Patents by Inventor Chun-Lung Chen

Chun-Lung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210143267
    Abstract: A manufacturing method of a semiconductor device includes the following steps. First patterned structures are formed on a substrate. Each of the first patterned structures includes a first semiconductor pattern and a first bottom protection pattern disposed between the first semiconductor pattern and the substrate. A first protection layer is formed on the first patterned structures and the substrate. A part of the first protection layer is located between the first patterned structures. A first opening is formed in the first protection layer between the first patterned structures. The first opening penetrates the first protection layer and exposes a part of the substrate. A first etching process is performed after forming the first opening. A part of the substrate under the first patterned structures is removed by the first etching process for suspending at least a part of each of the first patterned structures above the substrate.
    Type: Application
    Filed: January 19, 2021
    Publication date: May 13, 2021
    Inventors: Chuan-Chang Wu, Zhen Wu, Hsuan-Hsu Chen, Chun-Lung Chen
  • Patent number: 10983299
    Abstract: A head-mounted display apparatus includes a wearing device, a display-source arrangement portion and an optical assembly. The wearing device has a head-wearing portion and a hat brim portion connected to the head-wearing portion. The display-source arrangement portion is connected with the hat brim portion. The optical assembly is movably disposed on the hat brim portion, and arranged between the head-wearing portion and the display-source arrangement portion.
    Type: Grant
    Filed: May 8, 2019
    Date of Patent: April 20, 2021
    Assignee: QUANTA COMPUTER INC.
    Inventors: Chun-Lung Chen, Yuan-Peng Yu, Wei-Jen Chang, Hung-Chieh Wu
  • Patent number: 10937893
    Abstract: A manufacturing method of a semiconductor device includes the following steps. First patterned structures are formed on a substrate. Each of the first patterned structures includes a first semiconductor pattern and a first bottom protection pattern disposed between the first semiconductor pattern and the substrate. A first protection layer is formed on the first patterned structures and the substrate. A part of the first protection layer is located between the first patterned structures. A first opening is formed in the first protection layer between the first patterned structures. The first opening penetrates the first protection layer and exposes a part of the substrate. A first etching process is performed after forming the first opening. A part of the substrate under the first patterned structures is removed by the first etching process for suspending at least a part of each of the first patterned structures above the substrate.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: March 2, 2021
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chuan-Chang Wu, Zhen Wu, Hsuan-Hsu Chen, Chun-Lung Chen
  • Patent number: 10916694
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a first magnetic tunneling junction (MTJ) on a substrate; forming a first ultra low-k (ULK) dielectric layer on the first MTJ; performing a first etching process to remove part of the first ULK dielectric layer and forming a damaged layer on the first ULK dielectric layer; and forming a second ULK dielectric layer on the damaged layer.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: February 9, 2021
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Hui-Lin Wang, Tai-Cheng Hou, Wei-Xin Gao, Fu-Yu Tsai, Chin-Yang Hsieh, Chen-Yi Weng, Jing-Yin Jhang, Bin-Siang Tsai, Kun-Ju Li, Chih-Yueh Li, Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Yu-Tsung Lai, Wei-Hao Huang
  • Publication number: 20210013325
    Abstract: A manufacturing method of a semiconductor device includes the following steps. First patterned structures are formed on a substrate. Each of the first patterned structures includes a first semiconductor pattern and a first bottom protection pattern disposed between the first semiconductor pattern and the substrate. A first protection layer is formed on the first patterned structures and the substrate. A part of the first protection layer is located between the first patterned structures. A first opening is formed in the first protection layer between the first patterned structures. The first opening penetrates the first protection layer and exposes a part of the substrate. A first etching process is performed after forming the first opening. A part of the substrate under the first patterned structures is removed by the first etching process for suspending at least a part of each of the first patterned structures above the substrate.
    Type: Application
    Filed: August 19, 2019
    Publication date: January 14, 2021
    Inventors: Chuan-Chang Wu, Zhen Wu, Hsuan-Hsu Chen, Chun-Lung Chen
  • Publication number: 20210013401
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a magnetic tunneling junction (MTJ) on a substrate and a top electrode on the MTJ; forming a first inter-metal dielectric (IMD) layer around the MTJ and the top electrode; forming a stop layer on the first IMD layer; forming a second IMD layer on the stop layer; performing a first etching process to remove the second IMD layer and the stop layer; performing a second etching process to remove part of the top electrode; and forming a metal interconnection to connect to the top electrode.
    Type: Application
    Filed: August 1, 2019
    Publication date: January 14, 2021
    Inventors: Pei-Jou Lee, Kun-Chen Ho, Hsuan-Hsu Chen, Chun-Lung Chen
  • Patent number: 10890775
    Abstract: A head mounted display device includes a spectacles frame, two temples, an optomechanical module, a lens and a circuit board module. The temples are connected to the opposite ends of the spectacles frame, respectively. The lens is fixed to the spectacles frame. The optomechanical module is loaded on the spectacles frame, jointed to the lens, and configured for outputting signals to the lens. The circuit board module is disposed on the frame and electrically connected to the optomechanical module.
    Type: Grant
    Filed: September 24, 2019
    Date of Patent: January 12, 2021
    Assignee: Quanta Computer Inc.
    Inventors: Chun-Lung Chen, Yuan-Peng Yu, Hung-Chieh Wu, Chang-En Tsai, Yu-Chun Tsai
  • Patent number: 10873799
    Abstract: A headband adjustment structure includes a rotary adjusting assembly, a wearing unit having an adjustable accommodation space, a cable management module located between the wearing unit and the rotary adjusting assembly for carrying a cable, an adjustment gear set linkably coupled to the cable management module, and a driving rotation shaft set passing through the wearing unit and the cable management module, and linkably coupled to the wearing unit and the adjustment gear set, and coaxially connected to the rotary adjusting assembly. When the rotary adjusting assembly rotates the driving rotation shaft set, the driving rotation shaft set synchronously moves the wearing unit to adjust the adjustable accommodation space, and moves the cable management module through the adjustment gear set. The amount of the movement of the cable management module is different from that of the wearing unit.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: December 22, 2020
    Assignee: Quanta Computer Inc.
    Inventors: Chun-Wen Wang, Ko-Chun Wang, Chao Chien, Kok-Kan Chan, Chien-Yu Hou, Chun-Lung Chen
  • Patent number: 10854520
    Abstract: The present invention provides a method for forming a semiconductor structure. The method including: Firstly, a substrate is provided, a first region and a second region are defined thereon, next, a gate dielectric layer and a work function metal layer are sequentially formed on the substrate within the first region and within the second region. Afterwards, a dielectric layer is formed on the work function metal layer within the second region, a hydrogen gas treatment is then performed on the substrate, and the work function metal layer is removed within the first region.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: December 1, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Chun-Hsien Lin, Wei-Hao Huang, Kai-Teng Cheng
  • Publication number: 20200348524
    Abstract: A head mounted display device includes a spectacles frame, two temples, an optomechanical module, a lens and a circuit board module. The temples are connected to the opposite ends of the spectacles frame, respectively. The lens is fixed to the spectacles frame. The optomechanical module is loaded on the spectacles frame, jointed to the lens, and configured for outputting signals to the lens. The circuit board module is disposed on the frame and electrically connected to the optomechanical module.
    Type: Application
    Filed: September 24, 2019
    Publication date: November 5, 2020
    Inventors: Chun-Lung Chen, Yuan-Peng Yu, Hung-Chieh Wu, Chang-En Tsai, Yu-Chun Tsai
  • Publication number: 20200348535
    Abstract: A wearable device includes a frame, two feet, and two pivoting modules. Each of the pivoting modules includes a first bracket fixedly connected to the frame, and a second bracket fixedly connected to one of the feet and pivotally coupled to the first bracket. The second bracket includes a positioning member and an inserting member. The positioning member is located in the first bracket, and the positioning member includes a plurality of slots. The inserting member is switchably inserted into one of the slots for adjusting a maximum outreaching volume from the frame to the feet.
    Type: Application
    Filed: September 25, 2019
    Publication date: November 5, 2020
    Inventors: Chun-Lung Chen, Yuan-Peng Yu, Hung-Chieh Wu, Chang-En Tsai, Yu-Chun Tsai
  • Patent number: 10764995
    Abstract: A method for fabricating a substrate structure is provided, which includes the steps of: disposing at least a strengthening member on a carrier; sequentially forming a first circuit layer and a dielectric layer on the carrier, wherein the strengthening member is embedded in the dielectric layer; forming a second circuit layer on the dielectric layer; removing the carrier; and forming an insulating layer on the first circuit layer and the second circuit layer. The strengthening member facilitates to reduce thermal warping of the substrate structure.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: September 1, 2020
    Assignee: Siliconware Precision Industries Co., Ltd.
    Inventors: Jin-Wei You, Chun-Lung Chen
  • Publication number: 20200214381
    Abstract: A wearable display device includes a wearing device, a linking-lever set, a bracket and an optical imaging device. The linking-lever set includes a first rod and a second rod, and the first rod is pivotally connected to the wearing device and the second rod, respectively. The bracket is fixedly connected to the optical imaging device, and is pivotally connected to the second rod of the at least one linking-lever set.
    Type: Application
    Filed: April 16, 2019
    Publication date: July 9, 2020
    Applicant: Quanta Computer Inc.
    Inventors: Chun-Lung CHEN, Yuan-Peng YU, Wei-Jen CHANG, Hung-Chieh WU
  • Publication number: 20200209509
    Abstract: A head-mounted display apparatus includes a wearing device, a display-source arrangement portion and an optical assembly. The wearing device has a head-wearing portion and a hat brim portion connected to the head-wearing portion. The display-source arrangement portion is connected with the hat brim portion. The optical assembly is movably disposed on the hat brim portion, and arranged between the head-wearing portion and the display-source arrangement portion.
    Type: Application
    Filed: May 8, 2019
    Publication date: July 2, 2020
    Applicant: Quanta Computer Inc.
    Inventors: Chun-Lung CHEN, Yuan-Peng YU, Wei-Jen CHANG, Hung-Chieh WU
  • Publication number: 20200213708
    Abstract: A headband adjustment structure includes a rotary adjusting assembly, a wearing unit having an adjustable accommodation space, a cable management module located between the wearing unit and the rotary adjusting assembly for carrying a cable, an adjustment gear set linkably coupled to the cable management module, and a driving rotation shaft set passing through the wearing unit and the cable management module, and linkably coupled to the wearing unit and the adjustment gear set, and coaxially connected to the rotary adjusting assembly. When the rotary adjusting assembly rotates the driving rotation shaft set, the driving rotation shaft set synchronously moves the wearing unit to adjust the adjustable accommodation space, and moves the cable management module through the adjustment gear set. The amount of the movement of the cable management module is different from that of the wearing unit.
    Type: Application
    Filed: April 18, 2019
    Publication date: July 2, 2020
    Inventors: Chun-Wen Wang, Ko-Chun Wang, Chao Chien, Kok-Kan Chan, Chien-Yu Hou, Chun-Lung Chen
  • Publication number: 20200205498
    Abstract: A wearable display device includes a wearing device, a fixed frame, a sliding member, a bracket and an optical imaging device. The fixed frame is fixedly connected to the wearing device. The sliding member is slidably coupled to the fixed frame. The bracket is pivotally connected to the sliding member and is interlocked with the sliding member. The optical imaging device is fixedly connected to the bracket for sliding and rotating relative to the fixed frame.
    Type: Application
    Filed: May 8, 2019
    Publication date: July 2, 2020
    Applicant: Quanta Computer Inc.
    Inventors: Chun-Lung CHEN, Yuan-Peng YU, Wei-Jen CHANG, Hung-Chieh WU
  • Publication number: 20200212290
    Abstract: A method for fabricating semiconductor device includes the steps of: forming a first magnetic tunneling junction (MTJ) on a substrate; forming a first ultra low-k (ULK) dielectric layer on the first MTJ; performing a first etching process to remove part of the first ULK dielectric layer and forming a damaged layer on the first ULK dielectric layer; and forming a second ULK dielectric layer on the damaged layer.
    Type: Application
    Filed: January 23, 2019
    Publication date: July 2, 2020
    Inventors: Hui-Lin Wang, Tai-Cheng Hou, Wei-Xin Gao, Fu-Yu Tsai, Chin-Yang Hsieh, Chen-Yi Weng, Jing-Yin Jhang, Bin-Siang Tsai, Kun-Ju Li, Chih-Yueh Li, Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Yu-Tsung Lai, Wei-Hao Huang
  • Patent number: 10617025
    Abstract: A head-mounted display device includes a wearable device, a display module, a fixing rack and a connecting rod module. The wearable device is used to be placed on a human head. The display module is used to cover human eyes. The fixing rack is fixedly connected to the wearable device. The connecting rod module includes a support arm and a sliding member. The support arm is pivotally connected to the fixing rack. The sliding member is fixedly connected to the display module, and slidably engaged with the support arm and the fixing rack.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: April 7, 2020
    Assignee: QUANTA COMPUTER INC
    Inventors: Chun-Lung Chen, Yuan-Peng Yu, Hung-Chieh Wu, Feng-Shih Lin, Chi-Chang Yu, Chia-Hsing Shih, Shen-Her Wang
  • Publication number: 20190279909
    Abstract: The present invention provides a method for forming a semiconductor structure. The method including: Firstly, a substrate is provided, a first region and a second region are defined thereon, next, a gate dielectric layer and a work function metal layer are sequentially formed on the substrate within the first region and within the second region. Afterwards, a dielectric layer is formed on the work function metal layer within the second region, a hydrogen gas treatment is then performed on the substrate, and the work function metal layer is removed within the first region.
    Type: Application
    Filed: May 20, 2019
    Publication date: September 12, 2019
    Inventors: Chia-Lin Lu, Chun-Lung Chen, Kun-Yuan Liao, Chun-Hsien Lin, Wei-Hao Huang, Kai-Teng Cheng
  • Patent number: 10386887
    Abstract: A head-mounted display device includes a wearable device, a display and a linkage device. The wearable device is worn on a human head. The display includes a case for covering a human's eyes and face, and two guide grooves separately formed on the same side of the case. One end of the linkage device is slidably received within the guide grooves, the other end thereof is pivotally connected to the wearable device.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: August 20, 2019
    Assignee: Quanta Computer Inc.
    Inventors: Chun-Lung Chen, Kok-Kan Chan, Kin-Cheong Chan, Ko-Chun Wang