Abstract: A bumping process wherein a substrate is first provided with many electrical connections. Subsequently, the bumps on the bump transfer substrate are pressed onto the electrical connections of the substrate accompanying a heating process and then the bumps are transferred onto the electrical connections of the substrate because the adhesion characteristic between the bumps and the electrical connections is better than that between the bumps and the release layer.

Abstract: A solder ball fabrication process for forming solder balls over a wafer having an active layer is provided. A plurality of patterned solder mask layers is sequentially formed over the active surface of the wafer. Each patterned solder mask layer has at least an opening that exposes a solder ball pad on the wafer. The opening of the patterned solder mask layers further away from the solder ball pad is larger in diameter than the opening of the patterned solder mask close to the solder ball pad. Solder material is deposited into the openings and a reflow process is conducted to melt the solder material together so that a solder ball is formed over the solder ball pad.

Abstract: A flip chip interconnection structure is formed over the active surface of a chip. The active surface of the chip includes a plurality of bonding pads. A redistribution trace layer, including at least a redistribution trace, is formed over the active surface in a manner to electrically connect to the bonding pads. A plurality of conductive posts, made of a tin-lead alloy having a tin to lead ratio greater than about 10:90, are formed on and connected to the redistribution trace structure. An insulating layer is formed over the redistribution trace layer to encompass the conductive posts. The insulating layer comprises a plurality of openings through which the conductive posts externally protrude.

Abstract: A wafer-level package structure, applicable to a flip-chip arrangement on a carrier, which comprises a plurality of contact points, is described. This wafer-level package structure is mainly formed with a chip and a conductive layer. The conductive layer is arranged on the bonding pads of the chip as contact points. The conductive layer can further be arranged at a region outside the bonding pads on the chip as a heat sink to enhance the heat dissipation ability of the package.

Abstract: A bonding structure for bonding two substrates by a metal stud includes a first substrate, a second substrate, at least a metal stud and an adhesive. The bonding structure includes a first substrate, a second substrate, at least a metal stud and an adhesive. The metal stud is arranged between the first substrate and the second substrate and attached to the first substrate. The adhesive is applied between the metal stud and the second substrate to electrically connect the metal stud and the second substrate.

Abstract: A wafer bump fabrication process is provided in the present invention. A wafer with multiple bonding pads and a passivation layer, which exposes the bonding pads, is provided. The surface of each bonding pad has an under bump metallurgy layer. A patterned photoresist layer with a plurality of opening is formed which openings expose the under bump metallurgy layer. Afterwards a baking process is performed to cure the patterned photoresist layer. Following a solder paste fill-in process is performed to fill a solder paste into the openings. A reflow process is performed to form bumps from the solder paste in the openings. The patterned photoresist layer is removed.

Abstract: A method of modifying the tin to lead ratio of a tin-lead bump forms a patterned solder mask over a substrate that comprises a first tin-lead bump formed thereon, the patterned solder mask having an opening that exposes the tin-lead bump. A solder material including tin and lead is filled in the opening of the solder mask over the first tin-lead bump. The solder material has a tin to lead ratio that differs from that of the first tin-lead bump. The solder material is reflowed to fuse with the first tin-lead bump, which forms a second tin-lead bump. The tin to lead ratio of the second tin-lead bump is thereby different from that of the first tin-lead bump.

Abstract: A method of forming bumps on the active surface of a silicon wafer. An under-ball metallic layer is formed over the active surface of the wafer. A plurality of first solder blocks is attached to the upper surface of the under-ball metallic layer. Each first solder block has an upper surface and a lower surface. The lower surface of each first solder block bonds with the under-ball metallic layer. The upper surfaces of the first solder blocks are planarized. A second solder block is attached to the upper surface of each first solder block and then a reflux operation is carried out.

Abstract: A method of forming bumps on the active surface of a silicon wafer. A first under-ball metallic layer is formed over the active surface of the wafer. A second under-ball metallic layer is formed over the first under-ball metallic layer. A portion of the second under-ball metallic layer is removed to expose the first under-ball metallic layer. A plurality of solder blocks is implanted over the second under-ball metallic layer. A reflux operation is conducted and then the exposed first under-ball metallic layer is removed so that only the first under-ball metallic layer underneath the second under-ball metallic layer remains.

Abstract: A method of forming a bump on an active surface of a wafer is disclosed. The method of the invention forms an under ball metallurgy (UBM) onto the active surface of the wafer. Then, the UBM is partially removed until a portion of the active surface of the wafer is exposed. At least one conductive stud is bonded onto the non-removed UBM by wire bonding.

Abstract: A process for forming a plurality of bumps on a wafer comprises forming a first UBM (under ball metallurgy) over an active surface of a wafer. A second UBM is formed over the first UBM. A part of the second UBM is removed to expose the first UBM. A plurality of solders are respectively formed to cover the second UBM and the first UBM not covered by the second UBM. The first UBM not covered by the second UBM and not covered by the solders is removed.

Abstract: A process of forming bumps on conductive pads is provided. First, an adhesion layer made of titanium, titanium-wolfram alloy or chromium is formed on the conductive pads. Subsequently, a barrier layer made of nickel-vanadium alloy is formed on the adhesion layer. Next, a wettable layer made of copper is formed on the barrier layer. Subsequently, solder material is formed on the wettable layer. Subsequently, etching processes are performed to remove the wettable layer, the barrier layer and the adhesion layer that are exposed to the outside. The wettable layer, the barrier layer and the adhesion layer remain under the solder material. Afterward, a reflow process can be selectively performed.

Abstract: A method of forming bumps on the active surface of a silicon wafer. A first under-bump metallic layer is formed over the active surface of the wafer. A second under-bump metallic layer is formed over the first under-bump metallic layer. A portion of the second under-bump metallic layer is removed to expose the first under-bump metallic layer. A plurality of solder bumps is implanted onto the second under-bump metallic layer. The exposed first under-bump metallic layer is removed so that only the first under-bump metallic layer underneath the second under-bump metallic layer remains.

Abstract: A method for etching a nickel-vanadium alloy is described. The etching of the nickel-vanadium alloy is conducted using an etchant that comprises sulfuric acid. Further, the etching rate of the nickel-vanadium alloy is controlled based on the electrolytic reaction between the etchant and the nickel-vanadium alloy thin film.

Abstract: A flip-chip package with a heat spreader includes a substrate, a chip, a heat spreader, multiple first bumps, multiple second bumps, a first fill material and a second fill material. The substrate has multiple conductive nodes formed on a surface thereof. The chip has an active surface and a corresponding backside surface. The chip further has multiple conductive pads formed on the active surface. The chip is placed over the substrate, the active surface of the chip facing the surface of the substrate. The heat spreader having a cavity is placed on the substrate, wherein the cavity of the heat spreader faces the substrate and the chip is located inside the cavity. The first bumps are placed between the conductive pads of the chip and the conductive nodes of the substrate. The second bumps are placed between the backside surface of the chip and the heat spreader. The first fill material is filled between the chip and the substrate and covers the first bumps.

Abstract: A multi-chip stack package having a substrate, a first chip, a second chip, a plurality of bumps, a plurality of junction interface bumps, a plurality of conductive wires, a first filler material, a second filler material and an encapsulating material is provided. The substrate has a substrate surface with a plurality of first contacts and a plurality of second contacts. The first chip has a first active surface with a plurality of bonding pads thereon and a first chip back surface. The first chip is positioned over the substrate surface. The second chip has a second active surface with a plurality of bonding pads thereon and a second chip back surface. The second chip is positioned over the first chip back surface. The bumps are positioned between the first bonding pads and the first contacts. The junction interface bumps are positioned between the first chip back surface and the second chip back surface. The conductive wires electrically connect the second bonding pads and the second contacts.

Abstract: The present invention discloses a multi-chip stacking package, which comprises at least two chips, namely a first chip having a smaller area and a second chip having a larger area. The second chip is combined with a substrate in wire-bonding manner, and the first chip is fixed on the passive surface of the second chip. The passive surface of the second chip are further configured with a plurality of intermediate pads, which are metal pads in a certain fixed type, and the bonding wires from the first chip to the substrate are connected in two sections and with two operations.

Abstract: The present invention discloses a semiconductor package, wherein several chips can be packed thereinto. The present invention uses under bump metallurgies or bonding wires to connect the associated circuits of at least two chips in serial or in parallel. At least one slicing path is located between the at least two chips and a substrate is provided with an upper surface and a lower surface in which the upper surface is flip-chip bonded with the at least two chips.

Abstract: The present invention provides a bump fabrication process. A wafer is provided with a patterned photoresist layer formed on the wafer. The patterned photoresist layer has a plurality of openings, corresponding to bonding pads. A conductive layer is formed on the photoresist layer and the exposed bonding pads. Afterwards, a sticker film is provided to lift off the conductive layer on the photoresist layer, while the conductive layer within the openings is not removed. A solder paste is filled into the openings. A reflow step is performed to turn the filled solder paste into globular bumps. At last, the photoresist layer is removed.

Abstract: The present invention discloses a ball grid array package. The ball grid array package of the present invention comprises a substrate and at least one chip, and the substrate has a plurality of ball pads. The present invention disposes a plurality of testing pads having openings on the substrate, and the ball pads are electrically connected to the testing pads. By the structure, a probe of a testing socket can contact with the testing pads, and keep the shape of the ball pads complete.