Patents by Inventor Heinz Schuster

Heinz Schuster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7443948
    Abstract: There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
    Type: Grant
    Filed: February 2, 2006
    Date of Patent: October 28, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Jörg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Wolfgang Singer, Martin Antoni, Joachim Wietzorrek, Joachim Hainz
  • Patent number: 7442908
    Abstract: A microlithographic projection illumination system has a focus-detection system for optically detecting deviations of the image plane of a projection lens from the upper surface of a substrate arranged in the vicinity of its image plane. The focus-detection system has a system for coupling in at least one measuring beam that is obliquely incident on, and to be reflected at, the substrate surface into an intermediate zone between the final optical surface of the imaging system and the substrate surface and a system for coupling out the measuring beam and detecting it following its reflection at the substrate surface.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: October 28, 2008
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20080259441
    Abstract: An imaging system for imaging an object field arranged in an object surface of the imaging system onto an image field arranged in an image surface of the optical system while creating at least one intermediate image including: a first imaging subsystem for creating the intermediate image from radiation coming from the object surface, the first imaging subsystem having a first optical axis; and a second imaging subsystem different in construction from the first imaging subsystem for imaging the intermediate image onto the image surface, the second imaging subsystem having a second optical axis; wherein the first optical axis is offset with respect to the second optical axis by an axis offset at the intermediate image and wherein the intermediate image has a correction status adapted to the axis-offset such that the correction status of the image field is essentially free from aberrations caused by the axis-offset.
    Type: Application
    Filed: June 25, 2008
    Publication date: October 23, 2008
    Inventors: David Shafer, Aurelia Dodoc, Karl-Heinz Schuster
  • Patent number: 7428105
    Abstract: The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
    Type: Grant
    Filed: June 5, 2007
    Date of Patent: September 23, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: David R. Shafer, Susanne Beder, Karl-Heinz Schuster, Wolfgang Singer
  • Patent number: 7411656
    Abstract: A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.
    Type: Grant
    Filed: January 24, 2006
    Date of Patent: August 12, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Michael Totzeck, Birgit Enkisch, Karl-Heinz Schuster
  • Publication number: 20080182210
    Abstract: The disclosure relates to an image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus. In some embodiments, at least one optical element includes a cubic-crystalline material which at a given operating wavelength has a refractive index n that is greater than 1.6. The image-side numerical aperture NA of the image-projecting system is smaller than the refractive index n. The difference (n?NA) between the refractive index n and the numerical aperture NA of the image-projecting system is at most 0.2.
    Type: Application
    Filed: February 7, 2008
    Publication date: July 31, 2008
    Applicant: CARL ZEISS SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20080174759
    Abstract: Microlithographic projection exposure apparatuses, as well as related components, subsystems and methods are disclosed.
    Type: Application
    Filed: January 9, 2008
    Publication date: July 24, 2008
    Applicant: CARL ZEISS SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20080165426
    Abstract: In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto an image field in an image plane. The projection objective includes a system aperture stop and refractive and/or reflective optical elements that are arranged relative to an optical system axis. The centroid of the image field is arranged at a lateral distance from the optical system axis). The system aperture stop has an inner aperture stop border which encloses an aperture stop opening and whose shape is defined by a border contour curve. The border contour curve runs at least in part outside of a plane that spreads orthogonally to the optical system axis.
    Type: Application
    Filed: February 15, 2008
    Publication date: July 10, 2008
    Applicant: CARL ZEISS SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20080151381
    Abstract: Imaging systems, in particular a projection objectives of a microlithographic projection exposure apparatus, are provided. The imaging systems can have an optical axis and produce an image field which is extra-axial relative to the optical axis. The imaging systems can include a first optical element which causes a first distribution of the retardation in a plane that lies perpendicular to the optical axis, and at least one second optical element which causes a second distribution of the retardation in a plane that lies perpendicular to the optical axis. The second distribution of the retardation can at least partially compensate the first distribution of the retardation. The first and the second optical elements can be designed without rotational symmetry relative to the optical axis.
    Type: Application
    Filed: March 12, 2008
    Publication date: June 26, 2008
    Applicant: CARL ZEISS SMT AG
    Inventor: Karl-Heinz Schuster
  • Patent number: 7385764
    Abstract: The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
    Type: Grant
    Filed: December 14, 2004
    Date of Patent: June 10, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: David R. Shafer, Susanne Beder, Karl-Heinz Schuster, Wolfgang Singer
  • Publication number: 20080130076
    Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.
    Type: Application
    Filed: January 23, 2008
    Publication date: June 5, 2008
    Applicant: Carl Zeiss SMT AG
    Inventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
  • Patent number: 7382540
    Abstract: Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8<D1/D2<1.1.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: June 3, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Hans-Juergen Rostalski, Karl-Heinz Schuster, Russell Hudyma, Wilhelm Ulrich, Rolf Freimann
  • Patent number: 7375897
    Abstract: In certain aspects, the disclosure relates to an imaging system, particularly an objective or an illumination device of a microlithography projection-exposure apparatus having an optical axis (OA), with at least one optical element of an optically uniaxial crystal material whose optical crystallographic axis is substantially parallel to the optical axis (OA) of the imaging system and which at a working wavelength has an ordinary refractive index no and an extraordinary refractive index ne, with the extraordinary refractive index ne being smaller than the ordinary refractive index no; wherein the optical element is arranged in the ray path pattern in such a way that, at least for rays of the working wavelength which meet the optical element at an angle that falls within an angular range from the optical axis, the p-polarized component is reflected more strongly than the s-polarized component.
    Type: Grant
    Filed: December 9, 2005
    Date of Patent: May 20, 2008
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Patent number: 7372634
    Abstract: A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: May 13, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Johannes Wangler, Karl-Heinz Schuster, Alexander Sohmer, Alexander Epple, Christa Müller, legal representative, Jorg Schultz, Jurgen Grunwald
  • Patent number: 7362514
    Abstract: Imaging systems, in particular a projection objectives of a microlithographic projection exposure apparatus, are provided. The imaging systems can have an optical axis and produce an image field which is extra-axial relative to the optical axis. The imaging systems can include a first optical element which causes a first distribution of the retardation in a plane that lies perpendicular to the optical axis, and at least one second optical element which causes a second distribution of the retardation in a plane that lies perpendicular to the optical axis. The second distribution of the retardation can at least partially compensate the first distribution of the retardation. The first and the second optical elements can be designed without rotational symmetry relative to the optical axis.
    Type: Grant
    Filed: July 25, 2006
    Date of Patent: April 22, 2008
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Patent number: 7348565
    Abstract: There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.
    Type: Grant
    Filed: January 3, 2007
    Date of Patent: March 25, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
  • Patent number: 7339743
    Abstract: A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: March 4, 2008
    Assignee: Carl Zeiss SMT AG
    Inventor: Karl-Heinz Schuster
  • Publication number: 20080037111
    Abstract: A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
    Type: Application
    Filed: October 15, 2004
    Publication date: February 14, 2008
    Inventors: David Shafer, Alexander Epple, Aurelian Dodoc, Wilhelm Ulrich, Karl-Heinz Schuster
  • Publication number: 20080030869
    Abstract: The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
    Type: Application
    Filed: June 5, 2007
    Publication date: February 7, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: David Shafer, Susanne Beder, Karl-Heinz Schuster, Wolfgang Singer
  • Publication number: 20070258134
    Abstract: An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
    Type: Application
    Filed: July 14, 2004
    Publication date: November 8, 2007
    Inventors: Hans-Juergen Rostalski, Alexander Epple, Aurelian Dodoc, Johannes Wangler, Karl-Heinz Schuster, Joerg Schultz, Franz-Josef Stickel, Wolfgang Singer, Joachim Wietzorrek