Patents by Inventor Hiroshi Horikoshi

Hiroshi Horikoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150011704
    Abstract: A method for producing an optical material includes a predetermined compound (a), compound (b), compound (c), compound (d), and compound (e). The method minimizes the occurrence of a defect where peeling traces are left on a lens. The first to the fifth step minimizes the defect where peeling traces are left. First: dissolving the compound (b) into the compound (a) to obtain a first solution. Second: adding the compound (e) to the first solution obtained in the first step and then mixing to obtain a second solution not comprising the compound (d). Third: adding the compound (c) to the second solution obtained in the second step to obtain a reaction mixture. Fourth: adding the compound (d) to the reaction mixture obtained in the third step and then mixing to obtain a resin composition for an optical material. Fifth: cast-molding the resin composition and then polymerizing to obtain the optical material.
    Type: Application
    Filed: February 26, 2013
    Publication date: January 8, 2015
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei Takemura, Hiroyuki Okada, Hiroshi Horikoshi
  • Publication number: 20140371475
    Abstract: An object of the present invention is to provide a method for producing a sulfur-containing epoxy compound producing no scum-like insoluble matter. According to the present invention, a sulfur-containing halohydrin compound is dripped into and reacted with a mixed solvent containing an organic solvent and a basic compound to provide the method for producing the sulfur-containing epoxy compound. According to aspects of the present invention, the organic solvent is at least one type of compound selected from toluene and benzene, the basic compound is at least one type of compound selected from sodium hydroxide, potassium hydroxide and calcium hydroxide, and the reaction temperature is between ?5° C. and 30° C.
    Type: Application
    Filed: April 12, 2013
    Publication date: December 18, 2014
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takashi Aoki, Hiroshi Horikoshi
  • Patent number: 8896039
    Abstract: A method for manufacturing a solid-state imaging device includes: forming pixels that receive incident light in a pixel array area of a substrate; forming pad electrodes in a peripheral area located around the pixel array area of the substrate; forming a carbon-based inorganic film on an upper surface of each of the pad electrodes including a connection surface electrically connected to an external component; forming a coated film that covers upper surfaces of the carbon-based inorganic films; and forming an opening above the connection surface of each of the pad electrodes to expose the connection surface.
    Type: Grant
    Filed: August 14, 2013
    Date of Patent: November 25, 2014
    Assignee: Sony Corporation
    Inventor: Hiroshi Horikoshi
  • Publication number: 20140329353
    Abstract: A manufacturing method of a semiconductor device includes exposing a wiring layer which is formed of an alloy including two or more types of metals having different standard electrode potentials, on one surface side of a semiconductor substrate and performing a plasma process of allowing plasma generated by a mixture gas of a gas including nitrogen and an inert gas or plasma generated by a gas including nitrogen to irradiate a range which includes an exposed surface of the wiring layer.
    Type: Application
    Filed: June 30, 2014
    Publication date: November 6, 2014
    Applicant: SONY CORPORATION
    Inventors: Kazuto Watanabe, Atsushi Matsushita, Hiroshi Horikoshi, Iwao Sugiura, Yuuji Nishimura, Syota Yamabata
  • Patent number: 8786089
    Abstract: A manufacturing method of a semiconductor device includes exposing a wiring layer which is formed of an alloy including two or more types of metals having different standard electrode potentials, on one surface side of a semiconductor substrate and performing a plasma process of allowing plasma generated by a mixture gas of a gas including nitrogen and an inert gas or plasma generated by a gas including nitrogen to irradiate a range which includes an exposed surface of the wiring layer.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: July 22, 2014
    Assignee: Sony Corporation
    Inventors: Kazuto Watanabe, Atsushi Matsushita, Hiroshi Horikoshi, Iwao Sugiura, Yuuji Nishimura, Syota Yamabata
  • Publication number: 20130328152
    Abstract: A method for manufacturing a solid-state imaging device includes: forming pixels that receive incident light in a pixel array area of a substrate; forming pad electrodes in a peripheral area located around the pixel array area of the substrate; forming a carbon-based inorganic film on an upper surface of each of the pad electrodes including a connection surface electrically connected to an external component; forming a coated film that covers upper surfaces of the carbon-based inorganic films; and forming an opening above the connection surface of each of the pad electrodes to expose the connection surface.
    Type: Application
    Filed: August 14, 2013
    Publication date: December 12, 2013
    Applicant: SONY CORPORATION
    Inventor: Hiroshi Horikoshi
  • Publication number: 20130309802
    Abstract: A solid-state image pickup apparatus includes a substrate, a wiring layer, and a waveguide. The substrate is provided with a pixel array portion constituted of a plurality of pixels each having a photoelectric converter that converts incident light into an electrical signal. The wiring layer includes a plurality of wirings and an insulating layer that covers the plurality of wirings that are laminated above the substrate. The waveguide guides light to each of the photoelectric converters of the plurality of pixels, the waveguide being formed in the wiring layer. The waveguide is formed to have a waveguide exit end from which light exits the waveguide so that a distance between the waveguide exit end and a surface of the photoelectric converter that receives light from the waveguide become shorter, as wavelengths of light guided by the waveguide are longer.
    Type: Application
    Filed: June 11, 2013
    Publication date: November 21, 2013
    Inventors: Hiroshi Horikoshi, Koji Kikuchi, Tomohiro Yamazaki
  • Patent number: 8586766
    Abstract: A problem to be solved by the present invention is to provide an episulfide compound efficiently from an epoxy compound with no need of a measure against odor or corrosion, or a neutralization step. The present invention solved the above-described problem by a method for producing an episulfide compound in which an epoxy compound and a thiourea are reacted with each other in the presence of an ammonium compound.
    Type: Grant
    Filed: February 21, 2011
    Date of Patent: November 19, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Mineki Kubo, Hiroshi Horikoshi
  • Patent number: 8575293
    Abstract: According to the present invention, a resin compound for optical material, comprising (a) an episulfide compound represented by a specific structural formula, (b) a xylylenedithiol compound and (c) a xylylenediisocyanate compound can be provided. In a preferable embodiment of the present invention, a resin compound for optical material having superb optical properties, a high density and a high thermal resistance can be provided. Also according to the present invention, an optical material obtained by curing the above-described resin compound can be provided.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: November 5, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiroshi Horikoshi, Motoharu Takeuchi
  • Publication number: 20130267673
    Abstract: The present invention relates to a composition for an optical material, which is capable of suppressing occurrence of polymerization unevenness called striae, in particular, striae to be caused in high-powered lenses with sharp curves, and more specifically relates to a composition for an optical material including: a polymerization catalyst having a mass ratio of dibutyltin dichloride to monobutyltin trichloride of 97.0/3.0 to 100.0/0.0; a polythiol compound; and a polyiso(thio)cyanate compound.
    Type: Application
    Filed: November 7, 2011
    Publication date: October 10, 2013
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei Takemura, Hiroshi Horikoshi
  • Publication number: 20130231425
    Abstract: The present invention relates to a composition for an optical material capable of suppressing generation of inhomogeneity called “stria” in polymerization, in particular, generation of striae in a lens having high optical power or a surface with high radius of curvature, and more specifically relates to a composition for an optical material, comprising: a stabilizer having a mass ratio of dibutyltin dichloride to monobutyltin trichloride of 97.0/3.0 to 100.0/0.0; an episulfide compound; a polythiol compound; and a polymerization catalyst for the episulfide compound.
    Type: Application
    Filed: November 7, 2011
    Publication date: September 5, 2013
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei Takemura, Hiroshi Horikoshi
  • Patent number: 8524594
    Abstract: A method for manufacturing a solid-state imaging device includes: forming pixels that receive incident light in a pixel array area of a substrate; forming pad electrodes in a peripheral area located around the pixel array area of the substrate; forming a carbon-based inorganic film on an upper surface of each of the pad electrodes including a connection surface electrically connected to an external component; forming a coated film that covers upper surfaces of the carbon-based inorganic films; and forming an opening above the connection surface of each of the pad electrodes to expose the connection surface.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: September 3, 2013
    Assignee: Sony Corporation
    Inventor: Hiroshi Horikoshi
  • Patent number: 8492695
    Abstract: A solid-state image pickup apparatus includes a substrate, a wiring layer, and a waveguide. The substrate is provided with a pixel array portion constituted of a plurality of pixels each having a photoelectric converter that converts incident light into an electrical signal. The wiring layer includes a plurality of wirings and an insulating layer that covers the plurality of wirings that are laminated above the substrate. The waveguide guides light to each of the photoelectric converters of the plurality of pixels, the waveguide being formed in the wiring layer. The waveguide is formed to have a waveguide exit end from which light exits the waveguide so that a distance between the waveguide exit end and a surface of the photoelectric converter that receives light from the waveguide become shorter, as wavelengths of light guided by the waveguide are longer.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: July 23, 2013
    Assignee: Sony Corporation
    Inventors: Hiroshi Horikoshi, Koji Kikuchi, Tomohiro Yamazaki
  • Patent number: 8389671
    Abstract: The present invention can provide a composition for optical members, which contains (a) a compound having one or more of any group selected from the group consisting of an acryloyl group, a methacryloyl group, an allyl group and a vinyl group and one or more ?-epithiopropyl groups in a molecule. In a preferable embodiment of the present invention, the composition for optical members further contains at least one compound selected from (b) a compound having one or more ?-epithiopropyl groups in a molecule while having no polymerizable unsaturated bond group, (c) an inorganic compound having a sulfur atom and/or a selenium atom, (d) a compound having one or more thiol groups in a molecule, (e) a compound having one or more amino groups in a molecule while having no heterocyclic ring, and (f) a compound having one or more of at least one group selected from the group consisting of a vinyl group, an acryloyl group, a methacryloyl group and an allyl group in a molecule.
    Type: Grant
    Filed: March 11, 2008
    Date of Patent: March 5, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Motoharu Takeuchi, Hiroshi Horikoshi, Hiroaki Tanaka, Hirohito Ishizuka
  • Publication number: 20120309987
    Abstract: A problem to be solved by the present invention is to provide an episulfide compound efficiently from an epoxy compound with no need of a measure against odor or corrosion, or a neutralization step. The present invention solved the above-described problem by a method for producing an episulfide compound in which an epoxy compound and a thiourea are reacted with each other in the presence of an ammonium compound.
    Type: Application
    Filed: February 21, 2011
    Publication date: December 6, 2012
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Mineki Kubo, Hiroshi Horikoshi
  • Publication number: 20120309932
    Abstract: The present invention has an object of providing, for example, a composition for optical materials which contains a polythiol that can be predicted and assessed, in a stage prior to polymerization/curing, as being clouded or not clouded after polymerization/curing, and thus can be determined as being good or defective. According to the present invention, the above-described object is achieved by, for example, a composition for optical materials which comprises a polythiol that exhibits an initial turbidity of 0.5 ppm or less and a turbidity of 0.6 ppm or less after the storage at 50° C. for 7 days, and an episulfide. Namely, an optical material made from a composition for optical materials which contains a polythiol satisfying the above turbidity requirements can be prevented from clouding to exhibit excellent transparency.
    Type: Application
    Filed: February 21, 2011
    Publication date: December 6, 2012
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei Takemura, Hiroshi Horikoshi
  • Publication number: 20120211879
    Abstract: A manufacturing method of a semiconductor device includes exposing a wiring layer which is formed of an alloy including two or more types of metals having different standard electrode potentials, on one surface side of a semiconductor substrate and performing a plasma process of allowing plasma generated by a mixture gas of a gas including nitrogen and an inert gas or plasma generated by a gas including nitrogen to irradiate a range which includes an exposed surface of the wiring layer.
    Type: Application
    Filed: January 26, 2012
    Publication date: August 23, 2012
    Applicant: Sony Corporation
    Inventors: Kazuto WATANABE, Atsushi MATSUSHITA, Hiroshi HORIKOSHI, Iwao SUGIURA, Yuuji NISHIMURA, Syota YAMABATA
  • Publication number: 20120123081
    Abstract: The present invention is a production process for an optical material using, as raw materials thereof, a compound (a), a compound (b), a compound (c), a compound (d) and a compound (e) as shown below, the process comprising the following steps 1 to 5: Step 1: a step of obtaining a first liquid by dissolving the compound (b) in the compound (a); Step 2: a step of obtaining a second liquid by adding the compound (e) mixed with a portion of the compound (d) to the first liquid obtained in Step 1 and mixing the compound (e) mixed with a portion of the compound (d) with the first liquid uniformly; Step 3: a step of obtaining a reaction mixture by adding the compound (c) to the second liquid obtained in Step 2 and reacting the resulting mixture under reduced pressure; Step 4: a step of obtaining a resin composition for an optical material by adding the remainder of the compound (d) to the reaction mixture obtained in Step 3 and mixing the remainder of the compound (d) to the reaction mixture uniformly; and Step
    Type: Application
    Filed: July 12, 2010
    Publication date: May 17, 2012
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroyuki Okada, Hiroshi Horikoshi, Kenichi Toi
  • Publication number: 20100230578
    Abstract: A solid-state image pickup apparatus includes a substrate, a wiring layer, and a waveguide. The substrate is provided with a pixel array portion constituted of a plurality of pixels each having a photoelectric converter that converts incident light into an electrical signal. The wiring layer includes a plurality of wirings and an insulating layer that covers the plurality of wirings that are laminated above the substrate. The waveguide guides light to each of the photoelectric converters of the plurality of pixels, the waveguide being formed in the wiring layer. The waveguide is formed to have a waveguide exit end from which light exits the waveguide so that a distance between the waveguide exit end and a surface of the photoelectric converter that receives light from the waveguide become shorter, as wavelengths of light guided by the waveguide are longer.
    Type: Application
    Filed: March 3, 2010
    Publication date: September 16, 2010
    Applicant: Sony Corporation
    Inventors: Hiroshi Horikoshi, Koji Kikuchi, Tomohiro Yamazaki
  • Publication number: 20100130661
    Abstract: The present invention can provide a composition for optical members, which contains (a) a compound having one or more of any group selected from the group consisting of an acryloyl group, a methacryloyl group, an allyl group and a vinyl group and one or more ?-epithiopropyl groups in a molecule. In a preferable embodiment of the present invention, the composition for optical members further contains at least one compound selected from (b) a compound having one or more ?-epithiopropyl groups in a molecule while having no polymerizable unsaturated bond group, (c) an inorganic compound having a sulfur atom and/or a selenium atom, (d) a compound having one or more thiol groups in a molecule, (e) a compound having one or more amino groups in a molecule while having no heterocyclic ring, and (f) a compound having one or more of at least one group selected from the group consisting of a vinyl group, an acryloyl group, a methacryloyl group and an allyl group in a molecule.
    Type: Application
    Filed: March 11, 2008
    Publication date: May 27, 2010
    Inventors: Motoharu Takeuchi, Hiroshi Horikoshi, Hiroaki Tanaka, Hirohito Ishizuka