Patents by Inventor Jun Yoshikawa

Jun Yoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170044022
    Abstract: A method of producing hexagonal plate-like zinc oxide particles having a sharp particle size distribution (i.e., a relatively uniform particle size) at a high weight yield and a high percent yield is provided. The method of producing hexagonal plate-like zinc oxide particles of the present invention comprises mixing by stirring an aqueous hexamethylenetetramine (HMT) solution, a solution of an anionic surfactant in a water-insoluble organic solvent, and optionally water to form a microemulsion containing an aqueous phase of an aqueous hexamethylenetetramine solution having a molar concentration of 0.05 M or more; dropwise adding an aqueous zinc salt solution to the microemulsion; and heating the microemulsion containing the aqueous zinc salt solution to a reaction temperature of 80° C. or more without using any autoclave to form hexagonal plate-like zinc oxide particles.
    Type: Application
    Filed: October 28, 2016
    Publication date: February 16, 2017
    Applicants: NGK INSULATORS, LTD., NAGOYA INSTITUTE OF TECHNOLOGY
    Inventors: Jun YOSHIKAWA, Tsutomu NANATAKI, Tomokatsu HAYAKAWA
  • Publication number: 20170029865
    Abstract: A lactase preparation includes lactase and has a lactase activity of 4,000 NLU/g or more according to the FCC IV method, wherein the lactase originates from a lactase gene of yeast, and wherein the lactase preparation has an arylsulfatase activity of 0.1% or less based on the lactase activity, in which the arylsulfatase activity (unit: U/g) is determined and calculated.
    Type: Application
    Filed: October 18, 2016
    Publication date: February 2, 2017
    Applicant: Godo Shusei Co., Ltd.
    Inventors: Kazuma Shiota, Hirofumi Horiguchi, Ai Iyotani, Jun Yoshikawa, Tomoko Sato
  • Patent number: 9548418
    Abstract: Provided is a self-supporting gallium nitride substrate useful as an alternative material for a gallium nitride single crystal substrate, which is inexpensive and also suitable for having a large area. This substrate is composed of a plate composed of gallium nitride-based single crystal grains, wherein the plate has a single crystal structure in the approximately normal direction. This substrate can be manufactured by a method comprising providing an oriented polycrystalline sintered body; forming a seed crystal layer composed of gallium nitride on the sintered body so that the seed crystal layer has crystal orientation mostly in conformity with the crystal orientation of the sintered body; forming a layer with a thickness of 20 ?m or greater composed of gallium nitride-based crystals on the seed crystal layer so that the layer has crystal orientation mostly in conformity with crystal orientation of the seed crystal layer; and removing the sintered body.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: January 17, 2017
    Assignee: NGK Insulators, Ltd.
    Inventors: Morimichi Watanabe, Jun Yoshikawa, Tsutomu Nanataki, Katsuhiro Imai, Tomohiko Sugiyama, Takashi Yoshino, Yukihisa Takeuchi, Kei Sato
  • Patent number: 9543473
    Abstract: Provided is a self-supporting polycrystalline GaN substrate composed of GaN-based single crystal grains having a specific crystal orientation in a direction approximately normal to the substrate. The crystal orientations of individual GaN-based single crystal grains as determined from inverse pole figure mapping by EBSD analysis on the substrate surface are distributed with tilt angles from the specific crystal orientation, the average tilt angle being 1 to 10°. There is also provided a light emitting device including the self-supporting substrate and a light emitting functional layer, which has at least one layer composed of semiconductor single crystal grains, the at least one layer having a single crystal structure in the direction approximately normal to the substrate. The present invention makes it possible to provide a self-supporting polycrystalline GaN substrate having a reduced defect density at the substrate surface, and to provide a light emitting device having a high luminous efficiency.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: January 10, 2017
    Assignee: NGK Insulators, Ltd.
    Inventors: Morimichi Watanabe, Jun Yoshikawa, Yoshitaka Kuraoka, Tsutomu Nanataki
  • Patent number: 9522311
    Abstract: In an iron golf club head with a face portion and a neck portion integrally molded by forging, the iron golf club head is made of an iron steel material at least containing 0.30% by weight or less of carbon and 0.0005% by weight to 0.003% by weight of boron. The face portion has been subjected to quenching processing.
    Type: Grant
    Filed: September 8, 2014
    Date of Patent: December 20, 2016
    Assignees: MIZUNO CORPORATION, CHUO INDUSTRIES, LTD.
    Inventors: Kazuhiro Doi, Jun Yoshikawa
  • Publication number: 20160362789
    Abstract: Disclosed is a substrate processing method including: placing a plurality of substrates on a rotary table in a processing container; and performing a processing on the substrates while rotating the rotary table. A dummy workpiece is disposed in a gap between the substrates placed on the rotary table.
    Type: Application
    Filed: June 10, 2016
    Publication date: December 15, 2016
    Inventors: Jun Yoshikawa, Motoshi Fukudome
  • Publication number: 20160358756
    Abstract: Disclosed is a plasma processing apparatus including: a processing container that includes a bottom portion and a sidewall and defines a processing space; a microwave generator that generates microwaves; and a dielectric window attached to the sidewall of the processing container. The dielectric window is supported by a support surface formed in an upper end portion of the sidewall or a support surface formed in a conductor member disposed in the upper end portion of the sidewall, and includes a non-facing portion that does not face the processing space. Corner portions are formed on surfaces of the non-facing portion to fix a position of a node of standing waves. A distance from a sidewall corner portion to at least one of the plurality of corner portions is a distance in which a position of another node of the standing waves overlaps with a position of the sidewall corner portion.
    Type: Application
    Filed: June 2, 2016
    Publication date: December 8, 2016
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Michitaka AITA, Jun YOSHIKAWA, Motoshi FUKUDOME
  • Patent number: 9515347
    Abstract: An object of the present invention is to provide a lithium secondary battery cathode which can more improve characteristics of the battery. The cathode of the present invention includes an electroconductive cathode current collector, a plurality of plate-like particle formed of a cathode active material, and a binder containing microparticles formed of the cathode active material and being smaller than the plate-like particles. The plate-like particles are formed so as to have an aspect ratio of 4 to 50. The plate-like particles are arranged such that the particles cover the surface of the cathode current collector surface at a percent area of 85 to 98%. The binder is disposed so as to intervene between two adjacent plate-like particles.
    Type: Grant
    Filed: November 1, 2011
    Date of Patent: December 6, 2016
    Assignee: NGK Insulators, Ltd.
    Inventors: Shigeki Okada, Tsutomu Nanataki, Nobuyuki Kobayashi, Jun Yoshikawa, Akira Urakawa
  • Publication number: 20160293800
    Abstract: Provided is a light emitting device composite substrate suitable for manufacturing large-area light emitting devices at low cost. The light emitting device composite substrate comprises a substrate composed of an oriented polycrystalline alumina sintered body, and a light emitting functional layer formed on the substrate and having two or more layers composed of semiconductor single crystal grains, wherein each of the two or more layers has a single crystal structure in a direction approximately normal to the substrate.
    Type: Application
    Filed: June 15, 2016
    Publication date: October 6, 2016
    Applicant: NGK INSULATORS, LTD.
    Inventors: Morimichi WATANABE, Jun YOSHIKAWA, Tsutomu NANATAKI, Katsuhiro IMAI, Tomohiko SUGIYAMA, Takashi YOSHINO, Yukihisa TAKEUCHI, Kei SATO
  • Publication number: 20160197234
    Abstract: Provided is a self-supporting polycrystalline GaN substrate composed of GaN-based single crystal grains having a specific crystal orientation in a direction approximately normal to the substrate. The crystal orientations of individual GaN-based single crystal grains as determined from inverse pole figure mapping by EBSD analysis on the substrate surface are distributed with tilt angles from the specific crystal orientation, the average tilt angle being 1 to 10°. There is also provided a light emitting device including the self-supporting substrate and a light emitting functional layer, which has at least one layer composed of semiconductor single crystal grains, the at least one layer having a single crystal structure in the direction approximately normal to the substrate. The present invention makes it possible to provide a self-supporting polycrystalline GaN substrate having a reduced defect density at the substrate surface, and to provide a light emitting device having a high luminous efficiency.
    Type: Application
    Filed: March 17, 2016
    Publication date: July 7, 2016
    Inventors: Morimichi WATANABE, Jun YOSHIKAWA, Yoshitaka KURAOKA, Tsutomu NANATAKI
  • Publication number: 20160172541
    Abstract: Provided is a self-supporting gallium nitride substrate useful as an alternative material for a gallium nitride single crystal substrate, which is inexpensive and also suitable for having a large area. This substrate is composed of a plate composed of gallium nitride-based single crystal grains, wherein the plate has a single crystal structure in the approximately normal direction. This substrate can be manufactured by a method comprising providing an oriented polycrystalline sintered body; forming a seed crystal layer composed of gallium nitride on the sintered body so that the seed crystal layer has crystal orientation mostly in conformity with the crystal orientation of the sintered body; forming a layer with a thickness of 20 ?m or greater composed of gallium nitride-based crystals on the seed crystal layer so that the layer has crystal orientation mostly in conformity with crystal orientation of the seed crystal layer; and removing the sintered body.
    Type: Application
    Filed: February 5, 2016
    Publication date: June 16, 2016
    Inventors: Morimichi WATANABE, Jun YOSHIKAWA, Tsutomu NANATAKI, Katsuhiro IMAI, Tomohiko SUGIYAMA, Takashi YOSHINO, Yukihisa TAKEUCHI, Kei SATO
  • Publication number: 20160145768
    Abstract: Disclosed is a self-supporting zinc oxide substrate composed of a plate composed of a plurality of zinc-oxide-based single crystal grains, wherein the plate has a single crystal structure in an approximately normal direction, and the zinc-oxide-based single crystal grains have a cross-sectional average diameter of greater than 1 ?m. This substrate can be manufactured by a method comprising providing an oriented polycrystalline sintered body; forming a layer with a thickness of 20 ?m or greater composed of zinc-oxide-based crystals on the oriented polycrystalline sintered body so that the layer has crystal orientation mostly in conformity with crystal orientation of the oriented polycrystalline sintered body; and removing the oriented polycrystalline sintered body to obtain the self-supporting zinc oxide substrate.
    Type: Application
    Filed: November 25, 2015
    Publication date: May 26, 2016
    Inventors: Morimichi WATANABE, Jun YOSHIKAWA, Hirofumi YAMAGUCHI, Tsutomu NANATAKI
  • Patent number: 9343270
    Abstract: A plasma processing apparatus includes a processing chamber configured to partition a processing space and a microwave generator configured to generate microwaves for plasma excitation. Further, the plasma processing apparatus includes a dielectric member mounted in the processing chamber so as to seal the processing space, and configured to introduce the microwaves generated by the microwave generator into the processing space. Further, the plasma processing apparatus includes an injector mounted in the dielectric member, and configured to supply the processing gas made in a plasma state due to the microwaves to the processing space through a through-hole formed in the dielectric member. Further, the plasma processing apparatus includes a waveguide plate made of a dielectric material mounted in the injector so as to surround the through-hole of the dielectric member, and configured to guide the microwaves propagated into the dielectric member toward the through-hole to an inside of the injector.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: May 17, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Toshihisa Nozawa, Jun Yoshikawa, Michitaka Aita, Masahiro Yamazaki, Takehisa Saito, Fumihiko Kaji, Koji Yamagishi
  • Publication number: 20160126066
    Abstract: A plasma processing apparatus includes a processing container that defines a processing space, a gas supply unit provided on a sidewall of the processing container and configured to supply gas to the processing space, a dielectric member having a facing surface that faces the processing space, and an antenna provided on a surface opposite to the facing surface of the dielectric member and configured to radiate microwaves that turn the gas into plasma to the processing space through the dielectric member. The gas supply unit includes a transport hole transporting the gas to a position where the gas does not reach the processing space in the inside of the sidewall of the processing container and an injection hole communicated to the transport hole and configured to inject the gas transported to the position into the processing space. The injection hole has a diameter larger than that of the transport hole.
    Type: Application
    Filed: November 4, 2015
    Publication date: May 5, 2016
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Jun YOSHIKAWA
  • Publication number: 20160126114
    Abstract: A plasma processing apparatus includes a processing chamber, a table disposed in the processing chamber, a dielectric window provided at the processing chamber, and a surrounding body made of a dielectric material surrounding a processing space between the table and the dielectric window. The dielectric window and the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween.
    Type: Application
    Filed: October 14, 2015
    Publication date: May 5, 2016
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masayuki KOHNO, Yusuke YOSHIDA, Naoki MATSUMOTO, Ippei SHIMIZU, Naoki MIHARA, Jun YOSHIKAWA, Michitaka AITA, Yoshikazu AZUMAYA, Junsuke HOSHIYA
  • Patent number: 9327994
    Abstract: The present invention provides a zinc oxide powder that enables a high degree of orientation, and highly uniform dispersion of an additive substance, to be simultaneously achieved in a green body or a sintered body. The zinc oxide powder of the present invention comprises a plurality of plate-like zinc oxide particles and has a volume-based D50 average particle diameter of 1 to 5 ?m and a specific surface area of 1 to 5 m2/g. The zinc oxide powder has a degree of orientation of the (002) plane of 40% or greater when two-dimensionally arrayed into a monolayer on a substrate.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: May 3, 2016
    Assignee: NGK Insulators, Ltd.
    Inventors: Jun Yoshikawa, Katsuhiro Imai, Koichi Kondo
  • Publication number: 20160118224
    Abstract: A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.
    Type: Application
    Filed: September 29, 2015
    Publication date: April 28, 2016
    Inventors: Masayuki KOHNO, Ryou SON, Naoki MATSUMOTO, Jun YOSHIKAWA, Michitaka AITA, Ippei SHIMIZU, Yusuke YOSHIDA, Koji KOYAMA, Masami SUDAYAMA, Yukiyoshi ARAMAKI
  • Patent number: 9324542
    Abstract: In a plasma processing apparatus of an exemplary embodiment, energy of microwaves is introduced from an antenna into the processing container through a dielectric window. The plasma processing apparatus includes a central introducing unit and a peripheral introducing unit. A central introduction port of the central introducing unit injects a gas just below the dielectric window. A plurality of peripheral introduction ports of the peripheral introducing unit injects a gas towards a periphery of the placement region. The central introducing unit is connected to with a plurality of first gas sources including a reactive gas source and a rare gas source through a plurality of first flow rate control units. The peripheral introducing unit is connected to with a plurality of second gas sources including a reactive gas source and a rare gas source through a plurality of second flow rate control units.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: April 26, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Naoki Matsumoto, Yugo Tomita, Naoki Mihara, Kazuki Takahashi, Michitaka Aita, Jun Yoshikawa, Takahiro Senda, Yoshiyasu Sato, Kazuyuki Kato, Kenji Sudou, Hitoshi Mizusugi
  • Patent number: 9318307
    Abstract: Provided is a zinc oxide sputtering target, which can effectively suppress the occurrence of break or crack in the target during sputtering to enable production of a zinc oxide transparent conductive film with high productivity. The zinc oxide sputtering target is composed of a zinc oxide sintered body comprising zinc oxide crystal grains, wherein the zinc oxide sputtering target has a sputter surface having a (100) crystal orientation degree of 50% or more.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: April 19, 2016
    Assignee: NGK Insulators, Ltd.
    Inventors: Jun Yoshikawa, Katsuhiro Imai, Koichi Kondo
  • Patent number: 9312446
    Abstract: Provided is a self-supporting gallium nitride substrate useful as an alternative material for a gallium nitride single crystal substrate, which is inexpensive and also suitable for having a large area. This substrate is composed of a plate composed of gallium nitride-based single crystal grains, wherein the plate has a single crystal structure in the approximately normal direction. This substrate can be manufactured by a method comprising providing an oriented polycrystalline sintered body; forming a seed crystal layer composed of gallium nitride on the sintered body so that the seed crystal layer has crystal orientation mostly in conformity with the crystal orientation of the sintered body; forming a layer with a thickness of 20 ?m or greater composed of gallium nitride-based crystals on the seed crystal layer so that the layer has crystal orientation mostly in conformity with crystal orientation of the seed crystal layer; and removing the sintered body.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: April 12, 2016
    Assignee: NGK Insulators, Ltd.
    Inventors: Morimichi Watanabe, Jun Yoshikawa, Tsutomu Nanataki, Katsuhiro Imai, Tomohiko Sugiyama, Takashi Yoshino, Yukihisa Takeuchi, Kei Sato