Patents by Inventor Jin-a Ryu

Jin-a Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110034595
    Abstract: Disclosed are block copolymer formed by block-copolymerizing vinyl aromatic hydrocarbon and conjugated diene compound and asphalt modifier composition including specific functional additives. Asphalt modifier composition according to the present invention is rapidly dissolved in asphalt without substantially lowering a softening point of asphalt, making it possible to form uniform asphalt composition and improve the productivity of the asphalt composition.
    Type: Application
    Filed: May 20, 2009
    Publication date: February 10, 2011
    Inventors: Moon Seok Chun, Jin-Young Ryu, Ik Jun Choi
  • Publication number: 20110007697
    Abstract: Various methods and apparatuses for transmitting packet downlink ACK/NACK information in a wireless communication are disclosed. A method of transmitting ACK/NACK information in Fast ACK/NACK reporting (FANR) mode in a wireless communication system is presented. The method comprises receiving a command from the network to operate in FANR mode, determining the ACK/NACK state for a number of uplink data blocks, transmitting an ACK/NACK signal for a downlink data block in an uplink control message, if it was determined that the ACK/NACK state is not an ACK state for at least a predetermined number of uplink data blocks.
    Type: Application
    Filed: June 17, 2010
    Publication date: January 13, 2011
    Applicant: LG ELECTRONICS INC.
    Inventors: Jin Sook RYU, Yung Mi Kim
  • Publication number: 20100320270
    Abstract: Provided is a combi-card, i.e. a combination type IC card, which can be used in either contact and non-contact manner, and a communication system using the same, and the combi-card is provided with a transponder chip module formed with a RF antenna and attached in a recess region of a card body and is characterized by the use of the RF antenna of the transponder chip alone as a transmitting and receiving antenna.
    Type: Application
    Filed: June 18, 2010
    Publication date: December 23, 2010
    Applicant: Korea Minting, Security Printing & ID Card Operating Corp.
    Inventors: Jin Ho RYU, Jong Hoon CHAE, Ho Sang LEE, Ho Geun SONG, Jin Ki HONG, Hyun Mi KIM
  • Patent number: 7847092
    Abstract: The present invention relates to a method for preparation of organofluoro compounds containing radioactive isotope fluorine-18. More particularly, the present invention relates to a method for preparation of primary or secondary organofluoro compound by reacting fluorine salt containing radioactive isotope fluorine-18 with primary or secondary alkyl halide or primary or secondary alkyl sulfonate in the presence of alcohol of Chemical Formula 1 as a solvent to obtain high yield of organofluoro compound. Synthesis reaction according to the present invention may be carried out under mild condition to give high yield of the organofluoro compounds and the reaction time is decreased, and thereby is suitable for the mass production of the organofluoro compounds.
    Type: Grant
    Filed: December 9, 2005
    Date of Patent: December 7, 2010
    Assignees: FutureChem Co., Ltd., The Asan Foundation
    Inventors: Dae Hyuk Moon, Dae Yoon Chi, Dong Wook Kim, Seung Jun Oh, Jin-sook Ryu
  • Publication number: 20100295633
    Abstract: Disclosed herein is an electromagnetic bandgap (EBG) pattern structure, including: a nonconductive substrate; and a pattern assembly formed on the substrate and including regularly arranged closed-loop patterns and open-loop patterns both of which are made of a conductive material. The EBG pattern structure is advantageous in that it can be used to manufacture new security products by applying its frequency characteristics to securities or IDs and in that it can be variously used in security technologies for preventing forgery and alteration because various security codes can be created by adjusting the variables of its EBG pattern.
    Type: Application
    Filed: May 20, 2010
    Publication date: November 25, 2010
    Inventors: Jong Won YU, Won Gyu Lim, Hyeong Seok Jang, Dong Hoon Shin, Jin Ho Ryu, Hyun Mi Kim, Won Gyun Choe
  • Patent number: 7838179
    Abstract: In a method for fabricating a photo mask, first resist patterns are formed on a transparent substrate where a light blocking layer and a phase shift layer are formed. Line widths of the first resist patterns are measured to define a region requiring a line width correction. Second resist patterns exposing the defined region are formed on the first resist patterns. The line width of the light blocking layer is corrected by over-etching the exposed light blocking layer to a predetermined thickness. The second resist patterns are removed. Phase shift patterns and light blocking patterns are formed using the first resist patterns as an etch mask. Then, the first resist patterns are removed.
    Type: Grant
    Filed: December 5, 2007
    Date of Patent: November 23, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jin Ho Ryu
  • Patent number: 7823031
    Abstract: Provided are a method and system for testing a semiconductor memory device using an internal clock signal of the semiconductor memory device as a data strobe signal. The internally-generated data strobe signal may be delayed to synchronize with test data. Because a test device need not supply the data strobe signal, the number of semiconductor memory modules that can be simultaneously tested can be increased, and an average test time for a unit memory module can be decreased.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: October 26, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jun-bae Kim, Jin-ho Ryu, Sung-man Park
  • Publication number: 20100261727
    Abstract: 2-arylbenzothiophene derivatives or pharmaceutically acceptable salts thereof, a preparation method thereof, and a pharmaceutical composition for the diagnosis or treatment of degenerative brain disease containing the same as an active ingredient. Since the 2-arylbenzothiophene derivatives of Formula 1 have a relatively high binding affinity for ?-amyloid, they can be used as diagnostic reagents for diagnosing Alzheimer's disease at an early stage by non-invasive techniques when they are labeled with radioisotopes: wherein R1-R4, V, W, X, Y and Z are as defined in the Detailed Descript of the specification. Further, when the pharmaceutical composition containing the 2-arylbenzothiophene derivative binds with a low-molecular weight ?-amyloid peptide binding compound, generation of malignant high-molecular weight ?-amyloid deposits is minimized. Accordingly, the pharmaceutical composition can be used as a therapeutic agent of degenerative brain disease such as Alzheimer's disease.
    Type: Application
    Filed: October 15, 2009
    Publication date: October 14, 2010
    Inventors: Dae Yoon Chi, Byoung Se Lee, Youjung Jung, Uthaiwan Sirion, Yoo Jin Lim, Yu Jin Bae, Heejun Kim, So Young Chu, Dae Hyuk Moon, Jin-Sook Ryu, Jae Seung Kim, Seung Jun Oh
  • Publication number: 20100233590
    Abstract: A method for fabricating a photo mask using a fluorescence layer, comprising: forming a fluorescence layer on a frame region of a light-transmitting substrate that defines a main cell region and the frame region; forming a phase-shift layer and a light-shielding layer on the light-transmitting substrate and the fluorescence layer; forming a light-shielding main pattern in the main cell region and a light-shielding frame pattern in the frame region by patterning the light-shielding layer; forming a phase-shift main pattern and a phase-shift frame pattern to expose a portion of a surface of the fluorescence layer on side walls thereof, by etching the phase-shift layer using the light-shielding main pattern and the light-shielding frame pattern as an etch mask; irradiating light from a light source on the light-transmitting substrate and detecting an intensity of fluorescence of a fluorescence layer residue emitted from the exposed surface of the fluorescence layer; and determining under-etch or over-etch using
    Type: Application
    Filed: December 28, 2009
    Publication date: September 16, 2010
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Jin Ho Ryu
  • Patent number: 7794898
    Abstract: A method for fabricating a photomask includes forming a phase shift layer and a light blocking layer on a transparent substrate, forming a light blocking pattern including a space through which the phase shift layer is selectively exposed by etching light blocking layer, forming a resist pattern to fill the space, reducing a critical dimension (CD) of the resist pattern by irradiating ultraviolet (UV) rays onto the resist pattern, forming a phase shift pattern by etching the phase shift layer exposed during the reducing of the CD of the resist pattern using the reduced resist pattern and the light blocking pattern as an etch mask, and removing the resist pattern.
    Type: Grant
    Filed: April 17, 2008
    Date of Patent: September 14, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jin Ho Ryu
  • Publication number: 20100157142
    Abstract: A camera module according to an aspect of the invention may include: a housing supporting movements along an optical axis of a lens barrel having a lens therein; a board having an image sensor collecting light incident upon the lens to form an image, and fixed to the housing; filter glass provided within the housing, arranged above the board and creating a space within which the image sensor is provided; and a dust dam provided within the space, the dust dam onto which foreign objects entering the image sensor are stuck so as to prevent the movements of the foreign objects.
    Type: Application
    Filed: June 24, 2009
    Publication date: June 24, 2010
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Jin Mun RYU, Byung Nam Park, Sang Jin Kim
  • Publication number: 20100113763
    Abstract: The present invention relates to a method for preparation of organofluoro compounds containing radioactive isotope fluorine-18. More particularly, the present invention relates to a method for preparation of organofluoro compound [18F]florbetaben or [18F]AV-45 having <Chemistry Formula 11> and <Chemistry Formula 12>, respectively, by reacting fluorine salt containing radioactive isotope fluorine-18 with alkyl halide or alkyl sulfonate in the presence of alcohol of Chemistry Formula 1 as a solvent to obtain high yield of organofluoro compound. Synthesis reaction according to the present invention may be carried out under mild condition to give high yield of the organofluoro compounds and the reaction time is decreased, and thereby is suitable for the mass production of the organofluoro compounds.
    Type: Application
    Filed: October 26, 2009
    Publication date: May 6, 2010
    Applicants: FUTURECHEM CO., LTD., THE ASAN FOUNDATION
    Inventors: Dae Hyuk MOON, Dae Yoon CHI, Dong Wook KIM, Seung Jun OH, Jin-sook RYU
  • Publication number: 20100093356
    Abstract: A method and an apparatus of performing a cell reselection procedure in a wireless communication system are provided. The method includes starting a first reselection timer if a signal property value of a first neighbor cell with a higher priority than a serving cell is increased to above a threshold, starting a first delay timer if a second reselection timer that is a reselection timer of a second neighbor cell with a higher priority than the first neighbor cell is running at the expiry of the first reselection timer, reselecting the second neighbor cell as a suitable cell if the second reselection timer expires before the expiry of the first delay timer, and reselecting the first neighbor cell as the suitable cell if the first delay timer expires before the expiry of the second reselection timer.
    Type: Application
    Filed: September 10, 2009
    Publication date: April 15, 2010
    Inventors: Ji Woong Lee, Chul Hoi Koo, Yung-Mi Kim, Jin Sook Ryu, Hyounhee Koo
  • Publication number: 20100074104
    Abstract: A method and apparatus for an enhanced general packet radio service (EGPRS) system is provided. A plurality of temporary block flows (TBFs) are established or reconfigured. If fast ACK/NACK reporting (FANR) activation for one TBF is inconsistent with FANR activation for another TBF, the allocated TBFs are aborted.
    Type: Application
    Filed: September 22, 2009
    Publication date: March 25, 2010
    Inventors: Jin Sook Ryu, Ji Woong Lee, Yung Mi Kim, Chul Hoi Koo, Hyounhee Koo
  • Patent number: 7663397
    Abstract: A semiconductor device according to example embodiments that may include an on-die termination (ODT) control circuit having a pipe line structure which changes in response to a frequency of a clock signal and a termination resistance generator for generating termination resistance in response to a termination resistance control signal.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: February 16, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jeong Suk Yang, Jin Ho Ryu
  • Publication number: 20100032781
    Abstract: Provided is a camera module including an image sensor module including a substrate; an image sensor that is mounted on a top surface of the substrate; a ground pad that is disposed on a bottom surface of the substrate; and a sealing member that seals the image sensor mounted on the substrate; a lens member that is stacked on the image sensor module; and a conductive member that is formed on side surfaces of the image sensor module and the lens member so as to be electrically connected to the ground pad.
    Type: Application
    Filed: November 13, 2008
    Publication date: February 11, 2010
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventor: Jin Mun Ryu
  • Patent number: D633487
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: March 1, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dae-Joung Kim, Chul-Yong Cho, Jin-Le Ryu, Ji-Hyun Moon
  • Patent number: D633488
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: March 1, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dae-Joung Kim, Jin-Le Ryu, Seung-Ho Lee
  • Patent number: D633489
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: March 1, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dae-Joung Kim, Jin-Le Ryu, Chul-Yong Cho, Ji-Hyun Moon
  • Patent number: D633490
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: March 1, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dae-Joung Kim, Jin-Le Ryu, Chul-Yong Cho, Ji-Hyun Moon