Abstract: A device includes a gate electrode and a gate dielectric surrounding the gate electrode. The gate electrode surrounds a nanostructure. The nanostructure includes stacked nanosheets. The gate dielectric is formed by a high-k (HK) material. The HK material covers sidewalls of the gate electrode in a direction aligned to adjacent devices. Portions of the HK material are recessed from the sidewalls and refilled by a dielectric material with a dielectric constant less than the HK material and an electrical isolation capability greater than the HK material. Replacing the HK material over the sidewalls of the gate electrode with the dielectric material enhances electrical isolation between the gate electrode with adjacent contacts. Consequently, it can reduce electrical leakage between metal gate (MG) contacts and metal-to-device (MD) contacts in scaled transistors of an integrated circuit (IC).

Abstract: Various embodiments of the present application are directed towards image sensors including composite backside illuminated (CBSI) structures to enhance performance. In some embodiments, a first trench isolation structure extends into a backside of a substrate to a first depth and comprises a pair of first trench isolation segments. A photodetector is in the substrate, between and bordering the first trench isolation segments. A second trench isolation structure is between the first trench isolation segments and extends into the backside of the substrate to a second depth less than the first depth. The second trench isolation structure comprises a pair of second trench isolation segments. An absorption enhancement structure overlies the photodetector, between the second trench isolation segments, and is recessed into the backside of the semiconductor substrate. The absorption enhancement structure and the second trench isolation structure collectively define a CBSI structure.

Abstract: A chip package and method for fabricating the same are provided that includes a power delivery network (PDN) with non-uniform electrical conductance. The electrical conductance through each current path of the PDN may be selected to balance the distribution of current flow across the current paths through the chip package, thus compensating for areas of high and low current draw found in conventional designs.

Abstract: An image sensor includes a sensor unit, a sensing portion disposed within the sensor unit, and an isolation structure corresponding to the sensing portion. The isolation structure includes a first deep trench isolation (DTI) structure surrounding the sensor unit from top view, and a second deep trench isolation structure laterally enclosed by the first deep trench isolation structure. The second deep trench isolation structure is located close to a corner of the sensor unit defined by the first deep trench isolation structure. The second deep trench isolation structure is asymmetrical with respect to a horizontal middle line or a vertical middle line within the sensor unit.

Abstract: An IC structure includes a source epitaxial structure, a drain epitaxial structure, a first silicide region, a second silicide region, a source contact, a backside via rail, a drain contact, and a front-side interconnection structure. The first silicide region is on a front-side surface, a first sidewall of the source epitaxial structure, and a second sidewall of the source epitaxial structure. The second silicide region is on a front-side surface of the drain epitaxial structure. The source contact is in contact with the first silicide region and has a protrusion extending past a backside surface of the source epitaxial structure. The backside via rail is in contact with the protrusion of the source contact. The drain contact is in contact with the second silicide region. The front-side interconnection structure is on a front-side surface of the source contact and a front-side surface of the drain contact.

Abstract: A device includes a stack of semiconductor nanostructures, a gate structure wrapping around the semiconductor nanostructures, a source/drain region abutting the gate structure and the stack, a contact structure on the source/drain region, a backside dielectric layer under the stack, and a via structure extending from the contact structure to a top surface of the backside dielectric layer.

Abstract: A semiconductor structure includes an epitaxial region having a front side and a backside. The semiconductor structure includes an amorphous layer formed over the backside of the epitaxial region, wherein the amorphous layer includes silicon. The semiconductor structure includes a first silicide layer formed over the amorphous layer. The semiconductor structure includes a first metal contact formed over the first silicide layer.

Abstract: A semiconductor structure includes a first transistor having a first source/drain (S/D) feature and a first gate; a second transistor having a second S/D feature and a second gate; a multi-layer interconnection disposed over the first and the second transistors; a signal interconnection under the first and the second transistors; and a power rail under the signal interconnection and electrically isolated from the signal interconnection, wherein the signal interconnection electrically connects one of the first S/D feature and the first gate to one of the second S/D feature and the second gate.

Abstract: In some embodiments, the present application provides an integrated chip (IC). The IC includes a metal-insulator-metal (MIM) device disposed over a substrate. The MIM device includes a plurality of conductive plates that are spaced from one another. The MIM device further includes a first conductive plug structure that is electrically coupled to a first conductive plate and to a third conductive plate of the plurality of conductive plates. A first plurality of insulative segments electrically isolate a second conductive plate and a fourth conductive plate from the first conductive plug structure. The MIM device further includes a second conductive plug structure that is electrically coupled to the second conductive plate and to the fourth conductive plate of the plurality of conductive plates. A second plurality of insulative segments electrically isolate the first conductive plate and the third conductive plate from the second conductive plug structure.

Abstract: A device to control the charging or cessation of charging a robot battery is installed in a robot. The device for autonomous charging battery includes the robot battery, a charging mechanism, a relay, a first controller, and a second controller. The relay is electrically connected with the charging mechanism and the first controller, the battery is electrically connected with the charging mechanism, the second controller communicates with the first controller, and the charging mechanism is used for electrically connecting an external charging device. The second controller is configured to receive the robot control command and output the relay control command to the first controller based on the robot control command. The first controller is configured to switch the relay on or off based on the control command to control charging or cessation of charging. A method of autonomous charging battery is also provided.

Abstract: During a front side process of a wafer, a hard mask layer is formed under a metal portion of a semiconductor device, and an epitaxial layer is deposited to form epitaxial portions of the semiconductor device. In a back side process of the wafer to cut the epitaxial layer, the metal portion is covered and protected by the hard mask layer from damages during etching of the epitaxial layer.

Abstract: Semiconductor structures and methods of forming the same are provided. A semiconductor structure according to one embodiment includes first nanostructures, a first gate structure wrapping around each of the first nanostructures and disposed over an isolation structure, and a backside gate contact disposed below the first nanostructures and adjacent to the isolation structure. A bottom surface of the first gate structure is in direct contact with the backside gate contact.

Abstract: A semiconductor structure has a frontside and a backside. The semiconductor structure includes an isolation structure at the backside; one or more transistors at the frontside, wherein the one or more transistors have source/drain epitaxial features; two metal plugs through the isolation structure and contacting two of the source/drain electrodes from the backside; and a dielectric liner filling a space between the two metal plugs, wherein the dielectric liner partially or fully surrounds an air gap between the two metal plugs.

Abstract: A shielding housing structure of an electric connector includes an insulating body including a first terminal slot for insertion of a first terminal set, a second terminal slot for insertion of a second terminal set, a socket for insertion of a preset board; a shielding housing having an accommodation space assembled with a top side of the insulating body, and top holes and lateral holes formed thereon, and an insertion hole formed on upper edges of the lateral holes; and a movable cover having a top covering plate having top openings, and a side covering plate having lateral openings. The top covering plate is plugged into the insertion hole, and can be slid to a first position to form thermal convection ventilation holes on the shielding housing structure, or the top covering plate can be slid to a second position to form an enclosing status of the shielding housing.

Abstract: A method for compensating driving parameters for a display and a circuit system for the same are provided. The method is performed in a backlight control circuit of a backlight module and a display driving circuit of a display panel of a display. A compensation parameter table is introduced. The compensation parameter table records compensation parameters applied to the backlight module and the display panel under different brightness and chrominance. When the backlight module and the display panel are in operation, the compensation parameters can be obtained by querying the compensation parameter table according to voltage and current values applied to the circuit system of the display. The backlight control circuit then outputs driving signals to each LED driving circuit according to the compensation parameters for each region. The display driving circuit outputs driving signals to display elements of the display panel according to the compensation parameters.

Abstract: A device includes semiconductor device structure includes a first dielectric layer. A first plurality of nanostructures are disposed on the first dielectric layer, with the first plurality of nanostructures overlying one another. A first source/drain region is disposed laterally adjacent to a first side of the first plurality of nanostructures. A second dielectric layer is on a first side of the first source/drain region. A front side source/drain contact is disposed on a second side of the first source/drain region that is opposite the first side, and a backside source/drain contact is disposed on the first side of the first source/drain region. The backside source/drain contact extends through the second dielectric layer.

Abstract: Embodiments of 3D memory devices with a static random-access memory (SRAM) and fabrication methods thereof are disclosed herein. In certain embodiments, the 3D memory device includes a first semiconductor structure and a second semiconductor structure. The first semiconductor structure includes an array of SRAM cells and a first bonding layer, and the second semiconductor structure includes an array of 3D NAND memory strings and a second bonding layer. The first semiconductor structure is attached with the second semiconductor structure through the first bonding layer and the second bonding layer. The array of 3D NAND memory strings and the array of SRAM cells are coupled through a plurality of bonding contacts in the first bonding layer and the second bonding layer and are arranged at opposite sides of the plurality of bonding contacts.

Abstract: A semiconductor structure includes a source/drain (S/D) region, one or more dielectric layers over the S/D region, one or more semiconductor channel layers connected to the S/D region, an isolation structure under the S/D region and the one or more semiconductor channel layers, and a via under the S/D region and electrically connected to the S/D region. A lower portion of the via is surrounded by the isolation structure and an upper portion of the via extends vertically between the S/D region and the isolation structure.

Abstract: A method and system for code introspection in a multi-tenant architecture. The method includes receiving a query for code introspection from an entity, retrieving context for the entity that sent the query, retrieving raw code information based on the query, filtering the raw code information based on the context, and returning the filtered code information.

Abstract: The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes an image sensor disposed within a substrate. The substrate has sidewalls and a horizontally extending surface defining one or more trenches extending from a first surface of the substrate to within the substrate. One or more isolation structures are arranged within the one or more trenches. A doped region is arranged within the substrate laterally between sidewalls of the one or more isolation structures and the image sensor and vertically between the image sensor and the first surface of the substrate. The doped region has a higher concentration of a first dopant type than an abutting part of the substrate that extends along opposing sides of the image sensor.