Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a cap structure and methods of manufacture. The structure includes: a gate structure composed of conductive gate material; sidewall spacers on the gate structure, extending above the conductive gate material; and a capping material on the conductive gate material and extending over the sidewall spacers on the gate structure.

Abstract: Structures for a field-effect transistor and methods of forming a structure for field-effect transistor. A gate electrode is arranged in a lower portion of a trench in an interlayer dielectric layer, and a liner is formed inside an upper portion of the trench and over a top surface of the interlayer dielectric layer. A dielectric material is deposited in in the upper portion of the trench and over the liner on the top surface of the interlayer dielectric layer. The dielectric material is polished with a polishing process to remove the dielectric material from the liner on the top surface of the interlayer dielectric layer and to form a cap comprised of the dielectric material in the upper portion of the trench. The liner on the interlayer dielectric layer operates as a polish stop during the polishing process.

Abstract: Methods produce integrated circuit structures that include (among other components) fins extending from a first layer, source/drain structures on the fins, source/drain contacts on the source/drain structures, an insulator on the source/drain contacts defining trenches between the source/drain contacts, gate conductors in a lower portion of the trenches adjacent the fins, a first liner material lining a middle portion and an upper portion of the trenches, a fill material in the middle portion of the trenches, and a second material in the upper portion of the trenches. The first liner material is on the gate conductors in the trenches.

Abstract: Methods produce integrated circuit structures that include (among other components) fins extending from a first layer, source/drain structures on the fins, source/drain contacts on the source/drain structures, an insulator on the source/drain contacts defining trenches between the source/drain contacts, gate conductors in a lower portion of the trenches adjacent the fins, a first liner material lining a middle portion and an upper portion of the trenches, a fill material in the middle portion of the trenches, and a second material in the upper portion of the trenches. The first liner material is on the gate conductors in the trenches.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a cap structure and methods of manufacture. The structure includes: a gate structure composed of conductive gate material; sidewall spacers on the gate structure, extending above the conductive gate material; and a capping material on the conductive gate material and extending over the sidewall spacers on the gate structure.

Abstract: A present invention includes at least two light cups and a composite material base. The composite material base comprises a first surface, a second surface and a third surface adjacent to the first surface, and a fourth surface opposite to the first surface. The at least two light cups are formed on the first surface. At least two first metal plates and at least two second metal plates having different polarities and corresponding to the quantity of the light cups are provided on the second surface. One ends of the at least two first and second metal plates individually pass through the composite material base and extend into the light cup to form two electrode contacts, and the other ends of the at least two first metal plates extend to the fourth surface to form an exposed heat dissipation structure.

Abstract: A method of controlling NFET and PFET gate heights across different gate widths with chamfering and the resulting device are provided. Embodiments include forming an ILD over a fin; forming cavities in the ILD, each with similar or different widths; forming a high-K dielectric layer over the ILD and in each cavity; forming a pWF metal layer over the dielectric layer in one cavity; recessing the pWF metal layer to a height above the fin; forming an nWF metal layer in the cavities over the dielectric and pWF metal layers; recessing the nWF metal layer to a height above the pWF metal layer; forming a barrier layer over the dielectric and nWF metal layers; filling the cavities with a low-resistive metal; and recessing the barrier and dielectric layers to a height above the nWF metal layer; and concurrently etching the low-resistive metal.

Abstract: A bandgap reference circuit includes: a current generating circuit, a start-up circuit, a switch circuit, and a control circuit. The current generating circuit is arranged to generate a reference current according to a control signal on a control node. The start-up circuit is coupled to the current generating circuit and arranged to generate a trigger signal and output the trigger signal as the control signal when the bandgap reference circuit starts up. The switch circuit is coupled to the current generating circuit and arranged to generate a bandgap voltage according to the reference current, and the bandgap voltage is outputted to a regulator coupled to the bandgap reference circuit. The control circuit is coupled to the control node and the switch circuit and arranged to generate a switch control signal according to the trigger signal, and the switch control signal controls a switch status of the switch circuit.

Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated circuit device. The method may be performed by forming a conductive line over a substrate and in contact with a liner. A dielectric barrier layer is formed on the conductive line. The dielectric barrier layer includes an interfacial layer contacting the conductive line, a middle layer contacting the interfacial layer, and an upper layer contacting the middle layer. The interfacial layer and the liner collectively completely surround the conductive line. An inter-level dielectric layer is formed along sidewalls of the upper layer.

Abstract: Methods of fabricating a semiconductor device structure are provided. The method includes forming a fin structure over a substrate. The method also includes forming a gate structure over the fin structure. The method further includes epitaxially growing a source/drain structure covering the fin structure. In addition, the method includes epitaxially growing a capping layer over the source/drain structure. The capping layer has a top portion and a lower portion under the top portion. The top portion has a first thickness and the lower portion has a second. A ratio of the first thickness to the second thickness is in a range of about 1.01 to about 2. The method also includes etching the top portion and the lower portion of the capping layer. The method further includes forming a silicide layer over the source/drain structure and a contact over the silicide layer.

Abstract: A mask inspection device and method thereof are provided. In the mask inspection device, an image capturing module is controlled to capture an image of the object to be inspected, and when the captured image does not match a predetermined correction image, a horizontal position of the bearing module which holds the object is adjusted; when the captured image matches the predetermined correction image, a light emission element projects a spot light towards the object, and the image capturing module captures an image in a mask region of the object, so as to produce a mask inspection image. The mask inspection information can be obtained from a two-dimensional image of the mask inspection image, and an abnormal image of the mask inspection image is inspected to generate mask abnormal information.

Abstract: Provided herein is a mask inspection device, including an inspection base, a shift platform, a rotating platform, a bearing platform, a laser ranging module, a vertical shift module, a processing module, and an image capturing module. A mask, which is carried and held by the bearing platform, includes a dust-proof film, each region of which is measured by the laser ranging module for generating a distance measuring signal; each distance measuring signal is utilized to control the movement of the vertical shift module, such that image capturing module can take an inspection image of that region. Based on the distance measuring signals and inspection images, height information of the dust-proof film and inspection information can be acquired. Also provided herein is a method applicable to said mask inspection device.

Abstract: A device is disclosed that includes a control circuit and a scope circuit. The control circuit is configured to delay a voltage signal to generate a first control signal. The scope circuit is configured to be operated in one of a first mode and a second mode according to the first control signal. In the first mode, the scope circuit is configured to generate a first current signal indicating amplitudes of the voltage signal, and in the second mode, the scope circuit is configured to stop generating the first current signal.

Abstract: Structures for a field-effect transistor and methods for forming a structure for a field-effect transistor. A gate cavity is formed in a dielectric layer that includes a bottom surface and a plurality sidewalls that extend to the bottom surface. A gate dielectric layer is formed at the sidewalls and the bottom surface of the gate cavity. A work function metal layer is deposited on the gate dielectric layer at the sidewalls and the bottom surface of the gate cavity. A fill metal layer is deposited inside the gate cavity after the work function metal layer is deposited. The fill metal layer is formed in direct contact with the work function metal layer.

Abstract: Methods of forming a SAC cap with SiN U-shaped and oxide T-shaped structures and the resulting devices are provided. Embodiments include forming a substrate with a trench and a plurality of gate structures; forming a nitride liner over portions of the substrate and along sidewalls of each gate structure; forming an ILD between each gate structure and in the trench; recessing each gate structure between the ILD; forming a U-shaped nitride liner over each recessed gate structure; forming an a-Si layer over the nitride liner and the U-shaped nitride liner; removing portions of the nitride liner, the U-shaped nitride liner and the a-Si layer; forming a W layer over portions of the substrate adjacent to and between the a-Si layer; forming an oxide liner over the nitride liner, the U-shaped nitride liner and along sidewalls of the W layer; and forming an oxide layer over portions of the oxide liner.

Abstract: A device is disclosed that includes a control circuit, a scope circuit and a time-to-current converter. The control circuit configured to delay a voltage signal for a delay time to generate a first control signal, and to generate a second control signal according to the first control signal and the voltage signal. The scope circuit configured to generate a first current signal in response to the second control signal and the voltage signal. The time-to-current converter configured to generate a second current signal according to the first control signal and the voltage signal.

Abstract: The present disclosure relates to an integrated circuit device and an associated method of formation. The integrated circuit device includes a substrate, and a conductive metal interconnect line arranged within a dielectric material disposed over the substrate. An interfacial layer is in contact with an upper surface of the conductive metal interconnect line. An upper dielectric layer is arranged over the interfacial layer. A middle dielectric layer is arranged between the upper dielectric layer and the interfacial layer.

Abstract: The present disclosure describes a method to form silicon germanium (SiGe) source/drain regions with the incorporation of a lateral etch in the epitaxial source/drain growth process. For example, the method can include forming a plurality of fins on a substrate, where each of the plurality of fins has a first width. The SiGe source/drain regions can be formed on the plurality of fins, where each SiGe source/drain region has a second width in a common direction with the first width and a height. The method can also include selectively etching—e.g., via a lateral etch—the SiGe source/drain regions to decrease the second width of the SiGe source/drain regions. By decreasing the width of the SiGe source/drain regions, electrical shorts between neighboring fins can be prevented or minimized. Further, the method can include growing an epitaxial capping layer over the Si/Ge source/drain regions.

Abstract: A substrate inspection device is provided, which includes a main body, a bearing module, an illuminating and camera module and a control module. A mask is held by the bearing module, which has an opening. The illuminating and image capturing module is disposed on the lifting unit. After receiving the first detecting signal, the control module accordingly drives the lifting unit to shift towards the first direction, such that the illuminating and image capturing module moves closer to the substrate. The control module then controls the shifting unit to drive the light-emitting component to project a first spot-light on the substrate through the opening, and controls the shifting unit to move by a step manner so as to carry the bearing module. The control module also controls the illuminating and image capturing module to capture images the first regions of the substrate and to generate the first images.

Abstract: A method of controlling NFET and PFET gate heights across different gate widths with chamfering and the resulting device are provided. Embodiments include forming an ILD over a fin; forming cavities in the ILD, each with similar or different widths; forming a high-K dielectric layer over the ILD and in each cavity; forming a pWF metal layer over the dielectric layer in one cavity; recessing the pWF metal layer to a height above the fin; forming an nWF metal layer in the cavities over the dielectric and pWF metal layers; recessing the nWF metal layer to a height above the pWF metal layer; forming a barrier layer over the dielectric and nWF metal layers; filling the cavities with a low-resistive metal; and recessing the barrier and dielectric layers to a height above the nWF metal layer; and concurrently etching the low-resistive metal.