Patents by Inventor Jennifer Y. Sun

Jennifer Y. Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HEAT TREATED CERAMIC SUBSTRATE HAVING CERAMIC COATING
    Publication number: 20190233343
    Abstract: A heat treated ceramic article includes a ceramic substrate and a ceramic coating on the ceramic substrate. The ceramic coating is a non-sintered ceramic coating that has a different composition than the ceramic substrate. The heat treated ceramic article further includes a transition layer between the ceramic substrate and the ceramic coating, the transition layer comprising first elements from the ceramic coating that have reacted with second elements from the ceramic substrate, wherein the transition layer has a thickness of about 0.1 microns to about 5 microns.
    Type: Application
    Filed: April 8, 2019
    Publication date: August 1, 2019
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Biraja P. Kanungo, Dmitry Lubomirsky
  • Heat treated ceramic substrate having ceramic coating
    Patent number: 10364197
    Abstract: A heat treated ceramic article includes a ceramic substrate and a ceramic coating on the ceramic substrate. The ceramic coating is a non-sintered ceramic coating that has a different composition than the ceramic substrate. The heat treated ceramic article further includes a transition layer between the ceramic substrate and the ceramic coating, the transition layer comprising first elements from the ceramic coating that have reacted with second elements from the ceramic substrate, wherein the transition layer has a thickness of about 0.1 microns to about 5 microns.
    Type: Grant
    Filed: November 11, 2015
    Date of Patent: July 30, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Biraja P. Kanungo, Dmitry Lubomirsky
  • Ceramic article with reduced surface defect density
    Patent number: 10336656
    Abstract: A machined ceramic article having an initial surface defect density and an initial surface roughness is provided. The machined ceramic article is heated to a temperature range between about 1000° C. and about 1800° C. at a ramping rate of about 0.1° C. per minute to about 20° C. per minute. The machined ceramic article is heat-treated in air atmosphere. The machined ceramic article is heat treated at one or more temperatures within the temperature range for a duration of up to about 24 hours. The machined ceramic article is then cooled at the ramping rate, wherein after the heat treatment the machined ceramic article has a reduced surface defect density and a reduced surface roughness.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: July 2, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ren-Guan Duan, Thorsten Lill, Jennifer Y. Sun, Benjamin Schwarz
  • HIGH PURITY METALLIC TOP COAT FOR SEMICONDUCTOR MANUFACTURING COMPONENTS
    Publication number: 20190194817
    Abstract: An article comprises a component for a manufacturing chamber, a coating on the component, and an anodization layer formed on the coating. The anodization layer has a thickness of about 2-10 mil, comprises a low porosity layer portion having a density of greater than 99% and a porous columnar layer portion having a higher porosity than the low porosity layer portion. The porous columnar layer portion comprises a plurality of columnar nanopores having a diameter of about 10-50 nm.
    Type: Application
    Filed: March 5, 2019
    Publication date: June 27, 2019
    Inventors: Jennifer Y. Sun, Vahid Firouzdor
  • METHOD OF FORMING A BULK ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FROM YTTRIUM OXIDE AND ZIRCONIUM OXIDE
    Publication number: 20190157114
    Abstract: Disclosed herein is a ceramic article or coating useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The ceramic article or coating is formed from a combination of yttrium oxide and zirconium oxide.
    Type: Application
    Filed: January 18, 2019
    Publication date: May 23, 2019
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins
  • METHOD OF FORMING A COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FROM YTTRIUM OXIDE AND ZIRCONIUM OXIDE
    Publication number: 20190157115
    Abstract: Disclosed herein is a ceramic article or coating useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The ceramic article or coating is formed from a combination of yttrium oxide and zirconium oxide.
    Type: Application
    Filed: January 18, 2019
    Publication date: May 23, 2019
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins
  • COATED ARTICLE AND SEMICONDUCTOR CHAMBER APPARATUS FORMED FROM YTTRIUM OXIDE AND ZIRCONIUM OXIDE
    Publication number: 20190157113
    Abstract: Disclosed herein is a ceramic article or coating useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The ceramic article or coating is formed from a combination of yttrium oxide and zirconium oxide.
    Type: Application
    Filed: January 18, 2019
    Publication date: May 23, 2019
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins
  • PLASMA SPRAY COATING DESIGN USING PHASE AND STRESS CONTROL
    Publication number: 20190136360
    Abstract: A ceramic coating is coated on a body of an article, wherein the ceramic coating includes Y2O3, Y4Al2O9, Y3Al5O12, or a solid-solution of Y2O3 mixed with at least one of ZrO2, Al2O3, HfO2, Er2O3, Nd2O3, Nb2O5, CeO2, Sm2O3 or Yb2O3. The ceramic coating is applied to the body by a method including providing a plasma spraying system having a plasma current in the range of between about 100 A to about 1000 A, positioning a torch standoff of the plasma spraying system a distance from the body between about 60 mm and about 250 mm, flowing a first gas through the plasma spraying system at a rate of between about 30 L/min and about 400 L/min, and plasma spray coating the body to form a ceramic coating, wherein splats of the coating are amorphous and have a pancake shape.
    Type: Application
    Filed: December 21, 2018
    Publication date: May 9, 2019
    Inventors: Jennifer Y. Sun, Yikai Chen, Biraja Prasad Kanungo
  • ATOMIC LAYER DEPOSITION COATINGS FOR HIGH TEMPERATURE HEATERS
    Publication number: 20190136372
    Abstract: Embodiments of the disclosure relate to articles, coated chamber components and methods of coating chamber components with a low volatile coating. The low volatile coating can include a rare earth metal-containing layer that coats all surfaces of a component (e.g., a high temperature heater).
    Type: Application
    Filed: August 10, 2018
    Publication date: May 9, 2019
    Inventors: Guodong Zhan, David Fenwick, Jennifer Y. Sun
  • METHODS OF MINIMIZING PARTICLES ON WAFER FROM PLASMA SPRAY COATINGS
    Publication number: 20190135704
    Abstract: Methods comprise performing two or more thermal cycles on an article comprising a body and a ceramic coating. Each thermal cycle of the two or more thermal cycles comprise heating the ceramic article to a target temperature at a first ramping rate. Each thermal cycle further comprises maintaining the article at the target temperature for a first duration of time and then cooling the article to a second target temperature at a second ramping rate. The method further comprises submerging the article in a bath for a second duration of time to remove the particles from the ceramic coating.
    Type: Application
    Filed: November 8, 2017
    Publication date: May 9, 2019
    Inventors: Kaushal GANGAKHEDKAR, Jennifer Y. SUN, Xiao-Ming HE
  • Y2O3-SiO2 PROTECTIVE COATINGS FOR SEMICONDUCTOR PROCESS CHAMBER COMPONENTS
    Publication number: 20190131113
    Abstract: A semiconductor process chamber component including an article coated with a protective coating that may have Y2O3 at a concentration of about 10 molar % to about 65 molar % and SiO2 at a concentration of about 35 molar % to about 90 molar %.
    Type: Application
    Filed: October 31, 2018
    Publication date: May 2, 2019
    Inventors: David Fenwick, Jennifer Y. Sun
  • NANOPOWDERS, NANOCERAMIC MATERIALS AND METHODS OF MAKING AND USE THEREOF
    Publication number: 20190127280
    Abstract: Nanopowders containing nanoparticles having a core particle with a thin film coating. The core particles and thin film coatings are, independently, formed from at least one of a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride or combinations thereof. The thin film coating may be formed using a non-line of sight technique such as atomic layer deposition (ALD). Also disclosed herein are nanoceramic materials formed from the nanopowders and methods of making and using the nanopowders.
    Type: Application
    Filed: October 23, 2018
    Publication date: May 2, 2019
    Inventors: Guodong Zhan, Xiaowei Wu, Xiao Ming He, Jennifer Y. Sun
  • High purity metallic top coat for semiconductor manufacturing components
    Patent number: 10260160
    Abstract: A component for a manufacturing chamber comprises a coating and an anodization layer on the coating. The anodization layer has a thickness of about 2-10 mil. The anodization layer comprises a low porosity bottom layer portion having a porosity that is less than about 40-50% and a porous columnar top layer portion having a porosity of about 40-40% and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: April 16, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Vahid Firouzdor
  • CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES
    Publication number: 20190105751
    Abstract: Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.
    Type: Application
    Filed: December 11, 2018
    Publication date: April 11, 2019
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, David Koonce, Biraja Prasad Kanungo
  • Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
    Patent number: 10242888
    Abstract: A solid solution-comprising ceramic article useful in semiconductor processing, which article may be in the form of a solid, bulk ceramic, or may be in the form of a substrate having a ceramic coating of the same composition as the bulk ceramic material on at least one outer surface. The ceramic article is resistant to erosion by halogen-containing plasmas and provides advantageous mechanical properties. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide and zirconium oxide. The ceramic-comprising article includes ceramic which is formed from zirconium oxide at a molar concentration ranging from about 96 mole % to about 91 mole %, and yttrium oxide at a molar concentration ranging from about 4 mole % to about 9 mole %.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: March 26, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins
  • FLUORINATED RARE EARTH OXIDE ALD COATING FOR CHAMBER PRODUCTIVITY ENHANCEMENT
    Publication number: 20190078200
    Abstract: An article comprises a body having a coating. The coating comprises a M-O-F coating having a molar O/F ratio that is customized to future processing that the article may be exposed to.
    Type: Application
    Filed: February 23, 2018
    Publication date: March 14, 2019
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun
  • RARE-EARTH-BASED OXYFLUORIDE ALD COATING FOR CHAMBER PRODUCTIVITY ENHANCEMENT
    Publication number: 20190078199
    Abstract: An article comprises a body having a coating. The coating comprises a M-O—F coating having a molar O/F ratio that is customized to future processing that the article may be exposed to.
    Type: Application
    Filed: August 22, 2018
    Publication date: March 14, 2019
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun, Michael R. Rice
  • FLUORINATED RARE EARTH OXIDE ALD COATING FOR CHAMBER PRODUCTIVITY ENHANCEMENT
    Publication number: 20190078206
    Abstract: An article comprises a body having a coating. The coating comprises a M-O-F coating having a molar O/F ratio that is customized to future processing that the article may be exposed to.
    Type: Application
    Filed: February 23, 2018
    Publication date: March 14, 2019
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun
  • Plasma spray coating design using phase and stress control
    Patent number: 10196728
    Abstract: To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC is provided and a ceramic coating is coated on the body, wherein the ceramic coating includes a compound of Y2O3, Al2O3, and ZrO2. The ceramic coating is applied to the body by a method including providing a plasma spraying system having a plasma current in the range of between about 100 A to about 1000 A, positioning a torch standoff of the plasma spraying system a distance from the body between about 60 mm and about 250 mm, flowing a first gas through the plasma spraying system at a rate of between about 30 L/min and about 400 L/min, and plasma spray coating the body to form a ceramic coating, wherein splats of the coating are amorphous and have a pancake shape.
    Type: Grant
    Filed: May 14, 2015
    Date of Patent: February 5, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Yikai Chen, Biraja Prasad Kanungo
  • Chamber components with polished internal apertures
    Patent number: 10189141
    Abstract: Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.
    Type: Grant
    Filed: June 9, 2017
    Date of Patent: January 29, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, David Koonce, Biraja Prasad Kanungo