Abstract: According to one preferred embodiment of the present invention, a composition for optical materials, which contains a compound represented by formula (1) and a compound represented by formula (2), is able to be provided. This composition for optical materials enables stable storage of a compound represented by formula (2) at low cost, and also enables stable storage thereof with respect to temperature change. In addition, this composition for optical materials enables the achievement of an optical material which has good light resistance. (In formula (1), in represents an integer of 0-4; and n represents an integer of 0-2.) (In formula (2), m represents an integer of 0-4; and n represents an integer of 0-2.

Abstract: According to the present invention, a polythiol compound having a total nitrogen content of 50 to 600 ppm inclusive can be provided. According to the present invention, a method for producing the polythiol compound can also be provided, said method being characterized by comprising the steps of: reacting a polyalcohol with thiourea to prepare a thiuronium salt; and adding at least one base selected from the group consisting of hydrazine (hydrate), ammonia and an amine and an inorganic base (that is different from hydrazine (hydrate) or ammonia) to the thiuronium salt in the presence of an organic solvent to hydrolyze the thiuronium salt.

Abstract: According to the present invention, it is possible to provide an optical material composition that contains an episulfide compound represented by formula (1) and an episulfide compound represented by formula (2). According to this optical material composition, it is possible to suppress a reduction in the yield rate caused by molding defects, and possible to obtain an optical material having excellent dyeability. (In formula (1), m and p are each an integer between 0 and 4, and n and q are each an integer between 0 and 2.) (In formula (2), m is an integer between 0 and 4 and n is an integer between 0 and 2).

Abstract: The present invention inhibits the clouding of cured products obtained by polymerizing and curing a composition including sulfur and an episulfide compound, and inhibits clouding particularly in lenses, called plus-power lenses, that have large central thicknesses; and provides a composition for optical materials with which it is possible to predict and assess whether or not clouding will occur after curing and to determine quality at a stage before polymerization and curing. These objectives are achieved by, for example, a composition for optical materials that includes: sulfur, the turbidity value of which when made into a 30-mass % carbon disulfide solution is 10 ppm or less; and an episulfide compound. That is, clouding is prevented and excellent transparency is achieved in optical materials produced from said composition for optical materials that comprises an episulfide compound and sulfur that satisfies the aforementioned condition in terms of turbidity value.

Abstract: Provided are a novel alicyclic ester compound and a method for producing a compound of general formula (1) at a high yield from a compound of general formula (2) and a compound of general formula (3). An adamantane compound expressed by general formula (2) and a hydroxyalkyl (meth)acrylate ester compound expressed by general formula (3) are reacted with each other by use of a dehydration condensation agent as a catalyst to obtain an alicyclic ester compound expressed by general formula (1).

Abstract: The present invention is able to provide a curable composition which contains a poly(meth)acrylate compound having a fluorene ring (component (A)), a polythiol compound having a thioalkyl structure (component (B)), an ene compound having a polycyclic aromatic hydrocarbon skeleton (component (C)), and a polymerization initiator (component (D)). A curable composition according to the present invention is especially useful as an adhesive for optical applications, and has high refractive index as an optical characteristic, while having low contractility, photocurability, colorlessness and transparency, viscosity suitable for work, and the like.

Abstract: Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.

Abstract: The present invention provides a composition for an optical material containing a ring compound (a) represented by formula (1), an episulfide compound (b), and sulfur (c), wherein the content of the ring compound (a) in the composition for an optical material is in the range of 5-70 mass %, the content of the episulfide compound (b) is in the range of 20-90 mass %, and the content of the sulfur (c) is in the range of 1-39 mass %. (In the formula, X represents S, Se or Te. a to f=0 to 3, 8?(a+c+e)?1, 8?(b+d+f)?2, and (b+d+f)?(a+c+e).) This composition for an optical material has a high refractive index as an optical characteristic, and has sufficient heat resistance and good mold release characteristics.

Abstract: The present invention makes it possible to provide an optical material composition containing an episulfide compound (A), a polythiol compound (B), and a photochromic compound (C). The episulfide compound (A) is preferably a compound represented by formula (1), and the polythiol compound (B) is preferably a compound represented by formula (6). (In formula (1), m represents an integer of 0 to 4, and n represents an integer of 0 to 2.) (In formula (6), n represents an integer of 4 to 20, and R1 and R2 may be the same or different and represent H, SH, C1-10 alkyl groups, or C1-10 alkylthiol groups.

Abstract: The present invention provides a resist or a compound for use as a resist, which is highly sensitive and well-balanced without losing the fundamental physical properties required as a chemically amplified resist (e.g., resolution, line edge roughness (LER)). The present invention is directed to a (meth)acrylate compound represented by general formula (1) and a process for preparation thereof, as well as a (meth)acrylic copolymer obtainable by polymerization of the (meth)acrylate compound of general formula (1) and a photosensitive resin composition thereof: (wherein R1 represents a hydrogen atom or a methyl group, R2 represents a linear or branched alkyl group containing 2 to 4 carbon atoms, and each R3 may be the same or different and represents a group represented by the following formula (2) or (3), etc.) (provided that formulae (2) and (3) are as defined in the specification of the present application).

Abstract: According to the present invention, a composition for an optical material can be provided, which is characterized by containing an episulfide compound having a value of turbidity in acetone of 3.0 ppm or less. According to a preferred embodiment of the present invention, a composition for an optical material can be provided, which comprises: (a) a compound (an episulfide compound) which has a structure represented by formula (1) and has a value of turbidity in acetone of 3.0 ppm or less; (b) a polyisocyanate compound; and (c) a polythiol compound. (In the formula, m represents an integer of 0 to 4; and n represents an integer of 0 or 1.

Abstract: According to the present invention, it is possible to provide an optical material composition that contains an episulfide compound represented by formula (1) and an episulfide compound represented by formula (2). According to this optical material composition, it is possible to suppress a reduction in the yield rate caused by molding defects, and possible to obtain an optical material having excellent dyeability. (In formula (1), m and p are each an integer between 0 and 4, and n and q are each an integer between 0 and 2.) (In formula (2), m is an integer between 0 and 4 and n is an integer between 0 and 2.

Abstract: Through an optical material composition containing a compound (a), a compound (b), a polythiol (c) and sulfur (d) according to the present invention, good mold release properties are obtained, and the occurrence of separation mark defects can be suppressed. Compound (a): a compound having the structure represented by formula (1): (In formula (1), m is an integer of 0 to 4 and n is an integer of 0 to 2.) Compound (b): a compound having the structure represented by formula (2): (In formula (2), m is an integer of 0 to 4 and n is an integer of 0 to 2.

Abstract: A solid-state imaging apparatus includes an imaging region in which pixels are arranged, a connection region that surrounds the imaging region and includes an electrode pad, and an in-layer lens that is formed in the imaging region for each of the pixels. The in-layer lens is formed of a coating-type high-refractive-index material. The connection region includes an opening that is formed such that an upper surface of the electrode pad is exposed from the high-refractive-index material applied to the electrode pad.

Abstract: According to the present invention, it is possible to provide a thiol compound represented by formula (1): wherein R1 is CH2SCH2CH2SH, and R2 is hydrogen. In addition, according to the present invention, it is possible to provide a mixture of the thiol compound and 4-mercaptomethyl-1,8-dimercapto-3,6-dithiaoctane, wherein the ratio of the thiol compound is 0.001 to 5.0% by mass.

Abstract: According to the present invention, a composition for an optical material can be provided, which is characterized by containing an episulfide compound having a value of turbidity in acetone of 3.0 ppm or less. According to a preferred embodiment of the present invention, a composition for an optical material can be provided, which comprises: (a) a compound (an episulfide compound) which has a structure represented by formula (1) and has a value of turbidity in acetone of 3.0 ppm or less; (b) a polyisocyanate compound; and (c) a polythiol compound. (In the formula, m represents an integer of 0 to 4; and n represents an integer of 0 or 1.

Abstract: The present invention can provide a method for producing a cured product of an episulfide-based resin, the method having: (A) a step for obtaining a composition for a resin by mixing compound (a), compound (b) and a polymerization catalyst; (B) a step for pouring the composition for a resin into a mold; and (C) a step in which, by increasing the temperature of a heating medium, the composition for a resin is polymerized in the heating medium that contains a liquid having a thermal conductivity of 0.2 W/m·K or higher, or in a shower of the heating medium. The maximum temperature of the heating medium in step (C) is 55 to 110° C. (a) A compound which has two episulfide groups per molecule and which is represented by formula (1): wherein m represents an integer from 0 to 4 and n represents an integer from 0 to 2 (b) A compound having one or more thiol groups per molecule.

Abstract: Provided are a novel alicyclic ester compound and a method for producing a compound of general formula (1) at a high yield from a compound of general formula (2) and a compound of general formula (3).

Abstract: Provided are a resist and a compound for the resist improving the sensitivity, the resolution and the line edge roughness (LER) in a good balance without spoiling basic properties of a chemical amplification resist such as pattern shape, dry etching resistance, heat resistance and the like. Provided are a method for producing an alicyclic ester compound expressed by general formula (1), an alicyclic ester compound expressed by general formula (1), a (meth)acrylic copolymer obtained by polymerization of the alicyclic ester compound, and a photosensitive resin composition containing the (meth)acrylic copolymer. A method for producing an alicyclic ester compound expressed by general formula (1) includes reacting an adamantane compound expressed by general formula (2) with hydroxyalkylamine expressed by general formula (3) to produce an adamantaneamide compound expressed by general formula (4), and then reacting the adamantaneamide compound expressed by general formula (4) with (meth)acrylic acid.

Abstract: The present invention provides a resist or a compound for use as a resist, which is highly sensitive and well-balanced without losing the fundamental physical properties required as a chemically amplified resist (e.g., resolution, line edge roughness (LER)). The present invention is directed to a (meth)acrylate compound represented by general formula (1) and a process for preparation thereof, as well as a (meth)acrylic copolymer obtainable by polymerization of the (meth)acrylate compound of general formula (1) and a photosensitive resin composition thereof: (wherein R1 represents a hydrogen atom or a methyl group, R2 represents a linear or branched alkyl group containing 2 to 4 carbon atoms, and each R3 may be the same or different and represents a group represented by the following formula (2) or (3), etc.) (provided that formulae (2) and (3) are as defined in the specification of the present application).