Patents by Inventor Heinz Schuster

Heinz Schuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10345710
    Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: July 9, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
  • Patent number: 10337850
    Abstract: A measurement arrangement (10) and an associated method for interferometrically determining the surface shape (12) of a test object (14) includes a light source (16) providing an input wave (18) and a diffractive optical element (24). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (26), which is directed at the test object (14) and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (28). The measurement arrangement furthermore includes a reflective optical element (30) that back-reflects the reference wave (28) and a capture device (36) that captures an interferogram produced by superposing the test wave after interaction with the test object and the back-reflected reference wave (28), in each case after a further diffraction at the diffractive optical element in a capture plane (48).
    Type: Grant
    Filed: November 22, 2017
    Date of Patent: July 2, 2019
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Jochen Hetzler, Sebastian Fuchs, Hans-Michael Stiepan, Karl-Heinz Schuster
  • Patent number: 10207821
    Abstract: A coupling module for coupling a passenger boarding bridge with an aircraft has a floor assembly and a canopy roof spanning the floor assembly. The coupling module and/or the floor assembly is configured to be received at a cabin of a passenger boarding bridge such that the coupling module and/or the floor assembly can swivel relative to the cabin around a horizontal swivel axis. A position sensor is operable to measure an inclination of the floor assembly relative to a geodetic horizontal position.
    Type: Grant
    Filed: November 20, 2017
    Date of Patent: February 19, 2019
    Assignee: Hübner GmbH & Co. KG
    Inventors: Heinz Schuster, Frank Klöckl
  • Patent number: 10196157
    Abstract: A bottom of a coupling module as an interface between a passenger bridge or stairs and the fuselage of an aircraft, the coupling module featuring an exit opening, the floor comprising a floor head part, the floor head part being horizontally slidable, under the control of at least one sensor arrangement, in the direction of the exit opening of the coupling module, while forming a front side distance between the floor head part and the aircraft fuselage.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: February 5, 2019
    Assignee: Hübner GmbH & Co. KG
    Inventors: Heinz Schuster, Frank Klöckl
  • Patent number: 10131448
    Abstract: A coupling module forms an interface between a cabin of a passenger bridge and an aircraft. The coupling module has a projecting roof and a floor arrangement overspanned by the projecting roof. The floor arrangement is pivotable about a horizontal pivot axis relative to the cabin. At least the floor arrangement and the projecting roof have a common pivot axis that is arranged in or beneath the floor arrangement, with the floor arrangement at least indirectly and substantially supporting the projecting roof.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: November 20, 2018
    Assignee: Hübner GmbH & Co. KG
    Inventor: Heinz Schuster
  • Publication number: 20180141681
    Abstract: A coupling module for coupling a passenger boarding bridge with an aircraft has a floor assembly and a canopy roof spanning the floor assembly. The coupling module and/or the floor assembly is configured to be received at a cabin of a passenger boarding bridge such that the coupling module and/or the floor assembly can swivel relative to the cabin around a horizontal swivel axis. A position sensor is operable to measure an inclination of the floor assembly relative to a geodetic horizontal position.
    Type: Application
    Filed: November 20, 2017
    Publication date: May 24, 2018
    Inventors: Heinz Schuster, Frank Klöckl
  • Publication number: 20180118373
    Abstract: A coupling module forms an interface between a cabin of a passenger bridge and an aircraft. The coupling module has a projecting roof and a floor arrangement overspanned by the projecting roof. The floor arrangement is pivotable about a horizontal pivot axis relative to the cabin. At least the floor arrangement and the projecting roof have a common pivot axis that is arranged in or beneath the floor arrangement, with the floor arrangement at least indirectly and substantially supporting the projecting roof.
    Type: Application
    Filed: October 27, 2017
    Publication date: May 3, 2018
    Inventor: Heinz Schuster
  • Publication number: 20180106591
    Abstract: A measurement arrangement (10) and an associated method for interferometrically determining the surface shape (12) of a test object (14) includes a light source (16) providing an input wave (18) and a diffractive optical element (24). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (26), which is directed at the test object (14) and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (28). The measurement arrangement furthermore includes a reflective optical element (30) that back-reflects the reference wave (28) and a capture device (36) that captures an interferogram produced by superposing the test wave after interaction with the test object and the back-reflected reference wave (28), in each case after a further diffraction at the diffractive optical element in a capture plane (48).
    Type: Application
    Filed: November 22, 2017
    Publication date: April 19, 2018
    Inventors: Jochen HETZLER, Sebastian FUCHS, Hans-Michael STIEPAN, Karl-Heinz SCHUSTER
  • Publication number: 20180086484
    Abstract: A bottom of a coupling module as an interface between a passenger bridge or stairs and the fuselage of an aircraft, the coupling module featuring an exit opening, the floor comprising a floor head part, the floor head part being horizontally slidable, under the control of at least one sensor arrangement, in the direction of the exit opening of the coupling module, while forming a front side distance between the floor head part and the aircraft fuselage.
    Type: Application
    Filed: September 28, 2017
    Publication date: March 29, 2018
    Inventors: Heinz Schuster, Frank Klöckl
  • Publication number: 20180031839
    Abstract: An optical element for a display device that can be placed on the head of a user and generate an image as a virtual image. The optical element having a first part, which comprises an optically effective structure, and a second part connected to one another by an adhesive composition comprising a ultra material. The first part material comprises one or more cycloolefin polymers, the first and third material are different from one another, and the second part material and third material in each case comprise at least one organic polymer. The refractive index differences for at least one wavelength between 380 nm and 800 am between the first and the second material and between the second and the third material are in each case ?0.02. The method of producing the optical element and the display device comprising the optical element are also provided.
    Type: Application
    Filed: February 3, 2016
    Publication date: February 1, 2018
    Applicant: Carl Zeiss Smart Optics GmbH
    Inventor: Karl-Heinz Schuster
  • Publication number: 20170082930
    Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
    Type: Application
    Filed: August 29, 2016
    Publication date: March 23, 2017
    Inventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
  • Patent number: 9586698
    Abstract: An air passenger stair or an air passenger bridge (1) with an approximately U-shaped portal frame (3) disposed on the front end of the air passenger stair or bridge (1) for receiving a canopy roof (10), the canopy roof comprising at least one bellows (5) and an actuation device (9) for the bellows, wherein, in order to connect at least the actuation device (9) of the canopy roof (10) with the portal frame (10), an adapter device is disposed on the portal frame (3).
    Type: Grant
    Filed: May 19, 2014
    Date of Patent: March 7, 2017
    Assignee: Hübner GmbH & Co. KG
    Inventors: Jürgen Fülling, Jens Karasek, Heinz Schuster
  • Patent number: 9436095
    Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
    Type: Grant
    Filed: November 20, 2012
    Date of Patent: September 6, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
  • Publication number: 20160161852
    Abstract: A mirror for a microlithographic projection exposure apparatus and a method for processing a mirror. The mirror includes an optically effective surface, a mirror substrate and a multiple layer system configured to reflect electromagnetic radiation with an operational wavelength of the projection exposure apparatus which is incident on the optically effective surface. The multiple layer system has a plurality of reflection layer stacks (16a, 16b, 16c, 26a, 26b), between each of which a respective separation layer (15a, 15b, 15c, 25a, 25b) is arranged. This separation layer is produced from a material which has a melting temperature that is at least 80° C. but less than 300° C.
    Type: Application
    Filed: January 13, 2016
    Publication date: June 9, 2016
    Inventors: Karl-Heinz SCHUSTER, Boris BITTNER, Norbert WABRA, Sonja SCHNEIDER, Ricarda SCHNEIDER, Hendrik WAGNER, Christian WALD, Walter PAULS, Holger SCHMIDT
  • Publication number: 20160131980
    Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
    Type: Application
    Filed: September 14, 2015
    Publication date: May 12, 2016
    Inventors: Aurelian Dodoc, Karl-Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski
  • Patent number: 8786849
    Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.
    Type: Grant
    Filed: June 7, 2013
    Date of Patent: July 22, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Thomas Korb, Christian Hettich, Michael Layh, Ulrich Wegmann, Karl-Heinz Schuster, Matthias Manger
  • Publication number: 20130271749
    Abstract: First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.
    Type: Application
    Filed: June 7, 2013
    Publication date: October 17, 2013
    Inventors: Thomas KORB, Christian HETTICH, Michael LAYH, Ulrich WEGMANN, Karl-Heinz SCHUSTER, Matthias MANGER
  • Patent number: 8330935
    Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
    Type: Grant
    Filed: February 9, 2010
    Date of Patent: December 11, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
  • Patent number: 8325426
    Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.
    Type: Grant
    Filed: June 9, 2011
    Date of Patent: December 4, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
  • Patent number: RE44216
    Abstract: An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: May 14, 2013
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Michael Totzeck, Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker, Thomas Scheruebl, Wolfgang Harnisch, Norbert Rosenkranz, Ulrich Matejka