Abstract: A power amplifying device includes a first amplification circuit amplifying a first signal having a first frequency component and a second frequency component; a second amplification circuit amplifying a second signal received through an output node of the first amplification circuit; a filter circuit connected between a ground node of the first amplification circuit and a common ground to pass the first and second frequency components to the common ground through the ground node; and an inverting circuit that phase-inverts a signal including second harmonic components of the first and second frequency components that are received through the ground node of the first amplification circuit and provide the phase inverted signal to the output node of the first amplification circuit.

Abstract: A reference current generating circuit includes a current source circuit configured to generate a reference current based on an internal resistor; and a compensation circuit configured to comprise a first compensation circuit comprising a first compensation resistor and a second compensation resistor, and the first compensation resistor and the second compensation resistor are configured to convert the reference current into a first output current and compensate for process variation of the current source circuit.

Abstract: There is provided a power amplifier and an integrated circuit including the power amplifier. The power amplifier includes a first amplifier configured to amplify a first signal; a phase shifter configured to invert the first signal; and a harmonic sinker connected between an output terminal of the phase shifter and an output terminal of the first amplifier, configured to amplify an output signal of the phase shifter, and configured to have a conduction angle narrower than a conduction angle of the first amplifier.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a first tube defining an inner space, a substrate holder in which a plurality of substrates are vertically stacked in the inner space of the first tube, the substrate holder defining a plurality of processing spaces in which the substrates are individually processed, a gas supply unit having a plurality of main injection holes each of which is vertically defined to correspond to each of the processing spaces to supply a gas into the first tube, and an exhaust unit configured to exhaust the gas supplied into the plurality of processing spaces in the first tube to the outside. The exhaust unit includes a plurality of exhaust holes facing the main injection holes and vertically arranged in a line to correspond to the processing spaces. Therefore, the gas may smoothly flow on the substrate.

Abstract: In accordance with an exemplary embodiment, a substrate processing apparatus includes: a tube assembly having an inner space in which substrates are processed and assembled by laminating a plurality of laminates, each of which includes an injection part and an exhaust hole; a substrate holder configured to support the plurality of substrates in a multistage manner in the inner space; a supply line connected to one injection part of the plurality of laminates to supply a process gas; and an exhaust line connected to one of a plurality of exhaust holes to exhaust the process gas, and the substrate processing apparatus that has a simple structure and induces a laminar flow of the process gas to uniformly supply the process gas to a top surface of the substrate.

Abstract: A tunable inductor circuit includes a first common transmission line having one end connected to a first terminal; a first uncommon transmission line having one end connected to another end of the first common transmission line; a first switch circuit configured to selectively connect one of the other end of the first common transmission line and another end of the first uncommon transmission line to a first common node; a second common transmission line having one end connected to the first common node; a second uncommon transmission line having one end connected to another end of the second common transmission line; and a second switch circuit configured to selectively connect one of the other end of the second common transmission line and another end of the second uncommon transmission line to a second terminal.

Abstract: In accordance with an exemplary embodiment, a substrate processing apparatus includes: a tube assembly having an inner space in which substrates are processed and assembled by laminating a plurality of laminates, a substrate holder configured to support the plurality of substrates in a multistage manner in the inner space of the tube assembly, a gas supply unit installed on one side of the tube assembly to supply a process gas to each of the plurality of substrates in the inner space; and an exhaust unit connected to the tube assembly to exhaust the process gas supplied into the inner space, the substrate processing apparatus that induces a laminar flow to supply a uniform amount of process gas to a top surface of the substrate.

Abstract: Disclosed is a substrate processing apparatus comprising: a chamber which provides a substrate processing space; a process gas supply line which is for supplying a process gas into the chamber; a first diffusion plate which has formed on an edge portion thereof an injection hole for injecting the process gas; a substrate support which faces the first diffusion plate and is for supporting a substrate; a second diffusion plate which is provided between the first diffusion plate and the substrate support and has formed thereon a plurality of distribution holes; and a plasma generation unit which is for forming plasma in the space between the first diffusion plate and the second diffusion plate.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber including a first body part configured to provide a space in which substrates stand by and a second body part configured to provide a space in which a thin film deposition process is performed on each of the substrates, a substrate holder on which the substrates are stacked, the substrate holder being movable between the first body part and the second body part, a first supply unit configured to supply a first gas for depositing a thin film on the substrate in the second body part, a second supply unit configured to supply a second gas, which reacts with by-products generated while the thin film is deposited to generate fume, into the first body part, and an exhaust unit configured to exhaust the gases within the chamber. Thus, by-products generated while the thin film is deposited may be quickly removed.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a first tube defining an inner space, a substrate holder in which a plurality of substrates are vertically stacked in the inner space of the first tube, the substrate holder defining a plurality of processing spaces in which the substrates are individually processed, a gas supply unit having a plurality of main injection holes each of which is vertically defined to correspond to each of the processing spaces to supply a gas into the first tube, and an exhaust unit configured to exhaust the gas supplied into the plurality of processing spaces in the first tube to the outside. The exhaust unit includes a plurality of exhaust holes facing the main injection holes and vertically arranged in a line to correspond to the processing spaces. Therefore, the gas may smoothly flow on the substrate.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a tube having an inner space, a substrate support on which a plurality of substrates are stacked in multistage within the tube, the substrate support individually defining a plurality of processing spaces in which the plurality of substrates are respectively processed, a first gas supply part configured to supply a first gas into all the plurality of processing spaces, a second gas supply part comprising a plurality of injectors disposed to respectively correspond to the plurality of processing spaces so that the second gas is individually supplied onto each of the plurality of substrates, and an exhaust part configured to exhaust the gases within the tube. Thus, the gas may be individually supplied into each of the processing spaces in which the plurality of substrates are respectively processed.

Abstract: A power amplifier may include a first amplifying circuit configured to amplify an input RF signal; a second amplifying circuit connected to the first amplifying circuit in parallel configured to amplify the input RF signal; and a controller connected to at least one of the first amplifying circuit and the second amplifying circuit and configured to output a control signal in order to control an on-off state of at least one of the first amplifying circuit and the second amplifying circuit. Such an approach provides high efficiency without adding significant complexity to the power amplifier.

Abstract: The present disclosure relates to a substrate processing apparatus, and more particularly, a substrate processing apparatus that is capable of improving process uniformity on an entire surface of a substrate. The substrate processing apparatus includes a substrate boat in which a substrate is loaded, a reaction tube in which a processing process for the substrate loaded in the substrate boat is performed, a gas supply unit configured to supply a process gas into the reaction tube through an injection nozzle disposed on one side of the reaction tube, a heating unit including a plurality of vertical heating parts, which are disposed along a circumference of the reaction tube outside the reaction tube and configured to divide the circumference to the reaction tube into a plurality of portions so as to independently heat each of the divided portions of the reaction tube, and a control unit configured to control the heating unit.

Abstract: An radio frequency switch according to an example includes a first switching circuit including first switching elements connected in series between an antenna port and a transmission port and operated by a first gate signal, a second switching circuit including second switching elements connected in series between the antenna port and a reception port and operated by a second gate signal, a first shunt circuit connected between the transmission port and a ground and operated by the second gate signal, a second shunt circuit connected between the reception port and the ground and operated by the first gate signal, and a third shunt circuit connected between the reception port and the other end of an inductor grounded at one end and operated by the second gate signal.

Abstract: A power amplifier may include a first amplifying unit receiving a first bias signal to amplify a power level of an input signal; an envelope detecting unit detecting an envelope of the input signal; a comparing circuit unit comparing a peak value of the detected envelope with a preset reference voltage; and a second amplifying unit amplifying the power level of the input signal according to a second bias signal set depending on a comparison result of the comparing circuit unit.

Abstract: Provided is a substrate processing apparatus, and more particularly, a batch-type substrate processing apparatus where processes can be performed independently on a plurality of substrates. The substrate processing apparatus includes a substrate boat including a plurality of partition plates and a plurality of connection rods, an internal reaction tube, a gas supply unit, and an exhaust unit, and a plurality of substrates are loaded to be separated from the partition plates.

Abstract: A power amplifier may include a first amplifying circuit configured to amplify an input RF signal; a second amplifying circuit connected to the first amplifying circuit in parallel configured to amplify the input RF signal; and a controller connected to at least one of the first amplifying circuit and the second amplifying circuit and configured to output a control signal in order to control an on-off state of at least one of the first amplifying circuit and the second amplifying circuit. Such an approach provides high efficiency without adding significant complexity to the power amplifier.

Abstract: An radio frequency switch according to an example includes a first switching circuit including first switching elements connected in series between an antenna port and a transmission port and operated by a first gate signal, a second switching circuit including second switching elements connected in series between the antenna port and a reception port and operated by a second gate signal, a first shunt circuit connected between the transmission port and a ground and operated by the second gate signal, a second shunt circuit connected between the reception port and the ground and operated by the first gate signal, and a third shunt circuit connected between the reception port and the other end of an inductor grounded at one end and operated by the second gate signal.

Abstract: A web resource accessing and processing method is a method of allowing an authenticated client terminal to access a vendor neutral archive (VNA), wherein the web resource includes patient information, document information, and image information, the client terminal includes a memory, and the memory includes a patient information memory section in which the patient information of the web resource is stored, a document information section in which the document information of the web resource is stored, and an image information memory section in which the image information of the web resource is stored.

Abstract: A switching circuit may include a switching circuit unit; a reference voltage unit connected between the switching circuit unit and a signal input terminal and providing a preset reference voltage; and a voltage generating unit dividing a first control voltage provided to the switching circuit unit by a preset magnitude to generate a second control voltage corresponding to the reference voltage, and providing the second control voltage to bodies of the plurality of respective switching devices.