Patents by Inventor Hoon Ahn

Hoon Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200118926
    Abstract: Semiconductor devices are provided. The semiconductor devices may include a substrate, a first insulating film on the substrate, a lower metal layer in the first insulating film, and a second insulating film on the first insulating film. The lower metal layer may be in the second insulating film, the second insulating film may include a lower surface facing the substrate and an upper surface that is opposite the lower surface, and the upper surface of the second insulating film may be upwardly convex. The semiconductor devices may further include a barrier dielectric film including a recess on the second insulating film, and a via metal layer that is in the recess of the barrier dielectric film and electrically connected with the lower metal layer.
    Type: Application
    Filed: December 16, 2019
    Publication date: April 16, 2020
    Inventors: Eui Bok LEE, Deok Young JUNG, Sang Bom KANG, Doo-Hwan PARK, Jong Min BAEK, Sang Hoon AHN, Hyeok Sang OH, Woo Kyung YOU
  • Patent number: 10624222
    Abstract: Disclosed is a network port cover module and a network port locking device having the cover module. The network port cover module includes a plurality of modules inserted into and coupled to a network port of a network device, the plurality of modules being configured to be locked and coupled together or separated from each other, and configured to be locked and coupled to or unlocked and separated from the network port according to a locked and coupled state or an unlocked and separated state of the plurality of modules.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: April 14, 2020
    Assignee: COMXI CO., LTD.
    Inventor: Chang Hoon Ahn
  • Publication number: 20200105664
    Abstract: A semiconductor device and a method of manufacturing a semiconductor device, the semiconductor device including a substrate; a first insulating interlayer on the substrate; a first wiring in the first insulating interlayer on the substrate; an insulation pattern on a portion of the first insulating interlayer adjacent to the first wiring, the insulation pattern having a vertical sidewall and including a low dielectric material; an etch stop structure on the first wiring and the insulation pattern; a second insulating interlayer on the etch stop structure; and a via extending through the second insulating interlayer and the etch stop structure to contact an upper surface of the first wiring.
    Type: Application
    Filed: April 4, 2019
    Publication date: April 2, 2020
    Inventors: Kyu-Hee HAN, Jong-Min BAEK, Hoon-Seok SEO, Sang-Hoon AHN, Woo-Jin LEE
  • Patent number: 10594275
    Abstract: A power amplifying radiator is disclosed that includes an electric field receiver or radiofrequency (RF) energy coupling and impedance matching element, a capacitive coupler, a cavity combiner including a coaxial-cavity section providing electromagnetic communication with the capacitive coupler, and a phased-array antenna/one or more phased-array antennas. The RF energy coupling and impedance matching element is in electromagnetic communication with the one or more phased-array antennas via the cavity combiner. The cavity combiner includes a center conductor configured and disposed to project from the coaxial-cavity section such that the cavity combiner defines a co-axial cross-sectional configuration. The power amplifying radiator may be included within a high power microwave system.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: March 17, 2020
    Inventors: Hoon Ahn, Erich Enrique Kunhardt, Christine Kunhardt
  • Publication number: 20200084256
    Abstract: Provided is an image processing apparatus including: a communicator configured to request image content from outside and receive a plurality of segments included in the image content; a signal processor configured to decode the plurality of segments to convert the plurality of segments to an image signal and a speech signal; and a controller configured to calculate a network bandwidth required for the communicator to receive a first segment having a first bit rate among the plurality of segments, and re-request a first segment having a second bit rate on the basis of the calculated network bandwidth.
    Type: Application
    Filed: September 11, 2019
    Publication date: March 12, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jae Soon LEE, Young II Kim, Hyun Tae Kim, Kwang Hoon Ahn
  • Publication number: 20200084724
    Abstract: An electronic device is provided. The electronic device includes a first communication circuit, a second communication circuit, a processor configured to be electrically connected with the first communication circuit and the second communication circuit, and a memory configured to be electrically connected with the processor. The memory includes instructions, when executed by the processor, cause the processor to obtain location information of the electronic device, transmit a first message for requesting to change a state of the electronic device to a network, receive a first response message to the transmitted first message from the network, transmit a second message for requesting a parameter for an operation cycle of the second communication circuit to the network, receive a second response message to the second message from the network, and change the operation cycle of the second communication circuit to a value corresponding to a current state of the electronic device.
    Type: Application
    Filed: November 19, 2019
    Publication date: March 12, 2020
    Inventors: Ji Young CHA, Hye Jeong KIM, Jung Hoon AHN
  • Publication number: 20200075712
    Abstract: Semiconductor devices including a capacitor in which electrostatic capacity is improved by a simplified process and/or methods for fabricating the same are provided. The semiconductor device including an insulating structure defining a first trench on a substrate, a first conductive layer in the insulating structure, a first portion of an upper surface of the first conductive layer exposed by the first trench, a capacitor structure including a first electrode pattern on the first conductive layer, a dielectric pattern on the first electrode pattern, and a second electrode pattern on the dielectric pattern, the first electrode pattern extending along sidewalls and a bottom surface of the first trench and an upper surface of the insulating structure, and a first wiring pattern on the capacitor structure may be provided.
    Type: Application
    Filed: April 9, 2019
    Publication date: March 5, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Shaofeng Ding, Jeong Hoon Ahn
  • Publication number: 20200067071
    Abstract: The present disclosure relates to a strip-like electrode for use in a cylindrical jelly roll which includes a strip-like electrode assembly wound cylindrically to form a hollow cavity at the core portion thereof, and a lithium secondary battery including the same. The strip-like electrode includes: a strip-like electrode current collector; a first electrode active material layer formed on at least one surface of the strip-like electrode current collector; and a second electrode active material layer formed on the first electrode active material layer, wherein the second electrode active material layer is formed to have a length smaller than the length of the first electrode active material layer so that a part of one longitudinal surface of the first electrode active material layer can be exposed to the outside.
    Type: Application
    Filed: November 9, 2018
    Publication date: February 27, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Byoung-Hoon AHN, Jung-Min YANG, Sang-Hoon CHOY
  • Patent number: 10573895
    Abstract: The present invention provides a method of preparing an electrode slurry for lithium secondary batteries in which the physical properties of the electrode slurry are improved to minimize a drag line by performing the primary mixing process at high viscosity, a method of manufacturing an electrode of which a defect rate of the electrode is reduced and with which battery stability is improved by using the method of preparing an electrode slurry for secondary batteries, an electrode manufactured using the method, and a secondary battery including the electrode.
    Type: Grant
    Filed: March 15, 2017
    Date of Patent: February 25, 2020
    Assignee: LG Chem, Ltd.
    Inventors: Byoung Hoon Ahn, Ki Yeon Jo, Sang Hoon Choy, Hyun Sik Chae
  • Publication number: 20200058234
    Abstract: The present invention relates to a method, system and non-transitory computer-readable recording medium for assisting listening study. According to one aspect of the invention, there is provided a method for assisting listening study, comprising the steps of: determining a plurality of weak study sentences that a user who is provided with assessment study sentences by speech fails to understand, with reference to feedback from the user; determining at least some of pronunciations or pronunciation combinations commonly included in the plurality of weak study sentences as weak pronunciations or pronunciation combinations that the user fails to understand; and determining a compensatory study course to be provided to the user, with reference to the determined weak pronunciations or pronunciation combinations.
    Type: Application
    Filed: October 23, 2019
    Publication date: February 20, 2020
    Applicant: VITRUV INC.
    Inventors: Se Hoon GIHM, Myung Hoon AHN, Tae Hyoung OH, Du Seop JUNG
  • Publication number: 20200058294
    Abstract: A method of updating a grammar model used during speech recognition includes obtaining a corpus including at least one word, obtaining the at least one word from the corpus, splitting the at least one obtained word into at least one segment, generating a hint for recombining the at least one segment into the at least one word, and updating the grammar model by using at least one segment comprising the hint.
    Type: Application
    Filed: October 25, 2019
    Publication date: February 20, 2020
    Inventors: Dong-hoon AHN, Chi-youn PARK, Kyung-min LEE, Jae-won LEE
  • Patent number: 10566691
    Abstract: Disclosed is a receptacle connector that can be freely positioned and that has excellent space utilization. A receptacle connector having an antenna function according to an aspect of the present invention is a receptacle connector for electrically connecting a plug connector and a circuit board and comprises a metal housing, a contact assembly, and a ceramic shell. The metal housing has an open front surface and an interior formed in a hollow shape. The contact assembly is provided with a plurality of contacts installed inside the metal housing to relay electrical signals. The ceramic shell is coupled in a shape surrounding the housing. The top surface of the ceramic shell has an antenna pattern formed thereon.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: February 18, 2020
    Assignee: SRB CO., LTD.
    Inventors: Jae Hyuk Choi, Hoon Ahn, Seong Kyu Lim, Woo Jeong Kang
  • Publication number: 20200044238
    Abstract: The present invention provides a method of preparing a slurry for a secondary battery positive electrode which includes forming a first mixture in a paste state by adding a lithium iron phosphate-based positive electrode active material, a conductive agent, a binder, and a solvent, and preparing a slurry for a positive electrode by mixing while further adding a solvent to the first mixture in the paste state.
    Type: Application
    Filed: March 21, 2018
    Publication date: February 6, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Byoung Hoon Ahn, Sang Hoon Choy, Chang Wan Koo, Hyun Chul Ha
  • Publication number: 20200035613
    Abstract: A semiconductor may include a first inter metal dielectric (IMD) layer, a first blocking layer on the first IMD layer, a metal wiring and a second blocking layer. The first inter metal dielectric (IMD) layer may be formed on a substrate, the first IMD layer may include a low-k material having a dielectric constant lower than a dielectric constant of silicon oxide. The first blocking layer may be formed on the first IMD layer. The first blocking layer may include an oxide having a dielectric constant higher than the dielectric constant of the first IMD layer. The metal wiring may be through the first IMD layer and the first blocking layer. The second blocking layer may be formed on the metal wiring and the first blocking layer. The second blocking layer may include a nitride. The first and second blocking layers may reduce or prevent from the out gassing, so that a semiconductor device may have good characteristics.
    Type: Application
    Filed: February 26, 2019
    Publication date: January 30, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jun-Kwan KIM, Jae-Wha PARK, Sang-Hoon AHN
  • Publication number: 20200028174
    Abstract: The present invention relates to a positive electrode active material pre-dispersion composition which includes a lithium iron phosphate-based positive electrode active material, a dispersant, and a solvent, wherein the dispersant includes a hydrogenated nitrile butadiene rubber (HNBR), a slurry composition for a secondary battery positive electrode which is prepared by using the positive electrode active material pre-dispersion composition, a positive electrode for a secondary battery, and a lithium secondary battery including the positive electrode.
    Type: Application
    Filed: March 22, 2018
    Publication date: January 23, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Byoung Hoon Ahn, Houng Sik Yoo, Chang Wan Koo, Hyun Chul Ha, Sang Hoon Choy, Jong Won Lee, Dong Hyun Kim, Gye Min Kwon
  • Patent number: 10535600
    Abstract: A semiconductor device is provided. The semiconductor device includes a substrate including a lower wiring, a first interlayer insulating film disposed on the substrate and including a first region and a second region over the first region, an etch stop film on the first interlayer insulating film, a second interlayer insulating film on the etch stop film, a first upper wiring in the second interlayer insulating film, the etch stop film, and the second region of the first interlayer insulating film and the first upper wiring is spaced apart from the lower wiring and a via in the first region of the first interlayer insulating film, and the via connects the lower wiring and the first upper wiring, wherein the first upper wiring includes a first portion in the second interlayer insulating film, and a second portion in the etch stop film and the second region of the first interlayer insulating film, and a sidewall of the second portion of the first upper wiring includes a stepwise shape.
    Type: Grant
    Filed: May 23, 2018
    Date of Patent: January 14, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hoon Seok Seo, Jong Min Baek, Su Hyun Bark, Sang Hoon Ahn, Hyeok Sang Oh, Eui Bok Lee
  • Publication number: 20200015374
    Abstract: Disclosed is a network port cover module and a network port locking device having the cover module. The network port cover module includes a plurality of modules inserted into and coupled to a network port of a network device, the plurality of modules being configured to be locked and coupled together or separated from each other, and configured to be locked and coupled to or unlocked and separated from the network port according to a locked and coupled state or an unlocked and separated state of the plurality of modules.
    Type: Application
    Filed: January 29, 2019
    Publication date: January 9, 2020
    Inventor: Chang Hoon Ahn
  • Patent number: 10529618
    Abstract: A method of manufacturing a semiconductor device is disclosed. The method includes forming a first insulting layer on a substrate, forming a first conductor pattern in the first insulating layer, forming a second insulating layer on the first insulating layer, and forming a second wiring pattern and a contact via in the second insulating layer, wherein a top surface of the first insulating layer is higher than a top surface of the first conductor pattern.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: January 7, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Siqing Lu, Sang-Hoon Ahn, Xinglong Chen, Ki-Hyun Kim, Kyu-In Shim
  • Publication number: 20200006199
    Abstract: A semiconductor device including a substrate having a first surface and a second surface facing the first surface, the substrate having a via hole, the via hole extending from the first surface of the substrate toward the second surface of the substrate, a through via in the via hole, a semiconductor component on the first surface of the substrate, and an internal buffer structure spaced apart from the via hole and between the via hole and the semiconductor component, the internal buffer structure extending from the first surface of the substrate toward an inside of the substrate, a top end of the internal buffer structure being at a level higher than a top end of the through via may be provided.
    Type: Application
    Filed: January 4, 2019
    Publication date: January 2, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Shaofeng DING, So Ra Park, Jeong Hoon Ahn
  • Patent number: 10510658
    Abstract: Semiconductor devices are provided. The semiconductor devices may include a substrate, a first insulating film on the substrate, a lower metal layer in the first insulating film, and a second insulating film on the first insulating film. The lower metal layer may be in the second insulating film, the second insulating film may include a lower surface facing the substrate and an upper surface that is opposite the lower surface, and the upper surface of the second insulating film may be upwardly convex. The semiconductor devices may further include a barrier dielectric film including a recess on the second insulating film, and a via metal layer that is in the recess of the barrier dielectric film and electrically connected with the lower metal layer.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: December 17, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eui Bok Lee, Deok Young Jung, Sang Bom Kang, Doo-Hwan Park, Jong Min Baek, Sang Hoon Ahn, Hyeok Sang Oh, Woo Kyung You