Patents by Inventor Min Song

Min Song has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11744126
    Abstract: A display device may include a display panel including a display area, a non-display area which may be disposed on a periphery of the display area, and a pad area which may be disposed on one side of the non-display area. The display panel may include data lines disposed in the display area of the display panel along a second direction which intersects a first direction, and connection lines disposed in the display area of the display panel along the first direction. A first data line among the data lines may be connected to a first connection line among the connection lines.
    Type: Grant
    Filed: April 22, 2022
    Date of Patent: August 29, 2023
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Seung Hwan Cho, Jong Hyun Choi, Ju Chan Park, Seung Min Song, Min Seong Yi
  • Publication number: 20230268435
    Abstract: A semiconductor structure and a method for forming a semiconductor structure are provided. The semiconductor structure includes a substrate; a gate electrode disposed within the substrate; a gate dielectric layer disposed within the substrate and surrounding the gate electrode; a plurality of first protection structures disposed over the gate electrode; a second protection structure disposed over the gate dielectric layer and contacting the gate dielectric layer; and a pair of source/drain regions on opposing sides of the gate dielectric layer.
    Type: Application
    Filed: April 28, 2023
    Publication date: August 24, 2023
    Inventors: YI-HUAN CHEN, CHIEN-CHIH CHOU, SZU-HSIEN LIU, KONG-BENG THEI, HUAN-CHIH YUAN, JHU-MIN SONG
  • Patent number: 11735629
    Abstract: Semiconductor devices are provided. A semiconductor device includes a substrate and a gate structure on the substrate. The semiconductor device includes a channel on the substrate. The semiconductor device includes a source/drain layer on the channel. Moreover, the semiconductor device includes a spacer on a sidewall of the gate structure. The spacer includes a central portion overlapping the channel in a vertical direction, and a protrusion portion protruding from the central portion. Related methods of manufacturing semiconductor devices are also provided.
    Type: Grant
    Filed: December 3, 2021
    Date of Patent: August 22, 2023
    Inventors: Seung-Min Song, Woo-Seok Park, Jung-Gil Yang, Geum-Jong Bae, Dong-Il Bae
  • Patent number: 11736046
    Abstract: Disclosed is a motor control apparatus including an inverter part configured to convert DC power into AC power and provide the AC power to a motor, and a controller configured to control driving of the motor by using the inverter part, the controller configured to identify a stop position of a rotor in previous driving of the motor, and control the inverter part to apply an input signal of a specific pattern to the motor according to a start of driving the motor, wherein a phase of the input signal of the specific pattern is determined on the basis of the stop position of the rotor. Other example embodiments may be provided.
    Type: Grant
    Filed: December 30, 2021
    Date of Patent: August 22, 2023
    Assignee: LG ELECTRONICS INC.
    Inventors: Ki Wook Lee, Ha Min Song, Kwang Sik Kim
  • Publication number: 20230260994
    Abstract: Some embodiments relate to an integrated chip structure. The integrated chip structure includes a substrate having a first device region and a second device region. A plurality of first transistor devices are disposed in the first device region and respectively include epitaxial source/drain regions disposed on opposing sides of a first gate structure. The epitaxial source/drain regions have an epitaxial material. A plurality of second transistor devices are disposed in the second device region and respectively include implanted source/drain regions disposed on opposing sides of a second gate structure. A dummy region includes one or more dummy structures. The one or more dummy structures have dummy epitaxial regions including the epitaxial material.
    Type: Application
    Filed: February 17, 2022
    Publication date: August 17, 2023
    Inventors: Yu-Chang Jong, Yi-Huan Chen, Chien-Chih Chou, Tsung-Chieh Tsai, Szu-Hsien Liu, Huan-Chih Yuan, Jhu-Min Song
  • Publication number: 20230246030
    Abstract: A semiconductor structure and forming method thereof are provided. A substrate includes a first region, a second region, and a boundary region defined between the first region and the second region. An isolation structure is disposed in the boundary region. An upper surface of the isolation structure has a stepped profile. A first boundary dielectric layer and a second boundary dielectric layer are disposed over the isolation structure. The first boundary dielectric layer is substantially conformal with respect to the stepped profile of the isolation structure.
    Type: Application
    Filed: January 28, 2022
    Publication date: August 3, 2023
    Inventors: HUNG-SHU HUANG, JHIH-BIN CHEN, MING CHYI LIU, YU-CHANG JONG, CHIEN-CHIH CHOU, JHU-MIN SONG, YI-KAI CIOU, TSUNG-CHIEH TSAI, YU-LUN LU
  • Publication number: 20230238383
    Abstract: A semiconductor device includes a first transistor in a first region of a substrate and a second transistor in a second region of the substrate. The first transistor includes multiple first semiconductor patterns; a first gate electrode; a first gate dielectric layer; a first source/drain region; and an inner-insulating spacer. The second transistor includes multiple second semiconductor patterns; a second gate electrode; a second gate dielectric layer; and a second source/drain region. The second gate dielectric layer extends between the second gate electrode and the second source/drain region and is in contact with the second source/drain region. The first source/drain region is not in contact with the first gate dielectric layer.
    Type: Application
    Filed: April 3, 2023
    Publication date: July 27, 2023
    Inventors: JUNG-GIL YANG, GEUM-JONG BAE, DONG-IL BAE, SEUNG-MIN SONG, WOO-SEOK PARK
  • Patent number: 11710770
    Abstract: A semiconductor device includes a substrate having a first region and a second region, first and second nanowires disposed sequentially on the substrate in the first region, and extending respectively in a first direction, third and fourth nanowires disposed sequentially on the substrate in the second region, and extending respectively in the first direction, a first inner spacer between the first nanowire and the second nanowire, and including hydrogen of a first hydrogen mole fraction, and a second inner spacer between the third nanowire and the fourth nanowire, and including hydrogen of a second hydrogen mole fraction that is greater than the first hydrogen mole fraction.
    Type: Grant
    Filed: January 14, 2022
    Date of Patent: July 25, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Woo Cheol Shin, Sun Wook Kim, Seung Min Song, Nam Hyun Lee
  • Patent number: 11710712
    Abstract: A semiconductor device and a method for forming a semiconductor are provided. The semiconductor device includes: a first substrate, a first conductive line disposed on the first substrate, a second substrate opposite to the first substrate, a second conductive line disposed on the second substrate and adjacent to the first conductive line, and a plurality of bonding structures between the first conductive line and the second conductive line. The first conductive line includes a plurality of first segments separated from one another. The second conductive line includes a plurality of second segments separated from one another. Each of the bonding structures is connected to a respective first segment of the plurality of first segments and a respective second segment of the plurality of second segments such that the plurality of first segments, the plurality of bonding structures and the plurality of second segments are connected in series.
    Type: Grant
    Filed: January 5, 2021
    Date of Patent: July 25, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Jhu-Min Song, Fu-Jier Fan, Kong-Beng Thei, Alexander Kalnitsky, Hsiao-Chin Tuan
  • Patent number: 11703253
    Abstract: A water heating apparatus includes a sensor to detect an inflow water amount flowing into the water heating apparatus, and a controller to determine connection or disconnection between the water heating apparatus and a water storage tank, based on the inflow water amount flowing into the water heating apparatus for a preset time duration. Thus, the water heating apparatus determines whether or not the water storage tank is connected thereto based on the amount of inflow water introduced into the water heating apparatus. Then, the water heating apparatus determines the operation mode of the water heating apparatus based on the determination result. Thus, even when the user incorrectly sets the operation mode of the water heating apparatus, the water heating apparatus may actively and correctly operate.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: July 18, 2023
    Inventors: Chang Heoi Heo, Yong Min Song, Nam Soo Do
  • Patent number: 11699728
    Abstract: A semiconductor device including a fin field effect transistor (fin-FET) includes active fins disposed on a substrate, isolation layers on both sides of the active fins, a gate structure formed to cross the active fins and the isolation layers, source/drain regions on the active fins on sidewalls of the gate structure, a first interlayer insulating layer on the isolation layers in contact with portions of the sidewalls of the gate structure and portions of surfaces of the source/drain regions, an etch stop layer configured to overlap the first interlayer insulating layer, the sidewalls of the gate structure, and the source/drain regions, and contact plugs formed to pass through the etch stop layer to contact the source/drain regions. The source/drain regions have main growth portions in contact with upper surfaces of the active fins.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: July 11, 2023
    Inventors: Chang Woo Noh, Seung Min Song, Geum Jong Bae, Dong Il Bae
  • Publication number: 20230213694
    Abstract: The present disclosure provides a sunroof system for a vehicle including glass slidably insertable into a vehicle body of the vehicle, and a passive radiant cooling layer disposed below the glass and slidably insertable into the vehicle body. The passive radiant cooling layer includes at least two layers among a first emission layer having a high emissivity in a first band relative to a band outside the first band, a second emission layer having a high emissivity in a second band, which is included in the first band and narrower than the first band, relative to a band outside the second band, and a reflection layer having a high reflectivity in a third band, which is a shorter wavelength than the first band, relative to a band outside the third band.
    Type: Application
    Filed: March 10, 2023
    Publication date: July 6, 2023
    Applicants: FOEL INC., GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Young Min SONG, Do Hyeon KIM, Gil Ju LEE, Se-Yeon HEO, Jong Heon LEE
  • Publication number: 20230209710
    Abstract: Provided are a printed circuit board and a method for manufacturing the same, the printed circuit board including: an insulating member; a first pad disposed in the insulating member; a plurality of first vias respectively disposed on a lower side of the first pad in the insulating member and connected to the first pad; and a second via disposed on an upper side of the first pad in the insulating member and connected to the first pad.
    Type: Application
    Filed: June 28, 2022
    Publication date: June 29, 2023
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventor: Su Min SONG
  • Publication number: 20230207771
    Abstract: The present disclosure relates to a method for manufacturing a positive electrode for a lithium-sulfur battery including: (1) mixing a sulfur-carbon composite and a binder to prepare a slurry for a positive electrode active material; (2) applying the slurry for the positive electrode active material to one surface of the current collector; (3) a first drying step of drying the current collector, to which the slurry is applied, using hot air and medium wave infrared radiation; and (4) a second drying step of drying the current collector, to which the slurry is applied, using a laser heat source after the first drying step (3).
    Type: Application
    Filed: November 17, 2021
    Publication date: June 29, 2023
    Inventors: Hobeom KWACK, Yun Kyoung KIM, Hyun Min SONG, Yoon Hyun KIM, Jeong Won KIM, Dongseok SHIN
  • Patent number: 11679137
    Abstract: The present invention relates to Myoviridae bacteriophage Vib-PAP-4(Accession No. KCTC 13168BP), isolated from nature, which possesses ability to specifically kill Vibrio parahaemolyticus bacteria and has the genome represented by SEQ ID No: 1, and a method for preventing infection of Vibrio parahaemolyticus bacteria and treating infection of Vibrio parahaemolyticus baceteria, using a composition containing the bacteriophage as an effective ingredient.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: June 20, 2023
    Assignee: Intron Biotechnology, Inc.
    Inventors: Seong Jun Yoon, Soo Youn Jun, An Sung Kwon, Hyun Min Song, Soon Hye Hwang, Sang Hyeon Kang
  • Patent number: 11679138
    Abstract: The present invention relates to a Myoviridae bacteriophage Vib-PAP-7 (Accession number: KCTC 13247BP) isolated from nature, which has the ability to kill Vibrio parahaemolyticus and has the genome represented by SEQ ID NO: 1, and a method for preventing or treating a disease caused by Vibrio parahaemolyticus using a composition containing the Myoviridae bacteriophage Vib-PAP-7 as an active ingredient.
    Type: Grant
    Filed: March 8, 2018
    Date of Patent: June 20, 2023
    Assignee: Intron Biotechnology, Inc.
    Inventors: Seong Jun Yoon, Soo Youn Jun, An Sung Kwon, Hyun Min Song, Eun Ji Lee, Sang Hyeon Kang
  • Patent number: 11677022
    Abstract: A semiconductor structure and a method for forming a semiconductor structure are provided. The semiconductor structure includes a substrate; a gate electrode disposed within the substrate; a gate dielectric layer disposed within the substrate and surrounding the gate electrode; a plurality of first protection structures disposed over the gate electrode; a second protection structure disposed over the gate dielectric layer; and a pair of source/drain regions on opposing sides of the gate dielectric layer.
    Type: Grant
    Filed: May 14, 2021
    Date of Patent: June 13, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Yi-Huan Chen, Chien-Chih Chou, Szu-Hsien Liu, Kong-Beng Thei, Huan-Chih Yuan, Jhu-Min Song
  • Publication number: 20230166419
    Abstract: Provided is a razor cartridge including: at least one razor blade having a cutting edge formed therein; a blade housing accommodating the at least one razor blade in a longitudinal direction; and a housing cover comprising a razor blade window and a window frame, the razor blade window through which at least a portion of the cutting edge is exposed, and the window frame which is formed to surround at least a portion of the razor blade window and detachably coupled to the blade housing. At least one of the blade housing and the housing cover includes a detachment part for separating at least a portion of the window frame from the housing cover by an external force.
    Type: Application
    Filed: November 23, 2022
    Publication date: June 1, 2023
    Inventors: Seung Min SONG, Young Jin LEE, Sung Hee SON, Sang Hun PARK
  • Patent number: 11640973
    Abstract: A semiconductor device and a fabricating method thereof are provided. The semiconductor device includes a substrate, a first nanowire spaced apart from a first region of the substrate, a first gate electrode surrounding a periphery of the first nanowire, a second nanowire spaced apart from a second region of the substrate and extending in a first direction and having a first width in a second direction intersecting the first direction, a supporting pattern contacting the second nanowire and positioned under the second nanowire, and a second gate electrode extending in the second direction and surrounding the second nanowire and the supporting pattern.
    Type: Grant
    Filed: October 22, 2021
    Date of Patent: May 2, 2023
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung Gil Yang, Dong Il Bae, Chang Woo Sohn, Seung Min Song, Dong Hun Lee
  • Publication number: 20230107147
    Abstract: A server for a vehicle-to-everything (V2X) service sets a device area comprising a plurality of V2X devices, and classifies the plurality of V2X devices within the device area into a plurality of device groups. The plurality of device groups have mutually different transmission periods.
    Type: Application
    Filed: July 1, 2020
    Publication date: April 6, 2023
    Applicant: LG ELECTRONICS INC.
    Inventors: Min SONG, Jiyoon OH, Hakseong KIM