Patents by Inventor Everhardus Cornelis Mos

Everhardus Cornelis Mos has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6879868
    Abstract: An alignment system for a lithographic apparatus includes a detection system arranged in a path of at least a portion of an alignment radiation. The alignment system also includes a position determining unit in communication with the detection system. The position determining unit is adapted to measure a position of at least one alignment mark on a substrate. The substrate is overlaid with a layer of deposited material. A calculating unit is coupled to the position determining unit. The calculating unit calculates a corrected position of the alignment mark on the basis of the position of the at least one alignment mark being measured and a model of a process apparatus involved in a deposition of the layer of deposited material. The model taking into account an amount of deposition of the layer of deposited material.
    Type: Grant
    Filed: April 13, 2004
    Date of Patent: April 12, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Everhardus Cornelis Mos, Maurits Van Der Schaar
  • Publication number: 20040187722
    Abstract: An alignment system for a lithographic apparatus includes a detection system arranged in a path of at least a portion of an alignment radiation. The alignment system also includes a position determining unit in communication with the detection system. The position determining unit is adapted to measure a position of at least one alignment mark on a substrate. The substrate is overlaid with a layer of deposited material. A calculating unit is coupled to the position determining unit. The calculating unit calculates a corrected position of the alignment mark on the basis of the position of the at least one alignment mark being measured and a model of a process apparatus involved in a deposition of the layer of deposited material. The model taking into account an amount of deposition of the layer of deposited material.
    Type: Application
    Filed: April 13, 2004
    Publication date: September 30, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Everhardus Cornelis Mos, Maurits Van Der Schaar
  • Publication number: 20040174508
    Abstract: During device manufacturing, a beam of radiation is projected onto a substrate via a mask. The substrate is aligned with the mask using an alignment structure on the substrate, with properties of the light reflected from (or transmitted by) the alignment structure being used to determine the relative position of the substrate. Earlier processing of the substrate may cause errors in the position determined from the reflected light. In one embodiment of the invention, measurement of properties of the reflected light are used to determine a correction for errors caused by processing of the substrate. Parameters of a physical model of the alignment structure may be estimated from the reflected light and used to determine the correction. Amplitudes of a plurality of different diffraction peaks may be measured to determine the correction.
    Type: Application
    Filed: December 16, 2003
    Publication date: September 9, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Maurits Van Der Schaar
  • Publication number: 20040129900
    Abstract: A method of device inspection, the method comprising providing an asymmetric marker on a device to be inspected, the form of asymmetry of the marker being dependent upon the parameter to be inspected, directing light at the marker, obtaining a first measurement of the position of the marker via detection of diffracted light of a particular wavelength or diffraction angle, obtaining a second measurement of the position of the marker via detection of diffracted light of a different wavelength or diffraction angle, and comparing the first and second measured positions to determine a shift indicative of the degree of asymmetry of the marker.
    Type: Application
    Filed: September 22, 2003
    Publication date: July 8, 2004
    Inventors: Arie Jeffrey Den Boef, Frank Bornebroek, Hugo Augustinus Joseph Cramer, Mircea Dusa, Richard Johannes Franciscus Van Haren, Antoine Gaston Marie Kiers, Justin Lloyd Kreuzer, Maurits Van Der Schaar, Paul Jacques Van Wijnen, Everhardus Cornelis Mos, Pieter Willem Herman De Jager, Hans Van Der Laan, Paul Frank Luehrmann
  • Patent number: 6732004
    Abstract: A computer program for determining a corrected position of an alignment mark on a substrate to be exposed in a lithographic projection apparatus, said computer program comprising program code means for, when executed on a computer system, instructing the computer system to perform the steps of: controlling a measuring tool to measure the position of at least one alignment mark on said substrate overlaid with an Al layer; calculating a corrected position of the alignment mark on the basis of the measured position of the alignment mark and a model of a process apparatus involved in deposition of the Al layer. Preferably, positions of a plurality of alignment marks on a substrate are measured and used to find parameters of the model.
    Type: Grant
    Filed: February 22, 2002
    Date of Patent: May 4, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Everhardus Cornelis Mos, Maurits Van Der Schaar
  • Publication number: 20020147520
    Abstract: A computer program for determining a corrected position of an alignment mark on a substrate to be exposed in a lithographic projection apparatus, said computer program comprising program code means for, when executed on a computer system, instructing the computer system to perform the steps of: controlling a measuring tool to measure the position of at least one alignment mark on said substrate overlaid with an Al layer; calculating a corrected position of the alignment mark on the basis of the measured position of the alignment mark and a model of a process apparatus involved in deposition of the Al layer. Preferably, positions of a plurality of alignment marks on a substrate are measured and used to find parameters of the model.
    Type: Application
    Filed: February 22, 2002
    Publication date: October 10, 2002
    Inventors: Everhardus Cornelis Mos, Maurits Van Der Schaar