Patents by Inventor Heinz Schuster
Heinz Schuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7697198Abstract: A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.Type: GrantFiled: October 15, 2004Date of Patent: April 13, 2010Assignee: Carl Zeiss SMT AGInventors: David Shafer, Alexander Epple, Aurelian Dodoc, Wilhelm Ulrich, Karl-Heinz Schuster
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Publication number: 20100045952Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.Type: ApplicationFiled: November 4, 2009Publication date: February 25, 2010Applicant: CARL ZEISS SMT AGInventors: Aurelian Dodoc, Karl Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski
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Publication number: 20090316128Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.Type: ApplicationFiled: August 25, 2009Publication date: December 24, 2009Applicant: CARL ZEISS SMT AGInventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
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Publication number: 20090296204Abstract: A projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the object surface and an image-side imaging subsystem for directly imaging the final intermediate image onto the image surface. The image-side imaging subsystem includes at least one aspheric primary correcting lens having an aspheric primary correcting surface. The object-side imaging subsystem includes a secondary correcting group having at least one secondary correcting lens having an aspheric secondary correcting surface. Conditions involving maximum incidence angles and subaperture offsets at the correcting surfaces are given which should be observed to obtain sufficient aberration correction at very high image-side numerical apertures NA.Type: ApplicationFiled: February 6, 2008Publication date: December 3, 2009Applicant: CARL ZEISS SMT AGInventor: Karl-Heinz Schuster
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Publication number: 20090284831Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3?) which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: ApplicationFiled: December 9, 2008Publication date: November 19, 2009Applicant: CARL ZEISS SMT AGInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
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Patent number: 7592598Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.Type: GrantFiled: October 24, 2008Date of Patent: September 22, 2009Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
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Publication number: 20090213342Abstract: The invention relates to a projection exposure apparatus with a projection objective that serves to project a structure onto a substrate coated with a light-sensitive resist, wherein an immersion liquid is arranged between an optical element of the projection objective and the resist-coated substrate. As an immersion liquid saturated cyclic or polycyclic hydrocarbons can be used, such as for example cyclo-alkanes comprising up to 12 carbon atoms, saturated polycyclic hydrocarbons with 2 to 6 rings, bridged polycyclic hydrocarbons, cyclic ethers and derivatives of these substances.Type: ApplicationFiled: October 20, 2005Publication date: August 27, 2009Applicant: Carl Zeiss SMT AGInventors: Hans-Joachim Weippert, Karl-Heinz Schuster
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Patent number: 7570343Abstract: A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.Type: GrantFiled: November 23, 2005Date of Patent: August 4, 2009Assignee: Carl Zeis SMT AGInventors: Aurelian Dodoc, Karl Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski, Hubert Holderer, Bernhard Gellrich, Juergen Fischer, Susanne Beder, Andreas Wurmbrand, Ulrich Loering, Albrecht Ranck
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Patent number: 7551361Abstract: An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.Type: GrantFiled: July 14, 2004Date of Patent: June 23, 2009Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Rostalski, Alexander Epple, Aurelian Dodoc, Johannes Wangler, Karl-Heinz Schuster, Joerg Schultz, Franz-Josef Stickel, Wolfgang Singer, Joachim Wietzorrek
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Patent number: 7532306Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.Type: GrantFiled: August 13, 2004Date of Patent: May 12, 2009Assignee: Carl Zeiss SMT AGInventors: Aurelian Dodoc, Karl Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski
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Publication number: 20090073410Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.Type: ApplicationFiled: October 24, 2008Publication date: March 19, 2009Applicant: Carl Zeiss SMT AGInventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
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Publication number: 20090059385Abstract: A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n?1.6 at the operating wavelength.Type: ApplicationFiled: November 12, 2008Publication date: March 5, 2009Inventors: Susanne BEDER, Wolfgang Singer, Karl-Heinz Schuster
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Patent number: 7495840Abstract: A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA?0.85, if appropriate of NA?1.Type: GrantFiled: March 20, 2007Date of Patent: February 24, 2009Inventor: Karl-Heinz Schuster
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Publication number: 20090015812Abstract: There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ?193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.Type: ApplicationFiled: September 18, 2008Publication date: January 15, 2009Applicant: Carl Zeiss SMT AGInventors: Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni, Joachim Wietzorrek, Joachim Hainz
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Patent number: 7473907Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ?193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.Type: GrantFiled: March 28, 2005Date of Patent: January 6, 2009Assignees: Carl Zeiss SMT AG, ASML NetherlandsInventors: Wolfgang Singer, Martin Antoni, Johannes Wangler, Markus Weiss, Vadim Yevgenyevich Banine, Marcel Dierichs, Roel Moors, Karl Heinz Schuster, Axel Scholz, Philipp Bosselmann, Bernd Warm
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Patent number: 7474469Abstract: The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.Type: GrantFiled: September 22, 2005Date of Patent: January 6, 2009Assignee: Carl Zeiss SMT AGInventors: Michael Totzeck, Gerhart Fuerter, Olaf Dittmann, Karl-Heinz Schuster, David Shafer, Susanne Beder, Wolfgang Singer
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Publication number: 20080316452Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.Type: ApplicationFiled: August 28, 2008Publication date: December 25, 2008Applicant: CARL ZEISS SMT AGInventors: Aurelian Dodoc, Karl-Heinz Schuster, Joerg Mallmann, Wilhelm Ulrich, Hans-Juergen Rostalski
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Publication number: 20080309894Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: ApplicationFiled: August 21, 2008Publication date: December 18, 2008Applicant: CARL ZEISS SMT AGInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
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Patent number: 7466489Abstract: A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n?1.6 at the operating wavelength.Type: GrantFiled: June 14, 2005Date of Patent: December 16, 2008Inventors: Susanne Beder, Wolfgang Singer, Karl-Heinz Schuster
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Publication number: 20080304032Abstract: An immersion liquid for a microlithographic projection exposure apparatus is enriched with heavy isotopes. This reduces the chemical reactivity, which leads to an extension of the lifetime of optical elements which come in contact with the immersion liquid. For example, heavy water (D2O), deuterated sulfuric acid, (D2SO4) or deuterated phosphoric acid D3P16O4 may be used. Organic compounds such as perfluoro polyethers, which have been deuterated or enriched with heavy oxygen (18O), are furthermore suitable.Type: ApplicationFiled: August 12, 2008Publication date: December 11, 2008Applicant: CARL ZEISS SMT AGInventor: Karl-Heinz Schuster