Abstract: An interconnect structure and method for forming a multi-layered seed layer for semiconductor interconnections are disclosed. Specifically, the method and structure involves utilizing sequential catalytic chemical vapor deposition, which is followed by annealing, to form the multi-layered seed layer of an interconnect structure. The multi-layered seed layer will improve electromigration resistance, decrease void formation, and enhance reliability of ultra-large-scale integration (ULSI) chips.

Abstract: A secure electronic structure is provided including a via array as a physical unclonable function (PUF). Specifically, the secure electronic structure includes an array of electrical contact vias located between a lower level of a first regularly spaced array of conductors and an upper level of a second regularly spaced array of conductors. Each electrical contact via of the via array is individually addressed through the first regularly spaced array of conductors in the lower level and the second regularly spaced array of conductors in the upper level and has a resistance value. Each resistance value of each electrical contact via forms a distribution of resistance values, wherein the distribution of resistance values is random. This random distribution of the resistance values of the array of electrical contact vias can be used as a physical unclonable function in the electronic structure of the present disclosure.

Abstract: A secure electronic structure including a plurality of sub-lithographic conductor features having non-repeating random shapes as a physical unclonable function (PUF) and an integrated circuit including the same are provided. Some of the conductor features of the plurality of conductor features form ohmic electrical contact to a fraction of regularly spaced array of conductors that are located above or beneath the plurality of conductor features having the non-repeating shapes, while other conductor features of the plurality of conductor features do not form ohmic electrical contact with any of the regularly spaced array of conductors. Thus, a unique signature of electrical continuity is provided which can be used as a PUF within an integrated circuit.

Abstract: An interconnect structure and method for fabricating the interconnect structure having enhanced performance and reliability, by minimizing oxygen intrusion into a seed layer and an electroplated copper layer of the interconnect structure, are disclosed. At least one opening in a dielectric layer is formed. A sacrificial oxidation layer disposed on the dielectric layer is formed. The sacrificial oxidation layer minimizes oxygen intrusion into the seed layer and the electroplated copper layer of the interconnect structure. A barrier metal layer disposed on the sacrificial oxidation layer is formed. A seed layer disposed on the barrier metal layer is formed. An electroplated copper layer disposed on the seed layer is formed. A planarized surface is formed, wherein a portion of the sacrificial oxidation layer, the barrier metal layer, the seed layer, and the electroplated copper layer are removed. In addition, a capping layer disposed on the planarized surface is formed.

Abstract: A semiconductor structure is provided and includes a substrate having an edge surface and a device surface with a central area, a crack stop structure disposed on the device surface and a circuit structure including components disposed on the device surface in the central area and interconnects electrically coupled to the components. The interconnects are configured to extend from the central area to the edge surface while bridging over the crack stop structure.

Abstract: A semiconductor structure is provided and includes a substrate having an edge surface and a device surface with a central area, a crack stop structure disposed on the device surface and a circuit structure including components disposed on the device surface in the central area and interconnects electrically coupled to the components. The interconnects are configured to extend from the central area to the edge surface while bridging over the crack stop structure.

Abstract: A thin film metal resistor is provided that includes an in-situ formed metal nitride layer formed in a lower region of a metal nitride layer. The in-situ formed metal nitride layer, together with the overlying metal nitride layer, from a thin film metal resistor which has a nitrogen content that is greater than 60 atomic % nitrogen. The in-situ formed metal nitride layer is present on a nitrogen enriched dielectric surface layer. The presence of the in-situ formed metal nitride layer in the lower region of the metal nitride layer provides a two-component metal resistor having greater than 60 atomic % nitrogen therein.

Abstract: A monolithic integrated circuit and method includes a substrate, a plurality of semiconductor device layers monolithically integrated on the substrate, and a metal wiring layer with vias interconnecting the plurality of semiconductor device layers. The semiconductor device layers are devoid of bonding or joining interface with the substrate.

Abstract: A local interconnect structure is provided in which a tungsten region, i.e., tungsten stud, that is formed within a middle-of-the-line (MOL) dielectric material is not damaged and/or contaminated during a multiple interconnect patterning process. This is achieved in the present disclosure by forming a self-aligned tungsten nitride passivation layer within a topmost surface and upper sidewalls portions of the tungsten region that extend above a MOL dielectric material which includes a first interconnect pattern formed therein. During the formation of the self-aligned tungsten nitride passivation layer, a nitrogen enriched dielectric surface also forms within exposed surface of the MOL dielectric material. A second interconnect pattern is then formed adjacent to, but not connect with, the first interconnect pattern. Because of the presence of the self-aligned tungsten nitride passivation layer on the tungsten region, no damaging and/or contamination of the tungsten region can occur.

Abstract: A structure is provided with a metal cap for back end of line (BEOL) interconnects that substantially eliminates electro-migration (EM) damage, a design structure and a method of manufacturing the IC. The structure includes a metal interconnect formed in a dielectric material and a metal cap selective to the metal interconnect. The metal cap includes RuX, where X is at Boron, Phosphorous or a combination of Boron and Phosphorous.

Abstract: A metal-insulator-metal (MIM) capacitor structure integrated within a back-end-of-the-line (BEOL) structure is provided. The MIM capacitor structure includes a lower electrode, i.e., a first conductive material, embedded within a dielectric material of the BEOL structure, a dielectric material liner having a dielectric constant of equal to, or greater than, silicon dioxide located atop the lower electrode, and an upper electrode, i.e., a second conductive material, positioned between vertical portions of the dielectric material liner and atop a horizontal connecting portion of the dielectric material liner. In accordance with the present disclosure, the vertical portions of the dielectric material liner do not extend onto an upper surface of the dielectric material that includes the lower electrode.

Abstract: An interconnect structure located on a semiconductor substrate within a dielectric material positioned atop the semiconductor substrate is provided having an opening within the dielectric material, the opening includes an electrically conductive material extending from the bottom to the top, and contacting the sidewall; a first layer located on the sidewall of the opening, the first layer is made from a material including titanium oxide or titanium silicon oxide; a second layer located between the first layer and the electrically conductive material, the second layer is made from a material selected from the group TiXOb, TiXSiaOb, XOb, and XSiaOb, X is Mn, Al, Sn, In, or Zr; and a third layer located along a top surface of the electrically conductive material, the third layer is made from a material selected from the group TiXOb, TiXSiaOb, XOb, and XSiaOb, X is Mn, Al, Sn, In, or Zr.

Abstract: A structure with improved electromigration resistance and methods for making the same. A structure having improved electromigration resistance includes a bulk interconnect having a dual layer cap and a dielectric capping layer. The dual layer cap includes a bottom metallic portion and a top metal oxide portion. Preferably the metal oxide portion is MnO or MnSiO and the metallic portion is Mn or CuMn. The structure is created by doping the interconnect with an impurity (Mn in the preferred embodiment), and then creating lattice defects at a top portion of the interconnect. The defects drive increased impurity migration to the top surface of the interconnect. When the dielectric capping layer is formed, a portion reacts with the segregated impurities, thus forming the dual layer cap on the interconnect. Lattice defects at the Cu surface can be created by plasma treatment, ion implantation, a compressive film, or other means.

Abstract: A local interconnect structure is provided in which a tungsten region, i.e., tungsten stud, that is formed within a middle-of-the-line (MOL) dielectric material is not damaged and/or contaminated during a multiple interconnect patterning process. This is achieved in the present disclosure by forming a self-aligned tungsten nitride passivation layer within a topmost surface and upper sidewalls portions of the tungsten region that extend above a MOL dielectric material which includes a first interconnect pattern formed therein. During the formation of the self-aligned tungsten nitride passivation layer, a nitrogen enriched dielectric surface also forms within exposed surface of the MOL dielectric material. A second interconnect pattern is then formed adjacent to, but not connect with, the first interconnect pattern. Because of the presence of the self-aligned tungsten nitride passivation layer on the tungsten region, no damaging and/or contamination of the tungsten region can occur.

Abstract: A method of manufacturing the IC is provided, and more particularly, a method of fabricating a cap for back end of line (BEOL) interconnects that substantially eliminates electro-migration (EM) damage. The method includes forming an interconnect in an insulation material, and selectively depositing a metal cap material on the interconnect. The metal cap material includes RuX, where X is at least one of Boron and Phosphorous.

Abstract: A thin film metal resistor is provided that includes an in-situ formed metal nitride layer that is formed in a lower region of a deposited metal nitride layer. The in-situ formed metal nitride layer, together with the overlying deposited metal nitride layer, from a thin film metal resistor which has a nitrogen content that is greater than 60 atomic % nitrogen. The in-situ formed metal nitride layer is present on a nitrogen enriched dielectric surface layer. In accordance with the present disclosure, the in-situ formed metal nitride layer is formed during and/or after formation of the deposited metal nitride layer by reacting metal atoms from the deposited metal nitride layer with nitrogen atoms present in the nitrogen enriched dielectric surface layer. The presence of the in-situ formed metal nitride layer in the lower region of the metal nitride layer provides a two-component metal resistor having greater than 60 atomic % nitrogen therein.

Abstract: The present disclosure relates to a secure device having a physical unclonable function. The device includes an integrated circuit having a semiconducting material in at least one via in a backend of the integrated circuit. The present disclosure also relates to a method for manufacturing a secure device having a physical unclonable function. The method includes providing an integrated circuit and adding a semiconducting material to at least one via in a backend of the integrated circuit. In some instances a property of the semiconducting material in the at least one via is measured to derive a signature.

Abstract: Interconnect structures and methods of manufacturing the same are disclosed herein. The method includes forming a barrier layer within a structure and forming an alloy metal on the barrier layer. The method further includes forming a pure metal on the alloy metal, and reflowing the pure metal such that the pure metal migrates to a bottom of the structure, while the alloy metal prevents exposure of the barrier layer. The method further includes completely filling in the structure with additional metal.

Abstract: Electrical fuses and resistors having a sublithographic lateral or vertical dimension are provided. A conductive structure comprising a conductor or a semiconductor is formed on a semiconductor substrate. At least one insulator layer is formed on the conductive structure. A recessed area is formed in the at least one insulator layer. Self-assembling block copolymers are applied into the recessed area and annealed to form a fist set of polymer blocks and a second set of polymer blocks. The first set of polymer blocks are etched selective to the second set and the at least one insulator layer. Features having sublithographic dimensions are formed in the at least one insulator layer and/or the conductive structure. Various semiconductor structures having sublithographic dimensions are formed including electrical fuses and resistors.

Abstract: An interconnect structure that includes a dielectric material having a dielectric constant of about 3.0 or less is provided. This low k dielectric material has at least one conductive material having an upper surface embedded therein. The dielectric material also has a surface layer that is made hydrophobic prior to the formation of the noble metal cap. The noble metal cap is located directly on the upper surface of the at least one conductive material. Because of the presence of the hydrophobic surface layer on the dielectric material, the noble metal cap does not substantially extend onto the hydrophobic surface layer of the dielectric material that is adjacent to the at least one conductive material and no metal residues from the noble metal cap deposition form on this hydrophobic dielectric surface.