Abstract: It is an object of the invention to provide a substrate for a liquid crystal display, a liquid crystal display having the same, and a method of manufacturing the same which make it possible to provide a display having high luminance and preferable display characteristics to be used in display sections of information apparatuses and the like. Each pixel is defined by gate bus lines extending in the horizontal direction and drain bus lines extending in the vertical direction. TFTs are formed in the vicinity of intersections between the bus lines, and resin overlap sections for shielding the TFTs from light are formed above the same. No black matrix is formed on a common electrode substrate which is provided in a face-to-face relationship with a TFT substrate, and the bus lines and the resin overlap sections formed on the TFT substrate function as a black matrix.

Abstract: A conductive connection part (33) electrically connecting a conductive pattern (17) in a touch region (T1) to a lead line (30) includes a first connection layer (34A) formed below an interlayer insulating film (23) and connected so as to overlap with a base end part (30s) of the lead line (30), and a second connection layer (34B) connected to the first connection layer (34A) and crossing over a peripheral line (32) with the interlayer insulating film (23) being interposed between the second connection layer (34B) and the peripheral line (32).

Abstract: A external connecting terminal (35) includes a first interconnect layer (36A) formed of a same film as a first conductive pattern for touch position detection under an interlayer insulating film (23), and a second interconnect layer (36B) formed of a same film as a second conductive pattern for touch position detection on the interlayer insulating film (23). the first and the second interconnect layers are electrically connected to a lead line (31) at a portion overlapping the lead line (31), and electrically connected together at a portion outside the lead line (31).

Abstract: An internal connecting terminal (33) includes a first interconnect layer (34A) formed of a same film as a first conductive pattern for touch position detection under an interlayer insulating film (23), and a second interconnect layer (34B) formed of a same film as a second conductive pattern for touch position detection on the interlayer insulating film (23). The first and the second interconnect layers are electrically connected to a lead line (31) at a portion overlapping the lead line (31), and electrically connected together at a portion outside the lead line (31).

Abstract: It is an objective of the present invention to provide a thin film transistor substrate in which satisfactory contact between a drain electrode and a pixel electrode is achieved. A drain electrode (25d) includes a first conductive film (25dp), and a second conductive film (25dq) made of aluminum and stacked on the first conductive film (25dp). The second conductive film (25dq) is spaced apart from a first contact hole (27a) by a cavity section (28a) formed between the second conductive film (25dq) and the first contact hole (27a), where the cavity section (28a) is in communication with the first contact hole (27a). A pixel electrode (29) is provided to be out of contact with the second conductive film (25dq) of the drain electrode (25d).

Abstract: A source electrode and a drain electrode are formed by a stack of a titanium layer, a molybdenum nitride layer, an aluminum layer, and a molybdenum nitride layer, the titanium layer is formed by dry etching, and an oxide semiconductor layer is formed by performing annealing in an oxygen-containing atmosphere after formation of the source electrode and the drain electrode.

Abstract: A source section (S) is made of a source metal (25s) provided above a gate insulating film (23) and an oxide semiconductor film (24a), and a drain section (DR) includes a low resistance portion (24ad) which is part of the oxide semiconductor film (24a), where the part includes a surface of the oxide semiconductor film (24a) opposite to the gate insulating film (23), and the resistance of the part is reduced.

Abstract: A liquid crystal display device including first and second substrates and a liquid crystal layer therebetween. The device also includes a plurality of gate bus lines, and a plurality of drain bus lines that intersect the gate bus lines, as well as a plurality of pixel regions defined by the gate and drain bus lines. Additionally, the device includes a thin film transistor and a resin color filter layer formed in each of the pixel regions. There is a pixel electrode formed in each of the pixel regions on the resin color filter layer that includes a slit extending in parallel with an edge of the pixel region and a plurality of finer slits diagonally extending from the slit. Finally, the device includes a common electrode formed on the second substrate, and a vertical alignment film applied to each of surfaces of the substrates.

Abstract: The TFT substrate (100A) in the present invention includes a thin film transistor, a gate line (3a), a source line (13as), and first and second terminals (40a, 40b) for electrically connecting the thin film transistor to an external wiring which are formed on a substrate (1). The first terminal includes a first gate terminal portion (41a) and a first pixel electrode line (29a). The first pixel electrode line is in contact with the first gate terminal portion in a first opening portion (27c) provided in an insulating film (5), and covers an end face of the insulating film in the first opening portion. The second terminal includes a second gate terminal portion (41b) and a second pixel electrode line (29b). The second pixel electrode line is in contact with the second gate terminal portion in a second opening portion (27d) provided in the insulating film, and covers an end face of the insulating film in the second opening portion.

Abstract: An active matrix substrate (30a) includes a plurality of switching elements (5a), a first protective insulating film (20a) provided on the plurality of switching elements (5a), a transparent conductive layer (21b) provided on the first protective insulating film (20a), a second protective insulating film (22a) provided on the transparent conductive layer (21b), and a plurality of pixel electrodes (23a) on the second protective insulating film (22a), wherein a groove (G) is formed in the second protective insulating film (22a) along a vicinity of a corresponding one of the plurality of pixel electrodes (23a) so that part of the first protective insulating film (20a) is exposed, and the transparent conductive layer (21b) is provided along the groove (G) of the second protective insulating film (22a) to be exposed from a sidewall (W) of the groove (G) while being recessed from the sidewall (W) of the groove (G).

Abstract: A protective film has a first protective film (8) made of a silicon oxide film or a silicon nitride oxide film, a second protective film (9) made of a silicon nitride film, and a third protective film (10) made of a transparent resin film. The third protective film (10) is formed in a layer above the first protective film (8) and the second protective film (9). With this configuration, a liquid crystal display device-integrated touch panel (1) with long-term reliability can be realized.

Abstract: In an oxide semiconductor layer, a degree of oxidation S1 of a portion located on the side of the gate insulating film, and a degree of oxidation S2 of surface layer portions located in connection regions with source and drain electrodes have a relation of S2<S1 within a range in which the oxide semiconductor layer has predetermined electric resistance, and a degree of oxidation S3 of a surface layer portion of the channel region is made higher than the degrees of oxidation S1, S2 of the other regions within the range in which the oxide semiconductor layer has the predetermined electric resistance, by annealing the oxide semiconductor layer in an oxygen-containing atmosphere after formation of the source electrode and the drain electrode.

Abstract: A source electrode and a drain electrode are formed by a stack of a titanium layer, a molybdenum nitride layer, an aluminum layer, and a molybdenum nitride layer, the titanium layer is formed by dry etching, and an oxide semiconductor layer is formed by performing annealing in an oxygen-containing atmosphere after formation of the source electrode and the drain electrode.

Abstract: Gate electrodes, a gate insulating layer, and an oxide semiconductor layer are simultaneously formed to form a multilayer structure, so that an SOG film serves as an etching stopper on channel regions in forming source electrodes and drain electrodes. In the SOG film, channel isolation holes are formed in positions each of which is located between adjacent two of TFTs connected to a common one of the gate lines, and corresponds to the common gate line. The oxide semiconductor layer of the adjacent TFTs is divided in each channel isolation hole. Terminal sections of the gate lines are exposed in the terminal section exposing holes formed in positions each corresponding to a gate line end portion. The pixel electrode is made of a film identical to a film forming one layer included in the drain electrode.

Abstract: A liquid crystal display device (100) includes: a touch panel (101); and a color filter substrate (102) having (i) a first surface which faces the touch panel (101) and (ii) a second surface which is opposite from the first surface and on which at least one black matrix (15) is provided, the touch panel (101) including an Al layer (13c) that has a light blocking property, and in order to block light which enters the color filter substrate (102) from the second surface side and then leaks from a vicinity of the at least one black matrix (15) toward the touch panel (101), the Al layer (13c) being provided on the touch panel (101) so that a part of the Al layer (13c) and a part of the at least one black matrix (15) overlap each other when the Al layer (13c) is seen from the touch panel (101) side.

Abstract: A liquid crystal panel (1) includes (i) a CF substrate (2) on which a color filter is to be formed, (ii) a TFT substrate (3) on which a thin film transistor is to be formed, (iii) a sealing material (4) for sealing liquid crystal injected between the CF substrate (2) and the TFT substrate (3), (iv) a liquid crystal inlet (6) through which the liquid crystal is injected, and (v) structures (20) provided between a cut surface among cut surfaces of the liquid crystal panel (1), on which cut surface the liquid crystal inlet (6) is to be formed, and edges (4a) of the sealing material (4). The structures (20) each are made from a material from which the color filter is formed.

Abstract: The present invention provides a liquid crystal display device capable of reducing the number of steps and material costs and a method of producing the liquid crystal display device. A liquid crystal display device (100) of the present invention includes a liquid crystal display panel (105); and a touch panel (106). Out of the liquid crystal display panel (105) and the touch panel (106), one panel serves as a reference for alignment between the liquid crystal display panel (105) and the touch panel (106) and the other panel is aligned with the one panel. The other panel is provided with a second alignment mark that is aligned with a first alignment mark of the one panel. The second alignment mark is constituted by a transparent member.

Abstract: It is an object of the invention to provide a substrate for a liquid crystal display, a liquid crystal display having the same, and a method of manufacturing the same which make it possible to provide a display having high luminance and preferable display characteristics to be used in display sections of information apparatuses and the like. Each pixel is defined by gate bus lines extending in the horizontal direction and drain bus lines extending in the vertical direction. TFTs are formed in the vicinity of intersections between the bus lines, and resin overlap sections for shielding the TFTs from light are formed above the same. No black matrix is formed on a common electrode substrate which is provided in a face-to-face relationship with a TFT substrate, and the bus lines and the resin overlap sections formed on the TFT substrate function as a black matrix.

Abstract: Provided is a touch panel manufacturing method wherein the number of exposure masks needed for pattern formation is reduced, and a method for manufacturing a display device provided with a touch panel. A transparent conductive film layer (11) and a metal layer (12) are laminated on a transparent substrate (1), and the transparent conductive film layer (11) and the metal layer (12) are formed into predetermined electrode patterns, with use of one resist pattern. A protective film (13) covering the transparent conductive film layer (11) and the metal layer (12) is formed, and openings (14, 15, and 16) are provided at predetermined positioned in the protective film (13). By etching with use of the protective film (13) having the openings (14, 15, and 16), the metal layer (12) is removed so that the transparent conductive film layer (11) is exposed, whereby at least either touch electrodes (2) or connection terminals (5) are formed.

Abstract: A touch panel-equipped display device is provided that includes, on the front substrate of the display panel, touch electrodes that allow an exact touch location to be determined with simple structure. The device includes: a display panel (120) having a front substrate (1) and a back substrate (11) and having an image display region composed of a plurality of pixels; and a touch panel module (110) having touch electrodes (2) formed on an outer surface of the front substrate (1), wherein each of the touch electrodes (2) is formed of a metal material (6) disposed in a pattern that overlaps, when viewed in the thickness direction of the display panel (120), areas (7, 13) outside an opening of one of the pixels formed on at least one of the front substrate (1) and the back substrate (11).