Abstract: In some embodiments, a semiconductor wafer testing system is provided. The semiconductor wafer testing system includes a semiconductor wafer prober having one or more conductive probes, where the semiconductor wafer prober is configured to position the one or more conductive probes on an integrated chip (IC) that is disposed on a semiconductor wafer. The semiconductor wafer testing system also includes a ferromagnetic wafer chuck, where the ferromagnetic wafer chuck is configured to hold the semiconductor wafer while the wafer prober positions the one or more conductive probes on the IC. An upper magnet is disposed over the ferromagnetic wafer chuck, where the upper magnet is configured to generate an external magnetic field between the upper magnet and the ferromagnetic wafer chuck, and where the ferromagnetic wafer chuck amplifies the external magnetic field such that the external magnetic field passes through the IC with an amplified magnetic field strength.

Abstract: A heat dissipation device is provided, including a main body, a plurality of fins, a plurality of flat tubes, a pump head, and a fan. The pump head and the fan are disposed on opposite sides of the main body. The main body has three tanks arranged along the long axis of the main body. The flat tubes communicate with the tanks. The fins are disposed on the flat tubes.

Abstract: An optical device is provided. The optical device includes a fiber array and an optical assembly. The fiber array includes a common channel and a plurality of divided channels arranged in parallel in a first direction and extending along a second direction, and the fiber array has a first surface from a top view perspective. The optical assembly is coupled to the first surface of the fiber array. The first surface and the common channel of the fiber array form an angle less than 90 degrees from the top view perspective.

Abstract: A light-emitting diode is provided. The light-emitting diode includes a P-type semiconductor layer, a N-type semiconductor layer, and a light-emitting stack located therebetween. The light-emitting stack includes a plurality of well layers and a plurality of barrier layers that are alternately stacked, the well layers includes at least one first well layer, at least one second well layer, and third well layers that have different indium concentrations. The first well layer has the largest indium concentration, and the third well layers have the smallest indium concentration. Three of well layers that are closest to the P-type semiconductor layer are the third well layers, and the first well layer is closer to the N-type semiconductor layer than the P-type semiconductor layer.

Abstract: In a general aspect, an integrated quantum circuit includes a first substrate and a second substrate. The first substrate includes a first surface and a recess formed in the first substrate along the first surface. The recess has a recess surface and is configured to enclose a quantum circuit element. The first substrate includes a first electrically-conductive layer disposed on the first surface and covering at least a portion of the recess surface. The first electrically-conductive layer includes a first superconducting material. The second substrate includes a second surface and a quantum circuit element. The second substrate includes a second electrically-conductive layer on the second surface that includes a second superconducting material. The first substrate is adjacent the second substrate to enclose the quantum circuit device within the recess. The first electrically-conductive layer of the first substrate is electrically-coupled to the second electrically-coupled layer of the second substrate.

Abstract: A memory device, such as a MRAM device, includes a plurality of memory macros, where each includes an array of memory cells and a first ECC circuit configured to detect data errors in the respective memory macro. A second ECC circuit that is remote from the plurality of memory macros is communicatively coupled to each of the plurality of memory macros. The second ECC circuit is configured to receive the detected data errors from the first ECC circuits of the plurality of memory macros and correct the data errors.

Abstract: Structures and methods for separating semiconductor wafers into individual dies are disclosed. A semiconductor wafer or panel can include a crack assist structure in a scribe junction. The crack assist structure can include a plurality of vertical walls extending at least partially through a thickness of the wafer. In some embodiments, the plurality of vertical walls can be coupled to a weak interface. The weak interface can guide cracks that form during the dicing process in a direction along the walls, away from active circuitry. After dicing, the resulting semiconductor devices can include a plurality of vertical walls extending at least partially through a thickness of the semiconductor device. Each of the plurality of vertical walls can include at least a portion extending substantially parallel to a sidewall of the semiconductor device.

Abstract: A semiconductor device structure, along with methods of forming such, are described. The structure includes a substrate having one or more devices formed thereon, one or more bonding pads disposed over the substrate, and a first passivation layer disposed over the one or more bonding pads. The first passivation layer includes a first passivation sublayer having a first dielectric material, a second passivation sublayer disposed over the first passivation sublayer, and the second passivation sublayer has a second dielectric material different from the first dielectric material. The first passivation layer further includes a third passivation sublayer disposed over the second passivation sublayer, and the third passivation sublayer has a third dielectric material different from the second dielectric material. At least two of the first, second, and third passivation sublayers each includes a nitride.

Abstract: A method for fabricating an integrated circuit is provided. The method includes depositing a dielectric layer over a conductive feature; etching an opening in the dielectric layer to expose the conductive feature, such that the dielectric layer has a tapered sidewall surrounding the opening; depositing a bottom electrode layer into the opening in the dielectric layer; depositing a resistance switch layer over the bottom electrode layer; patterning the resistance switch layer and the bottom electrode layer respectively into a resistance switch element and a bottom electrode, in which a sidewall of the bottom electrode is landing on the tapered sidewall of the dielectric layer.

Abstract: Various embodiments of the present application are directed towards a method for forming a flat via top surface for memory, as well as an integrated circuit (IC) resulting from the method. In some embodiments, an etch is performed into a dielectric layer to form an opening. A liner layer is formed covering the dielectric layer and lining the opening. A lower body layer is formed covering the dielectric layer and filling a remainder of the opening over the liner layer. A top surface of the lower body layer and a top surface of the liner layer are recessed to below a top surface of the dielectric layer to partially clear the opening. A homogeneous upper body layer is formed covering the dielectric layer and partially filling the opening. A planarization is performed into the homogeneous upper body layer until the dielectric layer is reached.

Abstract: An apparatus for inserting a seal member into a seal groove includes a tray. The tray includes a holding groove formed in a front surface for containing the seal member. The holding groove is sized and shaped to correspond with the seal groove. A method of installing a seal member into a seal groove includes aligning the holding groove with the seal groove, and applying a pressure to a back surface of the tray, thereby deforming the tray and inserting the seal member into the seal groove.

Abstract: A method for manufacturing a semiconductor device is provided. The method includes disposing a mandrel layer on a dielectric layer and patterning the mandrel layer to form a first mandrel and a second mandrel spaced apart from the first mandrel. The minimum distance between the first mandrel and the second mandrel is equal to or less than about 90 nm. The method also includes etching the dielectric layer by using the first spacer, the second spacer, the third spacer, and the fourth spacer as etching masks to form a first dielectric element, a second dielectric element, a third dielectric element, and a fourth dielectric element. The method also includes forming a first shielding line between the second dielectric element and the third dielectric element.

Abstract: A semiconductor device and a method of manufacturing a semiconductor device are provided. The semiconductor device includes a substrate having a surface, a first signal line disposed on the surface of the substrate, and a second signal line disposed on the surface of the substrate and spaced apart from the first signal line. The semiconductor device also includes a first shielding line between the first signal line and the second signal line. The minimum distance between the first signal line and the second signal line is equal to or less than about 90 nanometers (nm).

Abstract: A method includes forming a semiconductor fin over a substrate; forming a gate structure over the semiconductor fin, the gate structure comprising: a first metallic layer; a second metallic layer over the first metallic layer, wherein the first metallic layer is a metal compound of a first element and a second element and the second metallic layer is a single-element metal of the second element; and an oxide layer between the first metallic layer and the second metallic layer.

Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first resistive random access memory (RRAM) element over a substrate. The first RRAM element has a first terminal and a second terminal. A second RRAM element is arranged over the substrate and has a third terminal and a fourth terminal. The third terminal is electrically coupled to the first terminal of the first RRAM element. A reading circuit is coupled to the second terminal and the fourth terminal. The reading circuit is configured to read a single data state from both a first non-zero read current received from the first RRAM element and a second non-zero read current received from the second RRAM element.

Abstract: In a method of manufacturing a semiconductor device, an initial pattern layout is obtained. The initial pattern layout incudes fin patterns which include active fin patterns to be formed as active fin structures and dummy fin patterns not to be formed as actual fin structures or to be removed. The locations of the fin patterns are modified, as follows. A space between adjacent active fin patterns is increased by a first amount, a space between the dummy fin patterns is decreased by a second amount, and a space between one of the dummy fin patterns and one of the active fin patterns adjacent to the one of the dummy fin patterns is decreased by a third amount. Mandrel patterns are placed so that the fin patterns of which locations are modified are placed along longitudinal edges of the mandrel patterns.

Abstract: A metal-insulator-metal (MIM) capacitor structure and a method for forming the same are provided. The MIM capacitor structure includes a first electrode layer formed over a substrate, and a first spacer formed on a sidewall of the first electrode layer. The MIM capacitor structure also includes a first dielectric layer formed on the first spacers, and an end of the first dielectric layer is in direct contact with the first pacer.

Abstract: In some embodiments, a method for generating a random bit is provided. The method includes generating a first random bit by providing a random number generator (RNG) signal to a magnetoresistive random-access memory (MRAM) cell. The RNG signal has a probability of about 0.5 to switch the resistive state of the MRAM cell from a first resistive state corresponding to a first data state to a second resistive state corresponding to a second data sate. The first random bit is then read from the MRAM cell.