Abstract: Couplers for attaching an accessory to an excavator arm of an excavator. Couplers having a first side for attaching the coupler to the excavator arm and a second side onto which the accessory will be coupled. The coupler includes a latch for selectively securing and releasing an attachment pin of the accessory in a jaw, groove, hook or slot in the second side of the coupler. The coupler is fully controllable from within the cab of the excavator and it allows improved security in the securement of the accessory to the coupler, i.e. preventing accidental decouplings, but while still allowing intentional decoupling operations to be carried out without undue burden.

Abstract: The present application relates to connectors for coupling together two surgical members of different materials while inhibiting galvanic corrosion. The connector may include a first coupling element composed of a material with a similar galvanic potential to one of the surgical members, and a second coupling element composed of a material with a similar galvanic potential to the second surgical member. Each of the first and second coupling elements may be configured to connect to the respective surgical member. The connector may also include a coupling medium disposed between the first and second coupling elements. The coupling medium may function to connect together the two coupling elements, and isolate the coupling elements to inhibit galvanic corrosion.

Abstract: A coupler includes first and second attachment pin jaws. A first latching mechanism is associated with the first jaw. The first latching mechanism has an arm connected to and extending away from a latching member. A second latching mechanism is associated with the jaw. The first and second latching mechanisms are adapted to latch the first and second attachment pins of an accessory in or on the first jaw and the second jaw, respectively. The second latching mechanism is powered for movement between a latching position and a non-latching position. The first latching mechanism is operatively connected to, or connectable with, the second latching mechanism to allow it to selectively operate the first latching mechanism between latching and non-latching positions by means of a groove or flange or finger on the second latching mechanism. A magnet is provided to ensure a correct disengagement of the first latch latching mechanism.

Abstract: Couplers for attaching an accessory to an excavator arm of an excavator. Couplers having a first side for attaching the coupler to the excavator arm and a second side onto which the accessory will be coupled. The coupler includes a latch for selectively securing and releasing an attachment pin of the accessory in a jaw, groove, hook or slot in the second side of the coupler. The coupler is fully controllable from within the cab of the excavator and it allows improved security in the securement of the accessory to the coupler, i.e. preventing accidental decouplings, but while still allowing intentional decoupling operations to be carried out without undue burden.

Abstract: Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support.

Abstract: An interior antenna is provided for coupling RF energy to a plasma in a process chamber having a wall. The antenna comprises a coil having a face exposed to the plasma in the process chamber. A plurality of standoffs are provided to support the coil at a spacing from the wall of the process chamber. At least one standoff comprises a terminal thorough which an electrical power can be applied to the coil, the terminal comprising a conductor receptacle. A conductor cup is around the standoff having the terminal. The conductor cup comprises a sidewall having an inner diameter that is sufficiently large to maintain a sidewall gap between the sidewall and the terminal.

Abstract: An implant for spacing apart skeletal structures. The implant includes a base, a rotatable member, and a connector. The base extends around at least a portion of the member, and the member is pivotally connected to the base by the connector. The member includes a first pair of opposing sides that have a first height that is smaller than or equal to a height of the base, and a second pair of opposing sides that have a second height larger than the base. The member is movable to a first rotational position with the first pair of opposing sides facing in the same direction as the sides of the base such that the member is shorter than or equal to the base. The member is also movable to a second rotational position with the second pair of opposing sides facing in the same direction as the sides of the base such that the member is taller than the base.

Abstract: An interbody implant spacer includes a flexible body defining a first surface configured for engagement with a first vertebral surface and a second surface configured for engagement with a second vertebral surface. The first surface includes at least one pre-formed protrusion extending outwardly therefrom. The body is expandable between a first, non-expanded configuration such that the at least one protrusion extends outwardly from the first surface and a second, expanded configuration such that the at least one protrusion extends outwardly from the first surface to engage the first vertebral surface and at least a portion of the second surface engages the second vertebral surface. Methods of use are disclosed.

Abstract: When a magnetron is scanned about the back of a target in a selected complex path having radial components, the erosion profile has a form depending upon the selection of paths. A radial erosion rate profile for a given magnetron is measured. Periodically during scanning, an erosion profile is calculated from the measured erosion rate profile, the time the magnetron spends at different radii, and the target power. The calculated erosion profile may be used to indicate when erosion has become excessive at any location prompting target replacement or to adjust the height of the magnetron above the target for repeated scans. In another aspect of the invention, the magnetron height is dynamically adjusted during a scan to compensate for erosion. The compensation may be based on the calculated erosion profile or on feedback control of the present value of the target voltage for a constant-power target supply.

Abstract: An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.

Abstract: Embodiments of the invention generally relate to a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a kit. More specifically, embodiments described herein relate to a process kit including a deposition ring and a pedestal assembly. The components of the process kit work alone, and in combination, to significantly reduce their effects on the electric fields around a substrate during processing.

Abstract: When a magnetron is scanned about the back of a target in a selected complex path having radial components, the erosion profile has a form depending upon the selection of paths. A radial erosion rate profile for a given magnetron is measured. Periodically during scanning, an erosion profile is calculated from the measured erosion rate profile, the time the magnetron spends at different radii, and the target power. The calculated erosion profile may be used to indicate when erosion has become excessive at any location prompting target replacement or to adjust the height of the magnetron above the target for repeated scans. In another aspect of the invention, the magnetron height is dynamically adjusted during a scan to compensate for erosion. The compensation may be based on the calculated erosion profile or on feedback control of the present value of the target voltage for a constant-power target supply.

Abstract: An electrostatic chuck and method of use thereof is provided herein. In some embodiments, an electrostatic chuck may include a disk having a first side to support a substrate thereon and a second side, opposing the first side, to provide an interface to selectively couple the disk to a thermal control plate, a first electrode disposed within the disk proximate the first side to electrostatically couple the substrate to the disk and a second electrode disposed within the disk proximate the opposing side of the disk to electrostatically couple the disk to the thermal control plate. In some embodiments, the second electrode may also be configured to heat the disk.

Abstract: A compressor blade root heating system for a turbine engine is disclosed. The compressor blade root heating system may be formed from one or more induction heaters formed from one or more induction coils positioned in close proximity to a root of a compressor blade. In one embodiment, the induction heater may be coupled to a static casing component positioned immediately upstream of a first row of compressor blades on a rotor assembly such that the induction heater is stationary during turbine engine operation. The induction heater causes eddy current formation, which heats the row one compressor blades. This heating increases the fracture toughness of the material forming the rotor and compressor blades, thereby increasing the mechanical life cycle.

Abstract: A coupler (24) for coupling an accessory (28) to an excavator arm (12) of an excavator (10), the coupler comprising a first jaw (30) that points in a generally longitudinal direction relative to the frame of the coupler (24), the jaw (30) being for receiving a first attachment pin of an accessory (28) and having a first sensor (40) for detecting the presence of an attachment pin therein, the coupler (24) further having a second jaw (32), or a latch (34), longitudinally spaced from the first jaw (30), and being for receiving a second attachment pin of the accessory (28), and having a second sensor (42) for detecting the presence of an attachment pin therein. The sensors (40, 42) transmit or send signals to a receiver (46, 48) for notifying the driver of the coupling status of the coupler (24) with respect to the accessory (28).

Abstract: Methods and apparatus to improve target life and deposition uniformity in PVD chambers are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis, the shunt plate rotatable about the central axis, a first open loop magnetic pole arc coupled to the shunt plate at a first radius from the central axis, and a second open loop magnetic pole arc coupled the shunt plate at a first distance from the first open loop magnetic pole arc, wherein at least one of the first radius varies along the first open loop magnetic pole arc or the first distance varies along the second open loop magnetic pole arc. In some embodiments, a first polarity of the first open loop magnetic pole arc opposes a second polarity of the second open loop magnetic pole arc.

Abstract: A magnetron actuator for moving a magnetron in a nearly arbitrary radial and azimuthal path in the back of a target in a plasma sputter reactor. The magnetron includes two coaxial rotary shafts extending along the chamber central axis and coupled to two independently controllable rotary actuators. An epicyclic gear mechanism or a frog-leg structure mechanically couple the shafts to the magnetron to control its radial and azimuthal position. A vertical actuator moves the shafts vertically in tandem to vary the magnetron's separation from the target's back surface and compensate for erosion of the front surface. The rotary actuators may be separately coupled to the shafts or a rotatable ring gear may be coupled to the shafts through respectively fixed and orbiting idler gears. Two radially spaced sensors detect reflectors attached to the inner and outer arms of the epicyclic gear mechanism for homing of the controller.

Abstract: Embodiments of the present invention provide improved methods and apparatus for physical vapor deposition (PVD) processing of substrates. In some embodiments, an apparatus for physical vapor deposition (PVD) may include a target assembly having a target comprising a source material to be deposited on a substrate, an opposing source distribution plate disposed opposite a backside of the target and electrically coupled to the target along a peripheral edge of the target, and a cavity disposed between the backside of the target and the source distribution plate; an electrode coupled to the source distribution plate at a point coincident with a central axis of the target; and a magnetron assembly comprising a rotatable magnet disposed within the cavity and having an axis of rotation that is aligned with a central axis of the target assembly, wherein the magnetron assembly is not driven through the electrode.

Abstract: Couplers for attaching an accessory to an excavator arm of an excavator. Couplers having a first side for attaching the coupler to the excavator arm and a second side onto which the accessory will be coupled. The coupler includes a latch for selectively securing and releasing an attachment pin of the accessory in a jaw, groove, hook or slot in the second side of the coupler. The coupler is fully controllable from within the cab of the excavator and it allows improved security in the securement of the accessory to the coupler, i.e. preventing accidental decouplings, but while still allowing intentional decoupling operations to be carried out without undue burden.