    Filed: February 9, 2007
    Date of Patent: April 17, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Wataru Nagatomo, Ryoichi Matsuoka, Hidetoshi Morokuma
  • Publication number: 20120048628
    Abstract: Provided is a torque detection apparatus including a base portion, a drive portion, and a detection portion. The drive portion includes a rotor having a main axis in a direction of a first axis, and a stator configured to rotate the rotor around the main axis. The detection portion includes a strain body and a detection element. The strain body includes a first end portion to be fixed to the base portion and a second end portion to be fixed to the rotor, and is arranged concentrically with the rotor. The detection element is provided to the strain body so as to detect a strain of the strain body around the first axis with respect to the base portion.
    Type: Application
    Filed: July 13, 2011
    Publication date: March 1, 2012
    Applicant: SONY CORPORATION
    Inventors: Yasunori KAWANAMI, Atsushi Miyamoto, Toshimitsu Tsuboi, Tetsuharu Fukushima, Kenta Kawamoto, Yasuhide Hosoda
  • Publication number: 20120041312
    Abstract: In an ultrasonic diagnosis device, while a signal component is preserved, a factor of degrading image quality such as a flicker of a noise is suppressed. An input image is separated into a signal component image and a noise component image. After frame synthesis processing is performed on the noise component image, the signal component image is synthesized with the noise component image having undergone the frame synthesis. Thus, the noise is suppressed. Otherwise, after the input image is separated into the signal component image and noise component image, the frame synthesis processing is performed on the signal component image. The noise component image is then synthesized with the signal component image having undergone the frame synthesis. Thus, discernment of a signal can be improved.
    Type: Application
    Filed: April 26, 2010
    Publication date: February 16, 2012
    Applicant: Hitachi Medical Corporation
    Inventors: Kenji Nakahira, Atsushi Miyamoto
  • Patent number: 8110800
    Abstract: The present invention is for providing a scanning electron microscope system adapted to output contour information fitting in with the real pattern edge end of a sample, and is arranged to generate a local projection waveform by projecting the scanning electron microscope image in the tangential direction with respect to the pattern edge at each point of the pattern edge of the scanning electron microscope image, estimate the cross-sectional shape of the pattern transferred on the sample by applying the local projection waveform generated at each point to a library, which has previously been created, correlating the cross-sectional shape with the electron beam signal waveform, obtain position coordinate of the edge end fitting in with the cross-sectional shape, and output the contour of the pattern as a range of position coordinates.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: February 7, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Chie Shishido, Maki Tanaka, Atsushi Miyamoto
  • Publication number: 20120026317
    Abstract: In order to obtain a quality image without deterioration owing to radiation noise in inspection using the optical video camera in high radiation environment, an inspection apparatus is formed of an image pick-up unit, an image obtaining unit which fetches a video image that contains a signal (noise) that is substantially independent of each frame obtained by the image pick-up unit, a local alignment unit which locally aligns frames with different time phases for forming the image fetched by the image obtaining unit, a frame synthesizing unit which synthesizes the plurality of frames aligned by the local alignment unit for generating a synthesis frame with an SN ratio higher than the SN ratio of the frame before frame synthesis, and an image output unit for displaying or recording the image formed of the synthesis frame generated by the frame synthesizing unit.
    Type: Application
    Filed: June 14, 2011
    Publication date: February 2, 2012
    Applicant: Hitachi-GE Nuclear Energy, Ltd.
    Inventors: Kenji NAKAHIRA, Atsushi Miyamoto, Naoki Hosoya, Minoru Yoshida
  • Patent number: 8106357
    Abstract: In the case where a specimen is imaged by a scanning electron microscope, it is intended to acquire an image of a high quality having a noise component reduced, thereby to improve the precision of an image processing. The intensity distribution of a beam is calculated on the basis of an imaging condition or specimen information, and an image restoration is performed by using a resolving power deterioration factor other than the beam intensity distribution as a target of a deterioration mode, so that a high resolving power image can be acquired under various conditions. In the scanning electron microscope for semiconductor inspections and semiconductor measurements, the restored image is used for pattern size measurement, defect detections, defect classifications and so on, so that the measurements can be improved in precision and so that the defect detections and classifications can be made high precise.
    Type: Grant
    Filed: January 18, 2008
    Date of Patent: January 31, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kenji Nakahira, Toshifumi Honda, Atsushi Miyamoto
  • Publication number: 20120002861
    Abstract: An apparatus and method for inspecting a defect of a circuit pattern formed on a semiconductor wafer includes a defect classifier have a comparison shape forming section for forming a plurality of comparison shapes corresponding to an SEM image of an inspection region by deforming the shape of the circuit pattern in accordance with a plurality of shape deformation rules using design data corresponding to the circuit pattern within the inspection region and a shape similar to the SEM image of the inspection region out of the plurality of comparison shapes formed and selected as the comparison shape, and a shape comparing and classifying section for classifying the SEM image using information of the comparison shape selected in the comparison shape forming section and the inspection shape of the circuit pattern of the SEM image of the inspection region.
    Type: Application
    Filed: September 13, 2011
    Publication date: January 5, 2012
    Inventors: Tomofumi Nishiura, Atsushi Miyamoto, Chie Shishido, Takumichi Sutani
  • Patent number: 8073242
    Abstract: This invention relates to a SEM system constructed to create imaging recipes or/and measuring recipes automatically and at high speed, and improve inspection efficiency and an automation ratio, and to a method using the SEM system; a method for creation of imaging recipes and measuring recipes in the SEM system is adapted to include, in a recipe arithmetic unit, the steps of evaluating a tolerance for an imaging position error level at an evaluation point, evaluating a value predicted of the imaging position error level at the evaluation point when any region on circuit pattern design data is defined as an addressing point, and determining an imaging recipe and a measuring recipe on the basis of a relationship between the tolerance for the imaging position error level at the evaluation point and the predicted value of the imaging position error level at the evaluation point.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: December 6, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Tomofumi Nishiura, Ryoichi Matsuoka, Hidetoshi Morokuma
  • Publication number: 20110285839
    Abstract: An imaging region of a high-magnification reference image capable of being acquired in a low-magnification field without moving a stage from a position at which a defective region has been imaged at a low magnification is searched for and if the search is successful, an image of the imaging region itself is acquired and the high-magnification reference image is acquired. If the search is unsuccessful, the imaging scheme is switched to that in which the high-magnification reference image is acquired from a chip adjacent to the defective region.
    Type: Application
    Filed: November 27, 2009
    Publication date: November 24, 2011
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Go Kotaki, Atsushi Miyamoto, Ryo Nakagaki, Takehiro Hirai
  • Patent number: 8045789
    Abstract: In the inspection apparatus for a defect of a semiconductor and the method using it for automatically detecting the defect on a semiconductor wafer and presuming the defect occurrence factor using the circuit design data, a plurality of shapes are formed from the circuit design data by deforming the design data with respect to shape deformation items stipulated for respective defect occurrence factor for comparison with the inspection object circuit pattern. The defect is detected by comparison of the group of shapes formed and the actual pattern. Further, the occurrence factors of these defects are presumed, and the defects are classified according to respective factor.
    Type: Grant
    Filed: January 8, 2009
    Date of Patent: October 25, 2011
    Assignee: Hitachi High-Technologies Corporaiton
    Inventors: Tomofumi Nishiura, Atsushi Miyamoto, Chie Shishido, Takumichi Sutani
  • Publication number: 20110234758
    Abstract: There is provided a robot device including an irradiation unit that irradiates pattern light to an external environment, an imaging unit that acquires an image by imaging the external environment, an external environment recognition unit that recognizes the external environment, an irradiation determining unit that controls the irradiation unit to be turned on when it is determined that irradiation of the pattern light is necessary based on an acquisition status of the image, and a light-off determining unit that controls the irradiation unit to be turned off when it is determined that irradiation of the pattern light is unnecessary or that irradiation of the pattern light is necessary to be forcibly stopped, based on the external environment.
    Type: Application
    Filed: March 23, 2011
    Publication date: September 29, 2011
    Applicant: Sony Corporation
    Inventors: Toshimitsu TSUBOI, Kenta Kawamoto, Yasunori Kawanami, Atsushi Miyamoto
  • Publication number: 20110238213
    Abstract: There is provided a gripping judgment apparatus including a plan unit that generates a target orbit for moving a gripping unit in a state in which an object as a gripping target is gripped by the gripping unit, an observation unit that measures movement of the gripping unit driven based on the target orbit, a gripping state judgment unit that judges whether or not an object as a gripping target is grippable based on a target value of the gripping unit derived from the target orbit and an actual measured value measured by the observation unit, and a gripping state change unit that changes a gripping state of an object gripped by the gripping unit based on a judgment result obtained by the gripping state judgment unit.
    Type: Application
    Filed: February 9, 2011
    Publication date: September 29, 2011
    Applicant: Sony Corporation
    Inventors: Kenichiro Nagasaka, Toshimitsu Tsuboi, Atsushi Miyamoto, Yasunori Kawanami, Tetsuharu Fukushima, Kenta Kawamoto