Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A control method of a plasma processing apparatus including a first electrode and a second electrode includes supplying a bias power to the first electrode, and supplying a negative DC voltage to the second electrode. The negative DC voltage periodically repeats a first state that takes a first voltage value and a second state that takes a second voltage value having an absolute value smaller than the first voltage value. The control method further includes a first control process of applying the first state of the negative DC voltage in a partial time period within each cycle of a signal synchronized with a cycle of a radio frequency of the bias power, or in a partial time period within each cycle of a periodically varying parameter measured in a transmission path of the bias power, and applying the second state continuously with the first state.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A fuel pump module includes a fuel pump, a housing, a filter, a bracket, a lid, a fuel passage, and a pressure regulating valve. The fuel pump supplies a fuel in a fuel tank that defines an opening to an outside of the fuel tank. The housing has a cylindrical shape and supports the fuel pump. The bracket connects the filter to the housing. The lid covers the opening and defines a discharge port through which the fuel is supplied to the outside. The fuel passage connects the fuel pump to the discharge port. The pressure regulating valve has a gravity center inside a space defined by a first virtual cylindrical surface including the housing. A minimum circumscribed circle of both the housing and the filter is smaller than the opening.

Abstract: When a tip of a blade cascade is ground with a grindstone, a jig is inserted between blade cascades of a blisk and a jig is inserted between blade cascades. A blade locking section of the jig locks with a side section in the width direction of a corresponding rotor blade via a damping member made from rubber or the like. A disk locking section of the jig locks with a disk of the blade cascade which the blade locking section locks with.

Abstract: A fuel pump module includes: a pump unit; a lid provided to close an opening of a fuel tank; and a flexible fuel tube. The pump unit includes a fuel pump configured to pump fuel out of the fuel tank, a housing that holds the fuel pump, and a filter configured to filter the fuel. The lid has a discharge port to supply the fuel to outside of the fuel tank. The flexible fuel tube connects the pump unit and the discharge port. The housing includes a guide portion configured to fix the pump unit to a fixing member having a pair of rails provided in the fuel tank, and a separation regulating member configured to regulate the guide portion from separating from the pair of rails by engaging with the fixing member.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A plasma processing apparatus includes: a shower head including a ceiling plate having a plurality of gas holes, and a base member having a space so as to supply the processing gas to the plurality of gas holes; a temperature adjustment mechanism provided in the shower head; an acquisition unit configured to acquire a combination of a plasma parameter and pressure in the space in the base member; an estimation unit configured to estimate temperature of the ceiling plate corresponding to the acquired combination of the parameter and the pressure with reference to temperature information indicating the temperature of the ceiling plate corresponding to the combination of the parameter and the pressure; and a temperature controller configured to control the temperature adjustment mechanism such that the estimated temperature of the ceiling plate becomes target temperature when a plasma processing is performed.

Abstract: A fuel pump module includes a fuel pump, a housing, a filter, a bracket, a lid, a fuel passage, and a pressure regulating valve. The fuel pump supplies a fuel in a fuel tank that defines an opening to an outside of the fuel tank. The housing has a cylindrical shape and supports the fuel pump. The bracket connects the filter to the housing. The lid covers the opening and defines a discharge port through which the fuel is supplied to the outside. The fuel passage connects the fuel pump to the discharge port. The pressure regulating valve has a gravity center inside a space defined by a first virtual cylindrical surface including the housing. A minimum circumscribed circle of both the housing and the filter is smaller than the opening.

Abstract: A fuel pump module includes: a pump unit; a lid provided to close an opening of a fuel tank; and a flexible fuel tube. The pump unit includes a fuel pump configured to pump fuel out of the fuel tank, a housing that holds the fuel pump, and a filter configured to filter the fuel. The lid has a discharge port to supply the fuel to outside of the fuel tank. The flexible fuel tube connects the pump unit and the discharge port. The housing includes a guide portion configured to fix the pump unit to a fixing member having a pair of rails provided in the fuel tank, and a separation regulating member configured to regulate the guide portion from separating from the pair of rails by engaging with the fixing member.

Abstract: A control method of a plasma processing apparatus including a first electrode and a second electrode includes supplying a bias power to the first electrode, and supplying a negative DC voltage to the second electrode. The negative DC voltage periodically repeats a first state that takes a first voltage value and a second state that takes a second voltage value having an absolute value smaller than the first voltage value. The control method further includes a first control process of applying the first state of the negative DC voltage in a partial time period within each cycle of a signal synchronized with a cycle of a radio frequency of the bias power, or in a partial time period within each cycle of a periodically varying parameter measured in a transmission path of the bias power, and applying the second state continuously with the first state.

Abstract: A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

Abstract: A substrate cleaning device 1 includes a substrate holding unit 10 configured to hold a substrate W, a first cleaning unit 11 having a first cleaning member 11a caused to come into contact with a first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, a second cleaning unit 12 having a second cleaning member 12a caused to come into contact with the first surface WA of the substrate W held by the substrate holding unit 10 to clean the first surface WA, and a controller 50 configured to control the first and second cleaning units 11, 12 so that, when any one of the first cleaning member 11a and the second cleaning member 12a cleans the first surface WA of the substrate W held by the substrate holding unit 10, the other cleaning member is at a position apart from the substrate W held by the substrate holding unit 10.

Abstract: The purpose of the present invention is to provide a pharmaceutical composition and a food which have the effect of preventing central nervous system diseases and inhibiting the advancement thereof. This pharmaceutical composition, which is used to prevent and treat central nervous system diseases, is characterized by including: a dried product or an extracted liquid of Anredera cordifolia; and nobiletin, which is a polymethoxyflavonoid.

Abstract: A pump unit includes an insertion guide member that extends in a longitudinal direction of the pump unit and is used to guide the pump unit at a time of inserting the pump unit into an opening portion of a fuel tank. The insertion guide member includes a stopper portion and a guide portion that are arranged along an edge part of the insertion guide member. When the pump unit is projected in the longitudinal direction onto a plane of projection, the stopper portion protrudes outward from an imaginary circle, which has a fitting portion's diameter, on the plane of projection. The guide portion guides the pump unit in a rotational direction relative to a stay. A cross section of the pump unit taken along a guide portion orthogonal plane is set to be within the imaginary circle, which has the fitting portion's diameter.