Patents by Inventor Chih-Ming Chen

Chih-Ming Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11924444
    Abstract: Method and apparatus for constrained de-blocking filter are disclosed. One method receives input data related to a current block in a current picture at a video encoder side or a video bitstream corresponding to compressed data including the current block in the current picture at a video decoder side, and determines a first boundary associated with the current block, wherein the first boundary corresponds to one vertical boundary or one horizontal boundary of the current block. The method then applies de-blocking process to a reconstructed current block corresponding to the current block to result in a filtered-reconstructed current block, using a plurality of first reference samples at a same side of the first boundary, and replaces a first set of the first reference samples by one or more padding values. The method then generates a filtered decoded picture including the filtered-reconstructed current block.
    Type: Grant
    Filed: April 11, 2022
    Date of Patent: March 5, 2024
    Assignee: HFI INNOVATION INC.
    Inventors: Chia-Ming Tsai, Chih-Wei Hsu, Ching-Yeh Chen, Tzu-Der Chuang, Yu-Wen Huang
  • Publication number: 20240071953
    Abstract: A memory device including a base semiconductor die, conductive terminals, memory dies, an insulating encapsulation and a buffer cap is provided. The conductive terminals are disposed on a first surface of the base semiconductor die. The memory dies are stacked over a second surface of the base semiconductor die, and the second surface of the base semiconductor die is opposite to the first surface of the base semiconductor die. The insulating encapsulation is disposed on the second surface of the base semiconductor die and laterally encapsulates the memory dies. The buffer cap covers the first surface of the base semiconductor die, sidewalls of the base semiconductor die and sidewalls of the insulating encapsulation. A package structure including the above- mentioned memory device is also provided.
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kai-Ming Chiang, Chao-wei Li, Wei-Lun Tsai, Chia-Min Lin, Yi-Da Tsai, Sheng-Feng Weng, Yu-Hao Chen, Sheng-Hsiang Chiu, Chih-Wei Lin, Ching-Hua Hsieh
  • Publication number: 20240071954
    Abstract: A memory device including a base semiconductor die, conductive terminals, memory dies, an insulating encapsulation and a buffer cap is provided. The conductive terminals are disposed on a first surface of the base semiconductor die. The memory dies are stacked over a second surface of the base semiconductor die, and the second surface of the base semiconductor die is opposite to the first surface of the base semiconductor die. The insulating encapsulation is disposed on the second surface of the base semiconductor die and laterally encapsulates the memory dies. The buffer cap covers the first surface of the base semiconductor die, sidewalls of the base semiconductor die and sidewalls of the insulating encapsulation. A package structure including the above-mentioned memory device is also provided.
    Type: Application
    Filed: November 9, 2023
    Publication date: February 29, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kai-Ming Chiang, Chao-wei Li, Wei-Lun Tsai, Chia-Min Lin, Yi-Da Tsai, Sheng-Feng Weng, Yu-Hao Chen, Sheng-Hsiang Chiu, Chih-Wei Lin, Ching-Hua Hsieh
  • Patent number: 11916077
    Abstract: The present disclosure describes an apparatus with a local interconnect structure. The apparatus can include a first transistor, a second transistor, a first interconnect structure, a second interconnect structure, and a third interconnect structure. The local interconnect structure can be coupled to gate terminals of the first and second transistors and routed at a same interconnect level as reference metal lines coupled to ground and a power supply voltage. The first interconnect structure can be coupled to a source/drain terminal of the first transistor and routed above the local interconnect structure. The second interconnect structure can be coupled to a source/drain terminal of the second transistor and routed above the local interconnect structure. The third interconnect structure can be routed above the local interconnect structure and at a same interconnect level as the first and second interconnect structures.
    Type: Grant
    Filed: May 24, 2021
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Liang Chen, Cheng-Chi Chuang, Chih-Ming Lai, Chia-Tien Wu, Charles Chew-Yuen Young, Hui-Ting Yang, Jiann-Tyng Tzeng, Ru-Gun Liu, Wei-Cheng Lin, Lei-Chun Chou, Wei-An Lai
  • Patent number: 11916151
    Abstract: Present disclosure provides a semiconductor structure, including a semiconductor fin having a first portion and a second portion over the first portion, a first conductive region abutting a first lateral surface of the first portion and a first lateral surface of the second portion, a metal gate having a bottom portion and an upper portion, the bottom portion being between the first portion and the second portion of the semiconductor fin, and the upper portion being over the second portion of the semiconductor fin, and a first spacer between the bottom portion of the metal gate and the first conductive region. A method for manufacturing the semiconductor structure described herein is also provided.
    Type: Grant
    Filed: June 25, 2021
    Date of Patent: February 27, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chia-Ming Hsu, Yi-Jing Li, Chih-Hsin Ko, Kuang-Hsin Chen, Da-Wen Lin, Clement Hsingjen Wann
  • Publication number: 20240062339
    Abstract: A photographing system and a method of image fusion are provided. The photographing system includes a plurality of camera and a controller. The cameras are configured to photograph a scene to produce a plurality of sub-images. The controller is signal-connected with the cameras to obtain the sub-images. The controller analyzes the sub-images to obtain a plurality of objects contained in the scene. After the controller establishes a Pareto set of each object, the controller splices the objects according to the Pareto sets of the objects to generate an image after fusion of the sub-images.
    Type: Application
    Filed: November 23, 2022
    Publication date: February 22, 2024
    Applicant: Wistron Corporation
    Inventors: Chih-Ming Chen, Shang-An Tsai
  • Patent number: 11906898
    Abstract: In a method of manufacturing a photo mask, a resist layer is formed over a mask blank, which includes a mask substrate, a phase shift layer disposed on the mask substrate and a light blocking layer disposed on the phase shift layer. A resist pattern is formed by using a lithographic operation. The light blocking layer is patterned by using the resist pattern as an etching mask. The phase shift layer is patterned by using the patterned light blocking layer as an etching mask. A border region of the mask substrate is covered with an etching hard cover, while a pattern region of the mask substrate is opened. The patterned light blocking layer in the pattern region is patterned through the opening of the etching hard cover. A photo-etching operation is performed on the pattern region to remove residues of the light blocking layer.
    Type: Grant
    Filed: August 10, 2020
    Date of Patent: February 20, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chun-Chieh Tien, Cheng-Hsuen Chiang, Chih-Ming Chen, Cheng-Ming Lin, Yen-Wei Huang, Hao-Ming Chang, Kuo-Chin Lin, Kuan-Shien Lee
  • Publication number: 20240056983
    Abstract: A power control method, for a first communication device, includes applying Bayesian Optimization, Causal Bayesian Optimization, or Dynamic Causal Bayesian Optimization to at least one data so as to determine a transmission power control value, and outputting the transmission power control value. The at least one data is extracted from at least one signal at least from a second communication device. The transmission power control value is configured to instruct the second communication device how to set the transmission power of the second communication device. Even if the second communication device moves fast, the second communication device is able to adjust its transmission power according to the optimized transmission power control value, thereby minimizing the power consumption of the second communication device.
    Type: Application
    Filed: November 20, 2022
    Publication date: February 15, 2024
    Applicant: Wistron Corporation
    Inventor: Chih-Ming Chen
  • Publication number: 20240047118
    Abstract: A transformer includes a magnetic core assembly, a bobbin, two first windings, a second winding and at least one circuit board. The bobbin includes a bobbin main body, a bobbin channel and a winding portion. The winding portion is formed on an outer periphery surface of the bobbin main body. The two first windings are disposed around the winding portion. One of the two first windings is disposed between the other one of the two first windings and the outer periphery surface of the bobbin main body. The second winding is disposed around the winding portion and disposed between the two first windings. The at least one circuit board includes a circuit board hole. The circuit board hole and the bobbin channel are communicated with each other. The magnetic core assembly partially penetrates through the circuit board hole and the bobbin channel.
    Type: Application
    Filed: November 17, 2022
    Publication date: February 8, 2024
    Inventors: Po-Sheng Wang, Hsi-Kuo Chung, Chih-Ming Chen, Hsiang-Yi Tseng, Hsi-Chen Liu
  • Publication number: 20240018661
    Abstract: In some embodiments, a semiconductor fabrication tool is provided. The semiconductor fabrication tool includes a first heating plate arranged within a processing chamber and a second heating plate arranged within the processing chamber vertically over the first heating plate. A first exhaust port is arranged within the processing chamber and a second exhaust port arranged within the processing chamber vertically over the first exhaust port. The first exhaust port is in communication with the first heating plate and is coupled to a first exhaust output. The second exhaust port is in communication with the second heating plate and is coupled to a second exhaust output. A first control element is configured to control a first exhaust pressure at the first exhaust port and a second control element is configured to control a second exhaust pressure at the second exhaust port.
    Type: Application
    Filed: July 24, 2023
    Publication date: January 18, 2024
    Inventors: Chiao-Chun Hsu, Chih-Ming Chen, Chung-Yi Yu, Sheng-Hsun Lu
  • Publication number: 20240022349
    Abstract: A communication method, for a receiver, including receiving a received signal, and obtaining information of an original signal according to the received signal. A transmitter obtains a transmitted signal according to the original signal. The transmitter sends the transmitted signal. The transmitted signal is changed to the received signal after passing through a channel. The transmitted signal and the received signal are correlated using a structural causal model. A number of a plurality of causal variables of a causal graph of the structural causal model and a causal structure of a causal graph of the structural causal model are determined together.
    Type: Application
    Filed: September 21, 2022
    Publication date: January 18, 2024
    Applicant: Wistron Corporation
    Inventor: Chih-Ming Chen
  • Publication number: 20240023445
    Abstract: In some embodiments, the present disclosure relates to a processing tool that includes a wafer chuck disposed within a hot plate chamber and having an upper surface is configured to hold a semiconductor wafer. A heating element is disposed within the wafer chuck and is configured to increase a temperature of the wafer chuck. A motor is coupled to the wafer chuck and configured to rotate the wafer chuck around an axis of rotation extending through the upper surface of the wafer chuck. The processing tool further includes control circuitry coupled to the motor and configured to operate the motor to rotate the wafer chuck while the temperature of the wafer chuck is increased to form a piezoelectric layer from a sol-gel solution layer on the semiconductor wafer.
    Type: Application
    Filed: July 24, 2023
    Publication date: January 18, 2024
    Inventors: Chih-Ming Chen, Chiao-Chun Hsu, Chung-Yi Yu
  • Patent number: 11863231
    Abstract: An optical network optimization method is disclosed. The optimization method includes training a neural network, adjusting at least one of a plurality of auxiliary output values of a plurality of auxiliary neurons of the neural network, and performing inference with the neural network. A neural network and an attention mechanism are utilized to predict network performance key performance indicator(s) so as to achieve efficient routing optimization, network planning and fast failure recovery.
    Type: Grant
    Filed: April 13, 2021
    Date of Patent: January 2, 2024
    Assignee: Wistron Corporation
    Inventor: Chih-Ming Chen
  • Patent number: 11856859
    Abstract: A piezoelectric device including a substrate, a metal-insulator-metal element, a hydrogen blocking layer, a passivation layer, a first contact terminal and a second contact terminal is provided. The metal-insulator-metal element is disposed on the substrate. The hydrogen blocking layer is disposed on the metal-insulator-metal element. The passivation layer covers the hydrogen blocking layer and the metal-insulator-metal element. The first contact terminal is electrically connected to the metal-insulator-metal element. The second contact terminal is electrically connected to the metal-insulator-metal element.
    Type: Grant
    Filed: November 16, 2022
    Date of Patent: December 26, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Chih-Ming Chen
  • Patent number: 11832520
    Abstract: In some embodiments, the present disclosure relates to a processing tool that includes a wafer chuck disposed within a hot plate chamber and having an upper surface configured to hold a semiconductor wafer. A heating element is disposed within the wafer chuck and configured to increase a temperature of the wafer chuck. A motor is coupled to the wafer chuck and configured to rotate the wafer chuck around an axis of rotation extending through the upper surface of the wafer chuck. The processing tool further includes control circuitry coupled to the motor and configured to operate the motor to rotate the wafer chuck while the temperature of the wafer chuck is increased to form a piezoelectric layer from a sol-gel solution layer on the semiconductor wafer.
    Type: Grant
    Filed: April 27, 2021
    Date of Patent: November 28, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Ming Chen, Chiao-Chun Hsu, Chung-Yi Yu
  • Publication number: 20230369526
    Abstract: A stacked (or vertically arranged) photodetector having at least one contact region on a germanium sensing region. Including the at least one contact on the germanium sensing region reduces the amount of surface area of the germanium sensing region that is interfaced with a substrate (e.g., a silicon substrate) in which the germanium sensing region is included. This reduces the amount of lattice mismatch reduces the amount of misfit defects for the germanium sensing region, which reduces the dark current for the photodetector. The reduced amount of dark current may increase the photosensitivity of the photodetector, may increase low-light performance of the photodetector, and/or may decrease noise and other defects in images and/or light captured by the photodetector, among other examples.
    Type: Application
    Filed: May 12, 2022
    Publication date: November 16, 2023
    Inventors: Chen-Hao CHIANG, Chih-Ming CHEN, Jing-Hwang YANG
  • Publication number: 20230369521
    Abstract: Some embodiments relate to an integrated circuit (IC) disposed on a silicon substrate, which includes a well region having a first conductivity type. An epitaxial pillar of SiGe or Ge extends upward from the well region. The epitaxial pillar includes a lower epitaxial region having the first conductivity type and an upper epitaxial region having a second conductivity type, which is opposite the first conductivity type. A dielectric layer is arranged over an upper surface of the substrate and is disposed around the lower epitaxial region to extend over outer edges of the well region. The dielectric layer has inner sidewalls that contact outer sidewalls of the epitaxial pillar. A dielectric sidewall structure has a bottom surface that rests on an upper surface of the dielectric layer and has inner sidewalls that extend continuously from the upper surface of the dielectric layer to a top surface of the epitaxial pillar.
    Type: Application
    Filed: July 12, 2023
    Publication date: November 16, 2023
    Inventors: Chih-Ming Chen, Lee-Chuan Tseng, Ming Chyi Liu, Po-Chun Liu
  • Patent number: 11814731
    Abstract: In some embodiments, a semiconductor fabrication tool is provided. The semiconductor fabrication tool includes a first processing zone having a first ambient environment and a second processing zone having a second ambient environment disposed at different location inside a processing chamber. A first exhaust port and a second exhaust port are disposed in the first and second processing zones, respectively. A first exhaust pipe couples the first exhaust port to a first individual exhaust output. A second exhaust pipe couples the second exhaust port to a second individual exhaust output, where the second exhaust pipe is separate from the first exhaust pipe. A first adjustable fluid control element controls the first ambient environment. A second adjustable fluid control element controls the second ambient environment, where the first adjustable fluid control element and the second adjustable fluid control element are independently adjustable.
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: November 14, 2023
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chiao-Chun Hsu, Chih-Ming Chen, Chung-Yi Yu, Sheng-Hsun Lu
  • Patent number: 11818864
    Abstract: A tiered immersion cooling system includes a chassis, a cabinet frame slidably mounted to the chassis, an upper immersion tank, and a lower immersion tank. The cabinet frame is slidable between a first internal position and a first external position. Sliding motion of the cabinet frame is in a horizontal direction along a depth of the chassis. The upper immersion tank is slidably mounted to the chassis. The upper immersion tank is slidable with the cabinet frame in the horizontal direction. The upper immersion tank slides relative to the cabinet frame, in a vertical direction along a height of the chassis. The lower immersion tank is positioned below the upper immersion tank in the vertical direction. The lower immersion tank is mounted to slide independently from the cabinet frame, in the horizontal direction. The lower immersion tank slides between a second internal and a second external position.
    Type: Grant
    Filed: October 21, 2021
    Date of Patent: November 14, 2023
    Assignee: QUANTA COMPUTER INC.
    Inventors: Chao-Jung Chen, Ta-Chih Chen, Chih-Ming Chen
  • Publication number: 20230357002
    Abstract: The present disclosure provides a packaging method, including: providing a first semiconductor substrate; forming a bonding region on the first semiconductor substrate, wherein the bonding region of the first semiconductor substrate includes a first bonding metal layer and a second bonding metal layer; providing a second semiconductor substrate having a bonding region, wherein the bonding region of the second semiconductor substrate includes a third bonding layer; and bonding the first semiconductor substrate to the second semiconductor substrate by bringing the bonding region of the first semiconductor substrate in contact with the bonding region of the second semiconductor substrate; wherein the first and third bonding metal layers include copper (Cu), and the second bonding metal layer includes Tin (Sn). An associated packaging structure is also disclosed.
    Type: Application
    Filed: July 21, 2023
    Publication date: November 9, 2023
    Inventors: Chih-Ming Chen, Yuan-Chih Hsieh, Chung-Yi Yu