Patents by Inventor Cheng-Ming Lin

Cheng-Ming Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190165116
    Abstract: A semiconductor device includes a semiconductor substrate having a channel region. A gate dielectric layer is over the channel region of the semiconductor substrate. A work function metal layer is over the gate dielectric layer. The work function metal layer has a bottom portion, an upper portion, and a work function material. The bottom portion is between the gate dielectric layer and the upper portion. The bottom portion has a first concentration of the work function material, the upper portion has a second concentration of the work function material, and the first concentration is higher than the second concentration. A gate electrode is over the upper portion of the work function metal layer.
    Type: Application
    Filed: July 10, 2018
    Publication date: May 30, 2019
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Peng-Soon LIM, Zi-Wei FANG, Cheng-Ming LIN
  • Publication number: 20190146326
    Abstract: In a method of manufacturing a photo mask, a resist layer is formed over a mask blank, which includes a mask substrate, a phase shift layer disposed on the mask substrate and a light blocking layer disposed on the phase shift layer. A resist pattern is formed by using a lithographic operation. The light blocking layer is patterned by using the resist pattern as an etching mask. The phase shift layer is patterned by using the patterned light blocking layer as an etching mask. A border region of the mask substrate is covered with an etching hard cover, while a pattern region of the mask substrate is opened. The patterned light blocking layer in the pattern region is patterned through the opening of the etching hard cover. A photo-etching operation is performed on the pattern region to remove residues of the light blocking layer.
    Type: Application
    Filed: February 26, 2018
    Publication date: May 16, 2019
    Inventors: Chun-Chieh TIEN, Cheng-Hsuen CHIANG, Chih-Ming CHEN, Cheng-Ming LIN, Yen-Wei HUANG, Hao-Ming CHANG, Kuo Chin LIN, Kuan-Shien LEE
  • Patent number: 10288869
    Abstract: A reflecting microscope module cooperating with an image capturing module includes a housing, a lens and a sample adhesive substance. The housing has a sample inspecting surface located on one side of the housing opposite to the image capturing module. The lens is disposed in the housing and the sample adhesive substance is detachably disposed on a bottom of the housing. The sample adhesive substance adjacently connected to the sample inspecting surface includes a substrate and a glue layer. The glue layer is integrally combined with the substrate to form one piece. A reflecting microscope device is also disclosed.
    Type: Grant
    Filed: January 31, 2017
    Date of Patent: May 14, 2019
    Assignee: AIDMICS BIOTECHNOLOGY CO., LTD.
    Inventors: Cheng-Ming Lin, Chang-Yu Chen, Tsun-Chao Chiang, Shu-Sheng Lin
  • Publication number: 20190137869
    Abstract: In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, unloading the photomask from the inspection system, and performing a second inspection process. In the first inspection process, a common Z calibration map of an objective lens of an optical module with respect to the photomask is generated and stored, and a first image of the photomask is captured by using an image sensor while focusing the objective lens of the optical module based on the common Z calibration map. The photomask is unloaded from the inspection system. In the second inspection process, the photomask is loaded on the inspection system and a second image of the photomask is captured by using an image sensor while focusing an objective lens of an optical module based on the common Z calibration map generated in the first inspection process.
    Type: Application
    Filed: December 5, 2017
    Publication date: May 9, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tsun-Cheng Tang, Cheng-Ming Lin, Sheng-Chang Hsu, Hao-Ming Chang, Waylen Chang
  • Patent number: 10281708
    Abstract: A microscope module, which is cooperated with an image capturing module, includes a housing, a convex lens and an illumination assembly. The housing has a sample inspecting surface located on one side of the housing, which is opposite to the image capturing module. The convex lens is disposed in the housing, and the shortest distance between the sample inspecting surface and the convex lens ranges from 0.1 mm to 3.0 mm. The illumination assembly has a light source and is located between the image capturing module and the convex lens. The light emitted from the light source enters the convex lens through an input surface of the convex lens, leaves the convex lens through an output surface of the convex lens, and then reaches the sample inspecting surface. A microscope device containing the microscope module is also disclosed.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: May 7, 2019
    Assignee: AIDMICS BIOTECHNOLOGY CO., LTD.
    Inventors: Cheng-Ming Lin, Chang-Yu Chen, Shu-Sheng Lin, Tsun-Chao Chiang
  • Publication number: 20180348625
    Abstract: A method of manufacturing a photomask includes at least the following steps. First, a phase shift layer and a hard mask layer are formed on a light transmitting substrate. A predetermined mask pattern is split into a first pattern and a second pattern. A series of processes is performed so that the hard mask layer and the phase shift layer have the first pattern and the second pattern. The series of processes includes at least the following steps. First, a first exposure process for transferring the first pattern is performed. Thereafter, a second exposure process for transferring the second pattern is performed. The first exposure process and the second exposure process are executed by different machines.
    Type: Application
    Filed: August 27, 2017
    Publication date: December 6, 2018
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Cheng-Ming Lin, Cheng-Hsuen Chiang, Chih-Ming Chen, Huai-Chih Cheng, Hao-Ming Chang, Hsao Shih, Hsin-Yi Yin
  • Publication number: 20180299768
    Abstract: A photo mask assembly including a photo mask, a first adhesive layer adhered with the photo mask, a pellicle frame and a pellicle is provided. The pellicle frame includes a plurality of recesses for accommodating the first adhesive layer. The pellicle frame is adhered with the photo mask through the first adhesive layer accommodated in the plurality of recesses. The pellicle is disposed on the pellicle frame. The pellicle frame is between the pellicle and the first adhesive layer. An optical apparatus including the above-mentioned photo mask assembly is also provided.
    Type: Application
    Filed: April 13, 2017
    Publication date: October 18, 2018
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shao-Chi Wei, Cheng-Ming Lin, Sheng-Chang Hsu, Yu-Hsin Hsu, Hao-Ming Chang
  • Patent number: 10101651
    Abstract: A photo mask assembly including a photo mask, a first adhesive layer adhered with the photo mask, a pellicle frame and a pellicle is provided. The pellicle frame includes a plurality of recesses for accommodating the first adhesive layer. The pellicle frame is adhered with the photo mask through the first adhesive layer accommodated in the plurality of recesses. The pellicle is disposed on the pellicle frame. The pellicle frame is between the pellicle and the first adhesive layer. An optical apparatus including the above-mentioned photo mask assembly is also provided.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: October 16, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: SHao-Chi Wei, Cheng-Ming Lin, Sheng-Chang Hsu, Yu-Hsin Hsu, Hao-Ming Chang
  • Publication number: 20180284601
    Abstract: A method of fabricating a photomask includes providing a blank mask; removing a portion of the resist layer to form a patterned resist layer exposing a portion of the cooling layer; patterning the cooling layer by using the patterned resist layer as an etching mask; patterning the opaque layer; and removing the patterned resist layer and the patterned cooling layer. The blank mask includes a light-transmitting substrate and an opaque layer, a cooling layer, and a resist layer sequentially stacked thereon, wherein the cooling layer has a thermal conductivity ranging between 160 and 5000 and an effective atomic number ranging between 5 and 14.
    Type: Application
    Filed: March 28, 2017
    Publication date: October 4, 2018
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hao-Ming Chang, Chih-Ming Chen, Cheng-Ming Lin, Sheng-Chang Hsu, Shao-Chi Wei, Hsao Shih, Li-Chih Lu
  • Publication number: 20180164675
    Abstract: A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.
    Type: Application
    Filed: April 6, 2017
    Publication date: June 14, 2018
    Inventors: Hao-Ming CHANG, Chien-Hung LAI, Cheng-Ming LIN, Hsuan-Wen WANG, Min-An YANG, S. C. HSU, Shao-Chi WEI, Yuan-Chih CHU
  • Publication number: 20180161828
    Abstract: A method for processing a substrate is provided. The method includes supplying a first flow of a chemical solution into a processing chamber, configured to process the substrate, via a first dispensing nozzle. The method further includes producing a first thermal image of the first flow of the chemical solution. The method also includes performing an image analysis on the first thermal image. In addition, the method includes moving the substrate into the processing chamber when the result of the analysis of the first thermal image is within the allowable deviation from the baseline.
    Type: Application
    Filed: April 18, 2017
    Publication date: June 14, 2018
    Inventors: Min-An YANG, Hao-Ming CHANG, Shao-Chi WEI, Kuo-Chin LIN, Sheng-Chang HSU, Li-Chih LU, Cheng-Ming LIN
  • Patent number: 9900558
    Abstract: A microscope module includes a light source assembly, a sampling assembly and a diffusing element. The light source assembly includes a light source and a light guide element. The light source is disposed close to the light incidence end of the light guide element. The sampling assembly includes a cover and a base. The cover and the base are combined to define a sample accommodating space, which is located at the light exit end of the light guide element. The diffusing element is disposed between the light source and the sample accommodating space. The light emitted from the light source passes through the diffusing element and then enters the sample accommodating space. A microscope device containing the microscope module is also disclosed.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: February 20, 2018
    Assignee: AIDMICS BIOTECHNOLOGY CO., LTD.
    Inventors: Cheng-Ming Lin, Shu-Sheng Lin, Chang-Yu Chen, Tsun-Chao Chiang
  • Publication number: 20170227519
    Abstract: An optical viewing device includes a first assembly and a second assembly. The first assembly includes a first body and a light source. The second assembly includes a second body, a convex lens and an image capturing module. The first body has a first connecting portion and a light output hole, and the first connecting portion is disposed on at least one side of the light output hole. The light source is disposed within the first body. The second body has a second connecting portion, which is disposed corresponding to the first connecting portion. The convex lens and the image capturing module are disposed within the second body, and the light outputted from the light output hole passes through the convex lens and then enters the image capturing module. The first connecting portion and the second connecting portion are connected with each other to form a chamber.
    Type: Application
    Filed: January 20, 2017
    Publication date: August 10, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Tsun-Chao CHIANG, Shu-Sheng LIN
  • Publication number: 20170227758
    Abstract: A reflecting microscope module cooperating with an image capturing module includes a housing, a lens and a sample adhesive substance. The housing has a sample inspecting surface located on one side of the housing opposite to the image capturing module. The lens is disposed in the housing and the sample adhesive substance is detachably disposed on a bottom of the housing. The sample adhesive substance adjacently connected to the sample inspecting surface includes a substrate and a glue layer. The glue layer is integrally combined with the substrate to form one piece. A reflecting microscope device is also disclosed.
    Type: Application
    Filed: January 31, 2017
    Publication date: August 10, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Tsun-Chao CHIANG, Shu-Sheng LIN
  • Publication number: 20170227757
    Abstract: A portable microscope apparatus operated with an image capture device includes a sample carrying module, a lens module, a first polarizer and a second polarizer. The sample carrying module includes a transparent carrier and a sample adhesive element including a substrate and a glue layer. The substrate has a concave portion and an extending portion. The concave portion is adjacently connected to the extending portion to form a first surface. The glue layer is at least partially disposed on the first surface and in an integrated form with the substrate. The lens module is detachably connected to the image capture device, and disposed between the sample carrying module and the image capture device. The first polarizer is disposed on an optical path on one side of the sample carrying module. The second polarizer is disposed on the optical path on the other side of the sample carrying module.
    Type: Application
    Filed: January 27, 2017
    Publication date: August 10, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Tsun-Chao CHIANG, Shu-Sheng LIN
  • Publication number: 20170227756
    Abstract: A microscope apparatus includes a sample carrying module, a light source module and a lens module. The sample carrying module includes an adhesive element and a body having a light-transmission region and a sample viewing surface. The adhesive element is detachably adhered to the body, and at least partially covers the light-transmission region, such that the adhesive element is disposed adjacent to the sample viewing surface. The light source module is detachably disposed at a side of the body, and includes a base and a light source. The base has an aperture, and the sample carrying module is detachably disposed at a side of the aperture. The light source is disposed in the base. The lens module includes at least one lens, which is detachably disposed at one side of the sample carrying module and substantially focuses at the sample viewing surface, and corresponds to the light source module.
    Type: Application
    Filed: January 26, 2017
    Publication date: August 10, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Tsun-Chao CHIANG, Shu-Sheng LIN
  • Publication number: 20170227518
    Abstract: A sample detecting device is used in cooperation with an image capturing device. The sample detecting device includes a first assembly and a second assembly. The first assembly includes a light emitting unit and a light-permeable unit. The light-permeable unit is disposed at one side of the light emitting unit. The first assembly and the second assembly match and connect with each other to form a sample containing space. The second assembly includes a body and a convex lens. The body has a first cavity portion and a second cavity portion. The light-permeable unit is disposed in the first cavity portion, and the convex lens is disposed in the second cavity portion. The light emitted from the light emitting unit sequentially passes through the light-permeable unit and the convex lens and leaves the body.
    Type: Application
    Filed: January 20, 2017
    Publication date: August 10, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Tsun-Chao CHIANG, Shu-Sheng LIN
  • Publication number: 20170138840
    Abstract: A microscope unit and a microscope device are disclosed. The microscope unit is used with an external image capture module or an image capture module of the microscope device. The microscope unit comprises a body, an optical assembly and a heating element. The body has a tunnel going through the body, and a specimen observation plane located in the tunnel. The optical assembly having a convex lens is disposed at one end of the tunnel. A minimum distance from the specimen observation plane to the convex lens ranges from 0.1 mm to 3.0 mm. The heating element is disposed corresponding to the specimen observation plane.
    Type: Application
    Filed: August 1, 2016
    Publication date: May 18, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Tsun-Chao CHIANG, Shu-Sheng LIN
  • Publication number: 20170084019
    Abstract: A detecting device for detecting a sample in a fluid includes an image capturing unit, at least one lens, a detecting area and a light source. The image capturing unit has at least one camera. The lens is disposed at one side of the image capturing unit corresponding to the camera. The lens and the image capturing unit together form a DOF area, and the lens has a first optical axis. The detecting area is located in the DOF area, and the fluid flows through the detecting area. The light source emits a light beam to the DOF area along a second optical axis for illuminating at least a part of the detecting area. The image capturing unit captures at least a part of the light beam reflected, refracted or excited by the sample flowing through the detecting area for generating at least one sample image.
    Type: Application
    Filed: September 21, 2016
    Publication date: March 23, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Tsun-Chao CHIANG, Shu-Sheng LIN
  • Publication number: 20170045723
    Abstract: A microscope module, which is cooperated with an image capturing module, includes a housing, a convex lens and an illumination assembly. The housing has a sample inspecting surface located on one side of the housing, which is opposite to the image capturing module. The convex lens is disposed in the housing, and the shortest distance between the sample inspecting surface and the convex lens ranges from 0.1 mm to 3.0 mm. The illumination assembly has a light source and is located between the image capturing module and the convex lens. The light emitted from the light source enters the convex lens through an input surface of the convex lens, leaves the convex lens through an output surface of the convex lens, and then reaches the sample inspecting surface. A microscope device containing the microscope module is also disclosed.
    Type: Application
    Filed: August 12, 2016
    Publication date: February 16, 2017
    Inventors: Cheng-Ming LIN, Chang-Yu CHEN, Shu-Sheng LIN, Tsun-Chao CHIANG