Patents by Inventor Hiroshi Horikoshi

Hiroshi Horikoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9447226
    Abstract: A composition for an optical material includes (a) a compound having two ?-epithiopropyl groups and having a specific structure, (b) a compound having one ?-epithiopropyl group and one glycidyl group and having a specific structure, (c) polyisocyanate and (d) polythiol, enables the prevention of the occurrence of such a defect that peeling traces linger on a lens. In the composition for an optical material, an embodiment in which (e) sulfur is additionally contained is preferred. Another embodiment of the present invention is a method for producing an optical material, characterized by adding an onium salt as a polymerization catalyst to the composition for an optical material in an amount of 0.0001 to 10% by mass relative to the total amount of the compound (a), the compound (b), polyisocyanate (c) and polythiol (d) and then polymerizing and curing the resultant mixture.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: September 20, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroyuki Okada, Hiroshi Horikoshi, Eiji Koshiishi, Teruo Kamura
  • Publication number: 20160259091
    Abstract: Through an optical material composition containing a compound (a), a compound (b), a polythiol (c) and sulfur (d) according to the present invention, good mold release properties are obtained, and the occurrence of separation mark defects can be suppressed. Compound (a): a compound having the structure represented by formula (1): (In formula (1), m is an integer of 0 to 4 and n is an integer of 0 to 2.) Compound (b): a compound having the structure represented by formula (2): (In formula (2), m is an integer of 0 to 4 and n is an integer of 0 to 2.
    Type: Application
    Filed: December 19, 2014
    Publication date: September 8, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Akinobu HORITA, Yousuke IMAGAWA, Teruo KAMURA, Hiroshi HORIKOSHI
  • Publication number: 20160229798
    Abstract: According to the present invention, a polythiol compound having a total nitrogen content of 50 to 600 ppm inclusive can be provided. According to the present invention, a method for producing the polythiol compound can also be provided, said method being characterized by comprising the steps of: reacting a polyalcohol with thiourea to prepare a thiuronium salt; and adding at least one base selected from the group consisting of hydrazine (hydrate), ammonia and an amine and an inorganic base (that is different from hydrazine (hydrate) or ammonia) to the thiuronium salt in the presence of an organic solvent to hydrolyze the thiuronium salt.
    Type: Application
    Filed: October 28, 2014
    Publication date: August 11, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yoshihiko NISHIMORI, Teruo KAMURA, Hiroshi HORIKOSHI
  • Publication number: 20160122461
    Abstract: According to the present invention, a composition for an optical material contains a compound (a), a compound (b), and a polyisocyanate compound (c), and can suppress the generation of striae defects. The compound (a) is a compound having a structure represented by formula (1). The compound (b) is a compound having a structure represented by formula (2).
    Type: Application
    Filed: June 13, 2014
    Publication date: May 5, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yoshihiko NISHIMORI, Teruo KAMURA, Hiroshi HORIKOSHI
  • Patent number: 9322957
    Abstract: A method for producing an optical material includes a predetermined compound (a), compound (b), compound (c), compound (d), and compound (e). The method minimizes the occurrence of a defect where peeling traces are left on a lens. The first to the fifth step minimizes the defect where peeling traces are left. First: dissolving the compound (b) into the compound (a) to obtain a first solution. Second: adding the compound (e) to the first solution obtained in the first step and then mixing to obtain a second solution not comprising the compound (d). Third: adding the compound (c) to the second solution obtained in the second step to obtain a reaction mixture. Fourth: adding the compound (d) to the reaction mixture obtained in the third step and then mixing to obtain a resin composition for an optical material. Fifth: cast-molding the resin composition and then polymerizing to obtain the optical material.
    Type: Grant
    Filed: February 26, 2013
    Date of Patent: April 26, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei Takemura, Hiroyuki Okada, Hiroshi Horikoshi
  • Publication number: 20160060244
    Abstract: According to the present invention, it is possible to provide a thiol compound represented by formula (1): wherein R1 is CH2SCH2CH2SH, and R2 is hydrogen. In addition, according to the present invention, it is possible to provide a mixture of the thiol compound and 4-mercaptomethyl-1,8-dimercapto-3,6-dithiaoctane, wherein the ratio of the thiol compound is 0.001 to 5.0% by mass.
    Type: Application
    Filed: December 8, 2014
    Publication date: March 3, 2016
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yoshihiko NISHIMORI, Teruo KAMURA, Hiroshi HORIKOSHI
  • Patent number: 9273185
    Abstract: According to a preferred embodiment of the present invention, with an optical material compound including an episulfide compound represented by formula (1) and an episulfide compound represented by formula (2), it is possible to stably and inexpensively store the episulfide compound represented by formula (2) and also provide an optical material having excellent light resistance (in formula (1), m represents an integer from 0 to 4, and n represents an integer from 0 to 2) (in formula (2), m represents an integer from 0 to 4, and n represents an integer from 0 to 2).
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: March 1, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki Kariyazono, Takashi Aoki, Hiroyuki Okada, Hiroshi Horikoshi
  • Patent number: 9260566
    Abstract: The present invention has an object of providing, for example, a composition for optical materials which contains a polythiol that can be predicted and assessed, in a stage prior to polymerization/curing, as being clouded or not clouded after polymerization/curing, and thus can be determined as being good or defective. According to the present invention, the above-described object is achieved by, for example, a composition for optical materials which comprises a polythiol that exhibits an initial turbidity of 0.5 ppm or less and a turbidity of 0.6 ppm or less after the storage at 50° C. for 7 days, and an episulfide. Namely, an optical material made from a composition for optical materials which contains a polythiol satisfying the above turbidity requirements can be prevented from clouding to exhibit excellent transparency.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: February 16, 2016
    Assignee: MITSUBISHI GAS CHEMICAL, INC.
    Inventors: Kouhei Takemura, Hiroshi Horikoshi
  • Patent number: 9242947
    Abstract: An object of the present invention is to provide a method for producing a sulfur-containing epoxy compound producing no scum-like insoluble matter. According to the present invention, a sulfur-containing halohydrin compound is dripped into and reacted with a mixed solvent containing an organic solvent and a basic compound to provide the method for producing the sulfur-containing epoxy compound. According to aspects of the present invention, the organic solvent is at least one type of compound selected from toluene and benzene, the basic compound is at least one type of compound selected from sodium hydroxide, potassium hydroxide and calcium hydroxide, and the reaction temperature is between ?5° C. and 30° C.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: January 26, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takashi Aoki, Hiroshi Horikoshi
  • Patent number: 9231016
    Abstract: A solid-state image pickup apparatus includes a substrate, a wiring layer, and a waveguide. The substrate is provided with a pixel array portion constituted of a plurality of pixels each having a photoelectric converter that converts incident light into an electrical signal. The wiring layer includes a plurality of wirings and an insulating layer that covers the plurality of wirings that are laminated above the substrate. The waveguide guides light to each of the photoelectric converters of the plurality of pixels, the waveguide being formed in the wiring layer. The waveguide is formed to have a waveguide exit end from which light exits the waveguide so that a distance between the waveguide exit end and a surface of the photoelectric converter that receives light from the waveguide become shorter, as wavelengths of light guided by the waveguide are longer.
    Type: Grant
    Filed: June 11, 2013
    Date of Patent: January 5, 2016
    Assignee: SONY CORPORATION
    Inventors: Hiroshi Horikoshi, Koji Kikuchi, Tomohiro Yamazaki
  • Patent number: 9182520
    Abstract: The present invention provides an optical material, an optical lens, and a production process for making the same. The production process includes a step of obtaining a first liquid by dissolving a compound (b) in compound (a); a step of obtaining a second liquid by adding a compound (e) mixed with a portion of a compound (d) to the first liquid and mixing; a step of obtaining a reaction mixture by adding a compound (c) to the second liquid and reacting the resulting mixture under reduced pressure; a step of obtaining a resin composition for an optical material by adding the remainder of the compound (d) to the reaction mixture and mixing; and a step of obtaining an optical material by casting and polymerizing the resin composition.
    Type: Grant
    Filed: July 12, 2010
    Date of Patent: November 10, 2015
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroyuki Okada, Hiroshi Horikoshi, Kenichi Toi
  • Publication number: 20150259477
    Abstract: According to a preferred embodiment of the present invention, with an optical material compound including an episulfide compound represented by formula (1) and an episulfide compound represented by formula (2), it is possible to stably and inexpensively store the episulfide compound represented by formula (2) and also provide an optical material having excellent light resistance (in formula (1), m represents an integer from 0 to 4, and n represents an integer from 0 to 2) (in formula (2), m represents an integer from 0 to 4, and n represents an integer from 0 to 2).
    Type: Application
    Filed: March 12, 2014
    Publication date: September 17, 2015
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki Kariyazono, Takashi Aoki, Hiroyuki Okada, Hiroshi Horikoshi
  • Patent number: 9133151
    Abstract: According to the present invention, a method for producing bis(?-epoxypropyl)sulfide or bis(?-epoxypropyl)polysulfide can be provided, which is characterized by comprising adding a metal compound selected from the group consisting of a metal hydrosulfide, a metal sulfide and a metal polysulfide to an epihalohydrin at ?5 to 30° C. in such a manner that the molar ratio of the epihalohydrin to the metal compound becomes 5 to 20 to thereby cause the reaction of the epihalohydrin with the metal compound. In a preferred embodiment, the epihalohydrin is epichlorohydrin, the metal hydrosulfide is sodium hydrosulfide or potassium hydrosulfide, the metal sulfide is sodium sulfide or potassium sulfide, and the metal polysulfide is sodium polysulfide or potassium polysulfide.
    Type: Grant
    Filed: June 21, 2013
    Date of Patent: September 15, 2015
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroshi Horikoshi, Motoharu Takeuchi
  • Patent number: 9099534
    Abstract: A manufacturing method of a semiconductor device includes exposing a wiring layer which is formed of an alloy including two or more types of metals having different standard electrode potentials, on one surface side of a semiconductor substrate and performing a plasma process of allowing plasma generated by a mixture gas of a gas including nitrogen and an inert gas or plasma generated by a gas including nitrogen to irradiate a range which includes an exposed surface of the wiring layer.
    Type: Grant
    Filed: June 30, 2014
    Date of Patent: August 4, 2015
    Assignee: Sony Corporation
    Inventors: Kazuto Watanabe, Atsushi Matsushita, Hiroshi Horikoshi, Iwao Sugiura, Yuuji Nishimura, Syota Yamabata
  • Publication number: 20150203633
    Abstract: The present invention has an object of providing, for example, a composition for optical materials which contains a polythiol that can be predicted and assessed, in a stage prior to polymerization/curing, as being clouded or not clouded after polymerization/curing, and thus can be determined as being good or defective. According to the present invention, the above-described object is achieved by, for example, a composition for optical materials which comprises a polythiol that exhibits an initial turbidity of 0.5 ppm or less and a turbidity of 0.6 ppm or less after the storage at 50° C. for 7 days, and an episulfide. Namely, an optical material made from a composition for optical materials which contains a polythiol satisfying the above turbidity requirements can be prevented from clouding to exhibit excellent transparency.
    Type: Application
    Filed: March 30, 2015
    Publication date: July 23, 2015
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kouhei TAKEMURA, Hiroshi HORIKOSHI
  • Patent number: 9062016
    Abstract: An object of the present invention is to provide a method for producing a sulfur-containing epoxy compound producing no scum-like insoluble matter. According to the present invention, a sulfur-containing halohydrin compound is dripped into and reacted with a mixed solvent containing an organic solvent and a basic compound to provide the method for producing the sulfur-containing epoxy compound. According to aspects of the present invention, the organic solvent is at least one type of compound selected from toluene and benzene, the basic compound is at least one type of compound selected from sodium hydroxide, potassium hydroxide and calcium hydroxide, and the reaction temperature is between ?5° C. and 30° C.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: June 23, 2015
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takashi Aoki, Hiroshi Horikoshi
  • Publication number: 20150166720
    Abstract: A composition for an optical material includes (a) a compound having two ?-epithiopropyl groups and having a specific structure, (b) a compound having one ?-epithiopropyl group and one glycidyl group and having a specific structure, (c) polyisocyanate and (d) polythiol, enables the prevention of the occurrence of such a defect that peeling traces linger on a lens. In the composition for an optical material, an embodiment in which (e) sulfur is additionally contained is preferred. Another embodiment of the present invention is a method for producing an optical material, characterized by adding an onium salt as a polymerization catalyst to the composition for an optical material in an amount of 0.0001 to 10% by mass relative to the total amount of the compound (a), the compound (b), polyisocyanate (c) and polythiol (d) and then polymerizing and curing the resultant mixture.
    Type: Application
    Filed: September 6, 2013
    Publication date: June 18, 2015
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroyuki Okada, Hiroshi Horikoshi, Eiji Koshiishi, Teruo Kamura
  • Publication number: 20150158836
    Abstract: According to the present invention, a method for producing bis(?-epoxypropyl)sulfide or bis(?-epoxypropyl)polysulfide can be provided, which is characterized by comprising adding a metal compound selected from the group consisting of a metal hydrosulfide, a metal sulfide and a metal polysulfide to an epihalohydrin at ?5 to 30° C. in such a manner that the molar ratio of the epihalohydrin to the metal compound becomes 5 to 20 to thereby cause the reaction of the epihalohydrin with the metal compound. In a preferred embodiment, the epihalohydrin is epichlorohydrin, the metal hydrosulfide is sodium hydrosulfide or potassium hydrosulfide, the metal sulfide is sodium sulfide or potassium sulfide, and the metal polysulfide is sodium polysulfide or potassium polysulfide.
    Type: Application
    Filed: June 21, 2013
    Publication date: June 11, 2015
    Inventors: Hiroshi Horikoshi, Motoharu Takeuchi
  • Publication number: 20150035104
    Abstract: A solid-state imaging apparatus includes an imaging region in which pixels are arranged, a connection region that surrounds the imaging region and includes an electrode pad, and an in-layer lens that is formed in the imaging region for each of the pixels. The in-layer lens is formed of a coating-type high-refractive-index material. The connection region includes an opening that is formed such that an upper surface of the electrode pad is exposed from the high-refractive-index material applied to the electrode pad.
    Type: Application
    Filed: July 23, 2014
    Publication date: February 5, 2015
    Inventor: Hiroshi Horikoshi
  • Publication number: 20150028270
    Abstract: The present invention inhibits the clouding of cured products obtained by polymerizing and curing a composition including sulfur and an episulfide compound, and inhibits clouding particularly in lenses, called plus-power lenses, that have large central thicknesses; and provides a composition for optical materials with which it is possible to predict and assess whether or not clouding will occur after curing and to determine quality at a stage before polymerization and curing. These objectives are achieved by, for example, a composition for optical materials that includes: sulfur, the turbidity value of which when made into a 30-mass % carbon disulfide solution is 10 ppm or less; and an episulfide compound. That is, clouding is prevented and excellent transparency is achieved in optical materials produced from said composition for optical materials that comprises an episulfide compound and sulfur that satisfies the aforementioned condition in terms of turbidity value.
    Type: Application
    Filed: March 1, 2013
    Publication date: January 29, 2015
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hiroaki Tanaka, Hiroshi Horikoshi