Patents by Inventor Lin Wang

Lin Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220006525
    Abstract: A method, an apparatus and a device for detecting an optical module, and a storage medium are provided. The method includes: constructing insertion loss ranges meeting an insertion loss specification that respectively correspond to different signal frequencies in a predetermined signal frequency range, to construct a target insertion loss region; acquiring a microstripline length, a stripline length, a via number and a connector number of a to-be-detected optical module; inputting the microstripline length, the stripline length, the via number and the connector number to a pre-constructed first model, to determine an insertion loss curve of the to-be-detected optical module in the signal frequency range; and determining that the to-be-detected optical module is unqualified if a part of the insertion loss curve is outside the target insertion loss region.
    Type: Application
    Filed: July 31, 2019
    Publication date: January 6, 2022
    Applicant: ZHENGZHOU YUNHAI INFORMATION TECHNOLOGY CO., LTD.
    Inventors: Lin WANG, Fazhi LIU
  • Publication number: 20210403614
    Abstract: The present invention relates to the technical field of catalyst preparation, and discloses a preparation method of a Ziegler-Natta catalyst. The method includes the following steps: subjecting magnesium halide, alcohol and an electron donor to a first contact reaction in the presence of an inert solvent to obtain a magnesium halide alcoholate and performing first cooling; subjecting titanium halide to second cooling; subjecting the cooled titanium halide, the cooled product containing the magnesium halide alcoholate and an electron donor to a second contact reaction; filtering the product of the second contact reaction to obtain the Ziegler-Natta catalyst; and subjecting the Ziegler-Natta catalyst and the heated titanium halide to a third contact reaction. The method has the advantages such as short cycle, high efficiency, etc., being suitable to industrial production.
    Type: Application
    Filed: July 1, 2019
    Publication date: December 30, 2021
    Applicants: China Energy Group Ningxia Coal Industry Co., Ltd., Institute of Chemistry, Chinese Academy of Sciences
    Inventors: Hongqiao Jiao, Huayi Li, Junjie Shao, Wei Yuan, Youliang Hu, He Huang, Qian Li, Lin Wang
  • Patent number: 11209574
    Abstract: A method for forecasting an agricultural irrigation water requirement includes: selecting a baseline period and crops each with a sown area larger than a set proportion as typical crops; calculating an irrigation water quota of the typical crop during a growth stage according to meteorological information; obtaining ten-day rainfall in a water-saving area from weather stations; and calculating effective rainfall in a sown region of the typical crop based on the ten-day rainfall; calculating an irrigation water requirement per unit area of the typical crop; and determining whether the irrigation water requirement per unit area of at least one typical crop is greater than an average of actual irrigation water usage per unit area measured in consecutive years, if yes, correcting the irrigation water requirement per unit area of all typical crops according to actual irrigation water usage; otherwise calculating a total water requirement for a next year.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: December 28, 2021
    Assignee: CHINA INSTITUTE OF WATER RESOURCES AND HYDROPOWER RESEARCH
    Inventors: Guiyu Yang, Hao Wang, Juncang Tian, Wanli Shi, Lin Wang, Zhaohui Yang
  • Publication number: 20210399209
    Abstract: A semiconductor device includes: a substrate comprising a magnetic tunneling junction (MTJ) region and a logic region; a first MTJ on the MTJ region; a first metal interconnection on the logic region; and a cap layer extending from a sidewall of the first MTJ to a sidewall of the first metal interconnection. Preferably, the cap layer on the MTJ region and the cap layer on the logic region comprise different thicknesses.
    Type: Application
    Filed: August 31, 2021
    Publication date: December 23, 2021
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Hui-Lin Wang, Yu-Ping Wang, Chen-Yi Weng, Chin-Yang Hsieh, Si-Han Tsai, Che-Wei Chang, Jing-Yin Jhang
  • Publication number: 20210389658
    Abstract: A projection screen and a projection system. The projection screen includes a reflection layer and a light absorption layer for absorbing light which are sequentially arranged from an incident side of projection light; the reflection layer comprises multiple microstructure units; each microstructure unit comprises a first plane and a second plane which are opposite to each other at an angle in a first direction as well as a third plane and a fourth plane which are opposite to each other at an angle in a second direction.
    Type: Application
    Filed: September 26, 2019
    Publication date: December 16, 2021
    Inventors: Wei SUN, Lin WANG, Zeda TANG, Fei HU, Yi LI
  • Publication number: 20210389657
    Abstract: A projection screen and a processing method therefor, wherein the projection screen comprises, in sequence from the incident side of projection light, a diffusion layer, a microlens array and a substrate. The inner side of the substrate is provided with a Fresnel microstructure, and part of the surface of the Fresnel microstructure is provided with a reflecting layer while the remaining part of the surface is a light absorbing layer. The microlens array is used for focusing the projection light on the reflecting layer. The reflecting layer is used for reflecting projection light back to the field of view of viewers. Ambient light is mostly absorbed by the light absorbing layer. The settings of the structure and dimension of the microlens array enable the projection light to be only incident onto the reflecting layer of the Fresnel microstructure and the ambient light to be mostly absorbed by the light absorbing layer.
    Type: Application
    Filed: September 26, 2019
    Publication date: December 16, 2021
    Inventors: Lin WANG, Wei SUN, Jie WANG, Fei HU, Yi LI
  • Publication number: 20210390993
    Abstract: A method for forming a semiconductor structure is disclosed. A substrate having a logic device region and a memory device region is provided. A first dielectric layer is formed on the substrate. Plural memory stack structures are formed on the first dielectric layer on the memory device region. An insulating layer is formed and conformally covers the memory stack structures and the first dielectric layer. An etching back process is performed to remove a portion of the insulating layer without exposing any portion of the memory stack structures. After the etching back process, a second dielectric layer is formed on the insulating layer and completely fills the spaces between the memory stack structures.
    Type: Application
    Filed: August 30, 2021
    Publication date: December 16, 2021
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Hui-Lin Wang, Yu-Ping Wang, Chen-Yi Weng, Chin-Yang Hsieh, Yi-Hui Lee, Ying-Cheng Liu, Yi-An Shih, I-Ming Tseng, Jing-Yin Jhang, Chien-Ting Lin
  • Publication number: 20210389394
    Abstract: A method for fabricating semiconductor device includes the steps of first forming a magnetic tunneling junction (MTJ) stack on a substrate, in which the MTJ stack includes a pinned layer on the substrate, a barrier layer on the pinned layer, and a free layer on the barrier layer. Next, a top electrode is formed on the MTJ stack, the top electrode, the free layer, and the barrier layer are removed, a first cap layer is formed on the top electrode, the free layer, and the barrier layer, and the first cap layer and the pinned layer are removed to form a MTJ and a spacer adjacent to the MTJ.
    Type: Application
    Filed: July 13, 2020
    Publication date: December 16, 2021
    Inventors: Hui-Lin Wang, Chen-Yi Weng, Che-Wei Chang, Si-Han Tsai, Ching-Hua Hsu, Jing-Yin Jhang, Yu-Ping Wang
  • Patent number: 11200058
    Abstract: Dynamic load balancing of hardware threads in clustered processor cores using shared hardware resources, and related circuits, methods, and computer readable media are disclosed. In one aspect, a dynamic load balancing circuit comprising a control unit is provided. The control unit is configured to determine whether a suboptimal load condition exists between a first cluster and a second cluster of a clustered processor core. If a suboptimal load condition exists, the control unit is further configured to transfer a content of private register(s) of a first hardware thread of the first cluster to private register(s) of a second hardware thread of the second cluster via shared hardware resources of the first hardware thread and the second hardware thread. The control unit is also configured to exchange a first identifier associated with the first hardware thread with a second identifier associated with the second hardware thread via the shared hardware resources.
    Type: Grant
    Filed: May 7, 2014
    Date of Patent: December 14, 2021
    Inventors: Suresh Kumar Venkumahanti, Stephen Robert Shannon, Lin Wang
  • Patent number: 11198621
    Abstract: A lithium-rich layered oxide material with a phase structure gradient and method for making the same are disclosed, used as cathode material for lithium ion battery. The invention has the following technical features: the spherical granule-shaped lithium-rich layered oxide material contains two types of structural units whose ratio gradually changes from the center to the surface of the spherical granule, wherein the monoclinic Li2MnO3 structural unit is gradually reduced, and the rhombohedral LiTMO2 structural unit is gradually increased from the center to the surface of the spherical granule. By controlling the ratio of the monoclinic Li2MnO3 structural unit versus the rhombohedral LiTMO2 structural unit along from the center to the surface the spherical granule, the performance of the Lithium-rich layered oxide materials as cathode for lithium ion battery, such as cyclic stability, specific discharge capacity, safety and other properties, is improved.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: December 14, 2021
    Assignee: Beijing University of Technology
    Inventors: Haijun Yu, Guangyin Li, Tianhao Wu, Errui Wang, Lin Wang, Qi Zhang
  • Patent number: 11197610
    Abstract: The present invention discloses a smart terminal and a smart wrist watch.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: December 14, 2021
    Assignee: GOERTEK INC.
    Inventors: Lin Wang, Peijie Zhao, Jianguo Zhang, Chao Yi
  • Publication number: 20210384294
    Abstract: Structures and formation methods of a semiconductor device structure are provided. The semiconductor device structure includes a semiconductor substrate and a gate stack over the semiconductor substrate. The gate stack includes a gate dielectric layer and a work function layer. The gate dielectric layer is between the semiconductor substrate and the work function layer. The semiconductor device structure also includes a halogen source layer. The gate dielectric layer is between the semiconductor substrate and the halogen source layer.
    Type: Application
    Filed: August 23, 2021
    Publication date: December 9, 2021
    Inventors: Chih-Wei Lin, Chih-Lin Wang, Kang-Min Kuo
  • Patent number: 11195994
    Abstract: A method of fabricating a semiconductor device includes the steps of: providing a semiconductor structure including a memory region and a logic region. The semiconductor structure includes a first interlayer dielectric and at least one magnetoresistive random access memory (MRAM) cell disposed on the first interlayer dielectric, and the MRAM cell is disposed in the memory region; depositing a second interlayer dielectric covering the first interlayer dielectric and the at least one MRAM cell; depositing a mask layer conformally covering the second interlayer dielectric; perform a planarization process to remove the mask layer in the memory region; after the step of performing the planarization process, removing the mask layer in the logic region.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: December 7, 2021
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Hui-Lin Wang, Po-Kai Hsu, Hung-Yueh Chen, Chen-Yi Weng, Si-Han Tsai, Jing-Yin Jhang, Yu-Ping Wang
  • Patent number: 11194243
    Abstract: Provided is a projection screen, comprising a substrate (10), a total reflection layer (20), and a light absorbing layer (30) for absorbing light rays, which are sequentially arranged from a light incident side, wherein the total reflection layer (20) is provided with a plurality of trapezoidal micro-structures extending in the vertical direction of the projection screen, and the plurality of trapezoidal micro-structures is periodically arranged in the horizontal direction of the projection screen. The projection screen has the characteristics of simple structure, easy processing, low cost and high contrast.
    Type: Grant
    Filed: January 5, 2019
    Date of Patent: December 7, 2021
    Assignee: Appotronics Corporation Limited
    Inventors: Lin Wang, Wei Sun, Fei Hu
  • Publication number: 20210377618
    Abstract: Disclosed is a video playing processing method. The method includes: receiving prompt information for playing a second video associated with a first video sent by an application server, the first video is a video being currently played, and the first video and the second video include a same video content segment; and showing the prompt information for playing the second video associated with the first video. Disclosed are also a terminal device, a server, and a storage medium.
    Type: Application
    Filed: April 8, 2019
    Publication date: December 2, 2021
    Inventors: Hao XIONG, Mengluo FENG, Peiqi WU, Dawei CHEN, Lin WANG, Jingui WANG
  • Patent number: 11188115
    Abstract: A sequence signal generator and a sequence signal generation method are provided. In the sequence signal generation method, a waveform output instruction sent by a host computer is received to acquire waveform data. The waveform data includes original square wave sequence data and target square wave sequence data, and the target square wave sequence data includes a preliminary delay parameter and a secondary delay parameter. An original square wave sequence signal is acquired according to the original square wave sequence data. According to the preliminary delay parameter, preliminary delay processing is performed on the original square wave sequence signal to acquire an intermediate square wave sequence signal, and according to the secondary delay parameter, secondary delay processing is performed on the intermediate square wave sequence signal to acquire a target square wave sequence signal.
    Type: Grant
    Filed: February 11, 2018
    Date of Patent: November 30, 2021
    Assignee: University of Science and Technology of China
    Inventors: Xi Qin, Wenzhe Zhang, Lin Wang, Yu Tong, Xing Rong, Jiangfeng Du
  • Patent number: 11186647
    Abstract: The present application provides single-domain antibodies targeting BCMA, and chimeric antigen receptors (such as monovalent CAR, and multivalent CAR including bi-epitope CAR) comprising one or more anti-BCMA single-domain antibodies. Further provided are engineered immune effector cells (such as T cells) comprising the chimeric antigen receptors. Pharmaceutical compositions, kits and methods of treating cancer are also provided.
    Type: Grant
    Filed: February 4, 2021
    Date of Patent: November 30, 2021
    Assignee: LEGEND BIOTECH USA INC.
    Inventors: Xiaohu Fan, Qiuchuan Zhuang, Pingyan Wang, Lin Wang, Lei Yang, Jiaying Hao
  • Publication number: 20210366688
    Abstract: We describe a super-resolution optical microscopy technique in which a sample is located on or adjacent to the planar surface of an aplanatic solid immersion lens and placed in a cryogenic environment.
    Type: Application
    Filed: August 5, 2021
    Publication date: November 25, 2021
    Inventor: Lin WANG
  • Patent number: 11180530
    Abstract: A salt of a phenylpropionamide derivative and a preparation method therefor is described. Specifically, the salt of the compound of formula (I) has good stability, and can be better used in clinical treatment. The process for preparing the salt of the compound of formula (I) of the present invention is simple and easy to operate.
    Type: Grant
    Filed: December 5, 2018
    Date of Patent: November 23, 2021
    Assignees: Jiangsu Hengrui Medicine CO., LTD., Shanghai Hengrui Pharmaceutical CO., LTD
    Inventors: Lin Wang, Jingquan Ye, Qiyun Shao, Jun Feng, Feng He, Xiaoli Cao, Yahui Ma
  • Patent number: D939518
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: December 28, 2021
    Assignee: Lyft, Inc.
    Inventors: Michael Shannon Potter, Michael Li Wang, Linda Dong, David Florian Kayode Ikuye, Linzi Renee Berry, Nikolas Laufer-Edel, Molly Angelica Ingles Lorenzo, Chia Hsieh, Marc Haumann, Oleg Vadim Panichev, Lin Wang, Frank Taehyun Yoo, Martin Conte Mac Donell