Patents by Inventor Ji-Soon Park

Ji-Soon Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250023044
    Abstract: The cathode active material according to embodiments of the present invention includes a lithium composite oxide particle having a form of secondary particle in which a plurality of primary particle are aggregated, wherein the primary particles respectively include a lithium conduction pathway through which lithium ions are diffused. Wherein the primary particles include a first particle, and the first particle has an angle of 45° to 90° formed by a direction from a center of the first particle to a center of the lithium composite oxide particle and a direction of the lithium conduction pathway included in the first particle, wherein a ratio of the number of the first particles among the primary particles located on a surface of the lithium composite oxide particle is 20% or more.
    Type: Application
    Filed: October 2, 2024
    Publication date: January 16, 2025
    Inventors: Sung Soon PARK, Ji Hoon CHOI, Jik Soo KIM, Kwang Ho LEE, Jeong Hoon JEUN
  • Patent number: 10917734
    Abstract: An electronic device for controlling a speaker and an operating method thereof are provided. The electronic device includes an audio output apparatus, and a processor configured to, according to a type of a first sound source to be output through the audio output apparatus, control an output of the audio output apparatus to output a first sound corresponding to the first sound source so as to be focused on a first area.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: February 9, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Ji-Soon Park
  • Patent number: 10777487
    Abstract: An integrated circuit (IC) device includes a semiconductor substrate having a via hole extending through at least a part thereof, a conductive structure in the via hole, a conductive barrier layer adjacent the conductive structure; and a via insulating layer interposed between the semiconductor substrate and the conductive barrier layer. The conductive barrier layer may include an outer portion oxidized between the conductive barrier layer and the via insulating layer, and the oxidized outer portion of the conductive barrier layer may substantially surrounds the remaining portion of the conductive barrier layer.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: September 15, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ju-il Choi, Kun-sang Park, Son-kwan Hwang, Ji-soon Park, Byung-lyul Park
  • Patent number: 10762242
    Abstract: A method and system for operating an electronic apparatus includes: implementing, by a first processor, a main process of the electronic apparatus; receiving a user input for controlling an operation of at least one element (e.g., camera, memory, microphone, or the like) configured to perform at least one function; and in response to a received user input, controlling power of the at least one element by using at least a second processor separate from the first processor.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: September 1, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-sup Lee, Ji-soon Park
  • Publication number: 20190013260
    Abstract: An integrated circuit (IC) device includes a semiconductor substrate having a via hole extending through at least a part thereof, a conductive structure in the via hole, a conductive barrier layer adjacent the conductive structure; and a via insulating layer interposed between the semiconductor substrate and the conductive barrier layer. The conductive barrier layer may include an outer portion oxidized between the conductive barrier layer and the via insulating layer, and the oxidized outer portion of the conductive barrier layer may substantially surrounds the remaining portion of the conductive barrier layer.
    Type: Application
    Filed: September 14, 2018
    Publication date: January 10, 2019
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ju-il CHOI, Kun-sang PARK, Son-kwan HWANG, Ji-soon PARK, Byung-lyul PARK
  • Patent number: 10128168
    Abstract: An integrated circuit (IC) device includes a semiconductor substrate having a via hole extending through at least a part thereof, a conductive structure in the via hole, a conductive barrier layer adjacent the conductive structure; and a via insulating layer interposed between the semiconductor substrate and the conductive barrier layer. The conductive barrier layer may include an outer portion oxidized between the conductive barrier layer and the via insulating layer, and the oxidized outer portion of the conductive barrier layer may substantially surrounds the remaining portion of the conductive barrier layer.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: November 13, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ju-il Choi, Kun-sang Park, Son-kwan Hwang, Ji-soon Park, Byung-lyul Park
  • Publication number: 20180176707
    Abstract: An electronic device for controlling a speaker and an operating method thereof are provided. The electronic device includes an audio output apparatus, and a processor configured to, according to a type of a first sound source to be output through the audio output apparatus, control an output of the audio output apparatus to output a first sound corresponding to the first sound source so as to be focused on a first area.
    Type: Application
    Filed: December 18, 2017
    Publication date: June 21, 2018
    Inventor: Ji-Soon Park
  • Publication number: 20180173901
    Abstract: A method and system for operating an electronic apparatus includes: implementing, by a first processor, a main process of the electronic apparatus; receiving a user input for controlling an operation of at least one element (e.g., camera, memory, microphone, or the like) configured to perform at least one function; and in response to a received user input, controlling power of the at least one element by using at least a second processor separate from the first processor.
    Type: Application
    Filed: December 8, 2017
    Publication date: June 21, 2018
    Inventors: Sang-sup LEE, Ji-soon PARK
  • Patent number: 9773114
    Abstract: A method of analyzing a program code of an electronic device includes configuring a tree by using a key string included in the program code and; in response to a command to find a specific key being received, performing a predetermined order traversal of the tree by using a string included in the specific key; in response to a node which matches a last string included in the specific key having a leaf node as a result of the predetermined order traversal, returning a value of the leaf node; and analyzing the program code by using the return value.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: September 26, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji-soon Park, Dongok Kang, Jeehoon Kang, Yong-ho Hwang, Kwangkeun Yi
  • Patent number: 9735090
    Abstract: An integrated circuit device includes a semiconductor structure, a through-silicon-via (TSV) structure that penetrates through the semiconductor structure and a connection terminal connected to the TSV structure. A metal capping layer includes a flat capping portion that covers the bottom surface of the connection terminal and a wedge-shaped capping portion that is integrally connected to the flat capping portion and that partially covers a side wall of the connection terminal. The metal capping layer may be formed by an electroplating process in which the connection terminal is in contact with a metal strike electroplating solution while a pulse-type current is applied.
    Type: Grant
    Filed: October 2, 2015
    Date of Patent: August 15, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ju-il Choi, Atsushi Fujisaki, Byung-Iyul Park, Ji-soon Park, Joo-hee Jang, Jeong-gi Jin
  • Patent number: 9691685
    Abstract: A semiconductor device includes a substrate having a die region and a scribe region surrounding the die region, a plurality of via structures penetrating through the substrate in the die region, a portion of the via structure being exposed over a surface of the substrate, and a protection layer pattern structure provided on the surface of the substrate surrounding a sidewall of the exposed portion of the via structure and having a protruding portion covering at least a portion of the scribe region adjacent to the via structure.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: June 27, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyu-Ha Lee, Hyung-Jun Jeon, Jum-Yong Park, Byung-Lyul Park, Ji-Soon Park, Jin-Ho An, Jin-Ho Chun
  • Publication number: 20170051424
    Abstract: A shielding unit for a plating apparatus may include a shielding plate, a controlling plate and a rotary actuator. The shielding plate may have a plurality of holes configured to permit a passage of an electrolyte therethrough. The controlling plate may make contact with the shielding plate. The controlling plate may have a plurality of controlling holes for controlling an opening ratio of the plurality of holes of the shielding plate. The rotary actuator may rotate the controlling plate to control the opening ratio of the plurality of holes shielding plate.
    Type: Application
    Filed: August 11, 2016
    Publication date: February 23, 2017
    Inventors: Atsushi Fujisaki, Ju-II Choi, Kun-Sang Park, Byung-Lyul Park, Ji-Soon Park
  • Publication number: 20170033032
    Abstract: A semiconductor device includes a substrate having a die region and a scribe region surrounding the die region, a plurality of via structures penetrating through the substrate in the die region, a portion of the via structure being exposed over a surface of the substrate, and a protection layer pattern structure provided on the surface of the substrate surrounding a sidewall of the exposed portion of the via structure and having a protruding portion covering at least a portion of the scribe region adjacent to the via structure.
    Type: Application
    Filed: May 25, 2016
    Publication date: February 2, 2017
    Inventors: Kyu-Ha Lee, Hyung-Jun Jeon, Jum-Yong Park, Byung-Lyul Park, Ji-Soon Park, Jin-Ho An, Jin-Ho Chun
  • Patent number: 9431341
    Abstract: Provided is a semiconductor device. The semiconductor device includes a passivation layer defining a metal pattern on a first surface of a substrate, an inter-layer insulating layer disposed on a second surface of the substrate, and a piezoelectric pattern formed between the metal pattern and the passivation layer on the first surface of the substrate. A through-silicon-via and/or a pad can be directly bonded to another through-silicon-via and/or another pad by applying pressure only, and without performing a heat process.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: August 30, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yi-Koan Hong, Byung-Lyul Park, Ji-Soon Park, Si-Young Choi
  • Publication number: 20160163590
    Abstract: Disclosed is a method of manufacturing a semiconductor device. A preliminary wafer-carrier assembly is formed in such a way that a wafer structure having a plurality of via structures is adhered to a light-penetrating carrier by a photodegradable adhesive. A wafer-carrier assembly having an optical shielding layer for inhibiting or preventing a light penetration is formed such that the wafer structure, the carrier and the adhesive are covered with the optical shielding layer except for the backside of the wafer structure through which the via structures are exposed. An interconnector is formed on the backside of the wafer structure such that the via structures make contact with the interconnector, and the wafer structure and the carrier are separated from each other by irradiating a light to the wafer-carrier assembly. Accordingly, the adhesive is inhibited or prevented from being dissolved during a plasma process on the wafer-carrier assembly.
    Type: Application
    Filed: December 2, 2015
    Publication date: June 9, 2016
    Inventors: Deokyoung Jung, Seong-Min Son, Jin-Ho An, Byung-Lyul Park, Ji-Soon Park, Ho-Jin Lee
  • Publication number: 20160099201
    Abstract: An integrated circuit device includes a semiconductor structure, a through-silicon-via (TSV) structure that penetrates through the semiconductor structure and a connection terminal connected to the TSV structure. A metal capping layer includes a flat capping portion that covers the bottom surface of the connection terminal and a wedge-shaped capping portion that is integrally connected to the flat capping portion and that partially covers a side wall of the connection terminal. The metal capping layer may be formed by an electroplating process in which the connection terminal is in contact with a metal strike electroplating solution while a pulse-type current is applied.
    Type: Application
    Filed: October 2, 2015
    Publication date: April 7, 2016
    Inventors: Ju-il Choi, Atsushi Fujisaki, Byung-lyul Park, Ji-soon Park, Joo-hee Jang, Jeong-gi Jin
  • Publication number: 20150310207
    Abstract: A method of analyzing a program code of an electronic device includes configuring a tree by using a key string included in the program code and; in response to a command to find a specific key being received, performing a predetermined order traversal of the tree by using a string included in the specific key; in response to a node which matches a last string included in the specific key having a leaf node as a result of the predetermined order traversal, returning a value of the leaf node; and analyzing the program code by using the return value.
    Type: Application
    Filed: April 23, 2015
    Publication date: October 29, 2015
    Applicants: Samsung Electronics Co., Ltd., Seoul National University R&DB Foundation
    Inventors: Ji-soon PARK, Dongok Kang, Jeehoon Kang, Yong-ho Hwang, Kwangkeun Yi
  • Patent number: 9100677
    Abstract: A method for generating a transport stream of a server is provided. The method for generating a transport stream of a server which sends broadcasting content to a client device comprises: scrambling broadcasting content by using a specific key; adding at least one content-encryption message which includes the specific key and a device key for obtaining the specific key from the at least one content-encryption message to the broadcasting content so as to generate a transport stream; and sending the generated transport stream to the client device.
    Type: Grant
    Filed: September 10, 2012
    Date of Patent: August 4, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dong-jin Kang, Dave Ahn, Ji-soon Park
  • Patent number: 9064941
    Abstract: A semiconductor device includes a substrate including a first surface and a second surface opposite to each other, a through-via electrode extending through the substrate. The through-via electrode has an interconnection metal layer and a barrier metal layer surrounding a side surface of the interconnection metal layer. One end of the through-via electrode protrudes above the second surface. A spacer insulating layer may be provided on an outer sidewall of the through-via electrode. A through-via electrode pad is connected to the through-via electrode and extends on the spacer insulating layer substantially parallel to the second surface. A first silicon oxide layer and a silicon nitride layer are stacked on the second surface. A thickness of the first silicon oxide layer is greater than a thickness of the silicon nitride layer.
    Type: Grant
    Filed: January 20, 2015
    Date of Patent: June 23, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Deok-young Jung, Pil-kyu Kang, Byung-lyul Park, Ji-soon Park, Seong-min Son, Jin-ho An, Ji-hwang Kim
  • Publication number: 20150137387
    Abstract: An integrated circuit (IC) device includes a semiconductor substrate having a via hole extending through at least a part thereof, a conductive structure in the via hole, a conductive barrier layer adjacent the conductive structure; and a via insulating layer interposed between the semiconductor substrate and the conductive barrier layer. The conductive barrier layer may include an outer portion oxidized between the conductive barrier layer and the via insulating layer, and the oxidized outer portion of the conductive barrier layer may substantially surrounds the remaining portion of the conductive barrier layer.
    Type: Application
    Filed: November 17, 2014
    Publication date: May 21, 2015
    Inventors: Ju-il CHOI, Kun-sang PARK, Son-kwan HWANG, Ji-soon PARK, Byung-lyul PARK