Patents by Inventor Chun-Chen Yeh

Chun-Chen Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180331039
    Abstract: Self-aligned contacts of a semiconductor device are fabricated by forming a metal gate structure on a portion of a semiconductor layer of a substrate. The metal gate structure contacts inner sidewalls of a gate spacer. A second sacrificial epitaxial layer is formed on a first sacrificial epitaxial layer. The first sacrificial epitaxial layer is adjacent to the gate spacer and is formed on source/drain regions of the semiconductor layer. The first and second sacrificial epitaxial layers are recessed. The recessing exposes at least a portion of the source/drain regions. A first dielectric layer is formed on the exposed portions of the source/drain regions, and over the gate spacer and metal gate structure. At least one cavity within the first dielectric layer is formed above at least one of the exposed portions of source/drain regions. At least one metal contact is formed within the at least one cavity.
    Type: Application
    Filed: July 11, 2018
    Publication date: November 15, 2018
    Inventors: Hong HE, Chiahsun TSENG, Chun-chen YEH, Yunpeng YIN
  • Patent number: 10128335
    Abstract: A semiconductor device includes a semiconductor-on-insulator wafer having a buried oxide layer. The buried oxide layer includes therein opposing etch barrier regions and a gate region between the etch barrier regions. The semiconductor device further includes at least one nanowire having a channel portion interposed between opposing source/drain portions. The channel portion is suspended in the gate region. A gate electrode is formed in the gate region, and completely surrounds all surfaces of the suspended nanowire. The buried oxide layer comprises a first electrical insulating material, and the etch barrier regions comprising a second electrical insulating material different from the first electrical insulating material.
    Type: Grant
    Filed: August 5, 2016
    Date of Patent: November 13, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Veeraraghavan S. Basker, Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh
  • Publication number: 20180308930
    Abstract: A vertical transistor device includes a vertically-oriented channel semiconductor (VOCS) structure positioned above a substrate and a first bottom spacer positioned above the substrate adjacent the VOCS structure. The first bottom spacer extends around less than an entirety of a perimeter of the VOCS structure. A gate structure is positioned around the VOCS structure. Only a portion of the gate structure is positioned vertically above the first bottom spacer so as to thereby define an air gap that is positioned under the gate structure. The air gap extends around a majority of a perimeter of the VOCS structure and a second bottom spacer positioned above the substrate. An upper portion of the second bottom spacer contacts a material formed around the VOCS structure so as to seal the air gap. The second bottom spacer has a vertical thickness that is greater than a vertical thickness of the air gap.
    Type: Application
    Filed: May 30, 2018
    Publication date: October 25, 2018
    Inventors: Ruilong Xie, Chun-Chen Yeh, Kangguo Cheng, Tenko Yamashita
  • Patent number: 10109723
    Abstract: A method of forming a semiconductor device that includes forming a fin structure from a bulk semiconductor substrate and forming an isolation region contacting a lower portion of a sidewall of the fin structure, wherein an upper portion of the sidewall of the fin structure is exposed. A sacrificial spacer is formed on the upper portion of the sidewall of the fin structure. The isolation regions are recessed to provide an exposed section of the sidewall of the fin structure. A doped semiconductor material is formed on the exposed section of the lower portion of the sidewall of the fin structure. Dopant is diffused from the doped semiconductor material to a base portion of the fin structure.
    Type: Grant
    Filed: November 3, 2016
    Date of Patent: October 23, 2018
    Assignee: International Business Machines Corporation
    Inventors: Veeraraghavan S. Basker, Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh
  • Publication number: 20180301541
    Abstract: Embodiments are directed to a method and resulting structures for a semiconductor device having reduced parasitic capacitance. A semiconductor fin is formed on a substrate. A first bottom spacer is formed on a surface of the substrate and a sidewall of the semiconductor fin. A sacrificial spacer is formed over a channel region of the semiconductor fin and a portion of the first bottom spacer. A second bottom spacer is formed on a surface of the first bottom spacer and adjacent to the sacrificial spacer. The sacrificial spacer is removed and a conductive gate is formed over the channel region of the semiconductor fin.
    Type: Application
    Filed: June 26, 2018
    Publication date: October 18, 2018
    Inventors: Kangguo Cheng, Ruilong Xie, Tenko Yamashita, Chun-Chen Yeh
  • Patent number: 10103251
    Abstract: A method of forming a semiconductor device that includes forming a fin structure from a bulk semiconductor substrate and forming an isolation region contacting a lower portion of a sidewall of the fin structure, wherein an upper portion of the sidewall of the fin structure is exposed. A sacrificial spacer is formed on the upper portion of the sidewall of the fin structure. The isolation regions are recessed to provide an exposed section of the sidewall of the fin structure. A doped semiconductor material is formed on the exposed section of the lower portion of the sidewall of the fin structure. Dopant is diffused from the doped semiconductor material to a base portion of the fin structure.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: October 16, 2018
    Assignee: International Business Machines Corporation
    Inventors: Veeraraghavan S. Basker, Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh
  • Patent number: 10103247
    Abstract: Methods form a structure having a lower source/drain contacting a substrate at the bottom of a transistor. A semiconductor fin extends from the lower source/drain away from the bottom of the transistor. An upper source/drain contacts an opposite end of the fin at the top of the transistor. A gate conductor surrounds (but is electrically insulated from the fin) and includes a raised contact portion extending toward the top of the transistor. A buried contact is located at the bottom of the transistor, and is electrically connected to the first source/drain. A silicide and a conformal metal are between the buried contact and the first source/drain. The conformal metal is also between the gate conductor and the fin. A first contact extends to the buried contact, a second contact extends to the upper source/drain, and a third contact extends to the raised contact portion.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: October 16, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Ruilong Xie, Hui Zang, Kangguo Cheng, Tenko Yamashita, Chun-chen Yeh
  • Publication number: 20180294340
    Abstract: Embodiments are directed to a method and resulting structures for a semiconductor device having reduced parasitic capacitance. A semiconductor fin is formed on a substrate. A first bottom spacer is formed on a surface of the substrate and a sidewall of the semiconductor fin. A sacrificial spacer is formed over a channel region of the semiconductor fin and a portion of the first bottom spacer. A second bottom spacer is formed on a surface of the first bottom spacer and adjacent to the sacrificial spacer. The sacrificial spacer is removed and a conductive gate is formed over the channel region of the semiconductor fin.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 11, 2018
    Inventors: Kangguo Cheng, Ruilong Xie, Tenko Yamashita, Chun-Chen Yeh
  • Patent number: 10096692
    Abstract: Embodiments are directed to a method and resulting structures for a semiconductor device having reduced parasitic capacitance. A semiconductor fin is formed on a substrate. A first bottom spacer is formed on a surface of the substrate and a sidewall of the semiconductor fin. A sacrificial spacer is formed over a channel region of the semiconductor fin and a portion of the first bottom spacer. A second bottom spacer is formed on a surface of the first bottom spacer and adjacent to the sacrificial spacer. The sacrificial spacer is removed and a conductive gate is formed over the channel region of the semiconductor fin.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: October 9, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Kangguo Cheng, Ruilong Xie, Tenko Yamashita, Chun-Chen Yeh
  • Patent number: 10096713
    Abstract: After forming a gate structure over a semiconductor fin that extends upwards from a semiconductor substrate portion, a sigma cavity is formed within the semiconductor fin on each side of the gate structure. A semiconductor buffer region composed of an un-doped stress-generating semiconductor material is epitaxially growing from faceted surfaces of the sigma cavity. Finally, a doped semiconductor region composed of a doped stress-generating semiconductor material is formed on the semiconductor buffer region to completely fill the sigma cavity. The doped semiconductor region is formed to have substantially vertical sidewalls for formation of a uniform source/drain junction profile.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: October 9, 2018
    Assignee: International Business Machines Corporation
    Inventors: Dechao Guo, Hemanth Jagannathan, Shogo Mochizuki, Gen Tsutsui, Chun-Chen Yeh
  • Patent number: 10084070
    Abstract: A method of forming a semiconductor device that includes forming a fin structure from a bulk semiconductor substrate and forming an isolation region contacting a lower portion of a sidewall of the fin structure, wherein an upper portion of the sidewall of the fin structure is exposed. A sacrificial spacer is formed on the upper portion of the sidewall of the fin structure. The isolation regions are recessed to provide an exposed section of the sidewall of the fin structure. A doped semiconductor material is formed on the exposed section of the lower portion of the sidewall of the fin structure. Dopant is diffused from the doped semiconductor material to a base portion of the fin structure.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: September 25, 2018
    Assignee: International Business Machines Corporation
    Inventors: Veeraraghavan S. Basker, Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh
  • Publication number: 20180269312
    Abstract: Device structures and fabrication methods for a vertical field-effect transistor. A semiconductor fin is formed that projects from a first source/drain region. A first spacer layer is formed on the first source/drain region. A dielectric layer is formed that extends in the vertical direction from the first spacer layer to a top surface of the semiconductor fin. The dielectric layer is recessed in the vertical direction, and a second spacer layer is formed on the recessed dielectric layer such that the dielectric layer is located in the vertical direction between the first spacer layer and the second spacer layer. After the dielectric layer is removed to open a space between the first spacer layer and the second spacer layer, a gate electrode is formed in the space. The vertical field-effect transistor has a gate length that is equal to a thickness of the recessed dielectric layer.
    Type: Application
    Filed: March 14, 2017
    Publication date: September 20, 2018
    Inventors: Ruilong Xie, Chun-chen Yeh, Kangguo Cheng, Tenko Yamashita
  • Patent number: 10079292
    Abstract: A method of forming a gate structure, including forming one or more vertical fins on a substrate; forming a bottom spacer on the substrate surface adjacent to the one or more vertical fins; forming a gate structure on at least a portion of the sidewalls of the one or more vertical fins; forming a gauge layer on at least a portion of the bottom spacer, wherein the gauge layer covers at least a portion of the gate structure on the sidewalls of the one or more vertical fins; and removing a portion of the gauge layer on the bottom spacer.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: September 18, 2018
    Assignee: International Business Machines Corporation
    Inventors: Kangguo Cheng, Ruilong Xie, Tenko Yamashita, Chun-Chen Yeh
  • Patent number: 10079234
    Abstract: A memory device including a plurality of memory unit cells arranged in a crossbar configuration for a neural network is provided. Each of the memory unit cells includes a readout transistor, a charging transistor, a discharging transistor, and a metal-insulator-metal (MIM) capacitor connected to one of source/drain regions of each of the charging transistor and the discharging transistor and a functional gate of the readout transistor for storing analog information.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: September 18, 2018
    Assignee: International Business Machines Corporation
    Inventors: Effendi Leobandung, Yulong Li, Paul Solomon, Chun-Chen Yeh
  • Publication number: 20180248017
    Abstract: A semiconductor device that includes at least one fin structure and a gate structure present on a channel portion of the fin structure. An epitaxial semiconductor material is present on at least one of a source region portion and a drain region portion on the fin structure. The epitaxial semiconductor material includes a first portion having a substantially conformal thickness on a lower portion of the fin structure sidewall and a second portion having a substantially diamond shape that is present on an upper surface of the source portion and drain portion of the fin structure. A spacer present on first portion of the epitaxial semiconductor material.
    Type: Application
    Filed: April 19, 2018
    Publication date: August 30, 2018
    Inventors: Veeraraghavan S. Basker, Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh
  • Patent number: 10062762
    Abstract: The present disclosure is directed to a device and method for reducing the resistance of the middle of the line in a transistor. The transistor has electrical contacts formed above, and electrically connected to, the gate, drain and source. The electrical contact connected to the gate includes a tungsten contact member deposited over the gate, and a copper contact deposited over the tungsten contact member. The electrical contacts connected to the drain and source include tungsten portions deposited over the drain and source regions, and copper contacts deposited over the tungsten portions.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: August 28, 2018
    Assignees: STMICROELECTRONICS, INC., GLOBALFOUNDRIES INC., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Qing Liu, Xiuyu Cai, Chun-chen Yeh, Ruilong Xie
  • Publication number: 20180240715
    Abstract: A device includes, among other things, a first vertical transistor device positioned above a semiconductor substrate. The first vertical transistor device includes a first gate structure, a first top spacer positioned above the first gate structure and having a first thickness in a vertical direction, and a first doped top source/drain structure positioned above the first top spacer. A second vertical transistor device positioned above the semiconductor substrate includes a second gate structure, a second top spacer positioned above the second gate structure and having a second thickness in a vertical direction less than the first thickness, and a second doped top source/drain structure positioned above the second top spacer.
    Type: Application
    Filed: February 6, 2018
    Publication date: August 23, 2018
    Inventors: Ruilong Xie, Chun-Chen Yeh, Tenko Yamashita, Kangguo Cheng
  • Publication number: 20180240875
    Abstract: Techniques for forming Ga-doped source drain contacts in Ge-based transistors are provided. In one aspect, a method for forming Ga-doped source and drain contacts includes the steps of: depositing a dielectric over a transistor; depositing a dielectric over the transistor; forming contact trenches in the dielectric over, and extending down to, source and drain regions of the transistor; depositing an epitaxial material into the contact trenches; implanting gallium ions into the epitaxial material to form an amorphous gallium-doped layer; and annealing the amorphous gallium-doped layer under conditions sufficient to form a crystalline gallium-doped layer having a homogenous gallium concentration of greater than about 5×1020 at./cm3. Transistor devices are also provided utilizing the present Ga-doped source and drain contacts.
    Type: Application
    Filed: April 16, 2018
    Publication date: August 23, 2018
    Inventors: Oleg Gluschenkov, Zuoguang Liu, Shogo Mochizuki, Hiroaki Niimi, Chun-chen Yeh
  • Publication number: 20180240873
    Abstract: Techniques for VFET top source and drain epitaxy are provided. In one aspect, a method of forming a VFET includes: patterning a fin to form a bottom source/drain region and a fin channel of the VFET; forming bottom spacers on the bottom source/drain region; depositing a high-? gate dielectric onto the bottom spacers and along sidewalls of the fin channel; forming gates over the bottom spacers; forming top spacers on the gates; partially recessing the fin channel to create a trench between the top spacers; forming a nitride liner along sidewalls of the trench; fully recessing the fin channel through the trench such that side portions of the fin channel remain intact; and forming a doped epitaxial top source and drain region over the fin channel. Methods not requiring a nitride liner and VFET formed using the present techniques are also provided.
    Type: Application
    Filed: February 21, 2017
    Publication date: August 23, 2018
    Inventors: Kangguo Cheng, Cheng Chi, Chi-Chun Liu, Ruilong Xie, Tenko Yamashita, Chun-Chen Yeh
  • Patent number: 10056378
    Abstract: A semiconductor device is provided comprising a substrate, two or more semiconductor fins, and one or more gates. A flowable oxide layer is deposited on the semiconductor device. An area between the two or more semiconductor fins is etched such that the substrate is exposed. An insulating layer is deposited within the etched area. At least the flowable oxide layer is removed.
    Type: Grant
    Filed: November 7, 2017
    Date of Patent: August 21, 2018
    Assignee: International Business Machines Corporation
    Inventors: Dechao Guo, Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh