Abstract: A cloud node in a cloud-based system includes one or more processors and memory storing instructions that, when executed, cause the one or more processors to: communicate with a user associated with a tenant of a plurality of tenants; obtain policy and configuration for the user based on the tenant, from a central authority in the cloud-based system; provide the one or more cloud services to the user, based on the policy and configuration; and crawl one or more cloud providers having a plurality of files for the user, based on the policy and configuration. The cloud node is inline between a user device of the user and the Internet, as well as connected to the one or more cloud providers.

Abstract: Techniques manage extents in a storage system having storage devices supporting a redundant storage strategy. A reserved area of the storage system is generated based on a set of first-type reserved extents respectively located in the storage devices, and the set of first-type reserved extents supports a reconstruction operation for a failed storage device when the failed storage device appears in the storage devices. A data area is generated based on a set of data extents respectively located outside the reserved area in the storage devices, and the data area provides data storage for a user. Here, a reserved extent size of the set of first-type reserved extents is smaller than a data extent size of data extents in the data area of the set of data extents. The quantity of extents can be reduced, thereby reducing overhead of storage and computing resources involved by associated metadata.

Abstract: The present invention provides an automatic container landing device based on an expert system and a control method therefor.

Abstract: A purifying device, including: an air guiding part provided with an air passage, a negative ion generator, and an air guiding cover. The negative ion generator includes an emitting head, and the emitting head is arranged to face the air passage. The air guiding part is provided with a first position limiting structure disposed on an inner wall of the air passage, and the first position limiting structure is provided with a position limiting groove configured to receive the emitting head. The air guiding cover is arranged on a top of the inner wall of the air passage and configured to press and cover the position limiting groove, and the inner wall of the air passage is configured to support the air guiding cover.

Abstract: An optical system may include a light source to provide a beam of light. The optical system may include a reflector to receive and redirect the beam of light. The optical system may include a light gate having an opening to permit the beam of light, from the reflector, to travel through the opening. The optical system may include a light sensor to receive a portion of the beam of light after the beam of light travels through the opening, and convert the portion of the beam of light to a signal. The optical system may include a processing device to determine whether a notch of a wafer is in an allowable position based on the signal.

Abstract: A semiconductor structure is disclosed. The semiconductor structure includes: a substrate of a first conductivity; a first region of the first conductivity formed in the substrate; a second region of the first conductivity formed in the first region, wherein the second region has a higher doping density than the first region; a source region of a second conductivity formed in the second region; a drain region of the second conductivity formed in the substrate; a pickup region of the first conductivity formed in the second region and adjacent to the source region; and a resist protective oxide (RPO) layer formed on a top surface of the second region. An associated fabricating method is also disclosed.

Abstract: A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.

Abstract: A method and an apparatus for generating HDR image with low bit width, a storage medium, and a terminal are provided. The method includes: determining a to-be-processed HDR image with high bit width; splitting the to-be-processed HDR image with high bit width to obtain N frames of split images which include a first frame to an Nth frame; performing bit width reduction processing on the N frames of split images respectively, to obtain N frames of low-bit-width images; and synthesizing the N frames of low-bit-width images to obtain the HDR image with low bit width.

Abstract: In a method of inspecting an extreme ultraviolet (EUV) radiation source, during an idle mode, a borescope mounted on a fixture is inserted through a first opening into a chamber of the EUV radiation source. The borescope includes a connection cable attached at a first end to a camera. The fixture includes an extendible section mounted from a first side on a lead screw, and the camera of the borescope is mounted on a second side, opposite to the first side, of the extendible section. The extendible section is extended to move the camera inside the chamber of the EUV radiation source. One or more images are acquired by the camera from inside the chamber of the EUV radiation source at one or more viewing positions. The one or more acquired images are analyzed to determine an amount of tin debris deposited inside the chamber of the EUV radiation source.

Abstract: The present invention provides an automatic container loading and unloading apparatus and method. The apparatus comprises: a data acquisition module, used for scanning a container truck panel to obtain laser point cloud data; a data preprocessing module, used for segmenting a laser point cloud on a surface of the container truck panel from the laser point cloud data; a key point extraction module, used for performing edge extraction on the laser point cloud on the surface of the container truck panel to obtain discrete points on edges of the keel of the container truck panel; and a straight line fitting module, used for performing random sample consensus straight line fitting on the discrete points on the edges of the keel of the container truck panel to obtain spatial straight lines of the edges of the keel of the truck panel.

Abstract: A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.

Abstract: Techniques for storage management involve: in accordance with a determination that an input/output (I/O) request of a storage system is received, determining a target storage device to which the I/O request is directed. The techniques further involve: in accordance with a determination that the target storage device is a storage device of a first type, processing the I/O request by accessing a memory of the storage system. The techniques further involve: in accordance with a determination that the target storage device is a storage device of a second type different from the first type, processing the I/O request without accessing the memory, the storage device of the second type having an access speed higher than that of the storage device of the first type. Accordingly, such techniques can improve performance of a storage system.

Abstract: A Cloud Access Security Broker (CASB) system includes a controller; a message broker connected to the controller; and a plurality of workers connected to the message broker and connected to one or more cloud providers having a plurality of files contained therein for one or more tenants, wherein the plurality of workers are configured to crawl through the plurality of files for the one or more tenants, based on policy and configuration for the one or more tenants provided via the controller, and based on assignments from the message broker. The plurality of workers can be further configured to cause an action in the one or more cloud providers based on the crawl and based on the policy and the configuration. The action can include any of allowing a file, deleting a file, quarantining a file, and providing a notification.

Abstract: In some embodiments, an integrated circuit is provided. The integrated circuit may include an inner ring-shaped isolation structure that is disposed in a semiconductor substrate. Further, the inner-ring shaped isolation structure may demarcate a device region. An inner ring-shaped well is disposed in the semiconductor substrate and surrounds the inner ring-shaped isolation structure. A plurality of dummy gates are arranged over the inner ring-shaped well. Moreover, the plurality of dummy gates are arranged within an interlayer dielectric layer.

Abstract: A method includes moving a wafer stage to a first station on a table body of a lithography chamber; placing a wafer on a top surface of the wafer stage; emitting a first laser beam from a first laser emitter toward a first beam splitter on a first sidewall of the wafer stage, wherein a first portion of the first laser beam is reflected by the first beam splitter to form a first reflected laser beam, and a second portion of the first laser beam transmits through the first beam splitter to form a first transmitted laser beam; calculating a position of the wafer stage on a first axis based on the first reflected laser beam; after calculating the position of the wafer, moving the wafer stage to a second station on the table body; and performing a lithography process to the wafer.

Abstract: A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.

Abstract: A method for using an extreme ultraviolet radiation source is provided. The method includes assembling a first droplet generator onto a port of a vessel; ejecting a target droplet from the first droplet generator to a zone of excitation in front of a collector; emitting a laser toward the zone of excitation, such that the target droplet is heated by the laser to generate extreme ultraviolet (EUV) radiation; stopping the ejection of the target droplet; after stopping the ejection of the target droplet, disassembling the first droplet generator from the port of the vessel; after disassembling the first droplet generator from the port of the vessel, inserting a cleaning device into the vessel through the port; and cleaning the collector by using the cleaning device.

Abstract: Some implementations herein include a detection circuit and a fast and accurate in-line method for detecting blockage on a droplet generator head of an extreme ultraviolet exposure tool without impacting the flow of droplets of a target material through the droplet generator head. In some implementations described herein, the detection circuit includes a switch circuit that is configured in an open configuration, in which the switch is electrically open between two electrode elements. When an accumulation of the target material occurs across two or more electrode elements on the droplet generator head, the accumulation functions as a switch that closes the detection circuit. A controller may detect closure of the detection circuit.

Abstract: A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.

Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.