Patents by Inventor Masaki Shiraishi
Masaki Shiraishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8452578Abstract: A method for simulating tire noise performance using a computer includes a step S1 of setting, using a finite number of elements, a tire model having a tread model portion provided with a tread groove, a step S2 of setting a road surface model using a finite number of elements, a step S4 of carrying out a rolling simulation to roll the tire model on the road surface model at least over a groove-grounded rolling distance between which the tread groove is brought into and out of contact with the road surface model; a step S5 of acquiring a surface coordinate value of the tread model portion in a time-series manner, and a step S7 of setting a sound space region around the tread model portion using the surface coordinate value of the tread model portion and of carrying out an aerodynamic simulation using the sound space region.Type: GrantFiled: October 28, 2008Date of Patent: May 28, 2013Assignee: Sumitomo Rubber Industries, Ltd.Inventor: Masaki Shiraishi
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Publication number: 20130106388Abstract: In order to reduce parasitic inductance of a main circuit in a power supply circuit, a non-insulated DC-DC converter is provided having a circuit in which a power MOS·FET for a high-side switch and a power MOS·FET for a low-side switch are connected in series. In the non-insulated DC-DC converter, the power MOS·FET for the high-side switch is formed by a p channel vertical MOS·FET, and the power MOS·FET for the low-side switch is formed by an n channel vertical MOS·FET. Thus, a semiconductor chip formed with the power MOS·FET for the high-side switch and a semiconductor chip formed with the power MOS·FET for the low-side switch are mounted over the same die pad and electrically connected to each other through the die pad.Type: ApplicationFiled: December 27, 2012Publication date: May 2, 2013Inventors: Masaki SHIRAISHI, Noboru AKIYAMA, Tomoaki UNO, Nobuyoshi MATSUURA
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Patent number: 8422261Abstract: A semiconductor device capable of reducing an inductance is provided. In the semiconductor device in which a rectification MOSFET, a commutation MOSFET, and a driving IC that drives these MOSFETs are mounted on one package, the rectification MOSFET, a metal plate, and the commutation MOSFET are laminated. A current of a main circuit flows from a back surface of the package to a front surface thereof. The metal plate is connected to an output terminal via a wiring in the package. Wire bondings are used for wirings for connecting the driving IC, the rectification MOSFET, and the commutation MOSFET, all terminals being placed on the same plane. For this reason, the inductance becomes small and also a power source loss and a spike voltage are reduced.Type: GrantFiled: July 13, 2012Date of Patent: April 16, 2013Assignee: Renesas Electronics CorporationInventors: Takayuki Hashimoto, Nobuyoshi Matsuura, Masaki Shiraishi, Yukihiro Satou, Tetsuya Kawashima
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Publication number: 20130020634Abstract: A semiconductor device includes: a first semiconductor layer of a first conductivity type; a second semiconductor layer of a second conductivity type on the first semiconductor layer; trenches in the first semiconductor layer; a semiconductor protruding part on the first semiconductor layer; a third semiconductor layer on the semiconductor protruding part; a fourth semiconductor layer on the third semiconductor layer; a gate insulating layer disposed along the trench; a first interlayer insulating layer disposed along the trench; a first conductive layer facing to the fourth semiconductor layer; a second conductive layer on the first interlayer insulating layer; a second interlayer insulating layer covering the second conductive layer; a third conductive layer on the third semiconductor layer and fourth semiconductor layer; a contacting part connecting the third conductive layer and third semiconductor layer; and a fourth conductive layer formed on the second semiconductor layer.Type: ApplicationFiled: July 19, 2012Publication date: January 24, 2013Applicant: Hitachi, Ltd.Inventors: So WATANABE, Masaki Shiraishi, Hiroshi Suzuki, Mutsuhiro Mori
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Patent number: 8350372Abstract: The present invention provides a non-insulated type DC-DC converter having a circuit in which a power MOS•FET for a high side switch and a power MOS•FET for a low side switch are connected in series. In the non-insulated type DC-DC converter, the power transistor for the high side switch, the power transistor for the low side switch, and driver circuits that drive these are respectively constituted by different semiconductor chips. The three semiconductor chips are accommodated in one package, and the semiconductor chip including the power transistor for the high side switch, and the semiconductor chip including the driver circuits are disposed so as to approach each other.Type: GrantFiled: February 13, 2012Date of Patent: January 8, 2013Assignee: Renesas Electronics CorporationInventors: Yukihiro Satou, Tomoaki Uno, Nobuyoshi Matsuura, Masaki Shiraishi
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Patent number: 8344459Abstract: The present invention enhances voltage conversion efficiency of a semiconductor device. In a non-isolated DC-DC converter that includes a high-side switch power MOSFET and a low-side switch power MOSFET, which are series-connected, the high-side switch power MOSFET and driver circuits for driving the high-side and low-side switch power MOSFETs are formed within one semiconductor chip, whereas the low-side switch power MOSFET is formed in another semiconductor chip. The two semiconductor chips are sealed in a single package.Type: GrantFiled: June 2, 2011Date of Patent: January 1, 2013Assignee: Renesas Electronics CorporationInventors: Tomoaki Uno, Masaki Shiraishi, Nobuyoshi Matsuura, Yukihiro Satou
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Patent number: 8345458Abstract: In order to reduce parasitic inductance of a main circuit in a power supply circuit, a non-insulated DC-DC converter is provided having a circuit in which a power MOS•FET for a high-side switch and a power MOS•FET for a low-side switch are connected in series. In the non-insulated DC-DC converter, the power MOS•FET for the high-side switch is formed by a p channel vertical MOS•FET, and the power MOS•FET for the low-side switch is formed by an n channel vertical MOS•FET. Thus, a semiconductor chip formed with the power MOS•FET for the high-side switch and a semiconductor chip formed with the power MOS•FET for the low-side switch are mounted over the same die pad and electrically connected to each other through the die pad.Type: GrantFiled: November 10, 2011Date of Patent: January 1, 2013Assignee: Renesas Electronics CorporationInventors: Masaki Shiraishi, Noboru Akiyama, Tomoaki Uno, Nobuyoshi Matsuura
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Publication number: 20120306020Abstract: In a non-insulated DC-DC converter having a circuit in which a power MOS•FET high-side switch and a power MOS•FET low-side switch are connected in series, the power MOS•FET low-side switch and a Schottky barrier diode to be connected in parallel with the power MOS•FET low-side switch are formed within one semiconductor chip. The formation region SDR of the Schottky barrier diode is disposed in the center in the shorter direction of the semiconductor chip, and on both sides thereof, the formation regions of the power MOS•FET low-side switch are disposed. From the gate finger in the vicinity of both long sides on the main surface of the semiconductor chip toward the formation region SDR of the Schottky barrier diode, a plurality of gate fingers are disposed so as to interpose the formation region SDR between them.Type: ApplicationFiled: August 17, 2012Publication date: December 6, 2012Applicant: RENESAS ELECTRONICS CORPORATIONInventors: Masaki SHIRAISHI, Tomoaki UNO, Nobuyoshi MATSUURA
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Patent number: 8319289Abstract: A technique for suppressing lowering of withstand voltage and lowering of breakdown resistance and reducing a feedback capacitance of a power MISFET is provided. A lateral power MISFET that comprises a trench region whose insulating layer is formed shallower than an HV-Nwell layer is provided in the HV-Nwell layer (drift region) formed on a main surface of a semiconductor substrate in a direction from the main surface to the inside. The lateral power MISFET has an arrangement on a plane of the main surface including a source layer (source region) and a drain layer (drain region) arranged at opposite sides to each other across a gate electrode (first conducting layer), and a dummy gate electrode (second conducting layer) that is different from the gate electrode is arranged between the gate electrode and the drain layer.Type: GrantFiled: December 27, 2007Date of Patent: November 27, 2012Assignee: Renesas Electronics CorporationInventors: Masaki Shiraishi, Noboru Akiyama, Takayuki Hashimoto
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Publication number: 20120273893Abstract: A semiconductor device capable of reducing an inductance is provided. In the semiconductor device in which a rectification MOSFET, a commutation MOSFET, and a driving IC that drives these MOSFETs are mounted on one package, the rectification MOSFET, a metal plate, and the commutation MOSFET are laminated. A current of a main circuit flows from a back surface of the package to a front surface thereof. The metal plate is connected to an output terminal via a wiring in the package. Wire bondings are used for wirings for connecting the driving IC, the rectification MOSFET, and the commutation MOSFET, all terminals being placed on the same plane. For this reason, the inductance becomes small and also a power source loss and a spike voltage are reduced.Type: ApplicationFiled: July 13, 2012Publication date: November 1, 2012Inventors: Takayuki Hashimoto, Nobuyoshi Matsuura, Masaki Shiraishi, Yukihiro Satou, Tetsuya Kawashima
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Publication number: 20120273897Abstract: The trench IGBT is provided with a plurality of trench gates disposed in a manner so as to form wide and narrow of gaps; has a MOS structure that has a channel of a first conductivity type and that is between the trench gate pair that is disposed with a narrow gap therebetween; and is provided with a floating semiconductor layer of the first conductivity type and that is separated from the trench gates by interposing a portion of a third semiconductor layer of a second conductivity type between the trench gate pair that is disposed with a wide gap therebetween. Also, this floating semiconductor layer is disposed parallel to and at a position corresponding to an emitter electrode and a first semiconductor layer having the same electric potential, with a insulating film therebetween.Type: ApplicationFiled: January 4, 2010Publication date: November 1, 2012Applicant: Hitachi, Ltd.Inventors: Masaki Shiraishi, Mutsuhiro Mori, Hiroshi Suzuki, So Watanabe
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Patent number: 8237493Abstract: A semiconductor device capable of reducing an inductance is provided. In the semiconductor device in which a rectification MOSFET, a commutation MOSFET, and a driving IC that drives these MOSFETs are mounted on one package, the rectification MOSFET, a metal plate, and the commutation MOSFET are laminated. A current of a main circuit flows from a back surface of the package to a front surface thereof. The metal plate is connected to an output terminal via a wiring in the package. Wire bondings are used for wirings for connecting the driving IC, the rectification MOSFET, and the commutation MOSFET, all terminals being placed on the same plane. For this reason, the inductance becomes small and also a power source loss and a spike voltage are reduced.Type: GrantFiled: September 23, 2011Date of Patent: August 7, 2012Assignee: Renesas Electronics CorporationInventors: Takayuki Hashimoto, Nobuyoshi Matsuura, Masaki Shiraishi, Yukihiro Satou, Tetsuya Kawashima
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Publication number: 20120176828Abstract: A semiconductor device includes first semiconductor layer of a first conductivity type; a second semiconductor layer of a second conductivity type that is formed near a surface of the first semiconductor layer; a first main electrode that is electrically connected to the second semiconductor layer; a third semiconductor layer of the second conductivity type that neighbors the first semiconductor layer; a fourth semiconductor layer of the first conductivity type that is selectively disposed in an upper portion of the third semiconductor layer; a second main electrode that is electrically connected to the third semiconductor layer and the fourth semiconductor layer; a trench whose side face is in contact with the third semiconductor layer and the fourth semiconductor layer; a gate electrode that is formed along the side face of the trench by a sidewall of polysilicon; and a polysilicon electrode.Type: ApplicationFiled: January 11, 2012Publication date: July 12, 2012Applicant: Hitachi, Ltd.Inventors: Masaki Shiraishi, Mutsuhiro Mori, Hiroshi Suzuki, So Watanabe
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Patent number: 8207558Abstract: A semiconductor device in which the self-turn-on phenomenon is prevented that can significantly improve power conversion efficiency. The semiconductor device is a system-in-package for power supply applications in which a high-side switch, a low-side switch, and two drivers are included in a single package. The device includes an auxiliary switch disposed between the gate and source of said low-side switch, and a low-side MOSFET 3 for the low-side switch and an auxiliary MOSFET 4 for the auxiliary switch are disposed on the same chip. In this way, the self-turn-on phenomenon can be prevented, allowing the mounting of a low-side MOSFET 3 with a low threshold voltage and thereby significantly improving power conversion efficiency. The gate of the auxiliary MOSFET 4 is driven by the driver for the high-side MOSFET 2, thereby eliminating the need for a new drive circuit and realizing the same pin configuration as existing products, which facilitates easy replacement.Type: GrantFiled: March 17, 2009Date of Patent: June 26, 2012Assignee: Renesas Electronics CorporationInventors: Masaki Shiraishi, Takayuki Iwasaki, Nobuyoshi Matsuura
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Publication number: 20120146211Abstract: In a non-insulated DC-DC converter having a circuit in which a power MOS•FET high-side switch and a power MOS•FET low-side switch are connected in series, the power MOS•FET low-side switch and a Schottky barrier diode to be connected in parallel with the power MOS•FET low-side switch are formed within one semiconductor chip. The formation region SDR of the Schottky barrier diode is disposed in the center in the shorter direction of the semiconductor chip, and on both sides thereof, the formation regions of the power MOS•FET low-side switch are disposed. From the gate finger in the vicinity of both long sides on the main surface of the semiconductor chip toward the formation region SDR of the Schottky barrier diode, a plurality of gate fingers are disposed so as to interpose the formation region SDR between them.Type: ApplicationFiled: February 14, 2012Publication date: June 14, 2012Applicant: RENESAS ELECTRONICS CORPORATIONInventors: Masaki SHIRAISHI, Tomoaki UNO, Nobuyoshi MATSUURA
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Patent number: 8200463Abstract: A method of simulating a tire rolling on a road at a certain speed by using a computer apparatus 1 comprises the steps of: modeling a flexible tire model 2 for numerical calculation by using finite elements having at least one elastic element (step S1), changing at least one elastic element of the flexible tire model 2 to rigid elements so as to make a rigid tire model 5 (step S6), accelerating the rigid tire model 5 (step S7), returning the elasticity of each element of the rigid tire model 5 into the original elasticity when the speed of the rigid tire model 5 has reached the certain speed (step S8), and obtaining at least one physical parameter related to the flexible tire model 2 (step S10).Type: GrantFiled: June 12, 2009Date of Patent: June 12, 2012Assignee: Sumitomo Rubber Industries, LTD.Inventors: Kenji Ueda, Masaki Shiraishi
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Publication number: 20120139130Abstract: The present invention provides a non-insulated type DC-DC converter having a circuit in which a power MOS•FET for a high side switch and a power MOS•FET for a low side switch are connected in series. In the non-insulated type DC-DC converter, the power transistor for the high side switch, the power transistor for the low side switch, and driver circuits that drive these are respectively constituted by different semiconductor chips. The three semiconductor chips are accommodated in one package, and the semiconductor chip including the power transistor for the high side switch, and the semiconductor chip including the driver circuits are disposed so as to approach each other.Type: ApplicationFiled: February 13, 2012Publication date: June 7, 2012Inventors: Yukihiro Satou, Tomoaki Uno, Nobuyoshi Matsuura, Masaki Shiraishi
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Patent number: 8159054Abstract: The present invention provides a non-insulated type DC-DC converter having a circuit in which a power MOS?FET for a high side switch and a power MOS?FET for a low side switch are connected in series. In the non-insulated type DC-DC converter, the power transistor for the high side switch, the power transistor for the low side switch, and driver circuits that drive these are respectively constituted by different semiconductor chips. The three semiconductor chips are accommodated in one package, and the semiconductor chip including the power transistor for the high side switch, and the semiconductor chip including the driver circuits are disposed so as to approach each other.Type: GrantFiled: July 22, 2011Date of Patent: April 17, 2012Assignee: Renesas Electronics CorporationInventors: Yukihiro Satou, Tomoaki Uno, Nobuyoshi Matsuura, Masaki Shiraishi
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Patent number: 8138598Abstract: In a non-insulated DC-DC converter having a circuit in which a power MOS•FET high-side switch and a power MOS•FET low-side switch are connected in series, the power MOS•FET low-side switch and a Schottky barrier diode to be connected in parallel with the power MOS•FET low-side switch are formed within one semiconductor chip. The formation region SDR of the Schottky barrier diode is disposed in the center in the shorter direction of the semiconductor chip, and on both sides thereof, the formation regions of the power MOS•FET low-side switch are disposed. From the gate finger in the vicinity of both long sides on the main surface of the semiconductor chip toward the formation region SDR of the Schottky barrier diode, a plurality of gate fingers are disposed so as to interpose the formation region SDR between them.Type: GrantFiled: January 13, 2010Date of Patent: March 20, 2012Assignee: Renesas Electronics CorporationInventors: Masaki Shiraishi, Tomoaki Uno, Nobuyoshi Matsuura
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Publication number: 20120049337Abstract: A non-insulated DC-DC converter has a power MOSFET for a highside switch and a power MOS•ET for a lowside switch. In the non-insulated DC-DC converter, the power MOS•ET for the highside switch and the power MOS•ET for the lowside switch, driver circuits that control operations of these elements, respectively, and a Schottky barrier diode connected in parallel with the power MOS•ET for the lowside switch are respectively formed in four different semiconductor chips. These four semiconductor chips are housed in one package. The semiconductor chips are mounted over the same die pad. The semiconductor chips are disposed so as to approach each other.Type: ApplicationFiled: November 10, 2011Publication date: March 1, 2012Inventors: Tomoaki UNO, Masaki Shiraishi, Nobuyoshi Matsuura, Toshio Nagasawa