Patents by Inventor Michael RIZZOLO

Michael RIZZOLO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170256494
    Abstract: A method of forming an interconnect with a bamboo grain microstructure. The method includes forming a conductive filler layer in a trench of an insulating layer to a predetermined depth such that an aspect ratio of a top portion of the trench is reduced to a threshold level, depositing a metal layer over the conductive filler layer in the top portion of the trench, the metal layer having a plurality of small grains, and annealing the metal layer to provide a bamboo grain microstructure having larger grains than grain boundaries of the plurality of small grains.
    Type: Application
    Filed: March 4, 2016
    Publication date: September 7, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Chih-Chao Yang
  • Publication number: 20170256495
    Abstract: A method of forming an interconnect with a bamboo grain microstructure. The method includes forming a conductive filler layer in a trench of an insulating layer to a predetermined depth such that an aspect ratio of a top portion of the trench is reduced to a threshold level, depositing a metal layer over the conductive filler layer in the top potion of the trench, the metal layer having a plurality of small grains, and annealing the metal layer to provide a bamboo grain microstructure having larger grains than grain boundaries of the plurality of small grains.
    Type: Application
    Filed: August 24, 2016
    Publication date: September 7, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Chih-Chao Yang
  • Patent number: 9754883
    Abstract: A method of forming an interconnect with a bamboo grain microstructure. The method includes forming a conductive filler layer in a trench of an insulating layer to a predetermined depth such that an aspect ratio of a top portion of the trench is reduced to a threshold level, depositing a metal layer over the conductive filler layer in the top portion of the trench, the metal layer having a plurality of small grains, and annealing the metal layer to provide a bamboo grain microstructure having larger grains than grain boundaries of the plurality of small grains.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: September 5, 2017
    Assignee: International Business Machines Corporation
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Chih-Chao Yang
  • Patent number: 9754891
    Abstract: Low-temperature techniques for doping of Cu interconnects based on interfacially-assisted thermal diffusion are provided. In one aspect, a method of forming doped copper interconnects includes the steps of: patterning at least one trench in a dielectric material; forming a barrier layer lining the trench; forming a metal liner on the barrier layer; depositing a seed layer on the metal liner; plating a Cu fill into the trench to form Cu interconnects; removing a portion of a Cu overburden to access an interface between the metal liner and the Cu fill; depositing a dopant layer; and diffusing a dopant(s) from the dopant layer along the interface to form a Cu interconnect doping layer between the metal liner and the Cu fill. Alternatively, the overburden and the barrier layer/metal liner can be completely removed, and the dopant layer deposited selectively on the Cu fill. An interconnect structure is also provided.
    Type: Grant
    Filed: September 23, 2015
    Date of Patent: September 5, 2017
    Assignee: International Business Machines Corporation
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Chao-Kun Hu, Takeshi Nogami, Deepika Priyadarshini, Michael Rizzolo
  • Patent number: 9754885
    Abstract: A method of forming an interconnect with a bamboo grain microstructure. The method includes forming a conductive filler layer in a trench of an insulating layer to a predetermined depth such that an aspect ratio of a top portion of the trench is reduced to a threshold level, depositing a metal layer over the conductive filler layer in the top potion of the trench, the metal layer having a plurality of small grains, and annealing the metal layer to provide a bamboo grain microstructure having larger grains than grain boundaries of the plurality of small grains.
    Type: Grant
    Filed: August 24, 2016
    Date of Patent: September 5, 2017
    Assignee: International Business Machines Corporation
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Chih-Chao Yang
  • Publication number: 20170249506
    Abstract: An anti-counterfeiting method, system, and non-transitory computer readable medium an anti-counterfeiting system, include a production circuit configured to produce a Directed Self-Assembly (DSA) pattern including a unique pattern, an analysis circuit configured to analyze the unique pattern, an embedding circuit configured to embed the unique pattern on a document, and a verification circuit configured to verify that the unique pattern embedded on the document corresponds to the document.
    Type: Application
    Filed: February 29, 2016
    Publication date: August 31, 2017
    Inventors: Benjamin David Briggs, Lawrence A. Clevengen, Bartlet H. DeProspo, Michael Rizzolo
  • Publication number: 20170236749
    Abstract: A method for forming a conductor includes forming trenches in an insulator layer. An alloy layer is deposited in the trenches. The alloy layer includes a conductor material and a barrier material. The alloy layer is annealed to form a barrier layer on the insulator layer and to purify the alloy layer into a conductor layer, such that the barrier material in the alloy layer is driven to an interface between the alloy layer and the insulator layer.
    Type: Application
    Filed: February 17, 2016
    Publication date: August 17, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Takeshi Nogami, Michael Rizzolo
  • Publication number: 20170236781
    Abstract: An interconnect for a semiconductor device includes an insulator layer having a trench. A barrier layer is formed on a surface of the insulator layer in the trench. An elemental cobalt conductor is formed on the barrier layer.
    Type: Application
    Filed: March 31, 2017
    Publication date: August 17, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Takeshi Nogami, Michael Rizzolo
  • Publication number: 20170236756
    Abstract: A method for providing a uniform recess depth between different fin gap sizes includes depositing a dielectric material between fins on a substrate. Etch lag is tuned for etching the dielectric material between narrow gaps faster than the dielectric material between wider gaps such that the dielectric material in the narrow gaps reaches a target depth. An etch block is formed in the narrow gaps. The wider gaps are etched to the target depth. The etch block is removed.
    Type: Application
    Filed: May 1, 2017
    Publication date: August 17, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Jay W. Strane
  • Publication number: 20170236717
    Abstract: A method for providing a uniform recess depth between different fin gap sizes includes depositing a dielectric material between fins on a substrate. Etch lag is tuned for etching the dielectric material between narrow gaps faster than the dielectric material between wider gaps such that the dielectric material in the narrow gaps reaches a target depth. An etch block is formed in die narrow gaps. The wider gaps are etched to the target depth. The etch block is removed.
    Type: Application
    Filed: May 1, 2017
    Publication date: August 17, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Jay W. Strane
  • Publication number: 20170220915
    Abstract: An aspect of the disclosure includes a security system and method having a key with nanoscale features. The key includes a body. At least one pattern member disposed on the body, the pattern member formed using a directed self-assembly polymer to define a pattern of random feature structures thereon, the feature structures having a width of less than 100 nanometers.
    Type: Application
    Filed: July 18, 2016
    Publication date: August 3, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Michael Rizzolo
  • Publication number: 20170221285
    Abstract: An aspect of the disclosure includes a security system and method having a key with nanoscale features. The key includes a body. At least one pattern member disposed on the body, the pattern member formed using a directed self-assembly polymer to define a pattern of random feature structures thereon, the feature structures having a width of less than 100 nanometers.
    Type: Application
    Filed: May 25, 2016
    Publication date: August 3, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Michael Rizzolo
  • Publication number: 20170213470
    Abstract: Techniques for motivating a user during a workout using different coaching styles are provided. In one aspect, a method for motivational coaching of a user during workout sessions includes the steps of: selecting a coaching style for the user based on input from the user and from coaching styles used for at least one other user; determining, during a workout session, whether the coaching style should be changed to enhance performance of the user based on data obtained from the user via a mobile device worn by the user; changing the coaching style if it is determined that the coaching style should be changed to enhance performance of the user; continuing with a current coaching style if it is determined that the coaching style should not be changed; and providing feedback to the user during the workout session based on the coaching style.
    Type: Application
    Filed: January 27, 2016
    Publication date: July 27, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Jonathan H. Connell, II, Nalini K. Ratha, Michael Rizzolo
  • Publication number: 20170210288
    Abstract: Techniques are provided for alerting drivers of hazardous driving conditions using the sensing capabilities of wearable mobile technology. In one aspect, a method for alerting drivers of hazardous driving conditions includes the steps of: collecting real-time data from a driver of a vehicle, wherein the data is collected via a mobile device worn by the driver; determining whether the real-time data indicates that a hazardous driving condition exists; providing feedback to the driver if the real-time data indicates that a hazardous driving condition exists, and continuing to collect data from the driver in real-time if the real-time data indicates that a hazardous driving condition does not exist. The real-time data may also be collected and used to learn characteristics of the driver. These characteristics can be compared with the data being collected to help determine, in real-time, whether the driving behavior is normal and whether a hazardous driving condition exists.
    Type: Application
    Filed: January 25, 2016
    Publication date: July 27, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Jonathan H. Connell, II, Nalini K. Ratha, Michael Rizzolo
  • Publication number: 20170169727
    Abstract: Techniques for leveraging the capabilities of wearable mobile technology to collect data and to provide real-time feedback to an orator about his/her performance and/or audience interaction are provided. In one aspect, a method for providing real-time feedback to a speaker making a presentation to an audience includes the steps of: collecting real-time data from the speaker during the presentation, wherein the data is collected via a mobile device worn by the speaker; analyzing the real-time data collected from the speaker to determine whether corrective action is needed to improve performance; and generating a real-time alert to the speaker suggesting the corrective action if the real-time data indicates that corrective action is needed to improve performance, otherwise continuing to collect data from the speaker in real-time. Real-time data may also be collected from members of the audience and/or from other speakers (if present) via wearable mobile devices.
    Type: Application
    Filed: December 10, 2015
    Publication date: June 15, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Jonathan H. Connell, II, Nalini K. Ratha, Michael Rizzolo
  • Patent number: 9666474
    Abstract: A method for providing a uniform recess depth between different fin gap sizes includes depositing a dielectric material between fins on a substrate. Etch lag is tuned for etching the dielectric material between narrow gaps faster than the dielectric material between wider gaps such that the dielectric material in the narrow gaps reaches a target depth. An etch block is formed in the narrow gaps. The wider gaps are etched to the target depth. The etch block is removed.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: May 30, 2017
    Assignee: International Business Machines Corporation
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Jay W. Strane
  • Publication number: 20170140629
    Abstract: The present invention provides techniques for leveraging the sensing capabilities of wearable mobile technology, such as a smartwatch, to provide real-time harm prevention. In one aspect of the invention, a method for harm prevention is provided. The method includes the steps of: collecting real-time data from at least one user, wherein the data is collected via a mobile device worn by the user (e.g., a smartwatch); analyzing the real-time data collected from the user to determine whether the real-time data indicates an emergency situation exists; and undertaking an appropriate action if the real-time data indicates that an emergency situation exists, otherwise continuing to collect data from the user in real-time. Third party data relating to potential source of harm to the user may also be obtained (e.g., from a weather service, newsfeeds, etc.
    Type: Application
    Filed: November 18, 2015
    Publication date: May 18, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Jonathan H. Connell, II, Nalini K. Ratha, Michael Rizzolo
  • Publication number: 20170134832
    Abstract: Techniques for modifying user behavior and screening for impairment using a mobile feedback controller, such as a smartwatch, are provided. In one aspect, a method for monitoring a user includes the steps of: collecting real-time data from the user, wherein the data is collected via a mobile feedback controller worn by the user; determining whether the data collected from the user indicates impairment; determining appropriate corrective actions to be taken if the data collected from the user indicates impairment, otherwise continuing to collect data from the user in real-time; determining whether any action is needed; and undertaking the appropriate corrective actions if action is needed, otherwise continuing to collect data from the user in real-time.
    Type: Application
    Filed: November 6, 2015
    Publication date: May 11, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Jonathan H. Connell, II, Nalini K. Ratha, Michael Rizzolo
  • Publication number: 20170125286
    Abstract: A method for providing a uniform recess depth between different fin gap sizes includes depositing a dielectric material between fins on a substrate. Etch lag is tuned for etching the dielectric material between narrow gaps faster than the dielectric material between wider gaps such that the dielectric material in the narrow gaps reaches a target depth. An etch block is formed in the narrow gaps. The wider gaps are etched to the target depth. The etch block is removed.
    Type: Application
    Filed: October 30, 2015
    Publication date: May 4, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Jay W. Strane
  • Publication number: 20170125302
    Abstract: A method for providing a uniform recess depth between different fin gap sizes includes depositing a dielectric material between fins on a substrate. Etch lag is tuned for etching the dielectric material between narrow gaps faster than the dielectric material between wider gaps such that the dielectric material in the narrow gaps reaches a target depth. An etch block is formed in the narrow gaps. The wider gaps are etched to the target depth. The etch block is removed.
    Type: Application
    Filed: January 6, 2017
    Publication date: May 4, 2017
    Inventors: Benjamin D. Briggs, Lawrence A. Clevenger, Michael Rizzolo, Jay W. Strane