Patents by Inventor Chih-An Yang

Chih-An Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240006556
    Abstract: A light-emitting diode includes an N-type semiconductor layer, a light-emitting layer, a first P-type semiconductor layer, a hole diffusion layer and a second P-type semiconductor layer sequentially stacked in that order. The hole diffusion layer includes a first sub-layer, a second sub-layer and a third sub-layer sequentially stacked along a direction from the first P-type semiconductor layer to the second P-type semiconductor layer. The first sub-layer is an AlN layer, the second sub-layer is an AlInGaN layer or an AlGaN layer, and the third sub-layer is an AlInGaN layer or an AlGaN layer. As a result, advantages of alleviating a current crowding problem and improving luminous efficiency can be achieved.
    Type: Application
    Filed: July 3, 2023
    Publication date: January 4, 2024
    Inventors: ShuenTa Teng, Hung-Chih Yang, Chunyu Liu
  • Patent number: 11856797
    Abstract: A resistive random access memory (RRAM) structure includes a resistive memory element formed on a semiconductor substrate. The resistive element includes a top electrode, a bottom electrode, and a resistive material layer positioned between the top electrode and the bottom electrode. The RRAM structure further includes a field effect transistor (FET) formed on the semiconductor substrate, the FET having a source and a drain. The drain has a zero-tilt doping profile and the source has a tilted doping profile. The resistive memory element is coupled with the drain via a portion of an interconnect structure.
    Type: Grant
    Filed: January 31, 2022
    Date of Patent: December 26, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chin-Chieh Yang, Hsia-Wei Chen, Chih-Yang Chang, Kuo-Chi Tu, Wen-Ting Chu, Yu-Wen Liao
  • Publication number: 20230410932
    Abstract: The present disclosure describes a magnetic memory device. The magnetic memory device includes a magnetic sensing array configured to sense an external magnetic field strength. The magnetic memory device further includes a voltage modulator configured to, in response to the external magnetic field strength being greater than a threshold magnetic field strength, provide a test voltage different from a current write voltage of the magnetic memory device. The magnetic memory device further includes an error check array configured to use the test voltage as a write voltage of the error check array and provide a bit error rate corresponding to the test voltage. The magnetic memory device further includes a control unit configured to adjust, based on the bit error rate being equal to or less than a threshold bit error rate, a write voltage of the magnetic memory device from the current write voltage to the test voltage.
    Type: Application
    Filed: July 31, 2023
    Publication date: December 21, 2023
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Hsiang CHEN, Chih-Yang Chang, Chia Yu Wang, Meng-Chun Shih
  • Publication number: 20230410931
    Abstract: The present disclosure describes a magnetic memory device. The magnetic memory device includes a magnetic sensing array configured to sense an external magnetic field strength. The magnetic memory device further includes a voltage modulator configured to, in response to the external magnetic field strength being greater than a threshold magnetic field strength, provide a test voltage different from a current write voltage of the magnetic memory device. The magnetic memory device further includes an error check array configured to use the test voltage as a write voltage of the error check array and provide a bit error rate corresponding to the test voltage. The magnetic memory device further includes a control unit configured to adjust, based on the bit error rate being equal to or less than a threshold bit error rate, a write voltage of the magnetic memory device from the current write voltage to the test voltage.
    Type: Application
    Filed: June 21, 2022
    Publication date: December 21, 2023
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Hsiang CHEN, Chih-Yang CHANG, Chia Yu WANG, Meng-Chun SHIH
  • Publication number: 20230402304
    Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a processing volume for processing a substrate and a pressure system in fluid communication with the processing volume and comprising a throttle valve assembly including a housing, a sensing device disposed in an interior of the housing, and a fan open to the interior of the housing, wherein, during operation of the pressure system to control a pressure within the processing volume, the sensing device is responsive to temperature changes in the interior of the housing such that the fan remains off when a temperature of the interior of the housing is less than a predetermined temperature and automatically turns on when the temperature within interior of the housing is equal to or greater than the predetermined temperature.
    Type: Application
    Filed: May 19, 2022
    Publication date: December 14, 2023
    Inventors: Gaurav SHRIVASTAVA, Pavankumar Ramanand HARAPANHALLI, Yao-Hung YANG, Sudhir R. GONDHALEKAR, Chih-Yang CHANG
  • Patent number: 11844286
    Abstract: Various embodiments of the present application are directed towards a method for forming a flat via top surface for memory, as well as an integrated circuit (IC) resulting from the method. In some embodiments, an etch is performed into a dielectric layer to form an opening. A liner layer is formed covering the dielectric layer and lining the opening. A lower body layer is formed covering the dielectric layer and filling a remainder of the opening over the liner layer. A top surface of the lower body layer and a top surface of the liner layer are recessed to below a top surface of the dielectric layer to partially clear the opening. A homogeneous upper body layer is formed covering the dielectric layer and partially filling the opening. A planarization is performed into the homogeneous upper body layer until the dielectric layer is reached.
    Type: Grant
    Filed: November 30, 2021
    Date of Patent: December 12, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsia-Wei Chen, Chih-Yang Chang, Chin-Chieh Yang, Jen-Sheng Yang, Sheng-Hung Shih, Tung-Sheng Hsiao, Wen-Ting Chu, Yu-Wen Liao, I-Ching Chen
  • Patent number: 11839516
    Abstract: Medical imaging equipment and a medical imaging method are provided. The medical imaging equipment includes medical equipment, a controller, and a head-mounted display. The medical equipment is configured to investigate a body portion and output a first image signal corresponding to the body portion. The first image signal has a first resolution. The controller is coupled to the medical equipment to receive the first image signal and convert the first resolution of the first image signal to a second image signal having a second resolution. The head-mounted display is coupled to the controller to display a display image of the second image signal. The head-mounted display has a direction line. When the head-mounted display faces the body portion, the display image and the body portion are located along to the direction line.
    Type: Grant
    Filed: June 8, 2021
    Date of Patent: December 12, 2023
    Assignee: Coretronic Corporation
    Inventors: I-Han Chen, Chen Hsiang Shih, Yi-Fa Wang, Chih-Yang Tsai, Chia-Wei Huang
  • Patent number: 11843172
    Abstract: A patch antenna includes a dielectric substrate formed by a high dielectric coefficient material covered with a soft material. The dielectric substrate has a first surface, an opposite second surface, and surrounding side surfaces there between. The patch antenna further includes a radiating metal arm formed on at least the first surface with a thin metal layer in a specific shape, a grounding metal plate disposed on the second surface, and a parasitic metal arm extending from the grounding metal plate towards the first surface via at least one of the side surfaces. The parasitic metal arm is approximate but not connected to the radiating metal arm. The radiation metal arm further includes an enclosed slot, together with the parasitic metal arm, improve the working bandwidth and high directivity of the antenna.
    Type: Grant
    Filed: March 8, 2022
    Date of Patent: December 12, 2023
    Assignee: QUANTUMZ INC.
    Inventors: Chih-Yang Lou, Meng-Hua Tsai, Wei-Ting Lee, Sin-Siang Wang
  • Publication number: 20230395438
    Abstract: A semiconductor device includes a die stack having dies selected into the stack based on their thicknesses. After the dies are formed on a wafer and thinned, a metrology tool is used to determine the thicknesses of the dies in the wafer. These thicknesses are stored in a known thickness die (KTD) map, along with other information such as their standard and average deviations and their classification into a binning class. In one example, dies which have been classified into bin 1 (having an optimal thickness) are selected to provide a high capacity highly reliable semiconductor device. In a further example, dies of different bins are mixed and matched to provide a uniform, highly controlled overall die stack height.
    Type: Application
    Filed: June 3, 2022
    Publication date: December 7, 2023
    Applicant: WESTERN DIGITAL TECHNOLOGIES, INC.
    Inventors: Nagesh Vodrahalli, Chih Yang Li, Xuyi Yang, Cong Zhang
  • Patent number: 11837312
    Abstract: The present disclosure describes a magnetic memory device. The magnetic memory device includes a magnetic sensing array configured to sense an external magnetic field strength. The magnetic memory device further includes a voltage modulator configured to, in response to the external magnetic field strength being greater than a threshold magnetic field strength, provide a test voltage different from a current write voltage of the magnetic memory device. The magnetic memory device further includes an error check array configured to use the test voltage as a write voltage of the error check array and provide a bit error rate corresponding to the test voltage. The magnetic memory device further includes a control unit configured to adjust, based on the bit error rate being equal to or less than a threshold bit error rate, a write voltage of the magnetic memory device from the current write voltage to the test voltage.
    Type: Grant
    Filed: June 21, 2022
    Date of Patent: December 5, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chia-Hsiang Chen, Chih-Yang Chang, Chia Yu Wang, Meng-Chun Shih
  • Publication number: 20230387345
    Abstract: A light-emitting device is provided. The light-emitting device generates a white light and includes at least one light-emitting diode. The at least one light-emitting diode generates a light beam with a broadband blue spectrum and includes a first semiconductor layer, a second semiconductor layer and a multiple quantum well structure. The multiple quantum well structure is located between the first semiconductor layer and the second semiconductor layer, and includes well layers and barrier layers. The well layers include a first well layer, a second well layer and third well layers different in indium concentrations. The first well layer has the largest indium concentration, and the third well layers have the smallest indium concentration.
    Type: Application
    Filed: August 10, 2023
    Publication date: November 30, 2023
    Inventors: BEN-JIE FAN, JING-QIONG ZHANG, YI-QUN LI, HUNG-CHIH YANG, TSUNG-CHIEH LIN, HO-CHIEN CHEN, SHUEN-TA TENG, CHENG-CHANG HSIEH
  • Publication number: 20230376671
    Abstract: A neural network based method places flexible blocks on a chip canvas in an integrated circuit (IC) design. The neural network receives an input describing geometric features of a flexible block to be placed on the chip canvas. The geometric features includes an area size and multiple aspect ratios. The neural network generates a probability distribution over locations on the chip canvas and the aspect ratios of the flexible block. Based on the probability distribution, a location on the chip canvas is selected for placing the flexible block with a chosen aspect ratio.
    Type: Application
    Filed: May 11, 2023
    Publication date: November 23, 2023
    Inventors: Jen-Wei Lee, Yi-Ying Liao, Te-Wei Chen, Yu-Hsiu Lin, Chia-Wei Chen, Chun-Ku Ting, Sheng-Tai Tseng, Ronald Kuo-Hua Ho, Hsin-Chuan Kuo, Chun-Chieh Wang, Ming-Fang Tsai, Chun-Chih Yang, Tai-Lai Tung, Da-Shan Shiu
  • Publication number: 20230376653
    Abstract: A neural network is used to place macros on a chip canvas in an integrated circuit (IC) design. The macros are first clustered into multiple macro clusters. Then the neural network generates a probability distribution over locations on a grid and aspect ratios of a macro cluster. The grid represents the chip canvas and is formed by rows and columns of grid cells. The macro cluster is described by at least an area size, aspect ratios, and wire connections. Action masks are generated for respective ones of the aspect ratios to block out a subset of unoccupied grid cells based on design rules that optimize macro placement. Then, by applying the action masks on the probability distribution, a masked probability distribution is generated. Based on the masked probability distribution, a location on the grid is selected for placing the macro cluster with a chosen aspect ratio.
    Type: Application
    Filed: May 11, 2023
    Publication date: November 23, 2023
    Inventors: Hsin-Chuan Kuo, Chia-Wei Chen, Yu-Hsiu Lin, Kun-Yu Wang, Sheng-Tai Tseng, Chun-Ku Ting, Fang-Ming Yang, Yu-Hsien Ku, Jen-Wei Lee, Ronald Kuo-Hua Ho, Chun-Chieh Wang, Yi-Ying Liao, Tai-Lai Tung, Ming-Fang Tsai, Chun-Chih Yang, Chih-Wei Ko, Kun-Chin Huang
  • Publication number: 20230380190
    Abstract: A method for fabricating an integrated circuit is provided. The method includes depositing a dielectric layer over a conductive feature; etching an opening in the dielectric layer to expose the conductive feature, such that the dielectric layer has a tapered sidewall surrounding the opening; depositing a bottom electrode layer into the opening in the dielectric layer; depositing a resistance switch layer over the bottom electrode layer; patterning the resistance switch layer and the bottom electrode layer respectively into a resistance switch element and a bottom electrode, in which a sidewall of the bottom electrode is landing on the tapered sidewall of the dielectric layer.
    Type: Application
    Filed: July 28, 2023
    Publication date: November 23, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chieh-Fei CHIU, Wen-Ting CHU, Yong-Shiuan TSAIR, Yu-Wen LIAO, Chih-Yang CHANG, Chin-Chieh YANG
  • Publication number: 20230378115
    Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a substrate having one or more devices formed thereon, one or more bonding pads disposed over the substrate, and a first passivation layer disposed over the one or more bonding pads. The first passivation layer includes a first passivation sublayer having a first dielectric material, a second passivation sublayer disposed over the first passivation sublayer, and the second passivation sublayer has a second dielectric material different from the first dielectric material. The first passivation layer further includes a third passivation sublayer disposed over the second passivation sublayer, and the third passivation sublayer has a third dielectric material different from the second dielectric material. At least two of the first, second, and third passivation sublayers each includes a nitride.
    Type: Application
    Filed: July 23, 2023
    Publication date: November 23, 2023
    Inventors: Hsin-Chi CHEN, Hsun-Ying HUANG, Chih-Ming LEE, Shang-Yen WU, Chih-An YANG, Hung-Wei HO, Chao-Ching CHANG, Tsung-Wei HUANG
  • Publication number: 20230369449
    Abstract: The transistor includes a first III-V compound layer. A second III-V compound layer is disposed on the first III-V compound layer and is different from the first III-V compound layer in composition. A carrier channel is located between the first III-V compound layer and the second III-V compound layer. A source feature and a drain feature are disposed on the second III-V compound layer.
    Type: Application
    Filed: July 27, 2023
    Publication date: November 16, 2023
    Inventors: Chun-Wei Hsu, Jiun-Lei Jerry Yu, Fu-Wei Yao, Chen-Ju Yu, Fu-Chih Yang, Chun Lin Tsai
  • Publication number: 20230358254
    Abstract: A fan assembly including a fan frame and an impeller. The fan frame includes a frame body and a first peripheral protruding plate and has an air inlet and an air outlet. The first peripheral protruding plate protrudes from a side of the frame body and forms an air channel together with the frame body. The first peripheral protruding plate is configured to reduce a noise made by the fan assembly. The air inlet is in fluid communication with the air outlet via the air channel. The impeller is rotatably disposed on the frame body and located in the air channel. The protruding height of the first peripheral protruding plate relative to the frame body ranges from 50 to 100 percent of an overall axial thickness of the impeller.
    Type: Application
    Filed: June 22, 2022
    Publication date: November 9, 2023
    Applicants: MICRO-STAR INT'L CO.,LTD., MSI COMPUTER (SHENZHEN) CO.,LTD.
    Inventors: Yi Wen CHEN, Yung Ching HUANG, Shang-Chih YANG
  • Publication number: 20230354618
    Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first resistive random access memory (RRAM) element and a second RRAM element over a substrate. A conductive element is arranged below the first RRAM element and the second RRAM element. The conductive element electrically couples the first RRAM element to the second RRAM element. An upper insulating layer continuously extends over the first RRAM element and the second RRAM element. An upper inter-level dielectric (ILD) structure laterally surrounds the first RRAM element and the second RRAM element. The upper insulating layer separates the first RRAM element and the second RRAM element from the upper ILD structure.
    Type: Application
    Filed: July 6, 2023
    Publication date: November 2, 2023
    Inventors: Chin-Chieh Yang, Chih-Yang Chang, Wen-Ting Chu, Yu-Wen Liao
  • Patent number: 11803539
    Abstract: A method of improving an efficiency of updating rule data stored in a block chain receives a rule updating request and obtains data as to the existing rule (rule data) in response to the rule updating request. Each obtained rule data is analyzed for compliance with a predefined rule strategy. When the obtained rule data is determined as complying, a priority level of each obtained rule data is confirmed. The obtained rule data is authenticated based on the priority level and a block chain authentication mechanism. When the obtained rule data is authenticated, the rule data stored in each block chain node in the block chain is updated. An electronic device and a computer readable storage medium applying the method are also provided.
    Type: Grant
    Filed: December 29, 2021
    Date of Patent: October 31, 2023
    Assignee: Fulian Precision Electronics (Tianjin) Co., LTD.
    Inventor: Chun-Chih Yang
  • Patent number: 11804538
    Abstract: A method of forming a high electron mobility transistor (HEMT) includes a first III-V compound layer and a second III-V compound layer disposed on the first III-V compound layer and is different from the first III-V compound layer in composition. A source feature and a drain feature are disposed on the second III-V compound layer. A p-type layer is disposed on a portion of the second III-V compound layer between the source feature and the drain feature. A gate electrode is disposed on the p-type layer. A capping layer is disposed on the second III-V compound layer.
    Type: Grant
    Filed: May 26, 2021
    Date of Patent: October 31, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chun-Wei Hsu, Jiun-Lei Jerry Yu, Fu-Wei Yao, Chen-Ju Yu, Fu-Chih Yang, Chun Lin Tsai